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1. 发明授权

US5327221A Device for detecting positional relationship between two objects 失效
标题翻译：用于检测两个物体之间的位置关系的装置
公开(公告)号：US5327221A
公开(公告)日：1994-07-05
申请号：US919380
申请日：1992-07-29
申请人： Kenji Saitoh , Masakazu Matsugu , Shigeyuki Suda , Yukichi Niwa , Ryo Kuroda , Noriyuki Nose , Minoru Yoshii , Naoto Abe , Mitsutoshi Ohwada
发明人： Kenji Saitoh , Masakazu Matsugu , Shigeyuki Suda , Yukichi Niwa , Ryo Kuroda , Noriyuki Nose , Minoru Yoshii , Naoto Abe , Mitsutoshi Ohwada
IPC分类号： G03F9/00 , G01B9/02
CPC分类号： G03F9/7023 , G03F9/7049
摘要： A device for detecting the positional relationship between first and second objects in a predetermined direction includes a light source for emitting light in a direction to the first or second object, and a first detecting portion for detecting the position of incidence of a first light deflected by the first and second objects, wherein the position of incidence of the first light upon the first detecting portion is changeable with a change in the positional relationship between the first and second objects in the predetermined direction. A second detecting portion detects the position of incidence of a second light deflected by at least one of the first and second objects, wherein the state of the position of incidence of the second light resulting from a change in the positional relationship between the first and second objects, in the predetermined direction differs from that of the first light. On the basis of the detection by the first and second detecting portions, the positional relationship between the first and second objects is detected without being affected by an inclination thereof.
摘要翻译：一种用于检测在预定方向上的第一和第二物体之间的位置关系的装置包括：用于沿与第一或第二物体的方向发射光的光源;以及第一检测部分，用于检测第一和第二物体偏转的第一光的入射位置第一和第二物体，其中在第一检测部分上的第一光的入射位置随预定方向上第一和第二物体之间的位置关系的改变而改变。第二检测部分检测由第一和第二物体中的至少一个偏转的第二光的入射位置，其中由第一和第二物体之间的位置关系的变化引起的第二光的入射位置的状态在预定方向上的物体与第一光不同。基于第一和第二检测部分的检测，检测第一和第二物体之间的位置关系，而不受其倾斜的影响。

2. 发明授权

US5294980A Positioning detecting method and apparatus 失效
标题翻译：定位检测方法及装置
公开(公告)号：US5294980A
公开(公告)日：1994-03-15
申请号：US58662
申请日：1993-05-10
申请人： Masakazu Matsugu , Kenji Saitoh , Yukichi Niwa , Noriyuki Nose , Ryo Kuroda , Shigeyuki Suda
发明人： Masakazu Matsugu , Kenji Saitoh , Yukichi Niwa , Noriyuki Nose , Ryo Kuroda , Shigeyuki Suda
IPC分类号： G03F9/00 , G01B11/00 , G01N21/85
CPC分类号： G03F9/70
摘要： A device for detecting a relative positional relationship between first and second objects with respect to a predetermined direction includes an illumination system for irradiating the first object with light, wherein the first and second objects are provided with first and second physical optic elements, respectively, each having a light converging or diverging function in at least one direction and wherein the illumination system illuminates the first physical optic element. A photodetecting system detects light passing through the first object and emanating from the second object, and is operable to detect light convergently or divergently influenced by both of the first and physical optic elements, such that the relative positional relationship between the first and second objects can be detected on the basis of the detection by the photodetecting system. At least one of the first and second physical optic elements has a light converging or diverging function in a direction perpendicular to the one direction and has different focal lengths in the perpendicular direction and in the one direction.
摘要翻译：用于检测相对于预定方向的第一和第二物体之间的相对位置关系的装置包括用于用光照射第一物体的照明系统，其中第一和第二物体分别设置有第一和第二物理光学元件，在至少一个方向上具有聚光或发散功能，并且其中所述照明系统照亮所述第一物理光学元件。光检测系统检测穿过第一物体并从第二物体发出的光，并且可操作以从第一物理光学元件和物理光学元件两者收敛或分散地检测光，使得第一和第二物体之间的相对位置关系基于光检测系统的检测来检测。第一和第二物理光学元件中的至少一个在垂直于一个方向的方向上具有聚光或发散功能，并且在垂直方向和一个方向上具有不同的焦距。

3. 发明授权

US5162656A Position detecting device employing marks and oblique projection 失效
标题翻译：位置检测装置采用标记和倾斜投影
公开(公告)号：US5162656A
公开(公告)日：1992-11-10
申请号：US841790
申请日：1992-03-02
申请人： Masakazu Matsugu , Kenji Saitoh , Shigeyuki Suda , Ryo Kuroda , Yukichi Niwa , Noriyuki Nose
发明人： Masakazu Matsugu , Kenji Saitoh , Shigeyuki Suda , Ryo Kuroda , Yukichi Niwa , Noriyuki Nose
IPC分类号： G03F9/00
CPC分类号： G03F9/7023 , G03F9/7049
摘要： A device for detecting positional relationship between a first and second objects in a predetermined direction is disclosed. The device includes light source for projecting light upon the first object so that the light incident on the first object is deflected thereby and emanates therefrom in a direction perpendicular to the predetermined direction; a light receiving portion disposed in a direction in which the light having been deflected perpendicularly to the predetermined direction and having been deflected again by the second object advances, the light receiving portion being operable to detect the position of incidence of the light thereupon, wherein the position of the light upon the light receiving means is changeable with the position of incidence of the light upon the second object; and a detecting system for detecting the positional relationship between the first and second objects in the predetermined direction, on the basis of the detection by the light receiving portion.
摘要翻译：公开了一种用于检测预定方向上的第一和第二物体之间的位置关系的装置。该装置包括用于将光投射到第一物体上的光源，使得入射在第一物体上的光由此偏转，并在垂直于预定方向的方向上从其发出; 光接收部分沿着垂直于预定方向偏转并被第二物体再次偏转的方向设置的方向延伸，光接收部分可操作以检测其上的光的入射位置，其中，光在光接收装置上的位置可随着第二物体上的光入射位置而改变; 以及检测系统，用于基于光接收部分的检测来检测第一和第二物体在预定方向上的位置关系。

4. 发明授权

US5343291A Method and apparatus for measuring an interval between two objects 失效
标题翻译：用于测量两个物体间隔的方法和装置
公开(公告)号：US5343291A
公开(公告)日：1994-08-30
申请号：US851109
申请日：1992-03-16
申请人： Mitsutoshi Ohwada , Masakazu Matsugu , Shigeyuki Suda , Minoru Yoshii , Yukichi Niwa , Noriyuki Nose , Kenji Saitoh , Masanobu Hasegawa
发明人： Mitsutoshi Ohwada , Masakazu Matsugu , Shigeyuki Suda , Minoru Yoshii , Yukichi Niwa , Noriyuki Nose , Kenji Saitoh , Masanobu Hasegawa
IPC分类号： G03F9/00 , G01B11/02
CPC分类号： G03F9/7023 , G03F9/7049
摘要： A device for measuring an interval between two plate-like objects includes a light source for projecting a light toward the objects, a detector for detecting a position of incidence, upon a predetermined surface, of the light projected by the light source and deflected by the two objects, and a calculating portion for measuring the interval of the two objects on the basis of the detection by the detector.
摘要翻译：用于测量两个板状物体之间的间隔的装置包括：用于向物体投射光的光源;检测器，用于检测由光源投射并被光源偏转的预定表面上的入射位置; 两个物体和用于根据检测器的检测来测量两个物体的间隔的计算部分。

5. 发明授权

US5319444A Position detecting method and apparatus 失效
标题翻译：位置检测方法和装置
公开(公告)号：US5319444A
公开(公告)日：1994-06-07
申请号：US20464
申请日：1993-02-22
申请人： Kenji Saitoh , Masakazu Matsugu , Yukichi Niwa , Noriyuki Nose , Minoru Yoshii , Shigeyuki Suda
发明人： Kenji Saitoh , Masakazu Matsugu , Yukichi Niwa , Noriyuki Nose , Minoru Yoshii , Shigeyuki Suda
IPC分类号： G03F9/00 , G01B11/14 , G01N21/86
CPC分类号： G03F9/7049
摘要： A method of detecting relative positional deviation between first and second objects. The method includes the steps of providing the first object with a first mark which functions as a lens, providing the second object with a second mark which functions as a lens, providing an optical system between the first and second objects, directing a radiation beam through the first mark and the optical system to the second mark, and detecting any shift of the radiation beam from the second mark irradiated with the radiation beam from the optical system, to detect the relative positional deviation of the first and second objects.
摘要翻译：一种检测第一和第二物体之间的相对位置偏差的方法。该方法包括以下步骤：向第一物体提供用作透镜的第一标记，为第二物体提供用作透镜的第二标记，在第一和第二物体之间提供光学系统，引导辐射束通过第一标记和第二标记的光学系统，并且检测来自用来自光学系统的辐射束照射的第二标记的辐射束的任何偏移，以检测第一和第二物体的相对位置偏差。

6. 发明授权

US5325176A Position detecting method and apparatus including Fraunhofer diffraction detector 失效
$Position detecting method and apparatus including Fraunhofer diffraction detector$
标题翻译：位置检测方法和装置，包括弗劳恩霍夫衍射检测器
公开(公告)号：US5325176A
公开(公告)日：1994-06-28
申请号：US875601
申请日：1992-04-28
申请人： Shigeyuki Suda , Kenji Saitoh , Masakazu Matsugu , Naoto Abe , Minoru Yoshii , Ryo Kuroda
发明人： Shigeyuki Suda , Kenji Saitoh , Masakazu Matsugu , Naoto Abe , Minoru Yoshii , Ryo Kuroda
IPC分类号： G03F9/00 , G01B11/02
CPC分类号： G03F9/7076
摘要： A device usable with a first object and a second object at least one of which is provided with a diffraction grating, for detecting the position of the second object relative to the first object, is disclosed. The device includes a light source for projecting a position detecting beam upon the first object; a beam detecting portion for receiving the position detecting beam after it is directed from the first object and being incident on the second object, the beam detecting portion receiving the position detecting beam to detect the position of the second object relative to the first object; wherein at least one diffraction grating is disposed in the path of the position detecting beam to be received by the beam detecting portion, which diffraction grating is effective to diffract the position detecting beam at least twice and wherein the beam detecting portion is disposed at a site effective not to receive unwanted diffraction light produced from the or at least one diffraction grating.
摘要翻译：公开了一种可用于第一物体和第二物体的装置，其中至少一个具有用于检测第二物体相对于第一物体的位置的衍射光栅。该装置包括用于将位置检测光束投射到第一物体上的光源; 光束检测部分，用于在从第一物体引导之后接收位置检测光束并入射到第二物体上，光束检测部分接收位置检测光束以检测第二物体相对于第一物体的位置; 其中至少一个衍射光栅设置在所述位置检测光束的路径中，以由所述光束检测部分接收，所述衍射光栅有效地将所述位置检测光束衍射至少两次，并且其中所述光束检测部分设置在位置有效地不接收由该至少一个衍射光栅产生的不想要的衍射光。

7. 发明授权

US5235408A Position detecting method and apparatus 失效
标题翻译：位置检测方法和装置
公开(公告)号：US5235408A
公开(公告)日：1993-08-10
申请号：US888434
申请日：1992-05-28
申请人： Masakazu Matsugu , Kenji Saitoh , Shigeyuki Suda
发明人： Masakazu Matsugu , Kenji Saitoh , Shigeyuki Suda
IPC分类号： G03F9/00
CPC分类号： G03F9/7049
摘要： A device for detecting a positional relationship between a mask and a wafer, includes a light source for projecting light toward the mask, a first photodetecting system for detecting the position, on a predetermined plane, of first light deflected by the mask and the wafer, wherein the position of incidence on the first photodetecting system of the first light is changeable with the positional relationship between the mask and the wafer, a second photodetecting system for detecting the position, on a predetermined plane, of incidence of second light deflected by the mask, wherein the position of incidence on the second photodetecting system, of the second light being changeable with relative inclination between the mask and the light source, and a position detecting system for detecting the relative position of the mask and the wafer on the basis of the detection by the first and second photodetecting systems, wherein the detection by the position detecting system can be free from the relative inclination between the mask and the light source.
摘要翻译：一种用于检测掩模和晶片之间的位置关系的装置，包括用于将光投射到掩模的光源，用于检测由掩模和晶片偏转的第一光在预定平面上的位置的第一光电检测系统，其中，所述第一光的第一受光系统上的入射位置可根据所述掩模和所述晶片之间的位置关系而改变;第二光电检测系统，用于检测由所述掩模偏转的第二光在预定平面上的位置的位置; 其特征在于，所述第二光检测系统中的所述入射位置，所述第二光的入射位置可以通过所述掩模和所述光源之间的相对倾斜度而变化;以及位置检测系统，用于基于所述掩模和所述光源检测所述掩模和所述晶片的相对位置由第一和第二光电检测系统进行检测，其中位置检测系统的检测可以不受面罩与光源之间的相对倾斜度。

8. 发明授权

US5200800A Position detecting method and apparatus 失效
标题翻译：位置检测方法和装置
公开(公告)号：US5200800A
公开(公告)日：1993-04-06
申请号：US892732
申请日：1992-05-29
申请人： Shigeyuki Suda , Kenji Saitoh , Minoru Yoshii , Noriyuki Nose
发明人： Shigeyuki Suda , Kenji Saitoh , Minoru Yoshii , Noriyuki Nose
IPC分类号： G03F9/00
CPC分类号： G03F9/7076
摘要： A method of detecting a position of a substrate having an alignment mark includes the steps of projecting a radiation beam from an optical head to the alignment mark such that the alignment mark produces a signal beam on the basis of which the position of the substrate is detected, forming a reference mark on the substrate at a position different from that of the alignment mark, projecting a radiation beam from the optical head to the reference mark, such that the reference mark produces a reference beam, detecting the relative positional deviation of the optical head relative to the reference mark on the basis of the produced reference beam, and adjusting the relative position of the optical head and the alignment mark on the basis of the detected relative positional deviation and, after the adjustment, detecting the position of the substrate on the basis of the produced signal beam.
摘要翻译：检测具有对准标记的基板的位置的方法包括以下步骤：将来自光学头的辐射束投射到对准标记，使得对准标记产生信号光束，基于该信号光束检测基板的位置在与所述对准标记不同的位置的基板上形成参考标记，将来自所述光学头的辐射束投射到所述基准标记，使得所述基准标记产生参考光束，检测所述光学器件的相对位置偏差基于所生成的参考光束相对于参考标记的头部，并且基于检测到的相对位置偏差来调整光学头和对准标记的相对位置，并且在调整之后，检测基板的位置产生信号光束的基础。

9. 发明授权

US08497995B2 Measurement apparatus and method for measuring surface shape and roughness 有权
标题翻译：用于测量表面形状和粗糙度的测量装置和方法
公开(公告)号：US08497995B2
公开(公告)日：2013-07-30
申请号：US12669825
申请日：2008-08-14
申请人： Kazuyuki Ota , Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazunori Okudomi , Hiroyuki Shinbata , Kenji Saitoh , Masakazu Matsugu
发明人： Kazuyuki Ota , Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazunori Okudomi , Hiroyuki Shinbata , Kenji Saitoh , Masakazu Matsugu
IPC分类号： G01B11/24
CPC分类号： G01B11/24 , G01B11/30
摘要： A measurement apparatus includes an illumination light setting unit which sets illumination light having an optical characteristic corresponding to a microstructure which is formed on the surface of a measurement target and is to be measured, and a measurement unit which measures reflected light when the measurement target is irradiated with the illumination light. In addition, an extraction unit extracts, from the measured reflected light, information about the surface shape of the measurement target and the microstructure formed on the surface.
摘要翻译：测量装置包括照明光设定单元，其设置具有对应于形成在测量对象物的表面上并要被测量的微结构的光学特性的照明光，以及测量单元，其在测量对象为用照明光照射。此外，提取单元从测量的反射光中提取关于测量目标的表面形状和形成在表面上的微结构的信息。

10. 发明授权

US08456621B2 Measurement system and measurement processing method 有权
标题翻译：测量系统和测量处理方法
公开(公告)号：US08456621B2
公开(公告)日：2013-06-04
申请号：US13595013
申请日：2012-08-27
申请人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
发明人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
IPC分类号： G01N21/00
CPC分类号： G01B11/25
摘要： This invention is directed to extract the scattering characteristic of a measurement target together when measuring the surface shape in a measurement system, which measures the surface shape of a measurement target, by the pattern projection method. To accomplish this, the measurement system includes an illumination unit which irradiates a measurement target with dot pattern light, a reflected light measurement unit which receives the reflected light at a reflection angle almost equal to a incident angle, and a reflected light extraction unit which extracts the inclination of the surface of the measurement target, based on the shift amount between the light receiving position of the received reflected light and a predetermined reference position, and extracts the luminance value of the reflected light and the dot diameter of the dot pattern light as information about the scattering characteristic.
摘要翻译：本发明旨在通过图案投影法在测量测量对象的表面形状的测量系统中测量表面形状时，将测量对象的散射特性一起提取。为了实现这一点，测量系统包括用点阵图形光照射测量对象的照明单元，以几乎等于入射角的反射角接收反射光的反射光测量单元和提取出的反射光提取单元基于接收到的反射光的光接收位置与预定的基准位置之间的偏移量，测量对象的表面的倾斜度，并将点阵图案光的反射光的亮度值和点直径提取为关于散射特性的信息。

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