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1. 发明授权

US09176075B2 Contamination inspection method and contamination inspection device 有权
标题翻译：污染检查方法和污染检查装置
公开(公告)号：US09176075B2
公开(公告)日：2015-11-03
申请号：US13390958
申请日：2010-06-21
申请人： Masanori Gunji , Tomonari Morioka , Hiroshi Akiyama , Hideki Fukushima
发明人： Masanori Gunji , Tomonari Morioka , Hiroshi Akiyama , Hideki Fukushima
IPC分类号： G01N21/00 , G01N21/956 , G01N21/94
CPC分类号： G01N21/95623 , G01N21/94
摘要： Provided are a contamination inspection method and a contamination inspection device for highly accurately detecting a defect in a wafer, a liquid crystal substrate and media or the like including patterns, for example, a semiconductor device or the like. The first aspect of the present invention is a contamination inspection device comprising: an irradiation optical system for irradiating lights on the inspection target substrate; and a spatial filter for shading diffracted lights form the inspection target substrate. Herein, the spatial filter comprises: a plurality of light shading materials; a control member for changing at least one of parameters selected from a shape, an angle and an interval with respect to the light shading material, and a control unit for controlling the control members.
摘要翻译：提供了用于高精度地检测包括图案的晶片，液晶基板和介质等的缺陷的污染检查方法和污染检查装置，例如半导体装置等。本发明的第一方面是一种污染检查装置，包括：照射光学系统，用于在检查对象基板上照射光; 并且用于遮蔽衍射光的空间滤光器形成检查对象基板。这里，空间滤波器包括：多个遮光材料; 用于改变相对于遮光材料的形状，角度和间隔中选择的参数中的至少一个的控制构件，以及用于控制控制构件的控制单元。

2. 发明申请

US20120147364A1 CONTAMINATION INSPECTION METHOD AND CONTAMINATION INSPECTION DEVICE 有权
标题翻译：污染检查方法和污染检查装置
公开(公告)号：US20120147364A1
公开(公告)日：2012-06-14
申请号：US13390958
申请日：2010-06-21
申请人： Masanori Gunji , Tomonari Morioka , Hiroshi Akiyama , Hideki Fukushima
发明人： Masanori Gunji , Tomonari Morioka , Hiroshi Akiyama , Hideki Fukushima
IPC分类号： G01N21/94
CPC分类号： G01N21/95623 , G01N21/94
摘要： Provided are a contamination inspection method and a contamination inspection device for highly accurately detecting a defect in a wafer, a liquid crystal substrate and media or the like including patterns, for example, a semiconductor device or the like. The first aspect of the present invention is a contamination inspection device comprising: an irradiation optical system for irradiating lights on the inspection target substrate; and a spatial filter for shading diffracted lights form the inspection target substrate. Herein, the spatial filter comprises: a plurality of light shading materials; a control member for changing at least one of parameters selected from a shape, an angle and an interval with respect to the light shading material, and a control unit for controlling the control members.
摘要翻译：提供了用于高精度地检测包括图案的晶片，液晶基板和介质等的缺陷的污染检查方法和污染检查装置，例如半导体装置等。本发明的第一方面是一种污染检查装置，包括：照射光学系统，用于在检查对象基板上照射光; 并且用于遮蔽衍射光的空间滤光器形成检查对象基板。这里，空间滤波器包括：多个遮光材料; 用于改变相对于遮光材料的形状，角度和间隔中选择的参数中的至少一个的控制构件，以及用于控制控制构件的控制单元。

3. 发明申请

US20080297786A1 INSPECTING DEVICE AND INSPECTING METHOD 审中-公开
标题翻译：检查设备和检查方法
公开(公告)号：US20080297786A1
公开(公告)日：2008-12-04
申请号：US12130597
申请日：2008-05-30
申请人： Hideki Fukushima , Minori Noguchi , Shuichi Chikamatsu
发明人： Hideki Fukushima , Minori Noguchi , Shuichi Chikamatsu
IPC分类号： G01N21/01
CPC分类号： G01N21/956
摘要： An object of the invention is to provide an inspecting method and an inspecting device which can detect a foreign material and a pattern defect at a high speed and a high precision, and can suppress a cost increase, by correcting a photographed image of an inspected subject and regulating a direction of an image sensor photographing the inspected subject without depending only upon a positional displacement correcting control of a stage. In an inspecting method of inspecting an inspected subject mounted on a moving stage by photographing by an image sensor, the method determines a positional displacement amount between a target position and an actual position of the stage which moves for photographing, and carries out a sampling position correction in correspondence to the positional displacement amount, on the basis of a photographed image sampling from a photographed range of the target position which is photographed.
摘要翻译：本发明的目的是提供一种检测方法和检查装置，其可以高速和高精度地检测异物和图案缺陷，并且可以通过校正被检查对象的拍摄图像来抑制成本增加以及在不依赖于台的位置偏移校正控制的情况下调节拍摄被检查对象的图像传感器的方向。在通过图像传感器拍摄来检查安装在移动台上的受检对象的检查方法中，该方法确定目标位置与拍摄移动台的实际位置之间的位置偏移量，并且执行采样位置基于从拍摄的目标位置的拍摄范围进行的拍摄图像的对应于位置偏移量的校正。

4. 发明申请

US20050264797A1 Method and apparatus for detecting defects 审中-公开
标题翻译：检测缺陷的方法和装置
公开(公告)号：US20050264797A1
公开(公告)日：2005-12-01
申请号：US11136664
申请日：2005-05-25
申请人： Hiroyuki Nakano , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Akira Hamamatsu , Hisafumi Iwata , Tetsuya Watanabe , Takahiro Jingu , Hideki Fukushima
发明人： Hiroyuki Nakano , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Akira Hamamatsu , Hisafumi Iwata , Tetsuya Watanabe , Takahiro Jingu , Hideki Fukushima
IPC分类号： G01B11/30 , G01N21/88 , G01N21/89 , G01N21/94 , G01N21/95 , G01N21/956 , H01L21/66
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/94 , G01N21/956 , G01N2021/8905 , G01N2021/9513
摘要： The present invention relates to a defect detection apparatus and method by which foreign particles and circuit pattern defects can be detected in distinction from the edge roughness of wiring on the substrate. The defect detection apparatus comprises an irradiation optical system includes: a beam expander; an optical member group formed by stacking multiple plate-like optical members each having a different optical path length at least in a beam-converging direction in order to admit the laser beam with the beam diameter extended by the beam expander and emit multiple slit-like beams each spatially reduced in coherence in the beam-converging direction; and beam-converging optical system by which the multiple slit-like beams each emitted from the optical member group is converged into a slit-like beam in the beam-converging direction and the slit-like beam is irradiated from an oblique direction onto the surface of the subject.
摘要翻译：本发明涉及一种缺陷检测装置和方法，通过该缺陷检测装置和方法可以检测与基板上的布线的边缘粗糙度相关的异物和电路图案缺陷。缺陷检测装置包括：照射光学系统，包括：扩束器; 光学构件组，其通过至少在束会聚方向上堆叠具有不同光程长度的多个板状光学构件而形成，以便允许具有由扩束器延伸的光束直径的激光束并且发射多个狭缝状光束在束收敛方向上的相干性在空间上减小; 以及束光聚光光学系统，其中从光学构件组发射的多个狭缝状光束在束会聚方向上会聚到狭缝状光束中，并且狭缝状光束从倾斜方向照射到表面上的主题。

5. 发明授权

US07986405B2 Foreign matter inspection method and foreign matter inspection apparatus 有权
标题翻译：异物检查方法和异物检查仪器
公开(公告)号：US07986405B2
公开(公告)日：2011-07-26
申请号：US12758363
申请日：2010-04-12
申请人： Hiroyuki Yamashita , Mamoru Kobayashi , Eiji Imai , Yoshio Morishige , Koichi Nagoya , Hideki Fukushima
发明人： Hiroyuki Yamashita , Mamoru Kobayashi , Eiji Imai , Yoshio Morishige , Koichi Nagoya , Hideki Fukushima
IPC分类号： G01N21/00
CPC分类号： G01N21/95607 , G01N21/94 , G01N2021/8825
摘要： In a foreign matter inspection apparatus comprising: irradiating unit for irradiating inspection light to an inspection area of an article to be inspected; intensity detecting unit for detecting intensity of either reflected light or scattered light, which is generated from the inspection area by irradiating thereto the inspection light; position detecting unit for detecting a position of either the reflected light or the scattered light within the inspection area; and deciding unit for deciding whether or not a foreign matter is present within the inspection area; the foreign matter inspection apparatus is comprised of: display unit capable of displaying thereon both a threshold image in which the threshold value is indicated over an entire area of the inspection area, and a detection sensitivity image indicated by being converted from the threshold image.
摘要翻译：一种异物检查装置，其特征在于，包括：将检查光照射到待检查物品的检查区域的照射单元; 强度检测单元，用于通过向检查光照射检测从检查区域产生的反射光或散射光的强度; 位置检测单元，用于检测检查区域内的反射光或散射光的位置; 以及决定单元，用于判定在所述检查区域内是否存在异物; 异物检查装置包括：能够在其上显示其中在检查区域的整个区域上指示了阈值的阈值图像的显示单元和由阈值图像转换的检测灵敏度图像。

6. 发明申请

US20130208270A1 DEFECT INSPECTING APPARATUS AND DEFECT INSPECTING METHOD 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US20130208270A1
公开(公告)日：2013-08-15
申请号：US13821468
申请日：2011-07-26
申请人： Hideki Fukushima , Nobuaki Hirose
发明人： Hideki Fukushima , Nobuaki Hirose
IPC分类号： G01N21/956
CPC分类号： G01N21/956 , G01N21/95607 , G01N2021/9513
摘要： The defect inspecting apparatus is capable of easily performing adjustment with a change of an elevation angle of illumination to a substrate to be inspected, while being low in cost. A plane parallel plate and a cylindrical lens supported by a lens holder are symmetrically disposed at the same tilt angle θ with respect to a horizontal plane. A shift in optical axis at a focal position of light (101) with the rotation of the cylindrical lens can be prevented from occurring. The light can be rotated with a motor and a belt by a rotating mechanism, while allowing the optical axes of the light to match each other at the same focal position. The lens holder and the rotating mechanism are connected to a vertically moving mechanism and moved along a guide of the vertically moving mechanism to thereby adjust the focal position of the cylindrical lens.
摘要翻译：缺点检查装置能够在成本低的同时随着照明仰角的变化而容易地执行调整。由透镜支架支撑的平面平行板和柱面透镜相对于水平面对称地设置在相同的倾斜角度θ。可以防止发生与圆柱形透镜旋转的光（101）的焦点位置处的光轴的偏移。光可以通过旋转机构用马达和皮带旋转，同时允许光的光轴在相同焦点位置彼此匹配。透镜支架和旋转机构连接到垂直移动机构并沿着垂直移动机构的引导件移动，从而调节柱面透镜的焦点位置。

7. 发明申请

US20110267605A1 FOREIGN MATTER INSPECTION METHOD AND FOREIGN MATTER INSPECTION APPARATUS 失效
标题翻译：外部事件检查方法和外部事件检查装置
公开(公告)号：US20110267605A1
公开(公告)日：2011-11-03
申请号：US13181159
申请日：2011-07-12
申请人： Hiroyuki Yamashita , Mamoru Kobayashi , Eiji Imai , Yoshio Morishige , Koichi Nagoya , Hideki Fukushima
发明人： Hiroyuki Yamashita , Mamoru Kobayashi , Eiji Imai , Yoshio Morishige , Koichi Nagoya , Hideki Fukushima
IPC分类号： G01N21/47 , G01N21/55
CPC分类号： G01N21/95607 , G01N21/94 , G01N2021/8825
摘要： In a foreign matter inspection apparatus comprising: irradiating unit for irradiating inspection light to an inspection area of an article to be inspected; intensity detecting unit for detecting intensity of either reflected light or scattered light, which is generated from the inspection area by irradiating thereto the inspection light; position detecting unit for detecting a position of either the reflected light or the scattered light within the inspection area; and deciding unit for deciding whether or not a foreign matter is present within the inspection area; the foreign matter inspection apparatus is comprised of: display unit capable of displaying thereon both a threshold image in which the threshold value is indicated over an entire area of the inspection area, and a detection sensitivity image indicated by being converted from the threshold image.
摘要翻译：一种异物检查装置，其特征在于，包括：将检查光照射到待检查物品的检查区域的照射单元; 强度检测单元，用于通过向检查光照射检测从检查区域产生的反射光或散射光的强度; 位置检测单元，用于检测检查区域内的反射光或散射光的位置; 以及决定单元，用于判定在所述检查区域内是否存在异物; 异物检查装置包括：能够在其上显示其中在检查区域的整个区域上指示了阈值的阈值图像的显示单元和由阈值图像转换的检测灵敏度图像。

8. 发明申请

US20100229385A1 Method of Processing Orifice 有权
标题翻译：加工孔的方法
公开(公告)号：US20100229385A1
公开(公告)日：2010-09-16
申请号：US12708261
申请日：2010-02-18
申请人： Masato HIGUMA , Kenichi Gunji , Tsuneyoshi Inoue , Yasuyuki Tanaka , Hideki Fukushima
发明人： Masato HIGUMA , Kenichi Gunji , Tsuneyoshi Inoue , Yasuyuki Tanaka , Hideki Fukushima
IPC分类号： B21K1/24 , B26F1/14 , B23Q3/04
CPC分类号： B21J5/10 , B21J9/00 , B21K1/24 , B23P15/16 , F02M61/168 , F02M61/1833 , F02M2200/8069 , Y10T29/49298 , Y10T29/49409 , Y10T29/49426 , Y10T29/49432 , Y10T83/6667 , Y10T83/9428 , Y10T408/03
摘要： Disclosed herein is a method for processing an orifice capable of processing recessed portions and orifices, each having a unique hole diameter different from each other, to high positioning accuracy and in a short time.A press includes: a B-axis angle indexing device 3 disposed on a base 2b, the B-axis angle indexing device 3 including a table B; an A-axis angle indexing device 25 disposed on the table B, the A-axis angle indexing device 25 including a table A; a chuck 32 disposed on the table A, the chuck 32 for holding a work; a base Z 6 disposed on a base, the base Z 6 being operable in an axis Z-direction; a base X 8 disposed on the base Z, the base X 8 being operable in an axis X-direction; a punch holding portion 13 disposed on the base X, the punch holding portion 13 being operable vertically in an axis Y-direction; and a plurality of punches 19, 22 held on the punch holding portion in parallel with the axis Z. The press is used to perform a pressing cycle at a desired position by changing a posture of the work and moving the punch in the Z-direction continuously using punches having different leading end diameters and shapes with the work held in the chuck.
摘要翻译：这里公开了一种能够处理具有彼此不同的独特孔直径的凹部和孔的孔的方法，以高的定位精度和短时间。压机包括：设置在基座2b上的B轴角度分度装置3，B轴角度分度装置3包括台B; 设置在工作台B上的A轴角度分度装置25，A轴角度分度装置25，其包括工作台A; 设置在工作台A上的卡盘32，用于保持工件的卡盘32; 设置在基座上的基座Z6，基座Z6可在Z轴方向上操作; 设置在基座Z上的基座X8，基座X8可沿轴线X方向操作; 设置在基座X上的冲头保持部13，冲头保持部13沿Y轴方向垂直地工作; 以及与轴线Z平行地保持在冲头保持部上的多个冲头19,22。压力机用于通过改变作业的姿势并在Z方向上移动冲头来在期望的位置执行按压循环连续地使用具有不同前端直径和形状的冲头，工件保持在卡盘中。

9. 发明授权

US08564767B2 Defect inspecting apparatus and defect inspecting method 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US08564767B2
公开(公告)日：2013-10-22
申请号：US13821468
申请日：2011-07-26
申请人： Hideki Fukushima , Nobuaki Hirose
发明人： Hideki Fukushima , Nobuaki Hirose
IPC分类号： G01N21/00
CPC分类号： G01N21/956 , G01N21/95607 , G01N2021/9513
摘要： The defect inspecting apparatus is capable of easily performing adjustment with a change of an elevation angle of illumination to a substrate to be inspected, while being low in cost. A plane parallel plate and a cylindrical lens supported by a lens holder are symmetrically disposed at the same tilt angle θ with respect to a horizontal plane. A shift in optical axis at a focal position of light (101) with the rotation of the cylindrical lens can be prevented from occurring. The light can be rotated with a motor and a belt by a rotating mechanism, while allowing the optical axes of the light to match each other at the same focal position. The lens holder and the rotating mechanism are connected to a vertically moving mechanism and moved along a guide of the vertically moving mechanism to thereby adjust the focal position of the cylindrical lens.
摘要翻译：缺点检查装置能够在成本低的同时随着照明仰角的变化而容易地执行调整。由透镜支架支撑的平面平行板和柱面透镜相对于水平面对称地设置在相同的倾斜角度θ。可以防止发生与圆柱形透镜旋转的光（101）的焦点位置处的光轴的偏移。光可以通过旋转机构用马达和皮带旋转，同时允许光的光轴在相同焦点位置彼此匹配。透镜支架和旋转机构连接到垂直移动机构并沿着垂直移动机构的引导件移动，从而调节柱面透镜的焦点位置。

10. 发明授权

US08402655B2 Method of processing orifice 有权
标题翻译：孔口加工方法
公开(公告)号：US08402655B2
公开(公告)日：2013-03-26
申请号：US12708261
申请日：2010-02-18
申请人： Masato Higuma , Kenichi Gunji , Tsuneyoshi Inoue , Yasuyuki Tanaka , Hideki Fukushima
发明人： Masato Higuma , Kenichi Gunji , Tsuneyoshi Inoue , Yasuyuki Tanaka , Hideki Fukushima
IPC分类号： B21K1/24 , B23P17/00 , B26D7/00
CPC分类号： B21J5/10 , B21J9/00 , B21K1/24 , B23P15/16 , F02M61/168 , F02M61/1833 , F02M2200/8069 , Y10T29/49298 , Y10T29/49409 , Y10T29/49426 , Y10T29/49432 , Y10T83/6667 , Y10T83/9428 , Y10T408/03
摘要： Disclosed herein is a method for processing an orifice capable of processing recessed portions and orifices, each having a unique hole diameter different from each other, to high positioning accuracy and in a short time.A press includes: a B-axis angle indexing device 3 disposed on a base 2b, the B-axis angle indexing device 3 including a table B; an A-axis angle indexing device 25 disposed on the table B, the A-axis angle indexing device 25 including a table A; a chuck 32 disposed on the table A, the chuck 32 for holding a work; a base Z 6 disposed on a base, the base Z 6 being operable in an axis Z-direction; a base X 8 disposed on the base Z, the base X 8 being operable in an axis X-direction; a punch holding portion 13 disposed on the base X, the punch holding portion 13 being operable vertically in an axis Y-direction; and a plurality of punches 19, 22 held on the punch holding portion in parallel with the axis Z. The press is used to perform a pressing cycle at a desired position by changing a posture of the work and moving the punch in the Z-direction continuously using punches having different leading end diameters and shapes with the work held in the chuck.
摘要翻译：这里公开了一种能够处理具有彼此不同的独特孔直径的凹部和孔的孔的方法，以高的定位精度和短时间。压机包括：设置在基座2b上的B轴角度分度装置3，B轴角度分度装置3包括台B; 设置在工作台B上的A轴角度分度装置25，A轴角度分度装置25，其包括工作台A; 设置在工作台A上的卡盘32，用于保持工件的卡盘32; 设置在基座上的基座Z6，基座Z6可在Z轴方向上操作; 设置在基座Z上的基座X8，基座X8可沿轴线X方向操作; 设置在基座X上的冲头保持部13，冲头保持部13沿Y轴方向垂直地工作; 以及与轴线Z平行地保持在冲头保持部上的多个冲头19,22。压力机用于通过改变作业的姿势并在Z方向上移动冲头来在期望的位置执行按压循环连续地使用具有不同前端直径和形状的冲头，工件保持在卡盘中。

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