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    • 9. 发明授权
    • Wet/dry vacuum drain system
    • 湿/干式真空排水系统
    • US06347429B1
    • 2002-02-19
    • US09369950
    • 1999-08-06
    • David R. HultJeffrey L. Young
    • David R. HultJeffrey L. Young
    • A47L900
    • A47L7/0042A47L5/365A47L7/0038A47L9/009
    • A drain system for a wet/dry vacuum, including: a generally U-shaped dolly having wheels mounted thereon for rotation; a collection drum having an inside bottom surface defining a plane, the collection drum adapted to be mounted to the dolly; a drain opening defined by the collection drum, the drain opening defines an inside lower surface, the inside lower surface generally in line with the plane defined by the inside bottom surface of the collection drum and the drain opening being positioned generally opposite the closed end of the U-shaped dolly; and a cap having first and second ends, the first end adapted to mate with the drain opening in a sealed manner, the second end defines a member adapted to extend out from the collection drum, the member has a length sufficient to prevent the collection drum from completely tipping over.
    • 一种用于湿/干真空的排水系统,包括:具有安装在其上用于旋转的轮的大致U形台车; 收集鼓,其具有限定平面的内底表面,所述收集鼓适于安装到所述台车上; 由收集鼓限定的排水开口,排放口限定内侧下表面,内侧下表面大体上与由收集鼓的内底表面限定的平面对齐,而排水口大致相对于收集鼓的封闭端 U形台车; 以及盖,其具有第一和第二端,所述第一端适于以密封方式与所述排放开口配合,所述第二端限定适于从所述收集鼓延伸出的构件,所述构件的长度足以防止所述收集鼓 从完全翻转过来。
    • 10. 发明授权
    • Method and apparatus for forming a borophosphosilicate film
    • 用于形成硼磷硅酸盐膜的方法和装置
    • US06345589B1
    • 2002-02-12
    • US09148436
    • 1998-09-04
    • Chandrasekaram RamiahJeffrey L. YoungNeil L. Pagel
    • Chandrasekaram RamiahJeffrey L. YoungNeil L. Pagel
    • C23C1600
    • C23C16/505C23C16/401
    • A method and apparatus for improving film stability and moisture resistance of a borophosphosilicate film. The BPSG film according to the present invention is formed under plasma conditions in which high and low frequency RF power is employed to generate the plasma. The high frequency power supply provides most of the energy to break the molecules in the process gas thereby forming the plasma and promoting the necessary reactions. The low frequency power supply regulates and controls ion bombardment of the BPSG film as it is formed. In a preferred embodiment, nitrogen is included in the process gas and the low frequency RF power supply is used to precisely control ion bombardment during deposition processing thereby allowing incorporation of an unexpectedly elevated amount of nitrogen into the film further improving film stability.
    • 一种用于提高硼磷硅酸盐膜的膜稳定性和耐湿性的方法和装置。 根据本发明的BPSG膜在等离子体条件下形成,其中采用高频和低频RF功率来产生等离子体。 高频电源提供大部分能量来打破工艺气体中的分子,从而形成等离子体并促进必要的反应。 低频电源调节和控制BPSG薄膜形成时的离子轰击。 在优选的实施方案中,氮气被包括在工艺气体中,并且低频RF电源用于在沉积处理期间精确地控制离子轰击,从而允许将意外升高量的氮掺入膜中进一步提高膜的稳定性。