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1. 发明授权

US08256441B2 Method for cleaning optical element of EUV light source device and optical element cleaning device 有权
标题翻译：用于清洁EUV光源装置和光学元件清洁装置的光学元件的方法
公开(公告)号：US08256441B2
公开(公告)日：2012-09-04
申请号：US12148969
申请日：2008-04-24
申请人： Masato Moriya , Yoshifumi Ueno , Tamotsu Abe , Akira Sumitani
发明人： Masato Moriya , Yoshifumi Ueno , Tamotsu Abe , Akira Sumitani
IPC分类号： B08B3/00 , B08B3/12 , B08B6/00 , A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/001 , G03F7/70033 , H05G2/005
摘要： A method for cleaning an optical element of an extreme ultraviolet light source device for removing, from the optical element in a chamber, scattered matter generated together with extreme ultraviolet light by plasma formed through laser beam excitation of a target in the chamber, the method which comprises: making the scattered matter generated by the plasma no larger than nanosize by using solid tin as the target and using a CO2 laser as an excitation source of the solid tin; and imparting, to the scattered matter no larger than the nanosize adhered to the optical element, an effect of overcoming the adherence of the scattered matter.
摘要翻译：一种用于清除极紫外光源装置的光学元件的方法，用于从腔室中的光学元件除去通过室中的靶的激光束激发而形成的等离子体与极紫外光一起产生的散射物质，包括：通过使用固体锡作为目标并使用CO 2激光器作为固体锡的激发源，使由等离子体产生的散射物质不大于纳米尺寸; 并且对不大于粘附到光学元件的纳米尺度的散射物质赋予克服散射物质的粘附的效果。

2. 发明申请

US20100025231A1 Method for cleaning optical element of EUV light source device and optical element cleaning device 有权
标题翻译：用于清洁EUV光源装置和光学元件清洁装置的光学元件的方法
公开(公告)号：US20100025231A1
公开(公告)日：2010-02-04
申请号：US12148969
申请日：2008-04-24
申请人： Masato Moriya , Yoshifumi Ueno , Tamotsu Abe , Akira Sumitani
发明人： Masato Moriya , Yoshifumi Ueno , Tamotsu Abe , Akira Sumitani
IPC分类号： C23C14/34 , B08B7/00
CPC分类号： H05G2/001 , G03F7/70033 , H05G2/005
摘要： A method for cleaning an optical element of an extreme ultraviolet light source device for removing, from the optical element in a chamber, scattered matter generated together with extreme ultraviolet light by plasma formed through laser beam excitation of a target in the chamber, the method which comprises: making the scattered matter generated by the plasma no larger than nanosize by using solid tin as the target and using a CO2 laser as an excitation source of the solid tin; and imparting, to the scattered matter no larger than the nanosize adhered to the optical element, an effect of overcoming the adherence of the scattered matter.
摘要翻译：一种用于清除极紫外光源装置的光学元件的方法，用于从腔室中的光学元件除去通过室中的靶的激光束激发而形成的等离子体与极紫外光一起产生的散射物质，包括：通过使用固体锡作为目标并使用CO 2激光器作为固体锡的激发源，使由等离子体产生的散射物质不大于纳米尺寸; 并且对不大于粘附到光学元件的纳米尺度的散射物质赋予克服散射物质的粘附的效果。

3. 发明申请

US20120298134A1 METHOD FOR CLEANING OPTICAL ELEMENT OF EUV LIGHT SOURCE DEVICE AND OPTICAL ELEMENT CLEANING DEVICE 审中-公开
标题翻译：清洗光源装置和光元件清洁装置的光学元件的方法
公开(公告)号：US20120298134A1
公开(公告)日：2012-11-29
申请号：US13567656
申请日：2012-08-06
申请人： Masato Moriya , Yoshifumi Ueno , Tamotsu Abe , Akira Sumitani
发明人： Masato Moriya , Yoshifumi Ueno , Tamotsu Abe , Akira Sumitani
IPC分类号： B08B7/00 , C23F1/08
CPC分类号： H05G2/001 , G03F7/70033 , H05G2/005
摘要： A method for cleaning an optical element of an extreme ultraviolet light source device for removing, from the optical element in a chamber, scattered matter generated together with extreme ultraviolet light by plasma formed through laser beam excitation of a target in the chamber, the method which comprises: making the scattered matter generated by the plasma no larger than nanosize by using solid tin as the target and using a CO2 laser as an excitation source of the solid tin; and imparting, to the scattered matter no larger than the nanosize adhered to the optical element, an effect of overcoming the adherence of the scattered matter.
摘要翻译：一种用于清除极紫外光源装置的光学元件的方法，用于从腔室中的光学元件除去通过室中的靶的激光束激发而形成的等离子体与极紫外光一起产生的散射物质，包括：通过使用固体锡作为目标并使用CO 2激光器作为固体锡的激发源，使由等离子体产生的散射物质不大于纳米尺寸; 并且对不大于粘附到光学元件的纳米尺度的散射物质赋予克服散射物质的粘附的效果。

4. 发明授权

US08288743B2 Apparatus for and method of withdrawing ions in EUV light production apparatus 有权
标题翻译： EUV光产生装置中离子离子的设备和方法
公开(公告)号：US08288743B2
公开(公告)日：2012-10-16
申请号：US12406388
申请日：2009-03-18
申请人： Yoshifumi Ueno , Osamu Wakabayashi , Tamotsu Abe , Akira Sumitani , Hideo Hoshino , Akira Endo , Georg Soumagne
发明人： Yoshifumi Ueno , Osamu Wakabayashi , Tamotsu Abe , Akira Sumitani , Hideo Hoshino , Akira Endo , Georg Soumagne
IPC分类号： B01D59/44
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , G21K1/093 , G21K2201/00 , H05G2/005 , H05G2/008
摘要： An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.
摘要翻译：一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子，其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。

5. 发明授权

US08492738B2 Apparatus for and method of withdrawing ions in EUV light production apparatus 有权
标题翻译： EUV光产生装置中离子离子的设备和方法
公开(公告)号：US08492738B2
公开(公告)日：2013-07-23
申请号：US13465108
申请日：2012-05-07
申请人： Yoshifumi Ueno , Osamu Wakabayashi , Tamotsu Abe , Akira Sumitani , Hideo Hoshino , Akira Endo , Georg Soumagne
发明人： Yoshifumi Ueno , Osamu Wakabayashi , Tamotsu Abe , Akira Sumitani , Hideo Hoshino , Akira Endo , Georg Soumagne
IPC分类号： H01J1/50
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , G21K1/093 , G21K2201/00 , H05G2/005 , H05G2/008
摘要： An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.
摘要翻译：一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子，其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。

6. 发明授权

US08354657B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US08354657B2
公开(公告)日：2013-01-15
申请号：US13047131
申请日：2011-03-14
申请人： Georg Soumagne , Yoshifumi Ueno , Hiroshi Komori , Akira Sumitani , Katsunobu Nishihara , Young Gwang Kang , Masanori Nunami
发明人： Georg Soumagne , Yoshifumi Ueno , Hiroshi Komori , Akira Sumitani , Katsunobu Nishihara , Young Gwang Kang , Masanori Nunami
IPC分类号： A61N5/06 , G01J3/10
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The apparatus includes a chamber, a target supply unit for supplying a target material into the chamber, a collector mirror for collecting extreme ultra violet light radiated from plasma generated by irradiating the target material with a laser beam to output the extreme ultra violet light, an electromagnet arranged outside of the chamber, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the electromagnet extend.
摘要翻译：在激光产生的等离子体型的极紫外光源装置中，将从等离子体发射的离子等带电粒子迅速地排出到室外。该装置包括：室，用于将目标材料供应到室中的目标供应单元，用于收集由用激光束照射目标材料而产生的等离子体辐射的极紫外光以输出极紫外光的集光镜; 设置在室外的电磁体，以及设置在室的两个表面中的至少一个表面上的电荷粒子收集机构，由电磁体产生的磁力线延伸。

7. 发明申请

US20110101863A1 EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET LIGHT 有权
标题翻译：极光紫外线光源装置及生产超极紫外线灯的方法
公开(公告)号：US20110101863A1
公开(公告)日：2011-05-05
申请号：US12547896
申请日：2009-08-26
申请人： Hiroshi Komori , Tatsuya Yanagida , Yoshifumi Ueno , Akira Sumitani , Akira Endo , Tsukasa Hori
发明人： Hiroshi Komori , Tatsuya Yanagida , Yoshifumi Ueno , Akira Sumitani , Akira Endo , Tsukasa Hori
IPC分类号： H01J7/00
CPC分类号： G21K5/00 , G03F7/70033 , G03F7/70916 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.
摘要翻译： EUV（Extreme Ultra Violet）光源装置将离子发生器中的目标材料离子化，并将电离靶材材料提供到产生等离子体的点。这减少了碎片的产生。离子发生器同时将与激发的锡水平相对应的多个波长的激光束照射在目标材料上以电离目标材料。电离目标材料从离子束提取器施加的高电压从电离器中提取，并被加速并提供给等离子体产生室。当驱动激光束照射在电离靶材上时，产生等离子体，从而发射EUV辐射。

8. 发明授权

US07928418B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US07928418B2
公开(公告)日：2011-04-19
申请号：US12385569
申请日：2009-04-13
申请人： Georg Soumagne , Yoshifumi Ueno , Hiroshi Komori , Akira Sumitani , Katsunobu Nishihara , Young Gwang Kang , Masanori Nunami
发明人： Georg Soumagne , Yoshifumi Ueno , Hiroshi Komori , Akira Sumitani , Katsunobu Nishihara , Young Gwang Kang , Masanori Nunami
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.
摘要翻译：在激光产生的等离子体型的极紫外光源装置中，将从等离子体发射的离子等带电粒子迅速地排出到室外。极紫外光源装置包括产生极紫外光的室，用于将目标材料供应到室内的预定位置的目标供应单元，用于将激光束施加到由用于产生等离子体的目标供应单元，用于收集从等离子体辐射的极端紫外光以输出极紫外光的集光镜;用于在等离子体的产生位置形成非对称磁场的磁场形成单元，其通过使用线圈和带电粒子收集机构，设置在腔室的两个表面中的至少一个上，线圈产生的磁力线延伸到该表面。

9. 发明授权

US07915600B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US07915600B2
公开(公告)日：2011-03-29
申请号：US11870020
申请日：2007-10-10
申请人： Yoshifumi Ueno , Georg Soumagne , Akira Sumitani , Osamu Wakabayashi
发明人： Yoshifumi Ueno , Georg Soumagne , Akira Sumitani , Osamu Wakabayashi
IPC分类号： G01J1/00
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033
摘要： An extreme ultra violet light source apparatus has a relatively high output for exposure and suppresses the production of debris as much as possible instead of disposing of debris that has been produced. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a target supply unit for supplying solid tin or lithium as a target to a predetermined position within the chamber; a CO2 laser for applying a laser beam based on pulse operation to the target supplied by the target supply unit so as to generate plasma; and a collector mirror having a multilayer film on a reflecting surface thereof, for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light.
摘要翻译：极紫外光源装置具有相对较高的曝光输出，尽可能地抑制碎片的产生，而不是处理已经产生的碎片。极紫外光源装置包括：产生极紫外光的室; 用于将固体锡或锂作为目标供应到所述室内的预定位置的目标供应单元; 用于将基于脉冲操作的激光束施加到由目标供给单元提供的目标以产生等离子体的CO 2激光器; 以及在其反射表面上具有多层膜的收集器反射镜，用于收集从等离子体辐射的极紫外光以输出极紫外光。

10. 发明授权

US08471226B2 Extreme ultraviolet light source device and method for producing extreme ultraviolet light 有权
标题翻译：极紫外光源装置及其制造方法
公开(公告)号：US08471226B2
公开(公告)日：2013-06-25
申请号：US12547896
申请日：2009-08-26
申请人： Hiroshi Komori , Tatsuya Yanagida , Yoshifumi Ueno , Akira Sumitani , Akira Endo , Tsukasa Hori
发明人： Hiroshi Komori , Tatsuya Yanagida , Yoshifumi Ueno , Akira Sumitani , Akira Endo , Tsukasa Hori
IPC分类号： A61N5/06
CPC分类号： G21K5/00 , G03F7/70033 , G03F7/70916 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.
摘要翻译： EUV（Extreme Ultra Violet）光源装置将离子发生器中的目标材料离子化，并将电离靶材材料提供到产生等离子体的点。这减少了碎片的产生。离子发生器同时将与激发的锡水平相对应的多个波长的激光束照射在目标材料上以电离目标材料。电离目标材料从离子束提取器施加的高电压从电离器中提取，并被加速并提供给等离子体产生室。当驱动激光束照射在电离靶材上时，产生等离子体，从而发射EUV辐射。

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