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1. 发明申请

US20120199553A1 CARBON FILM 有权
标题翻译：碳膜
公开(公告)号：US20120199553A1
公开(公告)日：2012-08-09
申请号：US13183622
申请日：2011-07-15
申请人： Yoshinori Koga , Masataka Hasegawa , Sumio Iijima , Kazuo Tsugawa , Masatou Ishihara
发明人： Yoshinori Koga , Masataka Hasegawa , Sumio Iijima , Kazuo Tsugawa , Masatou Ishihara
IPC分类号： B44C1/22 , C23C16/50 , B82Y40/00
CPC分类号： C23C16/26 , B24D11/003 , C03C17/007 , C03C17/22 , C03C2217/282 , C03C2217/42 , G02B1/105 , G02B1/14 , Y10T428/30
摘要： ProblemTo provide a carbon film and a laminate having optical characteristics of retaining high transparency, having high refraction index and less double refractivity, being excellent in electric insulating property, being capable of being coated at good adhesion to various substrates, and being capable of being formed at a low temperature, and applications thereof.Means for Solving the ProblemThe invention relates to a carbon film which has an approximate spectrum curve obtainable by superimposing, on a peak fitting curve A at a Bragg's angle (2θ±0.3°) of 43.9°, a peak fitting curve B at 41.7° and a base line in an X-ray diffraction spectrum by a CuKa1 ray, and has a film thickness of from 2 mm to 100 μm. The intensity of the fitting curve B relative to the intensity of the fitting curve A is preferably from 5 to 90% in the approximated spectrum described above. In the carbon film, the Raman shift has a peak at a 1333±10 cm−1 in the Raman scattering spectrum, and the half-value width of the peak is from 10 to 40 cm−1. Further, the invention relates to a laminate characterized by disposing, on the substrate, a carbon aggregate film of 2 nm to 100 μm thickness comprising an aggregate of carbon particles having an approximate spectrum curve described above. Moreover, the invention relates to an optical device, optical glass, wrist watch, electronic circuit substrate, or grinding tool having the laminate described above.
摘要翻译：问题为了提供具有保持高透明度，高折射率和较低双折射率的光学特性的碳膜和层压板，具有优异的电绝缘性，能够以良好的粘合力涂覆在各种基板上，并且能够在低温下形成，其应用。解决问题的手段本发明涉及一种具有近似光谱曲线的碳膜，其可通过在布拉格角（2θ= 0.3°）为43.9°的峰值拟合曲线A上叠加峰值拟合曲线B，在41.7° °，通过CuKa1射线在X射线衍射光谱中为基线，膜厚为2mm〜100μm。拟合曲线B相对于拟合曲线A的强度的强度在上述近似光谱中优选为5〜90％。在碳膜中，在拉曼散射光谱中，拉曼位移在1333±10cm -1处具有峰值，峰值的半值宽度为10至40cm -1。此外，本发明涉及一种层压体，其特征在于在基板上设置包括具有上述近似光谱曲线的碳粒子聚集体的2nm至100μm厚度的碳聚集体膜。此外，本发明涉及具有上述层压体的光学装置，光学玻璃，手表，电子电路基板或研磨工具。

2. 发明授权

US09074278B2 Carbon film laminate 有权
标题翻译：碳膜层压板
公开(公告)号：US09074278B2
公开(公告)日：2015-07-07
申请号：US13580468
申请日：2011-02-25
申请人： Masataka Hasegawa , Masatou Ishihara , Yoshinori Koga , Jaeho Kim , Kazuo Tsugawa , Sumio Iijima
发明人： Masataka Hasegawa , Masatou Ishihara , Yoshinori Koga , Jaeho Kim , Kazuo Tsugawa , Sumio Iijima
IPC分类号： B21D39/00 , C23C16/02 , B82Y30/00 , B82Y40/00 , C01B31/02 , C23C16/26 , C30B29/02 , C30B29/04 , C30B29/20 , C01B31/20 , C01B31/04
CPC分类号： C23C16/0281 , B82Y30/00 , B82Y40/00 , C01B32/05 , C01B32/186 , C01B32/50 , C23C16/26 , C30B29/02 , C30B29/04 , C30B29/20 , Y10T428/30 , Y10T428/31678
摘要： Small crystal size is the issue of a conventional method for formation of a film of graphene by a thermal CVD technique using a copper foil as a substrate. A carbon film laminate is described in which graphene having a larger crystal size is formed. The carbon film laminate is configured to include a sapphire single crystal having a surface composed of terrace surfaces which are flat at the atomic level, and atomic-layer steps, a copper single crystal thin film formed by epitaxial growth on the substrate, and graphene deposited on the copper single crystal thin film, and thus enabling formation of graphene having a large crystal size.
摘要翻译：小晶体尺寸是通过使用铜箔作为基底的热CVD技术形成石墨烯膜的常规方法的问题。描述了形成具有较大晶体尺寸的石墨烯的碳膜层压体。碳膜层叠体构成为包括具有由原子层平坦的台面表面构成的表面的蓝宝石单晶，原子层台阶，在基板上通过外延生长形成的铜单晶薄膜和沉积的石墨烯在铜单晶薄膜上，从而能够形成具有大晶体尺寸的石墨烯。

3. 发明申请

US20130052121A1 CARBON FILM LAMINATE 有权
标题翻译：碳膜层压板
公开(公告)号：US20130052121A1
公开(公告)日：2013-02-28
申请号：US13580468
申请日：2011-02-25
申请人： Masataka Hasegawa , Masatou Ishihara , Yoshinori Koga , Jaeho Kim , Kazuo Tsugawa , Sumio Iijima
发明人： Masataka Hasegawa , Masatou Ishihara , Yoshinori Koga , Jaeho Kim , Kazuo Tsugawa , Sumio Iijima
IPC分类号： B32B15/20 , B32B33/00 , C01B31/00 , B32B15/04 , B32B9/04 , B82Y30/00
CPC分类号： C23C16/0281 , B82Y30/00 , B82Y40/00 , C01B32/05 , C01B32/186 , C01B32/50 , C23C16/26 , C30B29/02 , C30B29/04 , C30B29/20 , Y10T428/30 , Y10T428/31678
摘要： An object of the present invention is to solve a problem such as a small crystal size, which is the issue of a conventional method for formation of a film of graphene by a thermal CVD technique using a copper foil as a substrate, and thus providing a carbon film laminate in which graphene having a larger crystal size is formed. The carbon film laminate is configured to include a sapphire (0001) single crystal having a surface composed of terrace surfaces which are flat at the atomic level, and atomic-layer steps, a copper (111) single crystal thin film formed by epitaxial growth on the substrate and graphene deposited on the copper (111) single crystal thin film, and thus enabling formation of graphene having a large crystal size.
摘要翻译：本发明的目的是解决诸如小晶体尺寸的问题，这是通过使用铜箔作为基板的热CVD技术形成石墨烯的薄膜的常规方法的问题，因此提供形成具有较大晶体尺寸的石墨烯的碳膜层压体。碳膜层压体被构造为包括具有由原子层平坦的台面表面构成的表面的蓝宝石（0001）单晶，以及原子层台阶，通过外延生长形成的铜（111）单晶薄膜衬底和石墨烯沉积在铜（111）单晶薄膜上，从而形成具有大晶体尺寸的石墨烯。

4. 发明授权

US08007909B2 Carbon film 有权
标题翻译：碳膜
公开(公告)号：US08007909B2
公开(公告)日：2011-08-30
申请号：US11578660
申请日：2005-04-15
申请人： Yoshinori Koga , Masataka Hasegawa , Sumio Iijima , Kazuo Tsugawa , Masatou Ishihara
发明人： Yoshinori Koga , Masataka Hasegawa , Sumio Iijima , Kazuo Tsugawa , Masatou Ishihara
IPC分类号： C01B31/00
CPC分类号： C23C16/26 , B24D11/003 , C03C17/007 , C03C17/22 , C03C2217/282 , C03C2217/42 , G02B1/105 , G02B1/14 , Y10T428/30
摘要： Disclosed is a carbon film which has optical characteristics of retaining a high transparency and being high in refractive index and low in double refractivity, is excellent in electric insulating performance, can be applied to various base materials with good adhesiveness, and can be formed at low temperature. Also disclosed is a laminate including a carbon film and a method for producing the laminate.
摘要翻译：公开了具有保持高透明度，高折射率，低折射率的光学特性的碳膜，具有优异的电绝缘性能，可以应用于具有良好粘合性的各种基材，并且可以在低温度。还公开了包括碳膜和层压体的制造方法的层压体。

5. 发明授权

US08501276B2 Carbon film 有权
标题翻译：碳膜
公开(公告)号：US08501276B2
公开(公告)日：2013-08-06
申请号：US13183622
申请日：2011-07-15
申请人： Yoshinori Koga , Masataka Hasegawa , Sumio Iijima , Kazuo Tsugawa , Masatou Ishihara
发明人： Yoshinori Koga , Masataka Hasegawa , Sumio Iijima , Kazuo Tsugawa , Masatou Ishihara
IPC分类号： C23C16/00
CPC分类号： C23C16/26 , B24D11/003 , C03C17/007 , C03C17/22 , C03C2217/282 , C03C2217/42 , G02B1/105 , G02B1/14 , Y10T428/30
摘要： Disclosed is a carbon film which has optical characteristics of retaining a high transparency and being high in refractive index and low in double refractivity, is excellent in electric insulating performance, can be applied to various base materials with good adhesiveness, and can be formed at low temperature. Also disclosed is a laminate including a carbon film and a method for producing the laminate.
摘要翻译：公开了具有保持高透明度，高折射率，低折射率的光学特性的碳膜，具有优异的电绝缘性能，可以应用于具有良好粘合性的各种基材，并且可以在低温度。还公开了包括碳膜和层压体的制造方法的层压体。

6. 发明申请

US20130052119A1 METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE CARBON FILM, AND TRANSPARENT CONDUCTIVE CARBON FILM 审中-公开
标题翻译：透明导电碳膜的生产方法和透明导电碳膜
公开(公告)号：US20130052119A1
公开(公告)日：2013-02-28
申请号：US13581361
申请日：2011-03-17
申请人： Jaeho Kim , Masatou Ishihara , Yoshinori Koga , Kazuo Tsugawa , Masataka Hasegawa , Sumio Iijima , Takatoshi Yamada
发明人： Jaeho Kim , Masatou Ishihara , Yoshinori Koga , Kazuo Tsugawa , Masataka Hasegawa , Sumio Iijima , Takatoshi Yamada
IPC分类号： C23C16/511 , C01B31/00
CPC分类号： C23C16/511 , B82Y30/00 , B82Y40/00 , C01B32/188 , C23C16/26 , C23C16/545 , H01B1/04
摘要： An object of the present invention is to solve problems such as high temperature processing and long processing time, which are issues of formation of a graphene film by thermal CVD, thereby providing a technique of forming a transparent conductive carbon film using a crystalline carbon film formed at lower temperature within a short time using a graphene film, and the method of the present invention is characterized by setting the temperature of a base material to 500° C. or lower and the pressure to 50 Pa or less, and also depositing a transparent conductive carbon film on a surface of a base material by a microwave surface-wave plasma CVD method in a gas atmosphere in which an oxidation inhibitor as an additive gas for suppressing oxidation of the surface of the base material is added to a carbon-containing gas or a mixed a carbon-containing gas and an inert gas.
摘要翻译：本发明的目的是解决通过热CVD形成石墨烯膜的问题，例如高温处理和长处理时间等问题，从而提供使用形成的结晶性碳膜形成透明导电性碳膜的技术使用石墨烯膜在短时间内在较低的温度下进行，本发明的方法的特征在于将基材的温度设定在500℃以下，将压力设定为50Pa以下，并且还沉积透明通过微波表面波等离子体CVD法在基体材料的表面上形成导电性碳膜，在气体气氛中，将作为用于抑制基材表面的氧化的添加气体的氧化抑制剂添加到含碳气体中或混合的含碳气体和惰性气体。

7. 发明申请

US20090226718A1 CARBON FILM 审中-公开
标题翻译：碳膜
公开(公告)号：US20090226718A1
公开(公告)日：2009-09-10
申请号：US11994587
申请日：2006-07-04
申请人： Masataka Hasegawa , Kazuo Tsugawa , Yoshinori Koga , Masatou Ishihara , Sumio Iijima
发明人： Masataka Hasegawa , Kazuo Tsugawa , Yoshinori Koga , Masatou Ishihara , Sumio Iijima
IPC分类号： B32B27/04 , C23C16/26
CPC分类号： C23C16/26 , C03C17/007 , C03C17/3411 , C03C2217/42 , C03C2218/153 , C23C16/0272 , C23C16/27 , C23C16/277 , C23C16/279 , C23C16/511 , G04B39/006 , Y10T428/268 , Y10T428/269
摘要： A carbon film including: carbon grains having substantially the same grain size in the range of 1 nm to 1,000 nm, and preferably in the range of 2 nm to 200 nm, in the thickness-wise direction of the carbon film; and an amorphous substance for suppressing generation of impurities accompanied by formation of the carbon grains and/or for suppressing growth of said carbon grains, the amorphous substance existing at least on the surfaces of the carbon grains in a grain boundary between the carbon grains and/or gaps between the carbon grains. Such a carbon film has excellent optical properties such as high transparency, a high refractive index and small birefringence, and exhibits excellent electrical insulation. Further, the carbon film can be coated on various substrates with high adhesion and can be formed at a low temperature. Therefore, the carbon film is extremely useful for application to an optical device, a wrist watch, an electronic circuit substrate, a grinding tool or a protection film.
摘要翻译：一种碳膜，包括：在碳膜的厚度方向上具有在1nm至1000nm范围内，优选在2nm至200nm范围内的基本相同晶粒尺寸的碳颗粒; 以及用于抑制伴随形成碳粒子的杂质的产生和/或用于抑制所述碳粒子生长的无定形物质，所述无定形物质至少存在于所述碳粒子之间的晶界中的所述碳粒子表面和/ 或碳粒之间的间隙。这种碳膜具有优异的光学性能，例如高透明度，高折射率和小双折射，并且表现出优异的电绝缘性。此外，碳膜可以以高粘合力涂布在各种基材上，并且可以在低温下形成。因此，碳膜对于应用于光学装置，手表，电子电路基板，研磨工具或保护膜是非常有用的。

8. 发明申请

US20070172660A1 Carbon film 有权
标题翻译：碳膜
公开(公告)号：US20070172660A1
公开(公告)日：2007-07-26
申请号：US11578660
申请日：2005-04-15
申请人： Yoshinori Koga , Masataka Hasegawa , Sumio Iijima , Kazuo Tsugawa , Masatou Ishihara
发明人： Yoshinori Koga , Masataka Hasegawa , Sumio Iijima , Kazuo Tsugawa , Masatou Ishihara
IPC分类号： B32B9/00
CPC分类号： C23C16/26 , B24D11/003 , C03C17/007 , C03C17/22 , C03C2217/282 , C03C2217/42 , G02B1/105 , G02B1/14 , Y10T428/30
摘要： Problem To provide a carbon film and a laminate having optical characteristics of retaining high transparency, having high refraction index and less double refractivity, being excellent in electric insulating property, being capable of being coated at good adhesion to various substrates, and being capable of being formed at a low temperature, and applications thereof. Means for Solving the Problem The invention relates to a carbon film which has an approximate spectrum curve obtainable by superimposing, on a peak fitting curve A at a Bragg's angle (2θ±0.3°) of 43.9°, a peak fitting curve B at 41.7° and a base line in an X-ray diffraction spectrum by a CuKa1 ray, and has a film thickness of from 2 mm to 100 μm. The intensity of the fitting curve B relative to the intensity of the fitting curve A is preferably from 5 to 90% in the approximated spectrum described above. In the carbon film, the Raman shift has a peak at a 1333±10 cm−1 in the Raman scattering spectrum, and the half-value width of the peak is from 10 to 40 cm−1. Further, the invention relates to a laminate characterized by disposing, on the substrate, a carbon aggregate film of 2 nm to 100 μm thickness comprising an aggregate of carbon particles having an approximate spectrum curve described above. Moreover, the invention relates to an optical device, optical glass, wrist watch, electronic circuit substrate, or grinding tool having the laminate described above.
摘要翻译：问题为了提供具有保持高透明度，高折射率和较低双折射率的光学特性的碳膜和层压板，具有优异的电绝缘性，能够以良好的粘合力涂覆在各种基板上，并且能够在低温下形成，其应用。解决问题的手段本发明涉及一种碳膜，其具有通过在布拉格角（2θ±0.3°）为43.9°的峰值拟合曲线A上以41.7°的峰值拟合曲线B叠加而获得的近似光谱曲线和通过CuKa 1 X射线在X射线衍射光谱中的基线，并且具有2mm至100μm的膜厚度。拟合曲线B相对于拟合曲线A的强度的强度在上述近似光谱中优选为5〜90％。在碳膜中，拉曼位移在拉曼散射光谱中的1333±10cm -1处具有峰值，峰的半值宽度为10至40cm -1， -1 。此外，本发明涉及一种层压体，其特征在于在基材上设置包含具有上述近似光谱曲线的碳颗粒聚集体的2nm至100μm厚度的碳聚集体膜。此外，本发明涉及具有上述层压体的光学装置，光学玻璃，手表，电子电路基板或研磨工具。

9. 发明申请

US20140079910A1 CARBON FILM LAMINATE, METHOD OF MANUFACTURING SAID LAMINATE, AND LUBRICANT USING SAID LAMINATE 审中-公开
标题翻译：碳膜层压板，制造层压板的方法和使用所述层压板的润滑剂
公开(公告)号：US20140079910A1
公开(公告)日：2014-03-20
申请号：US14115447
申请日：2012-05-10
申请人： Kazuo Tsugawa , Shunsuke Kawaki , Masatou Ishihara , Yoshinori Koga , Masataka Hasegawa , Jaeho Kim
发明人： Kazuo Tsugawa , Shunsuke Kawaki , Masatou Ishihara , Yoshinori Koga , Masataka Hasegawa , Jaeho Kim
IPC分类号： C10M103/02 , C10M177/00
CPC分类号： C10M103/02 , C10M103/06 , C10M177/00 , C10M2201/041 , C10M2201/042 , C10M2201/081 , C10M2201/102 , C10N2230/06 , C10N2240/10 , C10N2250/08 , C10N2250/10 , C10N2250/141 , C23C16/0272 , C23C16/26 , C23C16/511 , Y10T428/24355 , Y10T428/30
摘要： An object of the invention is to provide a carbon film laminate having a sliding surface with low friction, low abrasion, and low counterpart aggressiveness using high adhesiveness to a base material, hardness, surface flatness, low counterpart aggressiveness, transparency, and high thermal conductivity which are provided to the carbon film without using liquid and semiliquid lubricants such as lubricating oil. Provided is a carbon film laminate including a base material, a carbon film adhesion reinforcing layer which is provided on the base material and which is formed from silicon oxide (SiOx, x=1 to 2) containing fluorine atoms (F) in a concentration of 1×1019 atoms/cm3 or more, and a carbon film that is formed on the carbon film adhesion reinforcing layer. The carbon film contains fluorine atoms in the film in a concentration of 1×1019 to 1×1021 atoms/cm3, and has an approximate spectrum curve obtained by superimposing, on a peak fitting curve A at a Bragg angle (2θ±0.5°) of 43.9° in an X-ray diffraction spectrum by CuKα1 rays, a peak fitting curve B at 41.7° and a baseline.
摘要翻译：本发明的目的是提供一种具有低摩擦滑动面，低磨损性和低对比度侵蚀性的碳膜层叠体，其使用对基材的高粘附性，硬度，表面平整度，低对应物侵蚀性，透明性和高导热性其被提供给碳膜而不使用液体和半液体润滑剂如润滑油。本发明提供一种碳膜层压体，其特征在于，包括基材，碳膜附着增强层，其设置在所述基材上，且由含有氟原子（F）的氧化硅（SiO x，x = 1〜2）形成，所述氧化硅的浓度为 1×10 19原子/ cm 3以上，以及形成在碳膜附着增强层上的碳膜。该碳膜的浓度为1×1019〜1×1021原子/ cm3的膜中含有氟原子，并且具有通过在布拉格角（2θ=±0.5°）的峰值拟合曲线A上叠加而获得的近似光谱曲线）在CuKα1射线的X射线衍射光谱中为43.9°，峰值拟合曲线B为41.7°，基线为。

10. 发明申请

US20100092728A1 LAMINATE, AND POLISHING MATERIAL AND GRINDING MATERIAL USING THE SAME, AND METHOD FOR PRODUCING THE LAMINATE 失效
标题翻译：层压材料，抛光材料和使用其的研磨材料以及生产层压板的方法
公开(公告)号：US20100092728A1
公开(公告)日：2010-04-15
申请号：US12445210
申请日：2007-10-12
申请人： Masataka Hasegawa , Kazuo Tsugawa , Masatou Ishihara , Yoshinori Koga
发明人： Masataka Hasegawa , Kazuo Tsugawa , Masatou Ishihara , Yoshinori Koga
IPC分类号： B24D3/00
CPC分类号： B24D11/003 , B24B9/16 , B24D18/00 , C23C16/0254 , C23C16/26 , C23C30/00 , Y10T428/24372 , Y10T428/30
摘要： The invention provides a laminate capable of polishing and grinding the surface of a material having a high hardness such as diamond, sapphire or hard carbon film, rapidly and in a simplified manner with high planarity and high accuracy, utilizing the high adhesiveness to substrates, the hardness and the surface planarity that a carbon film has, but using neither diamond abrasive grains nor alkali slurry. The laminate comprises a substrate and a carbon layer provided on the substrate, wherein the carbon layer comprises a diamond fine grain provided on the substrate and crushed by impact given thereto, a formation/growth inhibiting material that inhibits the formation of an impurity inhibiting the growth of a carbon grain and/or inhibits the growth of a carbon grain, and a carbon grain, and an amount (amount per unit volume) of the formation/growth inhibiting material decreases from a lower layer toward an upper layer on the substrate side. Preferably, the formation/growth inhibiting material is an SiO2 material or an Al2O3 material, and optionally an adhesiveness-reinforcing layer comprising titanium or a titanium alloy or the like may be provided between the substrate and the carbon layer.
摘要翻译：本发明提供了一种能够以高平坦度和高精度快速且简单地抛光和研磨具有高硬度的材料的表面的层压体，利用对基材的高粘附性，硬度和碳膜具有的表面平面度，但不使用金刚石磨粒或碱浆。层压体包括基材和设置在基材上的碳层，其中碳层包括设置在基材上的金刚石细晶粒并通过冲击赋予其破碎，抑制形成抑制生长的杂质的形成/生长抑制材料的碳粒子和/或抑制碳粒的生长和碳粒子，并且，生成/生长抑制材料的量（每单位体积的量）从基材侧的下层向上层减少。优选地，形成/生长抑制材料是SiO 2材料或Al 2 O 3材料，并且可以在基材和碳层之间设置任选的包含钛或钛合金等的粘合性增强层。

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