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    • 7. 发明授权
    • Zoom lens system
    • 变焦镜头系统
    • US08553328B2
    • 2013-10-08
    • US13415083
    • 2012-03-08
    • Tetsuya AbeMasaru Eguchi
    • Tetsuya AbeMasaru Eguchi
    • G02B15/14
    • G02B15/177G02B13/18
    • A zoom lens system includes a negative first lens group, a positive second lens group, and a positive third lens group, in that order from the object side, wherein upon zooming from the short focal length extremity to the long focal length extremity, the distance between the first lens group and the second lens group decreases, and the distance between the second lens group and the third lens group increases. The second lens group includes a positive first sub-lens group and a negative second sub-lens group, in that order from the object side. The second sub-lens group is a negative single lens element serving as an image-stabilizer lens group which moves in directions orthogonal to the optical axis to change the imaging position to correct image shake.
    • 变焦透镜系统包括负第一透镜组,正第二透镜组和正第三透镜组,从物体侧开始,其中,从短焦距末端到长焦距端部变焦时,距离 第一透镜组和第二透镜组之间的距离减小,并且第二透镜组和第三透镜组之间的距离增加。 第二透镜组从物体侧起按顺序包括正的第一子透镜组和负的第二子透镜组。 第二子透镜组是用作图像稳定透镜组的负单透镜组,其在与光轴正交的方向上移动,以改变成像位置以校正图像抖动。
    • 9. 发明申请
    • METHOD FOR MANUFACTURING REFINED FAT OR OIL
    • 制造精油或油的方法
    • US20120258232A1
    • 2012-10-11
    • US13516415
    • 2010-12-14
    • Minoru KaseTetsuya AbeShinpei FukuharaToshiteru KomatsuKeiji Shibata
    • Minoru KaseTetsuya AbeShinpei FukuharaToshiteru KomatsuKeiji Shibata
    • A23D9/02A23D9/00
    • A23D7/02C11B3/10C11B3/14
    • Provided is a method for manufacturing refined fats and oils, including: treating fats and oils by bringing the fats and oils into contact with an adsorbent; and subsequently treating the fats and oils by bringing the fats and oils into contact with water vapor under at least one condition selected from the following conditions: (condition 1) the time for which the fats and oils are brought into contact with the water vapor in a temperature range of 175° C. or more and 205° C. or less is from 5 to 110 minutes; (condition 2) the time for which the fats and oils are brought into contact with the water vapor in a temperature range of more than 205° C. and 215° C. or less is from 5 to 50 minutes; and (condition 3) the time for which the fats and oils are brought into contact with the water vapor in a temperature range of more than 215° C. and 230° C. or less is from 5 to 30 minutes.
    • 本发明提供一种精制油脂的制造方法,其特征在于,包括:使脂肪和油与吸附剂接触而处理脂肪和油; 并且随后在从以下条件中选择的至少一种条件下使脂肪和油与水蒸气接触来处理脂肪和油:(条件1)脂肪和油与水蒸气接触的时间 175℃以上且205℃以下的温度范围为5〜110分钟; (条件2)在大于205℃和215℃或更低的温度范围内使油脂与水蒸气接触的时间为5至50分钟; 和(条件3)在大于215℃和230℃或更低的温度范围内使脂肪和油与水蒸气接触的时间为5至30分钟。
    • 10. 发明授权
    • Photomask substrate, photomask substrate forming member, photomask substrate fabricating method, photomask, and exposing method that uses the photomask
    • 光掩模基板,光掩模基板形成部件,光掩模基板的制造方法,光掩模和使用光掩模的曝光方法
    • US08153336B2
    • 2012-04-10
    • US12591121
    • 2009-11-09
    • Tetsuya AbeYuhei NittaYukiyasu Kimura
    • Tetsuya AbeYuhei NittaYukiyasu Kimura
    • G03F1/00
    • G03F7/70783C03B23/0252G03F1/60Y02P40/57
    • A photomask substrate with a substantially uniform thickness comprises: a first surface, which is a continuous curved surface whereon a mask pattern is to be formed; and a second surface. The first surface exhibits a square shape that comprises an opposing pair of first set sides and an opposing pair of second set sides and has support parts at end parts along the first set sides. When the photomask substrate is held such that the first surface is in a substantially vertical state, a reference plane that is parallel to a tangential plane of the first surface at the center point of the first surface is defined on the photomask substrate side that is closer to the first surface than to the second surface. At this time, a first distance in the thickness direction between the reference plane and the center point of the first surface is shorter than second distances in the thickness direction between the reference plane and the midpoints of the second set sides.
    • 具有基本均匀厚度的光掩模基板包括:第一表面,其是要形成掩模图案的连续弯曲表面; 和第二表面。 第一表面呈现正方形,其包括相对的一对第一组侧面和相对的第二组侧面,并且在沿着第一组侧面的端部处具有支撑部分。 当光掩模基板被保持使得第一表面处于基本垂直状态时,在第一表面的中心点处的平行于第一表面的切向平面的参考平面被限定在更接近的光掩模基板侧 到第一表面而不是第二表面。 此时,基准面和第一面的中心点之间的厚度方向上的第一距离比基准面与第二侧面的中点之间的厚度方向上的第二距离短。