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1. 发明授权

US09023669B2 Processing method of silicon substrate and liquid ejection head manufacturing method 有权
标题翻译：硅基板和液体喷头制造方法的处理方法
公开(公告)号：US09023669B2
公开(公告)日：2015-05-05
申请号：US13186740
申请日：2011-07-20
申请人： Atsushi Hiramoto , Masahiko Kubota , Ryoji Kanri , Akihiko Okano , Yoshiyuki Fukumoto , Atsunori Terasaki
发明人： Atsushi Hiramoto , Masahiko Kubota , Ryoji Kanri , Akihiko Okano , Yoshiyuki Fukumoto , Atsunori Terasaki
IPC分类号： H01L21/3065 , B41J2/16
CPC分类号： B41J2/1603 , B41J2/1629 , B41J2/1631 , B41J2002/14467 , H01L21/30655
摘要： A processing method of a silicon substrate including forming a second opening in a bottom portion of a first opening using a patterning mask having a pattern opening by plasma reactive ion etching. The reactive ion etching is performed with a shield structure formed in or on the silicon substrate, the shield structure preventing inside of the first opening from being exposed to the plasma.
摘要翻译：一种硅衬底的处理方法，包括使用具有通过等离子体反应离子蚀刻的图案开口的图案化掩模在第一开口的底部形成第二开口。反应离子蚀刻通过形成在硅衬底中或之上的屏蔽结构进行，防止第一开口内部的屏蔽结构暴露于等离子体。

2. 发明申请

US20120282715A1 STRUCTURE MANUFACTURING METHOD AND LIQUID DISCHARGE HEAD SUBSTRATE MANUFACTURING METHOD 有权
标题翻译：结构制造方法和液体放电头基板制造方法
公开(公告)号：US20120282715A1
公开(公告)日：2012-11-08
申请号：US13521694
申请日：2011-01-13
申请人： Atsunori Terasaki , Masahiko Kubota , Ryoji Kanri , Yoshiyuki Fukumoto
发明人： Atsunori Terasaki , Masahiko Kubota , Ryoji Kanri , Yoshiyuki Fukumoto
IPC分类号： H01L21/00
CPC分类号： B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1634 , B41J2/1639 , B41J2/1642
摘要： A method for processing a silicon substrate includes providing a combination of a first silicon substrate, a second silicon substrate, and an intermediate layer including a plurality of recessed portions, which is provided between the first silicon substrate and the second silicon substrate, forming a first through hole that goes through the first silicon substrate by executing etching of the first silicon substrate on a surface of the first silicon substrate opposite to a bonding surface with the intermediate layer by using a first mask, and exposing a portion of the intermediate layer corresponding to the plurality of recessed portions of the intermediate layer, forming a plurality of openings on the intermediate layer by removing a portion constituting a bottom of the plurality of recessed portions, and forming a second through hole that goes through the second silicon substrate by executing second etching of the second silicon substrate by using the intermediate layer on which the plurality of openings are formed as a mask.
摘要翻译：一种处理硅衬底的方法，包括提供第一硅衬底，第二硅衬底和包括多个凹陷部分的中间层的组合，其设置在第一硅衬底和第二硅衬底之间，形成第一衬底通过使用第一掩模在所述第一硅衬底的与所述中间层的接合表面相对的表面上执行所述第一硅衬底的表面的蚀刻来穿过所述第一硅衬底的通孔，以及将与所述第一硅衬底相对应的所述中间层的一部分中间层的多个凹部，通过除去构成多个凹部的底部的部分，在中间层上形成多个开口，并且通过执行第二蚀刻形成穿过第二硅衬底的第二通孔的第二硅衬底通过使用其上的中间层形成多个开口作为掩模。

3. 发明授权

US07985531B2 Method of producing an ink jet head and method of producing an electronic device 有权
标题翻译：喷墨头的制造方法以及电子装置的制造方法
公开(公告)号：US07985531B2
公开(公告)日：2011-07-26
申请号：US12042695
申请日：2008-03-05
申请人： Ryoji Kanri , Tamaki Sato
发明人： Ryoji Kanri , Tamaki Sato
IPC分类号： B41J2/16
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1639 , B41J2/1642 , B41J2/1643 , B41J2/1645 , B41J2/1646
摘要： Provided is a method of producing an ink jet head including: providing the substrate which includes a through hole which forms the supply opening, and a layer that covers an opening of the through hole on a side of the one surface of the substrate; forming a protective film so that the protective film covers a side wall of the through hole and reaches the layer; depositing a photosensitive resin on the protective film; applying light from the side of the one surface of the substrate to pattern the photosensitive resin; and removing the protective film formed on a portion of the opening of the through hole on the side of the one surface of the substrate, with the patterned photosensitive resin being used as a mask.
摘要翻译：提供了一种制造喷墨头的方法，包括：提供包括形成供给开口的通孔的基板和覆盖基板的一个表面侧的通孔的开口的层; 形成保护膜，使得保护膜覆盖通孔的侧壁并到达该层; 在保护膜上沉积感光树脂; 从基板的一个表面的侧面施加光以对感光性树脂进行图案化; 并且将图案化感光性树脂用作掩模，并移除在基板的一个表面侧的通孔的开口部分上形成的保护膜。

4. 发明授权

US07513601B2 Liquid discharge head and method of manufacturing the same 失效
标题翻译：液体排放头及其制造方法
公开(公告)号：US07513601B2
公开(公告)日：2009-04-07
申请号：US11288151
申请日：2005-11-29
申请人： Kazuhiro Asai , Masahiko Kubota , Ryoji Kanri
发明人： Kazuhiro Asai , Masahiko Kubota , Ryoji Kanri
IPC分类号： B41J2/14
CPC分类号： B41J2/1404 , B41J2002/14387
摘要： With the liquid discharge head, a discharge speed of liquid droplets is increased, a discharge amount of liquid droplets is stabilized, and a discharge efficiency of the liquid droplets is enhanced. A bubbling chamber has a first bubbling chamber which is connected to a supply path with a main surface of an element substrate forming a bottom surface thereof and in which bubbles are generated in ink by a heater, and a second bubbling chamber connected to the first bubbling chamber. Moreover, a nozzle has a discharge port portion including a discharge port connected to the second bubbling chamber. Assuming that an average sectional area of the first bubbling chamber is S1, an average sectional area of the second bubbling chamber is S2, and an average sectional area of the discharge port portion is S3 in sections parallel to the main surface of the element substrate, the nozzle satisfies a relation of S2>S1>S3.
摘要翻译：利用液体排出头，液滴的排出速度增加，液滴的排出量稳定，液滴的排出效率提高。起泡室具有第一鼓泡室，其连接到供给路径，其中元件基板的主表面形成其底表面，其中通过加热器在油墨中产生气泡，并且第二鼓泡室连接到第一鼓泡房间。此外，喷嘴具有包括连接到第二鼓泡室的排出口的排出口部分。假设第一发泡室的平均截面积为S1，则第二发泡室的平均截面积为S2，排出口部的平均截面积为与元件基板的主面平行的截面，喷嘴满足S2> S1> S3的关系。

5. 发明授权

US08518725B2 Structure manufacturing method and liquid discharge head substrate manufacturing method 有权
标题翻译：结构制造方法和排液头基板的制造方法
公开(公告)号：US08518725B2
公开(公告)日：2013-08-27
申请号：US13521694
申请日：2011-01-13
申请人： Atsunori Terasaki , Masahiko Kubota , Ryoji Kanri , Yoshiyuki Fukumoto
发明人： Atsunori Terasaki , Masahiko Kubota , Ryoji Kanri , Yoshiyuki Fukumoto
IPC分类号： H01L21/00 , H01L21/30 , H01L21/46 , B21D53/76 , B23P17/00 , G01D15/00 , G11B5/127 , B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1634 , B41J2/1639 , B41J2/1642
摘要： A method for processing a silicon substrate includes providing a combination of a first silicon substrate, a second silicon substrate, and an intermediate layer including a plurality of recessed portions, which is provided between the first silicon substrate and the second silicon substrate, forming a first through hole that goes through the first silicon substrate by executing etching of the first silicon substrate on a surface of the first silicon substrate opposite to a bonding surface with the intermediate layer by using a first mask, and exposing a portion of the intermediate layer corresponding to the plurality of recessed portions of the intermediate layer, forming a plurality of openings on the intermediate layer by removing a portion constituting a bottom of the plurality of recessed portions, and forming a second through hole that goes through the second silicon substrate by executing second etching of the second silicon substrate by using the intermediate layer on which the plurality of openings are formed as a mask.
摘要翻译：一种处理硅衬底的方法，包括提供第一硅衬底，第二硅衬底和包括多个凹陷部分的中间层的组合，其设置在第一硅衬底和第二硅衬底之间，形成第一衬底通过使用第一掩模在所述第一硅衬底的与所述中间层的接合表面相对的表面上执行所述第一硅衬底的表面的蚀刻来穿过所述第一硅衬底的通孔，以及将与所述第一硅衬底相对应的所述中间层的一部分中间层的多个凹部，通过除去构成多个凹部的底部的部分，在中间层上形成多个开口，并且通过执行第二蚀刻形成穿过第二硅衬底的第二通孔的第二硅衬底通过使用其上的中间层形成多个开口作为掩模。

6. 发明授权

US08398212B2 Ink jet head and method of manufacturing the same 有权
标题翻译：喷墨头及其制造方法
公开(公告)号：US08398212B2
公开(公告)日：2013-03-19
申请号：US12635948
申请日：2009-12-11
申请人： Akihiko Okano , Masahiko Kubota , Ryoji Kanri , Atsushi Hiramoto
发明人： Akihiko Okano , Masahiko Kubota , Ryoji Kanri , Atsushi Hiramoto
IPC分类号： B41J2/05
CPC分类号： B41J2/1404 , B41J2/14145 , B41J2/1603 , B41J2/1628 , B41J2/1634
摘要： An ink jet head includes a Si substrate with a surface having a {100} orientation; a passage holding ink on the Si substrate; an ink discharge port which is communicatively connected to the passage and through which ink is ejected; and a supply port which extends through the Si substrate, which is communicatively connected to the passage, and which supplies ink to the passage. The supply port has walls having two {111} planes facing each other.
摘要翻译：喷墨头包括具有{100}取向的表面的Si衬底; 在Si衬底上保持油墨的通道; 墨水排出口，其连通地连接到通道并通过其喷射墨水; 以及供应端口，其延伸穿过Si衬底，其通信地连接到通道，并且向通道供应墨水。供应端口具有彼此面对的两个{111}平面的壁。

7. 发明授权

US08017307B2 Method for manufacturing minute structure, method for manufacturing liquid discharge head, and liquid discharge head 有权
标题翻译：微细结构的制造方法，液体排出头的制造方法和排液头
公开(公告)号：US08017307B2
公开(公告)日：2011-09-13
申请号：US10568341
申请日：2005-06-27
申请人： Masahiko Kubota , Takumi Suzuki , Tamaki Sato , Ryoji Kanri , Maki Hatta , Kazuhiro Asai , Shoji Shiba , Hiroe Ishikura , Akihiko Okano
发明人： Masahiko Kubota , Takumi Suzuki , Tamaki Sato , Ryoji Kanri , Maki Hatta , Kazuhiro Asai , Shoji Shiba , Hiroe Ishikura , Akihiko Okano
IPC分类号： G03F7/20
CPC分类号： B41J2/1603 , B41J2/1404 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1639 , B41J2/1645 , B41J2202/11 , G03F7/095 , Y10T29/49401
摘要： A method for manufacturing a minute structure comprises a step of forming an ionizing radiation decomposing type positive type resist layer including a methyl isopropenyl ketone as a first positive type photosensitive material layer, a step of forming an ionizing radiation decomposing type positive type resist layer including a photosensitive material of a copolymer as a second positive type photosensitive material layer to be sensitized by an ionizing radiation of a second wavelength range on the first positive type photosensitive material layer, a step of forming a desired pattern in the above-mentioned second positive type photosensitive material layer, and development using a developing solution, and then, a step of forming a desired pattern in the above-mentioned first positive type photosensitive material layer to form a convex shape pattern.
摘要翻译：微细结构体的制造方法包括形成电离辐射分解型正型抗蚀剂层的步骤，该电离辐射分解型正型抗蚀剂层包括甲基异丙烯基酮作为第一正型感光材料层，形成电离辐射分解型正型抗蚀剂层的步骤包括作为通过第一正型感光材料层上的第二波长范围的电离辐射致敏的作为第二正型感光材料层的共聚物的感光材料，在上述第二正型感光材料层中形成所需图案的步骤材料层和使用显影溶液的显影，然后，在上述第一正型感光材料层中形成所需图案以形成凸形图案的步骤。

8. 发明申请

US20080227035A1 METHOD OF PRODUCING AN INK JET HEAD AND METHOD OF PRODUCING AN ELECTRONIC DEVICE 有权
标题翻译：制造喷墨头的方法和制造电子装置的方法
公开(公告)号：US20080227035A1
公开(公告)日：2008-09-18
申请号：US12042695
申请日：2008-03-05
申请人： Ryoji Kanri , Tamaki Sato
发明人： Ryoji Kanri , Tamaki Sato
IPC分类号： G03F7/039 , G03F7/00
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1639 , B41J2/1642 , B41J2/1643 , B41J2/1645 , B41J2/1646
摘要： Provided is a method of producing an ink jet head including: providing the substrate which includes a through hole which forms the supply opening, and a layer that covers an opening of the through hole on a side of the one surface of the substrate; forming a protective film so that the protective film covers a side wall of the through hole and reaches the layer; depositing a photosensitive resin on the protective film; applying light from the side of the one surface of the substrate to pattern the photosensitive resin; and removing the protective film formed on a portion of the opening of the through hole on the side of the one surface of the substrate, with the patterned photosensitive resin being used as a mask.
摘要翻译：提供了一种制造喷墨头的方法，包括：提供包括形成供给开口的通孔的基板和覆盖基板的一个表面侧的通孔的开口的层; 形成保护膜，使得保护膜覆盖通孔的侧壁并到达该层; 在保护膜上沉积感光树脂; 从基板的一个表面的侧面施加光以对感光性树脂进行图案化; 并且将图案化感光性树脂用作掩模，并移除在基板的一个表面侧的通孔的开口部分上形成的保护膜。

9. 发明申请

US20050248623A1 Method of manufacturing substrate for ink jet recording head and method of manufacturing recording head using substrate manufactured by this method 有权
标题翻译：喷墨记录头用基板的制造方法以及使用该方法制造的基板的记录头的制造方法
公开(公告)号：US20050248623A1
公开(公告)日：2005-11-10
申请号：US11118404
申请日：2005-05-02
申请人： Hirokazu Komuro , Teruo Ozaki , Shuji Koyama , Kousuke Kubo , Makoto Terui , Kazuhiro Hayakawa , Ryoji Kanri , Masataka Kato
发明人： Hirokazu Komuro , Teruo Ozaki , Shuji Koyama , Kousuke Kubo , Makoto Terui , Kazuhiro Hayakawa , Ryoji Kanri , Masataka Kato
IPC分类号： B41J2/14 , B41J2/16 , B41J2/05
CPC分类号： B41J2/1601 , B41J2/14129 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1642 , B41J2/1646
摘要： In order to form a more homogenous heat generating resistive layer, the present invention provides a method of manufacturing a substrate for an ink jet recording head having a support which has an insulative layer on its surface, a pair of electrode layers disposed on the surface of the support, and a heat generating resistive layer which continuously covers the pair of electrode layers and a section between the pair of electrode layers. The method includes the step of forming an electrode layer on the support and the step of forming the pair of electrode layers by etching the electrode layer. In the step of forming the pair of electrode layers by etching the electrode layer, by etching a surface portion of the insulative layer positioned between the pair of insulative layers, a recess is formed in the surface portion of the insulative layer.
摘要翻译：为了形成更均匀的发热电阻层，本发明提供一种制造喷墨记录头用基板的方法，所述喷墨记录头具有在其表面上具有绝缘层的支撑体，设置在其表面上的一对电极层所述支撑体和连续地覆盖所述一对电极层的所述发热电阻层和所述一对电极层之间的部分。该方法包括在支撑体上形成电极层的步骤和通过蚀刻电极层形成一对电极层的步骤。在通过蚀刻电极层形成一对电极层的步骤中，通过蚀刻位于一对绝缘层之间的绝缘层的表面部分，在绝缘层的表面部分形成凹部。

10. 发明授权

US09168749B2 Manufacturing method of liquid discharge head 有权
标题翻译：液体排放头的制造方法
公开(公告)号：US09168749B2
公开(公告)日：2015-10-27
申请号：US13126879
申请日：2009-12-02
申请人： Yoshikazu Saito , Hiroe Ishikura , Takumi Suzuki , Tamaki Sato , Hirono Yoneyama , Masafumi Morisue , Ryoji Kanri
发明人： Yoshikazu Saito , Hiroe Ishikura , Takumi Suzuki , Tamaki Sato , Hirono Yoneyama , Masafumi Morisue , Ryoji Kanri
IPC分类号： C08F2/46 , B41J2/16
CPC分类号： B41J2/1603 , B41J2/1631 , B41J2/1637
摘要： This invention relates to a manufacturing method of a liquid discharge head comprising: forming an active energy ray-curable resin layer on a surface of a substrate on which discharge energy generating elements are formed, attaching a material permeable to active energy rays onto a surface of the active energy ray-curable resin layer, pressing against the material permeable to active energy rays, a master mold being transparent to the active energy rays and having protrusions corresponding to a pattern of discharge ports so as to transfer the protrusions to the material permeable to active energy rays, selectively irradiating the active energy ray-curable resin layer with active energy rays according to a pattern of liquid flow paths so as to cure the active energy ray-curable resin layer, removing the master mold, and removing uncured portions of the active energy ray-curable resin layer.
摘要翻译：本发明涉及一种液体排出头的制造方法，包括：在其上形成有放电能量产生元件的基板的表面上形成活性能量射线固化树脂层，将可活性能量射线的材料附着在活性能量射线固化树脂层，压靠可渗透活性能量射线的材料，主模具对活性能量射线是透明的，并具有对应于排出口图案的突起，以将突起转移到可渗透的材料活性能量射线，根据液体流路的图案选择性地用活性能量射线照射活性能量射线固化树脂层，以固化活性能量射线固化树脂层，除去母模，并除去活性能量射线固化树脂层。

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