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    • 1. 发明申请
    • ISOLATED FULLY DEPLETED SILICON-ON-INSULATOR REGIONS BY SELECTIVE ETCH
    • 通过选择性蚀刻分离完全绝缘的绝缘体绝缘体区域
    • US20070128776A1
    • 2007-06-07
    • US11670262
    • 2007-02-01
    • Matthew BreitwischChung LamRandy MannDale Martin
    • Matthew BreitwischChung LamRandy MannDale Martin
    • H01L21/84H01L27/12H01L29/00
    • H01L21/764H01L21/76283H01L21/76289H01L29/78654
    • The present invention provides a method of forming an ultra-thin and uniform layer of Si including the steps of providing a substrate having semiconducting regions separated by insulating regions; implanting dopants into the substrate to provide an etch differential doped portion in the semiconducting regions underlying an upper Si-containing surface of the semiconducting regions; forming a trench in the substrate including the semiconducting regions and the insulating regions; removing the etch differential doped portion from the semiconductor regions to produce a cavity underlying the upper surface of the semiconducting regions; and filling the trench with a trench dielectric, wherein the trench dielectric material encloses the cavity underlying the upper Si-containing surface of the semiconducting regions. The upper Si-containing surface of the semiconducting regions has a uniform thickness of less than about 100 Å.
    • 本发明提供一种形成超薄且均匀的Si层的方法,包括以下步骤:提供具有由绝缘区分隔开的半导体区域的衬底; 将掺杂剂注入衬底中以在半导体区域的上部含Si表面下方的半导体区域中提供蚀刻差分掺杂部分; 在包括半导体区域和绝缘区域的衬底中形成沟槽; 从所述半导体区域去除所述蚀刻差分掺杂部分以在所述半导体区域的上表面下方形成空腔; 以及用沟槽电介质填充所述沟槽,其中所述沟槽电介质材料包围在所述半导体区域的所述上部含Si表面之下的空腔。 半导体区域的上部含Si表面具有小于约的均匀厚度。
    • 2. 发明申请
    • Isolated fully depleted silicon-on-insulator regions by selective etch
    • 通过选择性蚀刻隔离完全耗尽的绝缘体上硅区域
    • US20060027889A1
    • 2006-02-09
    • US10710821
    • 2004-08-05
    • Matthew BreitwischChung LamRandy MannDale Martin
    • Matthew BreitwischChung LamRandy MannDale Martin
    • H01L29/06H01L21/76
    • H01L21/764H01L21/76283H01L21/76289H01L29/78654
    • The present invention provides a method of forming an ultra-thin and uniform layer of Si including the steps of providing a substrate having semiconducting regions separated by insulating regions; implanting dopants into the substrate to provide an etch differential doped portion in the semiconducting regions underlying an upper Si-containing surface of the semiconducting regions; forming a trench in the substrate including the semiconducting regions and the insulating regions; removing the etch differential doped portion from the semiconductor regions to produce a cavity underlying the upper surface of the semiconducting regions; and filling the trench with a trench dielectric, wherein the trench dielectric material encloses the cavity underlying the upper Si-containing surface of the semiconducting regions. The upper Si-containing surface of the semiconducting regions has a uniform thickness of less than about 100 Å.
    • 本发明提供一种形成超薄且均匀的Si层的方法,包括以下步骤:提供具有由绝缘区分隔开的半导体区域的衬底; 将掺杂剂注入衬底中以在半导体区域的上部含Si表面下方的半导体区域中提供蚀刻差分掺杂部分; 在包括半导体区域和绝缘区域的衬底中形成沟槽; 从所述半导体区域移除所述蚀刻差分掺杂部分以产生位于所述半导体区域的上表面下方的空腔; 以及用沟槽电介质填充所述沟槽,其中所述沟槽电介质材料包围在所述半导体区域的所述上部含Si表面下面的空腔。 半导体区域的上部含Si表面具有小于约的均匀厚度。
    • 6. 发明申请
    • Electrolysis process and cell for use in same
    • 电解过程和电池用于其中
    • US20060091017A1
    • 2006-05-04
    • US10531862
    • 2003-10-21
    • Chung Lam
    • Chung Lam
    • C25D5/18C25C7/02
    • C25C1/00C22B15/0063C25C1/12C25C5/02C25C7/02C25C7/08Y02P10/236
    • An electrolysis process for the recovery of metal from an aqueous solution is defined. On electrolysing the solution metal is caused to deposit on a deposition surface of a cathode. The process includes the step of inducing a non-uniform current density across the deposition surface so as to form areas of high current density interspaced by areas of low current density. The difference between the areas of high current density and low current density is sufficient to cause metal deposition to be concentrated on the areas of high current density so as to promote non-uniform deposition of metal across the deposition surface. An electrolysis cell for the electro-recovery of metal from an aqueous solution is also defined. The cell includes a cathode which includes a deposition surface on which metal is deposited on electrolysing of the aqueous solution. In operation of the cell, the deposition surface has a non-uniform electrical field having areas of strong electrical field interspaced by areas of weak electrical field. The difference between the areas of strong electrical field and weak electrical field is sufficient to cause metal deposition to be concentrated on the areas of high electrical field so as to promote non-uniform deposition of metal on the surface.
    • 定义了从水溶液中回收金属的电解方法。 在电解时,使溶液金属沉积在阴极的沉积表面上。 该方法包括在沉积表面上引起不均匀电流密度的步骤,以形成由低电流密度的区域间隔的高电流密度的区域。 高电流密度和低电流密度的区域之间的差异足以使金属沉积集中在高电流密度的区域上,从而促使金属在沉积表面上的不均匀沉积。 还定义了用于从水溶液中电还原金属的电解槽。 该电池包括阴极,其包含沉积表面,在该沉积表面上电解水溶液时沉积金属。 在电池的操作中,沉积表面具有不均匀的电场,其具有由弱电场区域间隔的强电场区域。 强电场和弱电场的区域之间的差异足以使金属沉积集中在高电场的区域,以促进金属在表面上的不均匀沉积。
    • 10. 发明授权
    • Batteryless, osciliatorless, analog time cell usable as an horological device with associated programming methods and devices
    • 无电池,无振荡器,模拟时间单元可用作具有相关编程方法和设备的钟表装置
    • US06831879B1
    • 2004-12-14
    • US09703335
    • 2000-10-31
    • Viktors BerstisPeter Juergen KlimChung Lam
    • Viktors BerstisPeter Juergen KlimChung Lam
    • G04F1000
    • G04G99/00G04F10/10
    • A simple electronic horological device, termed a time cell, is presented with associated methods, systems, and computer program products. A time cell has an insulated, charge storage element that receives an electrostatic charge through its insulating medium, i.e. it is programmed. Over time, the charge storage element then loses the charge through its insulating medium. Given the reduction of the electric potential of the programmed charge storage element at a substantially known discharge rate, and by observing the potential of the programmed charge storage element at a given point in time, an elapsed time period can be determined. Thus, the time cell measures an elapsed time period without a continuous power source. One type of time cell is an analog time cell that may have a form similar to a non-volatile memory cell, particularly a floating gate field effect transistor (FGFET). The time cell may have an expanded floating gate for storing an electrostatic charge. At a given point in time after programming the analog time cell, a sensing operation indirectly observes the retained charge in the floating gate by directly or indirectly observing the threshold voltage of the FGFET. By knowing the operational characteristics of the time cell and its initial programming condition, the observation can be converted into an elapsed time value. A time cell can be designed and/or programmed to select the range of time to be measured.
    • 被称为时间单元的简单的电子钟表装置被提供有相关的方法,系统和计算机程序产品。 时间单元具有绝缘的电荷存储元件,其通过其绝缘介质接收静电电荷,即它被编程。 随着时间的推移,电荷存储元件然后通过其绝缘介质失去电荷。 考虑到以基本上已知的放电速率减小编程电荷存储元件的电位,并且通过在给定时间点观察编程电荷存储元件的电位,可以确定经过的时间段。 因此,时间单元测量没有连续电源的经过时间段。 一种类型的时间单元是模拟时间单元,其可以具有类似于非易失性存储单元,特别是浮动栅场效应晶体管(FGFET)的形式。 时间单元可以具有用于存储静电电荷的扩展浮动栅极。 在对模拟时间单元进行编程之后的给定时间点,感测操作通过直接或间接观察FGFET的阈值电压间接地观察浮动栅极中的保留电荷。 通过了解时间单元的操作特性及其初始编程条件,可以将观测值转换为经过的时间值。 时间单元可以被设计和/或编程以选择待测量的时间范围。