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1. 发明授权

US07459708B2 Extreme UV radiation source device and method for eliminating debris which forms within the device 有权
标题翻译：极端的UV辐射源装置和消除装置内形成的碎屑的方法
公开(公告)号：US07459708B2
公开(公告)日：2008-12-02
申请号：US11337539
申请日：2006-01-24
申请人： Masaki Inoue , Hironobu Yabuta , Taku Sumitomo , Kyohei Seki , Masaki Yoshioka
发明人： Masaki Inoue , Hironobu Yabuta , Taku Sumitomo , Kyohei Seki , Masaki Yoshioka
IPC分类号： H01J7/24 , G03F7/20
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70916
摘要： To suppress the adherence of debris as a result of a radiating fuel, such as tin or the like, within a vessel for forming high density and high temperature plasma of an extreme UV radiation source device, and to eliminate deposited tin and/or tin compounds with high efficiency, hydrogen radical producing parts are provided in the vessel; and hydrogen radicals are produced in the vessel so that deposition of tin and/or a tin compound is suppressed in the area with a low temperature of the device, such as a focusing mirror or the like, and the deposited tin and/or tin compound is eliminated.
摘要翻译：为了抑制由用于形成极紫外辐射源装置的高密度和高温等离子体的容器内的辐射燃料（例如锡等）导致的碎片的附着，并且消除沉积的锡和/或锡化合物在高效率的情况下，在该容器中提供氢根产生部件; 并且在容器中产生氢自由基，使得在诸如聚焦镜等的装置的低温区域和锡沉积的锡和/或锡化合物的区域中，锡和/或锡化合物的沉积被抑制被淘汰。

2. 发明申请

US20060163500A1 Extreme UV radiation source device and method for eliminating debris which forms within the device 有权
标题翻译：极端的UV辐射源装置和消除装置内形成的碎屑的方法
公开(公告)号：US20060163500A1
公开(公告)日：2006-07-27
申请号：US11337539
申请日：2006-01-24
申请人： Masaki Inoue , Hironobu Yabuta , Taku Sumitomo , Kyohei Seki , Masaki Yoshioka
发明人： Masaki Inoue , Hironobu Yabuta , Taku Sumitomo , Kyohei Seki , Masaki Yoshioka
IPC分类号： H05G2/00 , G21G4/00 , H01J35/00
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70916
摘要： To suppress the adherence of debris as a result of a radiating fuel, such as tin or the like, within a vessel for forming high density and high temperature plasma of an extreme UV radiation source device, and to eliminate deposited tin and/or tin compounds with high efficiency, hydrogen radical producing parts are provided in the vessel; and hydrogen radicals are produced in the vessel so that deposition of tin and/or a tin compound is suppressed in the area with a low temperature of the device, such as a focusing mirror or the like, and the deposited tin and/or tin compound is eliminated.
摘要翻译：为了抑制由用于形成极紫外辐射源装置的高密度和高温等离子体的容器内的辐射燃料（例如锡等）导致的碎片的附着，并且消除沉积的锡和/或锡化合物在高效率的情况下，在该容器中提供氢根产生部件; 并且在容器中产生氢自由基，使得在诸如聚焦镜等的装置的低温区域和锡沉积的锡和/或锡化合物的区域中，锡和/或锡化合物的沉积被抑制被淘汰。

3. 发明授权

US07656079B2 Heater and heating device with heaters with lamps having an independently powered multiple part filament 有权
标题翻译：具有加热器的加热器和加热装置具有独立供电的多部分灯丝
公开(公告)号：US07656079B2
公开(公告)日：2010-02-02
申请号：US11362788
申请日：2006-02-28
申请人： Yoichi Mizukawa , Keita Kanazu , Masaki Yoshioka , Shinji Suzuki , Kyohei Seki
发明人： Yoichi Mizukawa , Keita Kanazu , Masaki Yoshioka , Shinji Suzuki , Kyohei Seki
IPC分类号： H01K9/00
CPC分类号： H01K7/00 , H01K9/08 , H01L21/67115 , H05B3/0033 , H05B2203/032
摘要： A heating device in which uniform heating of an article to be processed is possible even in the case a temperature change which leads to a loss of the uniformity of the temperature distribution in a narrowly delineated area, and in which a reduction in the size of the device is possible. The heating device has a plurality of heaters, each heater having a single bulb of transparent material in which there is a filament that is divided in the axial direction into several filament parts and the respective filament parts are supplied with power independently of each other.
摘要翻译：即使在温度变化导致狭窄划定区域中的温度分布均匀性降低的情况下，也能够对待处理物品进行均匀加热的加热装置，其中，设备是可能的。加热装置具有多个加热器，每个加热器具有单个透明材料灯泡，其中存在沿轴向分成多个细丝部分的细丝，并且相应的灯丝部分彼此独立地供应电力。

4. 发明申请

US20060197454A1 Heater and heating device with heaters 有权
标题翻译：加热器和加热器加热器
公开(公告)号：US20060197454A1
公开(公告)日：2006-09-07
申请号：US11362788
申请日：2006-02-28
申请人： Yoichi Mizukawa , Keita Kanazu , Masaki Yoshioka , Shinji Suzuki , Kyohei Seki
发明人： Yoichi Mizukawa , Keita Kanazu , Masaki Yoshioka , Shinji Suzuki , Kyohei Seki
IPC分类号： H01J13/46
CPC分类号： H01K7/00 , H01K9/08 , H01L21/67115 , H05B3/0033 , H05B2203/032
摘要： A heating device in which uniform heating of an article to be processed is possible even in the case a temperature change which leads to a loss of the uniformity of the temperature distribution in a narrowly delineated area, and in which a reduction in the size of the device is possible. The heating device has a plurality of heaters, each heater having a single bulb of transparent material in which there is a filament that is divided in the axial direction into several filament parts and the respective filament parts are supplied with power independently of each other.
摘要翻译：即使在温度变化导致狭窄划定区域中的温度分布均匀性降低的情况下，也能够对待处理物品进行均匀加热的加热装置，其中，设备是可能的。加热装置具有多个加热器，每个加热器具有单个透明材料灯泡，其中存在沿轴向分成多个细丝部分的细丝，并且相应的灯丝部分彼此独立地供应电力。

5. 发明申请

US20080237501A1 EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND EXTREME ULTRAVIOLET RADIATION GENERATING METHOD 审中-公开
标题翻译：极光紫外线光源装置和超极紫外线辐射发生方法
公开(公告)号：US20080237501A1
公开(公告)日：2008-10-02
申请号：US12055361
申请日：2008-03-26
申请人： Tomonao Hosokai , Kazuhiko Horioka , Hiroshi Mizokoshi , Takuma Yokoyama , Kyohei Seki
发明人： Tomonao Hosokai , Kazuhiko Horioka , Hiroshi Mizokoshi , Takuma Yokoyama , Kyohei Seki
IPC分类号： G01J3/10
CPC分类号： G03F7/70033 , B82Y10/00 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： High temperature plasma raw material (21) is gasified by irradiation with a first energy beam (23). When the gasified raw material reaches the discharge region, pulsed power is applied between the electrodes (11, 12) and a second energy beam (24) irradiates. In this manner, the plasma is heated and excited and an EUV emission occurs. The emitted EUV emission is collected and extracted by EUV collector optics. Because of irradiation by the first and second energy beams (23, 24), a special distribution of high temperature plasma raw material density can be set to a specified distribution and demarcation of the position of the discharge channel can be set. Moreover, it is possible to lengthen pulses of extreme ultraviolet emission by supplying raw material gas of which the ion density in the discharge path is nearly the same as the ion density under EUV radiation emission conditions.
摘要翻译：高温等离子体原料（21）通过用第一能量束（23）照射而气化。当气化原料到达放电区域时，在电极（11,12）和第二能量束（24）照射之间施加脉冲功率。以这种方式，等离子体被加热和激发并发生EUV发射。发射的EUV发射由EUV收集器光学器件收集和提取。由于第一和第二能量束（23,24）的照射，可以将高温等离子体原料浓度的特殊分布设定为规定的分布，并且可以设定排出通道的位置的分界。此外，可以通过提供在EUV辐射发射条件下，放电路径中的离子密度几乎与离子密度相同的原料气体来延长极紫外发射的脉冲。

6. 发明授权

US07700899B2 Heating device of the light irradiation type 有权
标题翻译：光照射型加热装置
公开(公告)号：US07700899B2
公开(公告)日：2010-04-20
申请号：US11565112
申请日：2006-11-30
申请人： Shinji Suzuki , Kyohei Seki
发明人： Shinji Suzuki , Kyohei Seki
IPC分类号： A21B1/00
CPC分类号： H05B3/0047 , H01L21/67115
摘要： To devise a heating device of the light irradiation type in which costs can reduced by reducing the number of filament lamps and current source parts without adversely affecting the illuminance distribution with respect to a wafer, in a heating device of the light irradiation type that has a light source part, in which several filament lamps are located parallel to one another, in which at least one of the filament lamps has several filaments which are located along the bulb axis are supplied with power individually to produce light which is irradiated from the light source parts onto an article to be treated, the distance between at least some of the adjacent filament lamps to one another is nonuniform.
摘要翻译：为了设计光照射类型的加热装置，其中通过减少灯丝灯和电流源部件的数量而不会不利地影响相对于晶片的照度分布来降低成本，在具有光源部分，其中几个白炽灯彼此平行地定位，其中至少一个灯丝灯具有沿着灯泡轴定位的几根灯丝被单独供应以产生从光源照射的光部件到待处理的物品上，至少一些相邻的白炽灯彼此之间的距离是不均匀的。

7. 发明授权

US07622727B2 Extreme UV radiation source device 有权
标题翻译：极紫外线辐射源装置
公开(公告)号：US07622727B2
公开(公告)日：2009-11-24
申请号：US11617163
申请日：2006-12-28
申请人： Takahiro Shirai , Kyohei Seki
发明人： Takahiro Shirai , Kyohei Seki
IPC分类号： H01J7/36 , H05H1/00
CPC分类号： G03F7/70033 , B82Y10/00 , G21K2201/065 , H05G2/003 , H05G2/005
摘要： An EUV radiation source device with a chamber that is divided into a discharge space and a collector mirror space provided with EUV collector optics. Between them, an aperture component with an opening which is cooled is provided. First and second discharge electrodes are rotated. Sn or Li is irradiated with a laser. Pulsed power is applied between the first and second discharge electrodes to form a high density and high temperature plasma between the two electrodes so that EUV radiation with a wavelength of 13.5 nm is emitted, is focused by the EUV collector optics and is guided into the irradiation optical system of an exposure tool. There are a first pumping device and a second pumping device for pumping the discharge space and the collector mirror space. The discharge space is kept at a few Pa, and the collector mirror space is kept at a few 100 Pa.
摘要翻译：具有腔室的EUV辐射源装置，其被分成放电空间和设置有EUV收集器光学器件的收集器反射镜空间。在它们之间提供了具有被冷却的开口的孔部件。旋转第一放电电极和第二放电电极。用激光照射Sn或Li。在第一和第二放电电极之间施加脉冲功率以在两个电极之间形成高密度和高温等离子体，从而发射波长为13.5nm的EUV辐射，由EUV收集器光学器件聚焦并被引导到辐照曝光工具的光学系统。存在用于泵送放电空间和收集器反射镜空间的第一泵送装置和第二泵送装置。放电空间保持在几Pa，收集器反射镜空间保持在几百Pa。

8. 发明授权

US07535013B2 Extreme UV radiation exposure tool and extreme UV radiation source device 有权
标题翻译：极紫外辐射曝光工具和极紫外线辐射源装置
公开(公告)号：US07535013B2
公开(公告)日：2009-05-19
申请号：US11412793
申请日：2006-04-28
申请人： Kyohei Seki
发明人： Kyohei Seki
IPC分类号： G21K3/00
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/70575
摘要： To effectively eliminate radiation outside the band with a wavelength of 13.5 nm which has adverse effects on exposure without reducing the intensity of the EUV radiation with a wavelength of 13.5 nm, in an extreme UV radiation exposure tool which has an extreme UV radiation source device with an EUV focusing mirror which focuses extreme UV radiation and radiation outside the band which is emitted by the high density and high temperature region of a plasma, an illumination optical system for projecting this radiation onto a mask, and a projection optical system which projects the radiation from the mask onto a workpiece, a radiation shield is provided of a size which enables the radiation emerging from the EUV focusing mirror to be completely incident on it, and which has an opening of a size which results in essentially only extreme UV radiation being transmitted through it.
摘要翻译：在极紫外辐射曝光工具中，为了有效地消除波长在13.5nm以外的辐射，这对辐射有不利影响，而不会降低具有13.5nm波长的EUV辐射的强度，该工具具有极端的UV辐射源装置， EUV聚焦镜，其聚焦由等离子体的高密度和高温区域发射的带外的极紫外辐射和辐射，用于将该辐射投影到掩模上的照明光学系统，以及投影光学系统从掩模到工件的辐射屏蔽件提供的尺寸使得从EUV聚焦镜出射的辐射能够完全入射到其上，并且其具有基本上仅导致极端的紫外线辐射的尺寸的开口通过它。

9. 发明授权

US07912359B2 Heating device of the light irradiation type 失效
标题翻译：光照射型加热装置
公开(公告)号：US07912359B2
公开(公告)日：2011-03-22
申请号：US11848359
申请日：2007-08-31
申请人： Shinji Suzuki , Tetsuya Kitagawa , Kyohei Seki
发明人： Shinji Suzuki , Tetsuya Kitagawa , Kyohei Seki
IPC分类号： F21V9/00 , F21V7/04
CPC分类号： H01L21/67115 , H01L21/67109 , H05B3/0047
摘要： A heating device of the light irradiation type having an article to be heated, a guard ring located on the periphery of that article, multiple lamps located above the article to be heated and the guard ring, and a reflecting mirror located above the lamps, in which a light diffusion part is located in the upper region corresponding to the article to be heated so that the diffused light projects onto the entire surface of the article to be heated. The light diffusion part can be formed, for example, on a reflecting mirror, an optically transparent window part located between the article to be heated and the lamps or a light diffusion area formed on the light-emitting bulbs of the lamps. The size of the region occupied by the light diffusion part is such that diffused light is not projected to the guard ring.
摘要翻译：一种具有待加热物品的光照射型加热装置，位于该物品周边的保护环，位于被加热物上方的多个灯和防护环，以及位于灯的上方的反射镜，光扩散部位于对应于被加热物的上部区域，使得漫射光投射到待加热物品的整个表面上。光漫射部可以例如形成在反射镜上，位于待加热物品与灯之间的光学透明窗部或形成在灯的发光灯泡上的光扩散区域。由光扩散部占据的区域的大小使得漫射光不会被投射到防护环。

10. 发明申请

US20090149252A1 Storage medium storing a video reproduction controlling program, video reproduction controlling apparatus and video reproduction controlling method 审中-公开
标题翻译：存储视频再现控制程序，视频再现控制装置和视频再现控制方法的存储介质
公开(公告)号：US20090149252A1
公开(公告)日：2009-06-11
申请号：US12219932
申请日：2008-07-30
申请人： Noriyuki Sato , Shinobu Suzuki , Yasutaka Takeuchi , Takafumi Masaoka , Kyohei Seki
发明人： Noriyuki Sato , Shinobu Suzuki , Yasutaka Takeuchi , Takafumi Masaoka , Kyohei Seki
IPC分类号： A63F9/24
CPC分类号： H04N5/85 , G11B19/025 , G11B27/105 , G11B2220/2562 , H04N5/4403 , H04N5/765 , H04N5/775 , H04N5/907 , H04N9/8063 , H04N9/8205 , H04N21/42204 , H04N21/42222 , H04N21/42646 , H04N21/4312 , H04N21/4325 , H04N21/47217 , H04N21/4781
摘要： A game apparatus as a video reproduction controlling apparatus includes a CPU, and the CPU executes a reproduction control of a DVD. In the middle of reproducing the DVD, a content such as an video, a voice, etc. are reproduced. In a case that a reproduction operation such as pause, reproduction, fast reverse, fast forward, heading, etc. is not prohibited, in response to an instruction of the reproduced screen displayed on the monitor with a controller, an operation panel for reproduction operation is displayed. On the other hand, while a menu is reproduced or in a case that a screen button is displayed in accordance with the reproduction, the reproduction operation is prohibited, and even if the reproduced screen is instructed with the controller, the operation panel is not displayed.
摘要翻译：作为视频再现控制装置的游戏装置包括CPU，并且CPU执行DVD的再现控制。在再现DVD的过程中，再现了诸如视频，语音等的内容。在不用禁止诸如暂停，再现，快速反转，快进，前进等的再现操作的情况下，响应于用控制器显示在监视器上的再现画面的指令，用于再现操作的操作面板被展示。另一方面，当再现菜单时，或者在根据再现显示屏幕按钮的情况下，禁止再现操作，并且即使再现画面被控制器指示，也不显示操作面板。

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