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1. 发明申请

US20120256106A1 ELECTRON BEAM EXPOSURE APPARATUS AND ELECTRON BEAM EXPOSURE METHOD 有权
标题翻译：电子束曝光装置和电子束曝光方法
公开(公告)号：US20120256106A1
公开(公告)日：2012-10-11
申请号：US13439595
申请日：2012-04-04
申请人： Masaki Kurokawa , Akio Yamada , Tatsuro Okawa
发明人： Masaki Kurokawa , Akio Yamada , Tatsuro Okawa
IPC分类号： G21K5/04
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , G03F1/78 , H01J37/3023 , H01J2237/30461 , H01J2237/31769
摘要： In a multi-column electron beam exposure apparatus for performing exposure treatment in parallel by arranging a plurality of column cells on a wafer, a relationship between exposure intensity and a line width for each column cell is obtained (Steps S41 and S44). Then, correction parameters are obtained, which allow a relationship between exposure intensity and a line width for a correction target column cell to coincide with a relationship between exposure intensity and a line width for a reference column cell selected from among the plurality of column cells (Steps S43 and S46). Thereafter, exposure time of each column cell is obtained by correcting the exposure time of the reference column cell based on the correction parameters thus obtained.
摘要翻译：在多列电子束曝光装置中，通过在晶片上排列多个列单元来并行进行曝光处理，得到各列单元的曝光强度与行宽的关系（步骤S41，步骤S44）。然后，获得校正参数，其允许校正目标列单元的曝光强度和线宽之间的关系与从多个列单元格中选择的参考列单元的曝光强度和线宽之间的关系一致（步骤S43和S46）。此后，通过基于由此获得的校正参数来校正参考柱单元的曝光时间来获得每个列单元的曝光时间。

2. 发明授权

US08487281B2 Electron beam exposure apparatus and electron beam exposure method 有权
标题翻译：电子束曝光装置和电子束曝光方法
公开(公告)号：US08487281B2
公开(公告)日：2013-07-16
申请号：US13439595
申请日：2012-04-04
申请人： Masaki Kurokawa , Akio Yamada , Tatsuro Okawa
发明人： Masaki Kurokawa , Akio Yamada , Tatsuro Okawa
IPC分类号： A61N5/00
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , G03F1/78 , H01J37/3023 , H01J2237/30461 , H01J2237/31769
摘要： In a multi-column electron beam exposure apparatus for performing exposure treatment in parallel by arranging a plurality of column cells on a wafer, a relationship between exposure intensity and a line width for each column cell is obtained (Steps S41 and S44). Then, correction parameters are obtained, which allow a relationship between exposure intensity and a line width for a correction target column cell to coincide with a relationship between exposure intensity and a line width for a reference column cell selected from among the plurality of column cells (Steps S43 and S46). Thereafter, exposure time of each column cell is obtained by correcting the exposure time of the reference column cell based on the correction parameters thus obtained.
摘要翻译：在多列电子束曝光装置中，通过在晶片上排列多个列单元来并行进行曝光处理，得到各列单元的曝光强度与行宽的关系（步骤S41，步骤S44）。然后，获得校正参数，其允许校正目标列单元的曝光强度和线宽之间的关系与从多个列单元格中选择的参考列单元的曝光强度和线宽之间的关系一致（步骤S43和S46）。此后，通过基于由此获得的校正参数来校正参考柱单元的曝光时间来获得每个列单元的曝光时间。

3. 发明申请

US20110057114A1 Electron beam lithography apparatus and electron beam lithography method 有权
标题翻译：电子束光刻设备和电子束光刻法
公开(公告)号：US20110057114A1
公开(公告)日：2011-03-10
申请号：US12927180
申请日：2010-11-09
申请人： Akio Yamada , Masaki Kurokawa
发明人： Akio Yamada , Masaki Kurokawa
IPC分类号： H01J3/14
CPC分类号： H01J37/21 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/317 , H01J37/3174 , H01J2237/21
摘要： An electron beam lithography apparatus includes an electron gun emitting an electron beam, a deflector deflecting the electron beam, a focus corrector correcting a focus of the electron beam, a storage unit storing exposure data, and a controller correcting the exposure data based on a constant correction coefficient independent of time passage and a fluctuating correction coefficient changing with time, calculates a deflection efficiency indicating a relation between an input signal to the deflector and an amount of beam deflection, and a correction intensity indicating a relation between an input signal to the focus corrector and a beam focus, and writes the electron beam on a sample according to the deflection efficiency and the correction intensity.
摘要翻译：电子束光刻设备包括发射电子束的电子枪，偏转电子束的偏转器，校正电子束焦点的聚焦校正器，存储曝光数据的存储单元，以及基于常数来校正曝光数据的控制器校正系数与时间通过无关，波动校正系数随时间变化，计算指示偏转器的输入信号与光束偏转量之间的关系的偏转效率，以及表示与焦点的输入信号之间的关系的校正强度校正器和光束聚焦，并根据偏转效率和校正强度将电子束写入样品。

4. 发明授权

US08384052B2 Electron beam lithography apparatus and electron beam lithography method 有权
标题翻译：电子束光刻设备和电子束光刻法
公开(公告)号：US08384052B2
公开(公告)日：2013-02-26
申请号：US12927180
申请日：2010-11-09
申请人： Akio Yamada , Masaki Kurokawa
发明人： Akio Yamada , Masaki Kurokawa
IPC分类号： H01L21/027
CPC分类号： H01J37/21 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/317 , H01J37/3174 , H01J2237/21
摘要： An electron beam lithography apparatus includes an electron gun emitting an electron beam, a deflector deflecting the electron beam, a focus corrector correcting a focus of the electron beam, a storage unit storing exposure data, and a controller correcting the exposure data based on a constant correction coefficient independent of time passage and a fluctuating correction coefficient changing with time, calculates a deflection efficiency indicating a relation between an input signal to the deflector and an amount of beam deflection, and a correction intensity indicating a relation between an input signal to the focus corrector and a beam focus, and writes the electron beam on a sample according to the deflection efficiency and the correction intensity.
摘要翻译：电子束光刻设备包括发射电子束的电子枪，偏转电子束的偏转器，校正电子束焦点的聚焦校正器，存储曝光数据的存储单元，以及基于常数来校正曝光数据的控制器校正系数与时间通过无关，波动校正系数随时间变化，计算指示偏转器的输入信号与光束偏转量之间的关系的偏转效率，以及表示与焦点的输入信号之间的关系的校正强度校正器和光束聚焦，并根据偏转效率和校正强度将电子束写入样品。

5. 发明申请

US20140224436A1 ROLLER SHADE 有权
标题翻译：滚子阴影
公开(公告)号：US20140224436A1
公开(公告)日：2014-08-14
申请号：US14127397
申请日：2013-03-27
申请人： Shinya Yukisada , Akio Yamada
发明人： Shinya Yukisada , Akio Yamada
IPC分类号： B60J7/06 , E06B9/42
CPC分类号： B60J7/06 , B60J7/0015 , E06B9/42
摘要： A roller shade includes a light shielding sheet which can be rolled up in a roll shape, a roller and an electric motor for openably moving the light shielding sheet, guide belts connected to respective lower surfaces of side end parts of the light shielding sheet in a sheet width direction, and a pair of guide parts each having a guide space which receives a corresponding one of the side end parts of the light shielding sheet in the sheet width direction and a corresponding one of the guide belts, for guiding the side end part and the guide belt. In the roller shade, the light shielding sheet is prevented from being creased when the light shielding sheet moves in the width direction while being rolled or unrolled, due to lack of a tension of the light shielding sheet in the width direction.
摘要翻译：卷帘包括可卷绕成卷状的遮光片，滚子和电动马达，用于使遮光片可开启地移动，导光带连接到遮光片的侧端部的各个下表面以及一对引导部，每个引导部具有引导空间，该引导空间容纳遮光片的片宽度方向上的相应的一个侧端部和相应的一个引导带，用于引导侧端部和导带。在卷帘中，由于遮光片在宽度方向上的张力不足，防光片在卷绕或展开的同时沿宽度方向移动时，防止了遮光片的折痕。

6. 发明授权

US08222619B2 Multi-column electron beam exposure apparatus and multi-column electron beam exposure method 有权
标题翻译：多列电子束曝光装置和多列电子束曝光方法
公开(公告)号：US08222619B2
公开(公告)日：2012-07-17
申请号：US12586717
申请日：2009-09-25
申请人： Akio Yamada , Hiroshi Yasuda , Mitsuhiro Nakano , Takashi Kiuchi
发明人： Akio Yamada , Hiroshi Yasuda , Mitsuhiro Nakano , Takashi Kiuchi
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： B82Y40/00 , B82Y10/00 , H01J37/3045 , H01J37/3174 , H01J37/3177 , H01J2237/24507 , H01J2237/24521 , H01J2237/24535 , H01J2237/24542
摘要： A multi-column electron beam exposure apparatus includes: a plurality of column cells; a wafer stage including an electron-beam-property detecting unit for measuring an electron beam property; and a controller for measuring beam properties of electron beams used in all the column cells by using the electron-beam-property detecting unit, and for adjusting the electron beams of the respective column cells so that the properties of the electron beams used in the column cells may be approximately identical. The electron beam property may be any of a beam position, a beam intensity, and a beam shape of the electron beam to be emitted. The electron-beam-property detecting unit may be a chip for calibration with a reference mark formed thereon or a Faraday cup.
摘要翻译：多列电子束曝光装置包括：多个柱单元; 包括用于测量电子束特性的电子束特性检测单元的晶片台; 以及用于通过使用电子束特性检测单元来测量在所有列单元中使用的电子束的光束特性的控制器，并且用于调节各列电池的电子束，使得在列中使用的电子束的性质细胞可以大致相同。电子束特性可以是要发射的电子束的光束位置，光束强度和光束形状中的任何一个。电子束特性检测单元可以是用于在其上形成有参考标记的校准芯片或法拉第杯。

7. 发明申请

US20110226967A1 Electron beam lithography apparatus and electron beam lithography method 有权
标题翻译：电子束光刻设备和电子束光刻法
公开(公告)号：US20110226967A1
公开(公告)日：2011-09-22
申请号：US13068995
申请日：2011-05-25
申请人： Akio Yamada , Tomohiro Sakazaki , Hiroshi Yasuda
发明人： Akio Yamada , Tomohiro Sakazaki , Hiroshi Yasuda
IPC分类号： G21K5/00
CPC分类号： H01J37/3175 , B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： An electron beam lithography apparatus includes a storage for storing data on a drawing pattern assigned a rank based on an accuracy required for a device pattern, a drawing pattern adjustment unit to generate data on divided drawing patterns based on the rank, a settlement wait time adjustment unit to determine a settlement wait time based on the rank, and a controller to draw the device pattern while irradiating an electron beam based on the data on the divided drawing patterns and the settlement wait time. The drawing pattern adjustment unit determines upper limits on the long-side length of a divided drawing pattern or on the area of the divided drawing pattern based on the rank, and divides the drawing pattern based on the upper limits.
摘要翻译：一种电子束光刻设备，包括：存储器，用于根据设备图案所要求的准确度，对分配了等级的绘图图形进行数据存储;绘图模式调整单元，基于该等级生成分割图形的数据;结算等待时间调整基于等级确定结算等待时间的单元，以及基于划分的绘图图案和结算等待时间的数据来照射电子束时绘制设备图案的控制器。绘制图案调整单元基于等级来确定分割绘制图案的长边长度的上限或划分的绘制图案的区域的上限，并且基于上限划分绘图图案。

8. 发明授权

US07920164B2 Viewing surveillance system for carrying out surveillance independent of a broadcasting form 有权
标题翻译：观看独立于广播形式进行监视的监视系统
公开(公告)号：US07920164B2
公开(公告)日：2011-04-05
申请号：US10558687
申请日：2004-06-24
申请人： Eiji Kasutani , Akio Yamada , Kota Iwamoto
发明人： Eiji Kasutani , Akio Yamada , Kota Iwamoto
IPC分类号： H04N7/18 , H04N7/16 , G06K9/54 , G06K9/46 , G06K9/00
CPC分类号： H04N21/6582 , H04H60/32 , H04H60/40 , H04H60/59 , H04N7/17318 , H04N21/433 , H04N21/44008
摘要： A viewing surveillance system which make it possible to carry out the viewing surveillance independently from the broadcasting form like analog broadcasting or digital broadcasting. The viewing surveillance system also make it possible to carry out the viewing surveillance without any restriction set to viewers or any burden to the broadcast stations. The image feature data generating unit 12 receives a picture signal from the image viewing terminal 50, and generates the image feature data which represents a feature of the image from the picture signal. The image information transmitting unit 13 transmits the image feature data generated by the image feature data generating unit 12 to the viewing surveillance server 2. On the other hand, the image feature data generating units 21a to 21c also generates the image feature data based on the broadcasted programs and stores the image feature data in the program image feature data storing unit 22. The viewing program specifying unit 23 specifies the viewed program by matching the image feature data received from the image information transmitting unit 13 and the image feature data stored in the program image feature data storing unit 22.
摘要翻译：一种观看监视系统，其可以独立于诸如模拟广播或数字广播的广播形式进行观看监视。观看监视系统还可以进行观看监视，而不会对观众造成任何限制或对广播电台造成任何负担。图像特征数据生成单元12从图像观看终端50接收图像信号，并从图像信号生成表示图像的特征的图像特征数据。图像信息发送单元13将由图像特征数据生成单元12生成的图像特征数据发送到观看监视服务器2.另一方面，图像特征数据生成单元21a至21c还基于图像特征数据生成单元广播节目并将图像特征数据存储在节目图像特征数据存储单元22中。观看节目指定单元23通过将从图像信息发送单元13接收的图像特征数据和存储在图像特征数据中的图像特征数据进行匹配来指定所观看的节目节目图像特征数据存储单元22。

9. 发明授权

US07847272B2 Electron beam exposure mask, electron beam exposure method, and electron beam exposure system 有权
标题翻译：电子束曝光掩模，电子束曝光法和电子束曝光系统
公开(公告)号：US07847272B2
公开(公告)日：2010-12-07
申请号：US11235422
申请日：2005-09-26
申请人： Hiroshi Yasuda , Akio Yamada
发明人： Hiroshi Yasuda , Akio Yamada
IPC分类号： A61N5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/20 , H01J2237/31769
摘要： An electron beam exposure system is designed to correct a proximity effect. The electron beam exposure system includes: an electron beam generation unit for generating an electron beam; an electron beam exposure mask having opening portions that are arranged so that sizes of the opening portions change at a predetermined rate in order of arrangement; a mask deflection unit for deflecting the electron beam on the electron beam exposure mask; a substrate deflection unit for deflecting and projecting the electron beam onto a substrate; and a control unit for controlling deflection amounts in the mask deflection unit and the substrate deflection unit. The direction or directions of the change may be any one of a row direction and a column direction or may be the row and column directions.
摘要翻译：电子束曝光系统设计用于校正邻近效应。电子束曝光系统包括：用于产生电子束的电子束产生单元; 电子束曝光掩模，其具有开口部，其设置成使得开口部的尺寸按照布置的顺序以预定的速率变化; 用于使电子束在电子束曝光掩模上偏转的掩模偏转单元; 用于将电子束偏转和投影到衬底上的衬底偏转单元; 以及用于控制掩模偏转单元和基板偏转单元中的偏转量的控制单元。改变的方向或方向可以是行方向和列方向中的任何一个，或者可以是行和列方向。

10. 发明授权

US07677875B2 Injection molding machine for controlling measurement of an in-line screw 有权
标题翻译：用于控制直列螺杆测量的注塑机
公开(公告)号：US07677875B2
公开(公告)日：2010-03-16
申请号：US12208209
申请日：2008-09-10
申请人： Akio Yamada
发明人： Akio Yamada
IPC分类号： B29C45/77
CPC分类号： B29C45/76 , B29C2045/1792 , B29C2945/76498 , B29C2945/76568 , B29C2945/76605 , B29C2945/76665
摘要： A method for controlling measurement in a motor-driven in-line screw type injection molding machine using servo-motors as a measurement driving source and an injection driving source. Control is made so that all of a measured value of back pressure controlled by the measurement servo-motor, a measured value of an astern speed of a screw controlled by the injection servo-motor, and a measured rotational speed of the screw turn zero concurrently at timing when the screw reaches a measurement completion position. Thus, suck-back can be made dispensable.
摘要翻译：一种使用伺服电动机作为测量驱动源和注入驱动源的电动直列螺杆式注塑机中的测量方法。进行控制，使得由测量伺服电动机控制的背压的测量值，由喷射伺服电动机控制的螺杆的后退速度的测量值和螺杆的测量转速同时变为零在螺钉到达测量完成位置的时刻。因此，回吸可以是不必要的。

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