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    • 8. 发明授权
    • Semiconductor laser
    • 半导体激光器
    • US4456998A
    • 1984-06-26
    • US266610
    • 1981-05-22
    • Fujio TanakaYasuyuki OkamuraYukitoshi KushiroChuichi OtaShigeyuki Akiba
    • Fujio TanakaYasuyuki OkamuraYukitoshi KushiroChuichi OtaShigeyuki Akiba
    • H01S5/223H01S3/19
    • H01S5/2231
    • A semiconductor laser, which comprises a substrate of InP, an active layer, and two clad layers holding therebetween the active layer, and which is constructed so that the refractive index of the active layer may be larger than the refractive indexes of the two clad layers. In one of the two clad layers, the refractive index of a region adjacent to a radiation region in the active layer is larger than the refractive index of a region adjacent to a non-radiation region in the active layer. The refractive index of the other clad layer is equal to the refractive index of that region of said on clad layer adjoining the radiation region or the non-radiation region. The thickness and width of the radiation region of the active layer are selected so that the semiconductor laser may oscillate in the fundamental transverse mode. A buffer layer may be further provided between the active layer and one of the two clad layers.
    • 一种半导体激光器,其包括InP的衬底,有源层和保持在其间的有源层的两个覆盖层,并且被构造成使得有源层的折射率可以大于两个覆盖层的折射率 。 在两个包覆层中的一个中,与有源层中的辐射区相邻的区域的折射率大于与有源层中的非辐射区域相邻的区域的折射率。 另一个包覆层的折射率等于与辐射区域或非辐射区域相邻的所述上包层的区域的折射率。 选择有源层的辐射区域的厚度和宽度,使得半导体激光器可以在基本横向模式下振荡。 可以在活性层和两个包覆层中的一个之间进一步设置缓冲层。