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1. 发明授权

US4508877A Process for producing a high purity cyclized polymer of isoprene 失效
标题翻译：制备高纯度异戊二烯环化聚合物的方法
公开(公告)号：US4508877A
公开(公告)日：1985-04-02
申请号：US554299
申请日：1983-11-22
申请人： Masaaki Todoko , Hiroyuki Watanabe
发明人： Masaaki Todoko , Hiroyuki Watanabe
IPC分类号： C08F4/00 , C08C19/10 , C08F4/42 , C08F4/46 , C08F36/00 , C08F136/00 , C08F136/08 , C08F236/00 , C08F8/48
CPC分类号： C08C19/10
摘要： A process for producing cyclized isoprene polymers having a dispersion degree not higher than 2, which comprises living-polymerizing isoprene monomers using as initiator an organometal compound which is expressed by a general formula RM (where R is alkyl, aryl or aralkyl group and M is lithium, sodium or potassium atom), to obtain an isoprene polymer having a dispersion degree not larger than 1.1, which is close to a unit dispersion, and bringing the obtained polymer into contact with a catalyst composed of a boron trifluoride-ether complex and a carboxylic acid expressed by a general formula Cl.sub.3-n H.sub.n CCOOH (where n is an integer ranging from 0 to 3) under a mild condition. The cyclized polymer is very useful for negative resists in integrated circuits.
摘要翻译：一种生产具有不高于2的分散度的环化异戊二烯聚合物的方法，该方法包括使用由通式RM（其中R是烷基，芳基或芳烷基，M是R）表示的有机金属化合物作为引发剂的活性聚合异戊二烯单体锂，钠或钾原子），得到分散度不大于1.1的异戊二烯聚合物，其接近单位分散体，并使得到的聚合物与由三氟化硼 - 醚络合物和羧酸由通式为Cl 3 -nHnCCOOH（其中n为0至3的整数）表示。环化聚合物非常适用于集成电路中的负抗蚀剂。

2. 发明授权

US5212043A Photoresist composition comprising a non-aromatic resin having no aromatic structures derived from units of an aliphatic cyclic hydrocarbon and units of maleic anhydride and/or maleimide and a photosensitive agent 失效
标题翻译：包含非芳香树脂的非芳香族化合物的组合物，其具有不含芳烃环烷烃和马来酸酐和/或马来酰亚胺和感光剂的单体衍生的芳族结构
公开(公告)号：US5212043A
公开(公告)日：1993-05-18
申请号：US425191
申请日：1990-10-17
申请人： Takashi Yamamoto , Masaaki Todoko , Toru Seita , Kyoko Nagaoka , Kosaburo Matsumura
发明人： Takashi Yamamoto , Masaaki Todoko , Toru Seita , Kyoko Nagaoka , Kosaburo Matsumura
IPC分类号： G03F7/012 , G03F7/023
CPC分类号： G03F7/012 , G03F7/0125 , G03F7/0233 , Y10S430/108 , Y10S430/111
摘要： A photoresist composition comprising:a resin soluble in an aqueous alkaline solution, having units of an aliphatic cyclic hydrocarbon main frame and units derived from maleic anhydride and/or units derived from a maleimide; anda photosensitive agent in a sufficient amount to promote or hinder the solubility of said resin in an aqueous alkaline solution upon exposure to active radiation so as to create a substantial difference in the solubility as between an exposed portion and a non-exposed portion and to form a positive or negative image by subsequent development with an aqueous alkaline solution.
摘要翻译： PCT No.PCT / JP89 / 00159 Sec。 371日期：1989年10月17日 102（e）1989年10月17日PCT 1989年2月17日PCT。一种光致抗蚀剂组合物，其包含：可溶于碱性水溶液的树脂，其具有脂肪族环状烃主链单元和源自马来酸酐和/或衍生自马来酰亚胺的单元; 以及足够量的光敏剂，以便在暴露于主动辐射时促进或阻碍所述树脂在碱性水溶液中的溶解度，从而在暴露部分和非暴露部分之间产生明显的溶解度差异，通过随着碱性水溶液的显影形成正或负图像。

3. 发明授权

US5223376A Method for producing fine patterns utilizing specific polymeric diazonium salt, or diazonium salt/sulfone group containing polymer, as photobleachable agent 失效
标题翻译：使用特定的聚合重氮盐或含重氮盐/砜基的聚合物生产精细图案的方法，作为光可漂白剂
公开(公告)号：US5223376A
公开(公告)日：1993-06-29
申请号：US815885
申请日：1992-01-06
申请人： Masazumi Hasegawa , Masaaki Todoko , Mitsutoshi Fukuda
发明人： Masazumi Hasegawa , Masaaki Todoko , Mitsutoshi Fukuda
IPC分类号： G03F7/09
CPC分类号： G03F7/091
摘要： A method for producing fine patterns is disclosed, comprising spin-coating a photosensitive resin solution as an upper layer, which comprises a diazonium salt as a photobleachable agent, water and/or an organic solvent, and a polymer, on a photoresist layer as a lower layer and then light-exposing both the upper layer and the lower layer, wherein the polymer in the upper layer has a structural unit shown by formula (I): ##STR1## wherein R.sub.1, R.sub.2, and R.sub.3 each represents a hydrogen atom, an alkyl group having from 1 to 4 carbon atoms, a halogen atom, or a nitrile group; R.sub.4 represents a hydrogen atom, an alkyl group having from 1 to 4 carbon atoms, a halogen atom, a hydroxyl group, or a carboxyl group; and X represents a hydrogen atom, an alkali metal, an alkaline earth metal, or an ammonium group.According to another embodiment of this invention, a method for producing fine patterns is disclosed, comprising spin-coating a photosensitive resin solution as an upper layer, which comprises a diazonium salt as a photobleachable agent, water and/or an organic solvent, and a polymer, on a photoresist layer as a lower layer, wherein a counter anion of the diazonium salt is a functional group of the polymer in the photosensitive resin.According to this invention, a light of low contrast can be increased to one of high contrast without requiring complicated steps, and patterns of less than 1 .mu.m can be produced with good precision.
摘要翻译：公开了一种生产精细图案的方法，包括在作为上层的光致抗蚀剂层上旋涂作为上光层的感光性树脂溶液，其包含作为光可漂白剂的重氮盐，水和/或有机溶剂和聚合物，下层，然后对上层和下层进行曝光，其中上层中的聚合物具有式（I）所示的结构单元：其中R 1，R 2和R 3各自表示氢原子，具有1至4个碳原子的烷基，卤素原子或腈基; R4表示氢原子，具有1至4个碳原子的烷基，卤素原子，羟基或羧基; X表示氢原子，碱金属，碱土金属或铵基。根据本发明的另一个实施方案，公开了一种制造精细图案的方法，其包括旋涂作为上层的感光性树脂溶液，其包含重氮盐作为光漂白剂，水和/或有机溶剂，以及聚合物，作为下层的光致抗蚀剂层，其中重氮盐的抗衡阴离子是感光性树脂中的聚合物的官能团。根据本发明，可以将低对比度的光增加到高对比度之一而不需要复杂的步骤，并且可以以高精度产生小于1μm的图案。

4. 发明授权

US5202217A Solubilization-inhibitor and positive resist composition 失效
标题翻译：溶解抑制剂和阳性抗性组合物
公开(公告)号：US5202217A
公开(公告)日：1993-04-13
申请号：US562655
申请日：1990-08-03
申请人： Masaaki Todoko , Takashi Taniguchi , Toru Seita , Shinji Sato , Katuya Shibata
发明人： Masaaki Todoko , Takashi Taniguchi , Toru Seita , Shinji Sato , Katuya Shibata
IPC分类号： C07C229/12 , C07C245/14 , C07F7/18 , G03F7/004 , G03F7/022
CPC分类号： C07F7/1852 , C07C229/12 , C07C245/14 , C07F7/1844 , G03F7/0045 , G03F7/0226 , Y10S430/115
摘要： A positive resist composition comprising an aromatic group-containing alkali-soluble resin and a compound having an ammonium salt as skeleton, as the main components.

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