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1. 发明申请

US20050248623A1 Method of manufacturing substrate for ink jet recording head and method of manufacturing recording head using substrate manufactured by this method 有权
标题翻译：喷墨记录头用基板的制造方法以及使用该方法制造的基板的记录头的制造方法
公开(公告)号：US20050248623A1
公开(公告)日：2005-11-10
申请号：US11118404
申请日：2005-05-02
申请人： Hirokazu Komuro , Teruo Ozaki , Shuji Koyama , Kousuke Kubo , Makoto Terui , Kazuhiro Hayakawa , Ryoji Kanri , Masataka Kato
发明人： Hirokazu Komuro , Teruo Ozaki , Shuji Koyama , Kousuke Kubo , Makoto Terui , Kazuhiro Hayakawa , Ryoji Kanri , Masataka Kato
IPC分类号： B41J2/14 , B41J2/16 , B41J2/05
CPC分类号： B41J2/1601 , B41J2/14129 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1642 , B41J2/1646
摘要： In order to form a more homogenous heat generating resistive layer, the present invention provides a method of manufacturing a substrate for an ink jet recording head having a support which has an insulative layer on its surface, a pair of electrode layers disposed on the surface of the support, and a heat generating resistive layer which continuously covers the pair of electrode layers and a section between the pair of electrode layers. The method includes the step of forming an electrode layer on the support and the step of forming the pair of electrode layers by etching the electrode layer. In the step of forming the pair of electrode layers by etching the electrode layer, by etching a surface portion of the insulative layer positioned between the pair of insulative layers, a recess is formed in the surface portion of the insulative layer.
摘要翻译：为了形成更均匀的发热电阻层，本发明提供一种制造喷墨记录头用基板的方法，所述喷墨记录头具有在其表面上具有绝缘层的支撑体，设置在其表面上的一对电极层所述支撑体和连续地覆盖所述一对电极层的所述发热电阻层和所述一对电极层之间的部分。该方法包括在支撑体上形成电极层的步骤和通过蚀刻电极层形成一对电极层的步骤。在通过蚀刻电极层形成一对电极层的步骤中，通过蚀刻位于一对绝缘层之间的绝缘层的表面部分，在绝缘层的表面部分形成凹部。

2. 发明授权

US08021562B2 Method for manufacturing a filter substrate, inkjet recording head, and method for manufacturing the inkjet recording head 有权
标题翻译：用于制造过滤器基板的方法，喷墨记录头以及用于制造喷墨记录头的方法
公开(公告)号：US08021562B2
公开(公告)日：2011-09-20
申请号：US12174559
申请日：2008-07-16
申请人： Masataka Kato , Makoto Terui , Ryoji Kanri
发明人： Masataka Kato , Makoto Terui , Ryoji Kanri
IPC分类号： G01D15/00 , G11B5/127 , B44C1/22 , C03C15/00 , C03C25/68 , H01L21/302 , H01L21/461 , C23F1/00
CPC分类号： B41J2/1639 , B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1635
摘要： A filter capable of separating or filtering micro foreign particles in a flow passage is provided. A first mask and a second mask are formed on a silicon substrate by dry etching. Before performing the dry etching, a resist of the first mask is subjected to a heat treatment performed at a temperature equal to or higher than a glass transition point. A resist of the second mask is not subjected to such a heat treatment. This processing simultaneously forms in the substrate a groove portion and a wall having a hole that is located in the groove portion. A silicon material located beneath a wide portion of the first mask remains as a wall portion separating the holes.
摘要翻译：提供了能够分离或过滤流路中的微小异物的过滤器。通过干蚀刻在硅衬底上形成第一掩模和第二掩模。在进行干蚀刻之前，对第一掩模的抗蚀剂进行在玻璃化转变点以上的温度下进行的热处理。第二掩模的抗蚀剂不进行这种热处理。这种处理在基板中同时形成有槽部分和具有位于槽部分中的孔的壁。位于第一掩模的宽部分下方的硅材料保留为分离孔的壁部分。

3. 发明申请

US20060092246A1 Method for manufacturing a filter substrate, inkjet recording head, and method for manufacturing the inkjet recording head 失效
标题翻译：用于制造过滤器基板的方法，喷墨记录头以及用于制造喷墨记录头的方法
公开(公告)号：US20060092246A1
公开(公告)日：2006-05-04
申请号：US11263425
申请日：2005-10-31
申请人： Masataka Kato , Makoto Terui , Ryoji Kanri
发明人： Masataka Kato , Makoto Terui , Ryoji Kanri
IPC分类号： B41J2/05 , B41J2/175
CPC分类号： B41J2/1639 , B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1635
摘要： A filter capable of separating or filtering micro foreign particles in a flow passage is provided. A first mask and a second mask are formed on a silicon substrate by dry etching. Before performing the dry etching, a resist of the first mask is subjected to a heat treatment performed at a temperature equal to or higher than a glass transition point. A resist of the second mask is not subjected to such a heat treatment. This processing simultaneously forms in the substrate a groove portion and a wall having a hole that is located in the groove portion. A silicon material located beneath a wide portion of the first mask remains as a wall portion separating the holes.
摘要翻译：提供了能够分离或过滤流路中的微小异物的过滤器。通过干蚀刻在硅衬底上形成第一掩模和第二掩模。在进行干蚀刻之前，对第一掩模的抗蚀剂进行在玻璃化转变点以上的温度下进行的热处理。第二掩模的抗蚀剂不进行这种热处理。这种处理在基板中同时形成有槽部分和具有位于槽部分中的孔的壁。位于第一掩模的宽部分下方的硅材料保留为分离孔的壁部分。

4. 发明授权

US07452474B2 Method of manufacturing substrate for ink jet recording head and method of manufacturing recording head using substrate manufactured by this method 有权
标题翻译：喷墨记录头用基板的制造方法以及使用该方法制造的基板的记录头的制造方法
公开(公告)号：US07452474B2
公开(公告)日：2008-11-18
申请号：US11118404
申请日：2005-05-02
申请人： Hirokazu Komuro , Teruo Ozaki , Shuji Koyama , Kousuke Kubo , Makoto Terui , Kazuhiro Hayakawa , Ryoji Kanri , Masataka Kato
发明人： Hirokazu Komuro , Teruo Ozaki , Shuji Koyama , Kousuke Kubo , Makoto Terui , Kazuhiro Hayakawa , Ryoji Kanri , Masataka Kato
IPC分类号： G01D15/00
CPC分类号： B41J2/1601 , B41J2/14129 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1642 , B41J2/1646
摘要： In order to form a more homogenous heat generating resistive layer, the present invention provides a method of manufacturing a substrate for an ink jet recording head having a support which has an insulative layer on its surface, a pair of electrode layers disposed on the surface of the support, and a heat generating resistive layer which continuously covers the pair of electrode layers and a section between the pair of electrode layers. The method includes the step of forming an electrode layer on the support and the step of forming the pair of electrode layers by etching the electrode layer. In the step of forming the pair of electrode layers by etching the electrode layer, by etching a surface portion of the insulative layer positioned between the pair of insulative layers, a recess is formed in the surface portion of the insulative layer.
摘要翻译：为了形成更均匀的发热电阻层，本发明提供一种制造喷墨记录头用基板的方法，所述喷墨记录头具有在其表面上具有绝缘层的支撑体，设置在其表面上的一对电极层所述支撑体和连续地覆盖所述一对电极层的所述发热电阻层和所述一对电极层之间的部分。该方法包括在支撑体上形成电极层的步骤和通过蚀刻电极层形成一对电极层的步骤。在通过蚀刻电极层形成一对电极层的步骤中，通过蚀刻位于一对绝缘层之间的绝缘层的表面部分，在绝缘层的表面部分形成凹部。

5. 发明申请

US20080277379A1 METHOD FOR MANUFACTURING A FILTER SUBSTRATE, INKJET RECORDING HEAD, AND METHOD FOR MANUFACTURING THE INKJET RECORDING HEAD 有权
标题翻译：用于制造过滤器基板的方法，喷墨记录头和用于制造喷墨记录头的方法
公开(公告)号：US20080277379A1
公开(公告)日：2008-11-13
申请号：US12174559
申请日：2008-07-16
申请人： Masataka Kato , Makoto Terui , Ryoji Kanri
发明人： Masataka Kato , Makoto Terui , Ryoji Kanri
IPC分类号： B44C1/22
CPC分类号： B41J2/1639 , B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1635
摘要： A filter capable of separating or filtering micro foreign particles in a flow passage is provided. A first mask and a second mask are formed on a silicon substrate by dry etching. Before performing the dry etching, a resist of the first mask is subjected to a heat treatment performed at a temperature equal to or higher than a glass transition point. A resist of the second mask is not subjected to such a heat treatment. This processing simultaneously forms in the substrate a groove portion and a wall having a hole that is located in the groove portion. A silicon material located beneath a wide portion of the first mask remains as a wall portion separating the holes.
摘要翻译：提供了能够分离或过滤流路中的微小异物的过滤器。通过干蚀刻在硅衬底上形成第一掩模和第二掩模。在进行干蚀刻之前，对第一掩模的抗蚀剂进行在玻璃化转变点以上的温度下进行的热处理。第二掩模的抗蚀剂不进行这种热处理。这种处理在基板中同时形成有槽部分和具有位于槽部分中的孔的壁。位于第一掩模的宽部分下方的硅材料保留为分离孔的壁部分。

6. 发明申请

US20060109315A1 Method of manufacturing liquid discharge head, and liquid discharge head 有权
公开(公告)号：US20060109315A1
公开(公告)日：2006-05-25
申请号：US11280310
申请日：2005-11-17
申请人： Tamaki Sato , Ryoji Kanri , Masataka Kato
发明人： Tamaki Sato , Ryoji Kanri , Masataka Kato
IPC分类号： B41J2/05
CPC分类号： B41J2/1628 , B41J2/1603 , B41J2/1631 , B41J2/1632 , B41J2/1635 , B41J2/1639 , B41J2/1645
摘要： According to the present invention, there are provided an ink jet recording head capable of performing high-precision printing and recording and having a high reliability, and a method of manufacturing the head. The ink jet recording head of the present invention has: an element substrate on whose surface an ink discharge energy generating element is formed and which is made of silicon; and a thin and flat inorganic substrate in which an ink discharge port is formed in a portion disposed vertically above the ink discharge energy generating element. Furthermore, the head includes a photosensitive material layer which bonds the element substrate to the inorganic substrate and which is to constitute a wall forming an ink flow path which communicates with the ink discharge port. The inorganic substrate is laminated on the element substrate provided with the photosensitive material layer, and is thereafter provided with the ink discharge port.

7. 发明授权

US07560224B2 Method of manufacturing liquid discharge head, and liquid discharge head 有权
标题翻译：液体排出头和排液头的制造方法
公开(公告)号：US07560224B2
公开(公告)日：2009-07-14
申请号：US11280310
申请日：2005-11-17
申请人： Tamaki Sato , Ryoji Kanri , Masataka Kato
发明人： Tamaki Sato , Ryoji Kanri , Masataka Kato
IPC分类号： G03F7/00
CPC分类号： B41J2/1628 , B41J2/1603 , B41J2/1631 , B41J2/1632 , B41J2/1635 , B41J2/1639 , B41J2/1645
摘要： According to the present invention, there are provided an ink jet recording head capable of performing high-precision printing and recording and having a high reliability, and a method of manufacturing the head. The ink jet recording head of the present invention has: an element substrate on whose surface an ink discharge energy generating element is formed and which is made of silicon; and a thin and flat inorganic substrate in which an ink discharge port is formed in a portion disposed vertically above the ink discharge energy generating element. Furthermore, the head includes a photosensitive material layer which bonds the element substrate to the inorganic substrate and which is to constitute a wall forming an ink flow path which communicates with the ink discharge port. The inorganic substrate is laminated on the element substrate provided with the photosensitive material layer, and is thereafter provided with the ink discharge port.
摘要翻译：根据本发明，提供了能够执行高精度打印和记录并具有高可靠性的喷墨记录头及其制造方法。本发明的喷墨记录头具有：其表面上形成有排墨能量产生元件并由硅制成的元件基板; 以及薄而平坦的无机基材，其中在排墨能量产生元件上方垂直设置的部分中形成有墨水排放口。此外，头部包括将元件基板粘合到无机基板上的感光材料层，并且构成形成与墨水排出口连通的墨水流路的壁。将无机基板层叠在设置有感光材料层的元件基板上，然后设置有排墨口。

8. 发明授权

US07416285B2 Method for manufacturing a filter substrate, inkjet recording head, and method for manufacturing the inkjet recording head 失效
标题翻译：用于制造过滤器基板的方法，喷墨记录头以及用于制造喷墨记录头的方法
公开(公告)号：US07416285B2
公开(公告)日：2008-08-26
申请号：US11263425
申请日：2005-10-31
申请人： Masataka Kato , Makoto Terui , Ryoji Kann
发明人： Masataka Kato , Makoto Terui , Ryoji Kann
IPC分类号： B41J2/05
CPC分类号： B41J2/1639 , B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1635
摘要： A filter capable of separating or filtering micro foreign particles in a flow passage is provided. A first mask and a second mask are formed on a silicon substrate by dry etching. Before performing the dry etching, a resist of the first mask is subjected to a heat treatment performed at a temperature equal to or higher than a glass transition point. A resist of the second mask is not subjected to such a heat treatment. This processing simultaneously forms in the substrate a groove portion and a wall having a hole that is located in the groove portion. A silicon material located beneath a wide portion of the first mask remains as a wall portion separating the holes.
摘要翻译：提供了能够分离或过滤流路中的微小异物的过滤器。通过干蚀刻在硅衬底上形成第一掩模和第二掩模。在进行干蚀刻之前，对第一掩模的抗蚀剂进行在玻璃化转变点以上的温度下进行的热处理。第二掩模的抗蚀剂不进行这种热处理。这种处理在基板中同时形成有槽部分和具有位于槽部分中的孔的壁。位于第一掩模的宽部分下方的硅材料保留为分离孔的壁部分。

9. 发明申请

US20130027489A1 PRINTING APPARATUS 审中-公开
标题翻译：打印设备
公开(公告)号：US20130027489A1
公开(公告)日：2013-01-31
申请号：US13558995
申请日：2012-07-26
申请人： Kazuo Suzuki , Masaya Uetsuki , Toshimitsu Danzuka , Masataka Kato , Tsuyoshi Ibe , Asako Tomida , Hiroaki Komatsu
发明人： Kazuo Suzuki , Masaya Uetsuki , Toshimitsu Danzuka , Masataka Kato , Tsuyoshi Ibe , Asako Tomida , Hiroaki Komatsu
IPC分类号： B41J2/01
CPC分类号： B41J11/002
摘要： A printing apparatus includes a printing unit configured to apply ink to a recording medium while reciprocating a print head with respect to the recording medium and a drying unit configured to apply energy for accelerating dryness to the recording medium to which the ink is applied by the print head. The drying unit applies a larger energy at edges of a range within which the printing unit moves on the recording medium than at a middle of the range.
摘要翻译：打印装置包括打印单元，该打印单元被配置为在打印头相对于记录介质往复运动的同时向记录介质施加墨水;以及干燥单元，其构造成将能够加速干燥的能量施加到由印刷物施加墨水的记录介质头。干燥单元在记录介质上移动的范围的边缘处比在该范围的中间处施加更大的能量。

10. 发明授权

US07692234B2 Non-volatile semiconductor memory and method of making same, and semiconductor device and method of making device 有权
标题翻译：非易失性半导体存储器及其制造方法，以及半导体器件及其制造方法
公开(公告)号：US07692234B2
公开(公告)日：2010-04-06
申请号：US11862928
申请日：2007-09-27
申请人： Tetsuo Adachi , Masataka Kato , Toshiaki Nishimoto , Nozomu Matsuzaki , Takashi Kobayashi , Yoshimi Sudou , Toshiyuki Mine
发明人： Tetsuo Adachi , Masataka Kato , Toshiaki Nishimoto , Nozomu Matsuzaki , Takashi Kobayashi , Yoshimi Sudou , Toshiyuki Mine
IPC分类号： H01L29/788
CPC分类号： H01L21/28273 , G11C11/5628 , G11C16/0466 , G11C16/10 , G11C16/3454 , H01L21/28061 , H01L27/105 , H01L27/115 , H01L27/11519 , H01L27/11526 , H01L27/11529 , H01L27/11536 , H01L27/11546 , H01L29/6659 , H01L29/66825 , H01L29/7833
摘要： A semiconductor device, which ensures device reliability especially in fine regions and enables great capacitance and high-speed operations, has memory cells including, in a first region of a main surface of a semiconductor substrate, a gate insulating film, a floating gate electrode, an interlayer insulating film, a control gate electrode, and source and drain regions of the second conduction type arranged in a matrix, with a shallow isolation structure for isolating the memory cells. When using a shallow structure buried with an insulating film for element isolation, the isolation withstand voltage in fine regions can be prevented from lowering and the variation in threshold level of selective transistors can be reduced. When the memory cells in a memory mat are divided by means of selective transistors, the disturb resistance of the memory cells can be improved.
摘要翻译：一种半导体器件，其特别是确保器件的可靠性，特别是在微细的区域中并且能够实现大的电容和高速操作，具有在半导体衬底的主表面的第一区域中包括栅绝缘膜，浮栅电极，层间绝缘膜，控制栅极电极以及以矩阵形式布置的第二导电类型的源极和漏极区域，具有用于隔离存储单元的浅隔离结构。当使用用绝缘膜掩埋的浅结构用于元件隔离时，可以防止微细区域中的隔离耐受电压降低，并且可以降低选择性晶体管的阈值电平的变化。当通过选择性晶体管分配存储器垫中的存储单元时，可以提高存储单元的干扰电阻。

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