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    • 3. 发明申请
    • Photovoltaic device
    • 光伏装置
    • US20060209915A1
    • 2006-09-21
    • US11350899
    • 2006-02-10
    • Masaki Shima
    • Masaki Shima
    • H01S5/00
    • H01L31/03921H01L31/02363H01L31/075H01L31/202Y02E10/548Y02P70/521
    • An aspect of the present invention provides a photovoltaic device having a first semiconductor layer of a first conduction type and a third semiconductor layer of a second conductivity type. At least one of the first and third semiconductor layers includes an amorphous semiconductor layer. The amorphous semiconductor layer has a larger band gap than a non-monocrystal semiconductor layer having crystallinity. Accordingly, it is possible to increase a built-in electric field that is a potential difference between the Fermi level of the first semiconductor layer of the first conductivity type and the Fermi level of the third semiconductor layer of the second conductivity type.
    • 本发明的一个方面提供一种具有第一导电类型的第一半导体层和第二导电类型的第三半导体层的光伏器件。 第一和第三半导体层中的至少一个包括非晶半导体层。 非晶半导体层具有比具有结晶性的非单晶半导体层更大的带隙。 因此,可以增加作为第一导电类型的第一半导体层的费米能级与第二导电类型的第三半导体层的费米能级之间的电位差的内置电场。
    • 4. 发明授权
    • Photoelectric conversion device
    • 光电转换装置
    • US07075052B2
    • 2006-07-11
    • US10663663
    • 2003-09-17
    • Masaki ShimaShigeharu Taira
    • Masaki ShimaShigeharu Taira
    • H01L31/00H01L31/036
    • H01L31/03682H01L31/075Y02E10/546Y02E10/548
    • A photoelectric conversion device capable of improving an open-circuit voltage is obtained. In this photoelectric conversion device, many of crystal grains contained in a third non-single-crystalline semiconductor layer have major axes substantially perpendicular to a main surface of a substrate on an interfacial portion between at least either a first non-single-crystalline semiconductor layer or a second non-single-crystalline semiconductor layer and the third non-single-crystalline semiconductor layer, and many of crystal grains contained in either semiconductor layer have major axes substantially parallel to the main surface of the substrate on the aforementioned interfacial portion.
    • 获得能够提高开路电压的光电转换装置。 在该光电转换装置中,包含在第三非单晶半导体层中的许多晶粒在至少第一非单晶半导体层之间的界面部分上具有大致垂直于衬底主表面的长轴 或第二非单晶半导体层和第三非单晶半导体层,并且包含在任一半导体层中的许多晶粒具有基本上平行于上述界面部分上的基板的主表面的长轴。
    • 5. 发明授权
    • Photovoltaic element and manufacturing method thereof
    • 光伏元件及其制造方法
    • US5935344A
    • 1999-08-10
    • US736418
    • 1996-10-24
    • Koji EndoMasaki Shima
    • Koji EndoMasaki Shima
    • H01L31/04H01L31/072H01L31/075H01L31/20H01L31/00
    • H01L31/202H01L31/035281H01L31/0747Y02E10/547Y02P70/521
    • A photovoltaic element having improved conversion efficiency and improved light confining property as well as a method of manufacturing the photovoltaic element with superior productivity are provided. The photovoltaic element includes an n type single crystal silicon substrate having first and second main surfaces, an intrinsic amorphous silicon layer formed on the first main surface, a p type amorphous silicon layer formed thereon, a conductive thin film formed thereon, a collecting electrode formed thereon, an intrinsic amorphous silicon layer formed on the second main surface of n type single crystal silicon substrate, an n type amorphous silicon layer formed thereon, a conductive thin film formed thereon and a back electrode formed thereon. At a peripheral portion of a laminated portion including the intrinsic amorphous silicon layer formed on the first main surface of the n type single crystal silicon substrate, the p type amorphous silicon layer and the conductive thin film, a trench deep enough to reach at least the intrinsic amorphous semiconductor layer is formed.
    • 提供了具有改善的转换效率和改善的光限制性的光电元件以及制造具有优异生产率的光电元件的方法。 光电元件包括​​具有第一和第二主表面的n型单晶硅衬底,形成在第一主表面上的本征非晶硅层,形成在其上的ap型非晶硅层,形成在其上的导电薄膜,在其上形成的集电极 形成在n型单晶硅衬底的第二主表面上的本征非晶硅层,在其上形成的n型非晶硅层,形成在其上的导电薄膜和形成在其上的背电极。 在形成在n型单晶硅衬底的第一主表面上的本征非晶硅层的层压部分的周边部分,p型非晶硅层和导电薄膜,深度足以达到至少 形成本征非晶半导体层。
    • 9. 发明申请
    • Stacked photovoltaic device
    • 堆叠式光伏器件
    • US20070000538A1
    • 2007-01-04
    • US11447263
    • 2006-06-06
    • Masaki Shima
    • Masaki Shima
    • H01L31/00
    • H01L31/0725H01L31/03685H01L31/076Y02E10/545Y02E10/548
    • A stacked photovoltaic device which includes a first photovoltaic unit having an amorphous silicon layer 8 as a photoelectric conversion layer, and a second photovoltaic unit having a microcrystalline silicon layer 5 as a photo-electric conversion layer and succeeding backwardly from the first photovoltaic unit closer to a light incidence plane. The microcrystalline silicon layer 5 serving as the photoelectric conversion layer in the second photovoltaic unit has a ratio α2(=I(Si—O)/I(Si—H)) greater than a ratio α1(=I(Si—O)/I(Si—H)) of the amorphous silicon layer 8 serving as the photoelectric conversion layer in the first photovoltaic unit, where I(Si—O) is a peak area for the Si—O stretching mode of each silicon layer and I(Si—H) is a peak area for the Si—H stretching mode of each silicon layer when the amorphous and microcrystalline silicon layers 8 and 5 are measured by infrared absorption spectroscopy. Also, a short-circuit current Isc2 of the second photovoltaic unit is greater than a short-circuit current Isc1 of the first photovoltaic unit.
    • 一种堆叠的光伏器件,其包括具有作为光电转换层的非晶硅层8的第一光伏单元和具有微晶硅层5作为光电转换层的第二光伏单元,并且从第一光电单元的后面向后延伸, 光入射平面。 在第二光伏单元中用作光电转换层的微晶硅层5具有比α<2>(= I(Si-O)/ I(Si-H) 在第一光电单元中用作光电转换层的非晶硅层8的I 1(Si-O)/ I(Si-H)),其中I(Si-O) 每个硅层的Si-O拉伸模式的峰面积和I(Si-H)是当通过红外吸收测量非晶硅和微晶硅层8和5时每个硅层的Si-H拉伸模式的峰面积 光谱学。 此外,第二光伏单元的短路电流I SC2 <2>大于第一光伏单元的短路电流Isc1> 1 1。