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    • 1. 发明授权
    • Mirror for dental examination
    • 牙科检查镜
    • US5741132A
    • 1998-04-21
    • US615709
    • 1996-03-13
    • Masayoshi UsuiYoshiki OshidaSeiichi Hata
    • Masayoshi UsuiYoshiki OshidaSeiichi Hata
    • A61B1/24A61B1/253
    • A61B1/253
    • A dental examination mirror is provided. The dental examination mirror includes an examination unit having a planar base wall and a side wall projecting upwardly and outwardly from the base wall. The side wall includes an edge remote from the base wall. A mirror wall is sealingly secured to the edge of the side wall and is substantially parallel to the base wall. The surface of the mirror wall facing away from the base wall are reflective to permit observation of regions in an intraoral cavity. At least portions of the mirror wall enable transmission of light. A light source and a heat source are disposed in the examination unit between the base wall and mirror wall. Light from the light source will be transmitted through at least portions of the mirror wall to illuminate at least portions of the intraoral cavity without shining light toward the eyes of the dentist or patient. The heat source in the examination unit prevents fogging of the mirror.
    • 提供牙科检查镜。 牙科检查镜包括具有平面底壁和从底壁向上和向外突出的侧壁的检查单元。 侧壁包括远离基壁的边缘。 镜壁密封地固定到侧壁的边缘并且基本上平行于底壁。 反射镜壁的表面远离基壁是反射性的,以允许观察口腔内的区域。 镜壁的至少部分能够传输光。 光源和热源设置在检查单元中的基壁和反射镜壁之间。 来自光源的光将被透射通过镜壁的至少部分,以照亮口腔内的至少部分,而不向朝向牙医或患者的眼睛发光。 检查单元中的热源防止镜子起雾。
    • 10. 发明授权
    • Thin film-planar structure and method for producing the same
    • 薄膜平面结构及其制造方法
    • US06406637B1
    • 2002-06-18
    • US09557155
    • 2000-04-25
    • Akira ShimokohbeSeiichi Hata
    • Akira ShimokohbeSeiichi Hata
    • H01L21302
    • B81C1/00666B81C2201/0169
    • A thin film made of an amorphous material having a supercooled liquid phase region is formed on a substrate. Then, the thin film is processed by wet-etching, etc. to form a thin film-processed body having, for example, a one side-fixed beam like shape. Subsequently, the thin film-processed body is heated to a temperature within the supercooled liquid phase region and held at the temperature for 0.5-5 minutes. Thereafter, the thin film-processed body is cooled down to room temperature. Then, at least a part of the substrate is removed by wet-etching, etc. to form a thin film-planar structure composed of the thin film-processed body having the one side-fixed beam like shape.
    • 在基板上形成由具有过冷液相区域的非晶材料制成的薄膜。 然后,通过湿法蚀刻等处理薄膜,以形成具有例如单侧固定光束形状的薄膜加工体。 随后,将薄膜加工体加热到过冷液相区域内的温度,并保持在该温度0.5-5分钟。 然后,将薄膜处理体冷却至室温。 然后,通过湿蚀刻等除去基板的至少一部分,以形成由具有一个侧面固定的梁状的薄膜加工体构成的薄膜平面结构。