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1. 发明授权

US07361631B2 Compositions for the removal of organic and inorganic residues 失效
标题翻译：用于去除有机和无机残留物的组合物
公开(公告)号：US07361631B2
公开(公告)日：2008-04-22
申请号：US10942290
申请日：2004-09-15
申请人： Matthew I. Egbe , Jennifer M. Rieker , Darryl W. Peters , Irl E. Ward
发明人： Matthew I. Egbe , Jennifer M. Rieker , Darryl W. Peters , Irl E. Ward
IPC分类号： C11D3/30
CPC分类号： C11D7/5022 , C11D3/0073 , C11D7/10 , C11D7/265 , C11D7/267 , C11D7/30 , C11D7/3218 , C11D7/3263 , C11D7/3281 , C11D7/5013 , C11D11/0047 , G03F7/422 , G03F7/425 , G03F7/426 , H01L2224/0381
摘要： A composition and method using same for removing photoresist and/or processing residue from a substrate are described herein. In one aspect, there is provided a composition for removing residue consisting essentially of: an acidic buffer solution having an acid selected from a carboxylic acid or a polybasic acid and an ammonium salt of the acid in a molar ratio of acid to ammonium salt ranging from 10:1 to 1:10; an organic polar solvent that is miscible in all proportions in water; a fluoride, and water wherein the composition has a pH ranging from about 3 to about 7.
摘要翻译：这里描述了一种用于从衬底去除光致抗蚀剂和/或处理残留物的组合物和方法。在一个方面，提供了一种用于除去残留物的组合物，其基本上由以下组成：酸性缓冲溶液，其具有选自羧酸或多元酸的酸和酸的铵盐，酸与铵盐的摩尔比为 10：1至1:10; 一种在水中以各种比例混溶的有机极性溶剂; 氟化物和水，其中所述组合物的pH为约3至约7。

2. 发明授权

US5709756A Basic stripping and cleaning composition 失效
标题翻译：基本剥离和清洗组合物
公开(公告)号：US5709756A
公开(公告)日：1998-01-20
申请号：US744013
申请日：1996-11-05
申请人： Irl E. Ward , Francis W. Michelotti , Darryl W. Peters
发明人： Irl E. Ward , Francis W. Michelotti , Darryl W. Peters
IPC分类号： C11D7/10 , C11D7/32 , C11D7/34 , C11D7/50 , C11D11/00 , G03F7/16 , G03F7/42 , H01L21/306 , H01L21/302 , B08B3/08
CPC分类号： G03F7/425 , C11D11/0047 , C11D7/10 , C11D7/3218 , C11D7/5009 , H01L21/02063 , C11D7/32 , C11D7/34 , G03F7/16 , Y10S438/906
摘要： An aqueous and basic stripping and cleaning composition is provided which contains a hydroxylamine, ammonium fluoride, water and optionally DMSO. The pH of the composition is greater than about 8. Also provided is a method of stripping and cleaning utilizing the compositions of the invention.
摘要翻译：提供含有羟胺，氟化铵，水和任选的DMSO的水性和碱性汽提和清洁组合物。组合物的pH大于约8.还提供了利用本发明组合物的汽提和清洗方法。

3. 发明授权

US06828289B2 Low surface tension, low viscosity, aqueous, acidic compositions containing fluoride and organic, polar solvents for removal of photoresist and organic and inorganic etch residues at room temperature 有权
标题翻译：低表面张力，低粘度，水性，含氟化物和有机物的酸性组合物，用于去除光致抗蚀剂的极性溶剂和室温下的有机和无机蚀刻残留物
公开(公告)号：US06828289B2
公开(公告)日：2004-12-07
申请号：US09238851
申请日：1999-01-27
申请人： Darryl W. Peters , Irl E. Ward
发明人： Darryl W. Peters , Irl E. Ward
IPC分类号： C11D330
CPC分类号： C11D7/5022 , C11D3/0073 , C11D7/10 , C11D7/265 , C11D7/267 , C11D7/30 , C11D7/3218 , C11D7/3263 , C11D7/3281 , C11D7/5013 , C11D11/0047 , G03F7/422 , G03F7/425 , G03F7/426 , H01L2224/0381
摘要： The present invention relates to compositions useful in removing photoresist and organic and inorganic residues and processes for removal of photoresists and etch residues. The compositions are aqueous, acidic compositions containing fluoride and organic polar solvents. The compositions are free of glycols and have a low surface tension and viscosity. Corrosion inhibitors are optionally present.
摘要翻译：本发明涉及可用于除去光致抗蚀剂和有机和无机残余物的组合物以及用于除去光刻胶和蚀刻残留物的方法。组合物是包含氟化物和有机极性溶剂的水性酸性组合物。组合物不含二醇并具有低表面张力和粘度。任选存在腐蚀抑制剂。

4. 发明授权

US5698503A Stripping and cleaning composition 失效
标题翻译：剥离和清洗组合物
公开(公告)号：US5698503A
公开(公告)日：1997-12-16
申请号：US745754
申请日：1996-11-08
申请人： Irl E. Ward , Francis W. Michelotti , Darryl W. Peters
发明人： Irl E. Ward , Francis W. Michelotti , Darryl W. Peters
IPC分类号： C09K13/08 , C11D7/08 , C11D7/26 , C11D7/32 , C11D7/34 , C11D7/50 , G03F7/42 , B08B3/08
CPC分类号： C11D7/261 , C09K13/08 , C11D7/08 , C11D7/5009 , C11D7/5013 , C11D7/5022 , G03F7/422 , G03F7/426 , C11D7/265 , C11D7/32 , C11D7/34
摘要： An aqueous and acidic stripping and cleaning composition is provided which contains a polyhydric alcohol, ammonium fluoride, dimethylsulfoxide and water. The pH of the composition is greater than about 4 but less than 7. Also provided is a method of stripping and cleaning utilizing the compositions of the invention. Optionally, the composition may contain a phosphate buffer.
摘要翻译：提供含有多元醇，氟化铵，二甲基亚砜和水的水性和酸性剥离和清洗组合物。组合物的pH大于约4但小于7.还提供了利用本发明组合物进行汽提和清洗的方法。任选地，组合物可以含有磷酸盐缓冲液。

5. 发明授权

US5997658A Aqueous stripping and cleaning compositions 失效
标题翻译：水性剥离和清洁组合物
公开(公告)号：US5997658A
公开(公告)日：1999-12-07
申请号：US4937
申请日：1998-01-09
申请人： Darryl W. Peters , Irl E. Ward , Francis Michelotti , Floyd Riddle, Jr.
发明人： Darryl W. Peters , Irl E. Ward , Francis Michelotti , Floyd Riddle, Jr.
IPC分类号： C09D9/00 , C11D3/20 , C11D3/28 , C11D3/30 , C11D11/00 , C23G1/20 , G03F7/42 , H01L21/306 , B08B7/00
CPC分类号： G03F7/425 , C09D9/00 , C11D11/0047 , C11D3/2086 , C11D3/2093 , C11D3/28 , C11D3/30 , C23G1/20 , H01L21/02063
摘要： An aqueous stripping composition comprising a mixture of an organic amine and a corrosion inhibitor which is benzotriazole alone or in combination with gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper or titanium containing substrates.
摘要翻译：包含有机胺和腐蚀抑制剂的混合物的水性剥离组合物，其是单独的苯并三唑或与没食子酸，其酯或类似物组合的苯并三唑。剥离组合物有效地剥离光致抗蚀剂，在低温下与有机光致抗蚀剂膜结合或排除有机光致抗蚀剂薄膜的等离子体工艺产生的有机，金属 - 有机材料，无机盐，氧化物，氢氧化物或复合物的残余物，几乎不含铜或含钛底物的腐蚀。

6. 发明授权

US6054422A Cutting and lubricating composition for use with a wire cutting apparatus 失效
标题翻译：用于线切割设备的切割和润滑组合物
公开(公告)号：US6054422A
公开(公告)日：2000-04-25
申请号：US252543
申请日：1999-02-19
申请人： Irl E. Ward , Phuong Tang
发明人： Irl E. Ward , Phuong Tang
IPC分类号： B24B57/02 , B24B37/00 , C10M105/18 , C10M107/34 , C10M125/02 , C10M125/08 , C10M125/10 , C10M125/26 , C10M129/06 , C10M129/16 , C10M129/24 , C10M129/70 , C10M133/06 , C10M133/16 , C10M133/44 , C10M135/08 , C10M145/14 , C10M145/40 , C10M169/04 , C10N10/06 , C10N10/12 , C10N20/04 , C10N20/06 , C10N30/00 , C10N40/00 , C10N40/22 , C10M111/04
CPC分类号： C10M169/041 , C10M107/34 , C10M2201/00 , C10M2201/061 , C10M2201/062 , C10M2201/087 , C10M2201/10 , C10M2201/102 , C10M2201/105 , C10M2201/16 , C10M2201/18 , C10M2207/02 , C10M2207/021 , C10M2207/04 , C10M2207/046 , C10M2207/08 , C10M2207/125 , C10M2207/129 , C10M2207/28 , C10M2209/084 , C10M2209/103 , C10M2209/1033 , C10M2209/104 , C10M2209/1045 , C10M2209/105 , C10M2209/1055 , C10M2209/106 , C10M2209/1065 , C10M2209/1075 , C10M2209/1085 , C10M2209/1095 , C10M2209/12 , C10M2215/02 , C10M2215/04 , C10M2215/042 , C10M2215/06 , C10M2215/064 , C10M2215/065 , C10M2215/066 , C10M2215/067 , C10M2215/068 , C10M2215/08 , C10M2215/082 , C10M2215/086 , C10M2215/12 , C10M2215/122 , C10M2215/22 , C10M2215/221 , C10M2215/223 , C10M2215/224 , C10M2215/225 , C10M2215/226 , C10M2215/26 , C10M2215/28 , C10M2215/30 , C10M2217/04 , C10M2219/04 , C10M2219/042 , C10M2219/044 , C10M2223/06 , C10M2223/061 , C10M2223/065 , C10N2240/401
摘要： A lubricating composition which may contain up to 70 weight percent abrasive grit material for use with wire saw and slicing apparatus for cutting or slicing hard and brittle materials. The composition contains abrasive particles suspended in a mixture of high and low molecular weight polyalkylene glycols and a suspension agent. The viscosity of the composition is about 50 to 700 cps.
摘要翻译：一种润滑组合物，其可以含有高达70重量％的磨料砂粒材料，用于线锯和切割装置，用于切割或切割硬和脆性材料。该组合物含有悬浮在高分子量低分子量聚亚烷基二醇和悬浮剂混合物中的磨料颗粒。组合物的粘度为约50至700cps。

7. 发明授权

US5417877A Organic stripping composition 失效
标题翻译：有机剥离组合物
公开(公告)号：US5417877A
公开(公告)日：1995-05-23
申请号：US983257
申请日：1992-11-30
申请人： Irl E. Ward
发明人： Irl E. Ward
IPC分类号： C09K15/04 , C09D9/00 , G03F7/42 , H01L21/027 , H01L21/30
CPC分类号： C09D9/005 , G03F7/425
摘要： Organic stripping composition for photoresists comprising organic polar solvents and basic amines which includes an inhibitor which forms a coordination complex with a metal.
摘要翻译：用于光刻胶的有机剥离组合物包括有机极性溶剂和碱性胺，其包括与金属形成配位络合物的抑制剂。

8. 发明授权

US5244952A Polyvinyl butyral pellicle compositions 失效
标题翻译：聚乙烯醇缩丁醛防护薄膜组合物
公开(公告)号：US5244952A
公开(公告)日：1993-09-14
申请号：US694343
申请日：1991-05-01
申请人： Irl E. Ward
发明人： Irl E. Ward
IPC分类号： C08F8/28 , C08J3/09 , G03F1/62
CPC分类号： C08J3/096 , C08J5/18 , G03F1/62 , C08J2329/14
摘要： An improved pellicle for use in projection printing comprises a pellicle in which the transparent film is formed from a specific polyvinyl butyral resin from a casting composition which is a mixture of the specific polyvinyl butyral resin and dimethylformamide.
摘要翻译：用于投影印刷的改进的防护薄膜组件包括防护薄膜，其中透明膜由特定的聚乙烯醇缩丁醛树脂由特定的聚乙烯醇缩丁醛树脂和二甲基甲酰胺的混合物的浇铸组合物形成。

9. 发明授权

US4584727A Sofa bed spring improvements 失效
标题翻译：沙发床弹簧改进
公开(公告)号：US4584727A
公开(公告)日：1986-04-29
申请号：US623089
申请日：1984-06-21
申请人： Bernard Reiss , Irl E. Ward
发明人： Bernard Reiss , Irl E. Ward
IPC分类号： A47C17/22 , A47C17/23 , A47C17/04 , A47C19/00
CPC分类号： A47C17/23 , A47C17/225
摘要： A sofa bed has a stationary framework and a foldable bed frame connected to and foldable into the framework, the foldable frame having an outer section connected to and pivotal relative to a body section, the outer section overlying the body section in the folded position of the frame to form a seat. The outer section has a plurality of individual seat support elements extending thereacross transversely to the sofa back. The individual elements are spaced apart in a direction parallel to that axis, and each of the individual elements is downwardly deflectable independently of the other when a person sits on said seat, and is arched so that a concavity is formed in the sofa form for the sofa cushions, and as that the mattress is compressed. A spring edge is mounted on and extends above a front rail of the stationary framework to form the front supporting edge of the seat.
摘要翻译：沙发床具有固定框架和连接到框架上并可折叠到框架中的可折叠床架，所述可折叠框架具有连接到主体部分并且可相对于主体部分枢转的外部部分，所述外部部分覆盖所述主体部分的折叠位置框架形成一个座位。外部部分具有多个单独的座椅支撑元件，其横向于沙发背面延伸。各个元件在平行于该轴线的方向上间隔开，并且当人坐在所述座椅上时，每个单独的元件可以独立于另一个独立地向下偏转，并且是拱形的，使得以沙发形式形成凹部，用于沙发垫，以及床垫被压缩。弹簧边缘安装在固定框架的前导轨上并在其上方延伸以形成座椅的前支撑边缘。

10. 发明授权

US07727420B2 Corrosion inhibiting compositions 失效
标题翻译：腐蚀抑制组合物
公开(公告)号：US07727420B2
公开(公告)日：2010-06-01
申请号：US11130768
申请日：2005-05-17
申请人： Irl E. Ward
发明人： Irl E. Ward
IPC分类号： C23F11/10
CPC分类号： C11D3/0084 , C09G1/02 , C11D3/3765 , C11D7/26
摘要： Corrosion inhibiting composition for use in aqueous or semi-aqueous stripping, cleaning, abrasive lapping and abrasive slurry compositions that form 5, 6, 7, or 8-membered chelating rings with a base metal together with a film forming polymeric chelation agent. Optionally there is included an oxygen scavenger.
摘要翻译：用于水性或半水性剥离，清洁，磨料研磨和磨料浆料组合物中的腐蚀抑制组合物，其与基底金属一起形成5,6,7或8元螯合环以及成膜聚合物螯合剂。任选地，包括除氧剂。

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