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    • 7. 发明申请
    • Line width measuring method, substrate processing method, substrate processing apparatus and substrate cooling processing unit
    • 线宽测量方法,基板处理方法,基板处理装置和基板冷却处理单元
    • US20050141891A1
    • 2005-06-30
    • US11013784
    • 2004-12-17
    • Michio TanakaMasami Yamashita
    • Michio TanakaMasami Yamashita
    • G01B11/02G01N21/41G03F7/20G03F9/00H01L21/027H01L21/66
    • G03F7/705G03F7/70625
    • In optical line width measurement performed using the scatterometry technique, the present invention measures the line width formed on a substrate more accurately than in the prior art. After a predetermined pattern is formed in a resist film on a substrate, the refractive index and the extinction coefficient of the resist film are measured. Based on the measured values, calculation is performed to obtain calculated light intensity distributions of reflected light reflected from a plurality of virtual patterns. The calculated light intensity distributions are stored, and their library is created. The substrate for which the refractive index and so on are measured is irradiated with light, and the light intensity distribution of its reflected light is measured. The light intensity distribution is collated with the calculated light intensity distributions in the library, so that the line width of the virtual pattern having a matching light intensity distribution is regarded as the line width of the real pattern. Since the library of the light intensity distributions of the virtual pattern is created based on the actually measured refractive index and so on after the formation of the pattern, an accurate line width matching the pattern state at the time of measuring the line width is measured.
    • 在使用散射测量技术进行的光线宽度测量中,本发明比现有技术更准确地测量在衬底上形成的线宽。 在基板上的抗蚀剂膜中形成预定图案之后,测量抗蚀剂膜的折射率和消光系数。 基于测量值,执行计算以获得从多个虚拟图案反射的反射光的计算的光强度分布。 存储计算的光强度分布,并创建它们的库。 用光照射测定折射率等的基板,测定其反射光的光强度分布。 将光强度分布与库中计算的光强度分布进行比较,使得具有匹配的光强度分布的虚拟图案的线宽被视为实曲线的线宽。 由于在形成图案之后,基于实际测量的折射率等创建虚拟图案的光强度分布的库,因此测量与测量线宽度时的图案状态匹配的精确线宽。