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1. 发明授权

US5997658A Aqueous stripping and cleaning compositions 失效
标题翻译：水性剥离和清洁组合物
公开(公告)号：US5997658A
公开(公告)日：1999-12-07
申请号：US4937
申请日：1998-01-09
申请人： Darryl W. Peters , Irl E. Ward , Francis Michelotti , Floyd Riddle, Jr.
发明人： Darryl W. Peters , Irl E. Ward , Francis Michelotti , Floyd Riddle, Jr.
IPC分类号： C09D9/00 , C11D3/20 , C11D3/28 , C11D3/30 , C11D11/00 , C23G1/20 , G03F7/42 , H01L21/306 , B08B7/00
CPC分类号： G03F7/425 , C09D9/00 , C11D11/0047 , C11D3/2086 , C11D3/2093 , C11D3/28 , C11D3/30 , C23G1/20 , H01L21/02063
摘要： An aqueous stripping composition comprising a mixture of an organic amine and a corrosion inhibitor which is benzotriazole alone or in combination with gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper or titanium containing substrates.
摘要翻译：包含有机胺和腐蚀抑制剂的混合物的水性剥离组合物，其是单独的苯并三唑或与没食子酸，其酯或类似物组合的苯并三唑。剥离组合物有效地剥离光致抗蚀剂，在低温下与有机光致抗蚀剂膜结合或排除有机光致抗蚀剂薄膜的等离子体工艺产生的有机，金属 - 有机材料，无机盐，氧化物，氢氧化物或复合物的残余物，几乎不含铜或含钛底物的腐蚀。

2. 发明授权

US06828289B2 Low surface tension, low viscosity, aqueous, acidic compositions containing fluoride and organic, polar solvents for removal of photoresist and organic and inorganic etch residues at room temperature 有权
标题翻译：低表面张力，低粘度，水性，含氟化物和有机物的酸性组合物，用于去除光致抗蚀剂的极性溶剂和室温下的有机和无机蚀刻残留物
公开(公告)号：US06828289B2
公开(公告)日：2004-12-07
申请号：US09238851
申请日：1999-01-27
申请人： Darryl W. Peters , Irl E. Ward
发明人： Darryl W. Peters , Irl E. Ward
IPC分类号： C11D330
CPC分类号： C11D7/5022 , C11D3/0073 , C11D7/10 , C11D7/265 , C11D7/267 , C11D7/30 , C11D7/3218 , C11D7/3263 , C11D7/3281 , C11D7/5013 , C11D11/0047 , G03F7/422 , G03F7/425 , G03F7/426 , H01L2224/0381
摘要： The present invention relates to compositions useful in removing photoresist and organic and inorganic residues and processes for removal of photoresists and etch residues. The compositions are aqueous, acidic compositions containing fluoride and organic polar solvents. The compositions are free of glycols and have a low surface tension and viscosity. Corrosion inhibitors are optionally present.
摘要翻译：本发明涉及可用于除去光致抗蚀剂和有机和无机残余物的组合物以及用于除去光刻胶和蚀刻残留物的方法。组合物是包含氟化物和有机极性溶剂的水性酸性组合物。组合物不含二醇并具有低表面张力和粘度。任选存在腐蚀抑制剂。

3. 发明授权

US5698503A Stripping and cleaning composition 失效
标题翻译：剥离和清洗组合物
公开(公告)号：US5698503A
公开(公告)日：1997-12-16
申请号：US745754
申请日：1996-11-08
申请人： Irl E. Ward , Francis W. Michelotti , Darryl W. Peters
发明人： Irl E. Ward , Francis W. Michelotti , Darryl W. Peters
IPC分类号： C09K13/08 , C11D7/08 , C11D7/26 , C11D7/32 , C11D7/34 , C11D7/50 , G03F7/42 , B08B3/08
CPC分类号： C11D7/261 , C09K13/08 , C11D7/08 , C11D7/5009 , C11D7/5013 , C11D7/5022 , G03F7/422 , G03F7/426 , C11D7/265 , C11D7/32 , C11D7/34
摘要： An aqueous and acidic stripping and cleaning composition is provided which contains a polyhydric alcohol, ammonium fluoride, dimethylsulfoxide and water. The pH of the composition is greater than about 4 but less than 7. Also provided is a method of stripping and cleaning utilizing the compositions of the invention. Optionally, the composition may contain a phosphate buffer.
摘要翻译：提供含有多元醇，氟化铵，二甲基亚砜和水的水性和酸性剥离和清洗组合物。组合物的pH大于约4但小于7.还提供了利用本发明组合物进行汽提和清洗的方法。任选地，组合物可以含有磷酸盐缓冲液。

4. 发明授权

US07361631B2 Compositions for the removal of organic and inorganic residues 失效
标题翻译：用于去除有机和无机残留物的组合物
公开(公告)号：US07361631B2
公开(公告)日：2008-04-22
申请号：US10942290
申请日：2004-09-15
申请人： Matthew I. Egbe , Jennifer M. Rieker , Darryl W. Peters , Irl E. Ward
发明人： Matthew I. Egbe , Jennifer M. Rieker , Darryl W. Peters , Irl E. Ward
IPC分类号： C11D3/30
CPC分类号： C11D7/5022 , C11D3/0073 , C11D7/10 , C11D7/265 , C11D7/267 , C11D7/30 , C11D7/3218 , C11D7/3263 , C11D7/3281 , C11D7/5013 , C11D11/0047 , G03F7/422 , G03F7/425 , G03F7/426 , H01L2224/0381
摘要： A composition and method using same for removing photoresist and/or processing residue from a substrate are described herein. In one aspect, there is provided a composition for removing residue consisting essentially of: an acidic buffer solution having an acid selected from a carboxylic acid or a polybasic acid and an ammonium salt of the acid in a molar ratio of acid to ammonium salt ranging from 10:1 to 1:10; an organic polar solvent that is miscible in all proportions in water; a fluoride, and water wherein the composition has a pH ranging from about 3 to about 7.
摘要翻译：这里描述了一种用于从衬底去除光致抗蚀剂和/或处理残留物的组合物和方法。在一个方面，提供了一种用于除去残留物的组合物，其基本上由以下组成：酸性缓冲溶液，其具有选自羧酸或多元酸的酸和酸的铵盐，酸与铵盐的摩尔比为 10：1至1:10; 一种在水中以各种比例混溶的有机极性溶剂; 氟化物和水，其中所述组合物的pH为约3至约7。

5. 发明授权

US5709756A Basic stripping and cleaning composition 失效
标题翻译：基本剥离和清洗组合物
公开(公告)号：US5709756A
公开(公告)日：1998-01-20
申请号：US744013
申请日：1996-11-05
申请人： Irl E. Ward , Francis W. Michelotti , Darryl W. Peters
发明人： Irl E. Ward , Francis W. Michelotti , Darryl W. Peters
IPC分类号： C11D7/10 , C11D7/32 , C11D7/34 , C11D7/50 , C11D11/00 , G03F7/16 , G03F7/42 , H01L21/306 , H01L21/302 , B08B3/08
CPC分类号： G03F7/425 , C11D11/0047 , C11D7/10 , C11D7/3218 , C11D7/5009 , H01L21/02063 , C11D7/32 , C11D7/34 , G03F7/16 , Y10S438/906
摘要： An aqueous and basic stripping and cleaning composition is provided which contains a hydroxylamine, ammonium fluoride, water and optionally DMSO. The pH of the composition is greater than about 8. Also provided is a method of stripping and cleaning utilizing the compositions of the invention.
摘要翻译：提供含有羟胺，氟化铵，水和任选的DMSO的水性和碱性汽提和清洁组合物。组合物的pH大于约8.还提供了利用本发明组合物的汽提和清洗方法。

6. 发明申请

US20110039485A1 Apertured Abrasive Disk Assembly With Improved Flow Dynamics 审中-公开
标题翻译：具有改进的流动动力学的有孔磨料组件
公开(公告)号：US20110039485A1
公开(公告)日：2011-02-17
申请号：US12817461
申请日：2010-06-17
申请人： Stephen J. Benner , Darryl W. Peters
发明人： Stephen J. Benner , Darryl W. Peters
IPC分类号： B24B27/00
CPC分类号： B24D7/10 , B24B55/06
摘要： The evacuation properties of an abrasive disk are improved by forming its apertures to exhibit a configuration that will direct process fluids onto or away from a workpiece (or contact) interface through capillary action, surface tension/affinity, and/or boundary layer pump actions. The capillary action is accomplished by modifying the geometries of the apertures to form capillary tubes, where the orientation and lift angle of the capillary tubes is controlled to improve the flow of relatively thin layers of liquids. The surface tension/affinity between a liquid material and the abrasive disk is controlled by modifying the through-hole apertures to exhibit a serrated inner surface, which will decrease the attraction between the material of the abrasive disk and the process liquid. A plurality of apertured disks may be stacked, and their respective apertures properly arranged on each surface, to create a Tesla pump such that the kinetic energy associated with rotation of the disk assembly will preferentially bias both the vertical and tangential flow of liquids between the working surface and the disk assembly.
摘要翻译：研磨盘的排出性能通过形成其孔而改善，以形成将通过毛细管作用，表面张力/亲合性和/或边界层泵作用将工艺流体引导到工件（或接触）界面或远离工件（或接触）界面的构型。通过改变孔的几何形状以形成毛细管来实现毛细管作用，其中毛细管的取向和提升角度被控制以改善相对薄的液体层的流动。液体材料和研磨盘之间的表面张力/亲合力通过改变通孔孔而显示出锯齿状的内表面来控制，这将减小研磨盘的材料与处理液体之间的吸引力。可以堆叠多个有孔的盘，并且它们各自的孔适当地布置在每个表面上，以产生特斯拉泵，使得与盘组件的旋转相关联的动能优先偏置工作之间的液体的垂直和切向流动表面和盘组件。

7. 发明申请

US20110015108A1 Aqueous Buffered Fluoride-Containing Etch Residue Removers and Cleaners 审中-公开
标题翻译：含氟缓冲氟化物除垢剂和清洁剂
公开(公告)号：US20110015108A1
公开(公告)日：2011-01-20
申请号：US12893639
申请日：2010-09-29
申请人： Roberto J. Rovito , Jennifer M. Rieker , Darryl W. Peters
发明人： Roberto J. Rovito , Jennifer M. Rieker , Darryl W. Peters
IPC分类号： G03F7/42
CPC分类号： C11D7/28 , C11D7/263 , C11D7/267 , C11D7/3209 , C11D7/3281 , C11D7/34 , C11D7/5004
摘要： The invention relates to aqueous, buffered, fluoride containing compositions having a pH of greater than 7.0 to about 11.0. In certain embodiments, the buffered compositions have an extended worklife because pH dependent attributes such as oxide and metal etch rates are stable so long as the pH remains stable.
摘要翻译：本发明涉及pH大于7.0至约11.0的含水，缓冲，含氟化物的组合物。在某些实施方案中，缓冲的组合物具有延长的工作寿命，因为pH依赖性属性如氧化物和金属蚀刻速率是稳定的，只要pH保持稳定。

8. 发明申请

US20080076688A1 Copper passivating post-chemical mechanical polishing cleaning composition and method of use 审中-公开
标题翻译：铜钝化后化学机械抛光清洗组合物及其使用方法
公开(公告)号：US20080076688A1
公开(公告)日：2008-03-27
申请号：US11524619
申请日：2006-09-21
申请人： Jeffrey A. Barnes , Elizabeth Walker , Darryl W. Peters , Kyle Bartosh , Ewa R. Oldak , Kevin P. Yanders
发明人： Jeffrey A. Barnes , Elizabeth Walker , Darryl W. Peters , Kyle Bartosh , Ewa R. Oldak , Kevin P. Yanders
IPC分类号： B08B7/00 , C11D7/32
CPC分类号： C11D11/0047 , C11D3/0042 , C11D3/2079 , C11D3/28 , C11D3/30 , C11D3/34 , C11D7/265 , C11D7/32 , C11D7/3209 , C11D7/3218 , C11D7/3281 , C11D7/34 , C11D7/36 , H01L21/02063 , H01L21/02074
摘要： Alkaline aqueous cleaning compositions and processes for cleaning post-chemical mechanical polishing (CMP) residue, post-etch residue and/or contaminants from a microelectronic device having said residue and contaminants thereon. The alkaline aqueous cleaning compositions include amine, passivating agent, and water. The composition achieves highly efficacious cleaning of the residue and contaminant material from the microelectronic device while simultaneously passivating the metal interconnect material.
摘要翻译：碱性水性清洁组合物和用于从具有所述残留物和污染物的微电子装置清洁化学后机械抛光（CMP）残留物，蚀刻后残留物和/或污染物的方法。碱性水性清洗组合物包括胺，钝化剂和水。该组合物可实现对微电子器件的残留物和污染物质的高效清洁，同时钝化金属互连材料。

9. 发明授权

US07922823B2 Compositions for processing of semiconductor substrates 有权
标题翻译：用于处理半导体衬底的组合物
公开(公告)号：US07922823B2
公开(公告)日：2011-04-12
申请号：US11814714
申请日：2006-01-26
申请人： Elizabeth Walker , Shahri Naghshineh , Jeffrey A. Barnes , Ewa Oldak , Darryl W. Peters , Kevin P. Yanders
发明人： Elizabeth Walker , Shahri Naghshineh , Jeffrey A. Barnes , Ewa Oldak , Darryl W. Peters , Kevin P. Yanders
IPC分类号： C11D7/32
CPC分类号： H01L21/02071 , C11D7/06 , C11D7/26 , C11D7/264 , C11D7/265 , C11D7/32 , C11D7/3218 , C11D11/0047 , H01L21/02063 , H01L21/02068 , H01L21/02074
摘要： Compositions useful in microelectronic device manufacturing for surface preparation and/or cleaning of wafer substrates such as microelectronic device precursor structures. The compositions can be employed for processing of wafers that have, or are intended to be further processed to include, copper metallization, e.g., in operations such as surface preparation, pre-plating cleaning, post-etching cleaning, and post-chemical mechanical polishing cleaning of microelectronic device wafers. The compositions contain (i) alkanolamine, (ii) quaternary ammonium hydroxide and (iii) a complexing agent, and are storage-stable, as well as non-darkening and degradation-resistant in exposure to oxygen.
摘要翻译：用于微电子器件制造用于诸如微电子器件前体结构的晶片衬底的表面制备和/或清洁的组合物。组合物可用于处理具有或将要进一步加工以包括铜金属化的晶片，例如在诸如表面处理，预镀清洗，后蚀刻清洁和后化学机械抛光清洁微电子器件晶圆。组合物包含（i）链烷醇胺，（ii）季铵氢氧化物和（iii）络合剂，并且是储存稳定的，以及在暴露于氧气时不变暗和降解。

10. 发明授权

US07807613B2 Aqueous buffered fluoride-containing etch residue removers and cleaners 有权
标题翻译：含水缓冲氟化物的蚀刻残渣去除剂和清洁剂
公开(公告)号：US07807613B2
公开(公告)日：2010-10-05
申请号：US10877305
申请日：2004-06-25
申请人： Roberto J. Rovito , Jennifer M. Rieker , Darryl W. Peters
发明人： Roberto J. Rovito , Jennifer M. Rieker , Darryl W. Peters
IPC分类号： C11D7/50
CPC分类号： C11D7/28 , C11D7/263 , C11D7/267 , C11D7/3209 , C11D7/3281 , C11D7/34 , C11D7/5004
摘要： The invention relates to aqueous, buffered, fluoride containing compositions having a pH of greater than 7.0 to about 11.0. In certain embodiments, the buffered compositions have an extended worklife because pH dependent attributes such as oxide and metal etch rates are stable so long as the pH remains stable.
摘要翻译：本发明涉及pH大于7.0至约11.0的含水，缓冲，含氟化物的组合物。在某些实施方案中，缓冲的组合物具有延长的工作寿命，因为pH依赖性属性如氧化物和金属蚀刻速率是稳定的，只要pH保持稳定。

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