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1. 发明申请

US20090251091A1 SAMPLE STAGE APPARATUS AND METHOD OF CONTROLLING THE SAME 有权
标题翻译：样品台装置及其控制方法
公开(公告)号：US20090251091A1
公开(公告)日：2009-10-08
申请号：US12420358
申请日：2009-04-08
申请人： Masashi FUJITA , Shuichi NAKAGAWA , Takashi KOBAYASHI
发明人： Masashi FUJITA , Shuichi NAKAGAWA , Takashi KOBAYASHI
IPC分类号： G05B11/18
CPC分类号： H01J37/20 , H01J2237/20228 , H01J2237/20285 , H01J2237/20292
摘要： The present invention provides a stage apparatus capable of reducing a positioning time without increasing a positional deviation. A positioning control method of a sample stage apparatus includes: a high-speed movement step of moving a table to a high-speed movement target position at a first movement speed; a positional deviation correcting step of moving the table to a low-speed positioning step start position at a second movement speed that is lower than the first movement speed; a low-speed positioning step of moving the table to a target position at a third movement speed that is lower than the second movement speed. After the low-speed positioning step is completed, a rod connected to a motor returns to its original position to separate a pin of the rod side from a concave portion of the table side.
摘要翻译：本发明提供一种能够在不增加位置偏差的情况下减少定位时间的舞台装置。采样台装置的定位控制方法包括：以第一移动速度将桌子移动到高速移动目标位置的高速移动步骤; 位置偏差校正步骤，以低于第一移动速度的第二移动速度将桌子移动到低速定位步骤开始位置; 低速定位步骤，以低于第二移动速度的第三移动速度将桌子移动到目标位置。在低速定位步骤完成之后，连接到电动机的杆返回到其初始位置，以将杆侧的销与台侧的凹部分开。

2. 发明申请

US20080210865A1 Pattern Measuring Method and Electron Microscope 有权
标题翻译：图案测量方法和电子显微镜
公开(公告)号：US20080210865A1
公开(公告)日：2008-09-04
申请号：US12038116
申请日：2008-02-27
申请人： Shuichi NAKAGAWA , Sho Takami
发明人： Shuichi NAKAGAWA , Sho Takami
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J37/1472 , H01J37/265 , H01J37/3045 , H01J2237/22 , H01J2237/2816 , H01J2237/2817
摘要： An object of the present invention is to provide a pattern measuring method and an electron microscope that achieve truly high measurement throughput by achieving both precise location of a measurement target position and high-speed movement of the scanning position of an electron beam to the measurement target position. In order to attain the object described above, according to an aspect of the present invention, there is provided a pattern measuring method and an apparatus that move the scanning position of an electron beam based on coordinate information about a first pattern, which is a target to be measured with the electron beam, move the scanning position of the electron beam to a region comprising a second pattern, the relative distance of which from the first pattern is previously registered, in a case where detection of the first pattern at the point of arrival fails, and move the scanning position of the electron beam based on detection of the second pattern and information about the relative distance.
摘要翻译：本发明的目的是提供一种图形测量方法和电子显微镜，其通过实现测量目标位置的精确定位和电子束的扫描位置的高速移动到测量目标而实现真正高的测量吞吐量位置。为了实现上述目的，根据本发明的一个方面，提供了一种图案测量方法和装置，其基于关于作为目标的第一图案的坐标信息来移动电子束的扫描位置要用电子束测量，将电子束的扫描位置移动到包括第一图案的第一图案在第一图案的检测的情况下包括第二图案的区域，该第二图案的距离与第一图案的相对距离被预先登记到达失败，并且基于第二图案的检测和关于相对距离的信息移动电子束的扫描位置。

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