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1. 发明授权

US07856606B2 Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems 有权
标题翻译：用于抑制使用光刻系统打印的特征的波纹的装置，方法和程序产品
公开(公告)号：US07856606B2
公开(公告)日：2010-12-21
申请号：US11092983
申请日：2005-03-30
申请人： Markus Franciscus Antonius Eurlings , Melchior Mulder , Thomas Laidig , Uwe Hollerbach
发明人： Markus Franciscus Antonius Eurlings , Melchior Mulder , Thomas Laidig , Uwe Hollerbach
IPC分类号： G06F17/50
CPC分类号： G03F7/705 , G03F1/36 , G03F7/70433 , G03F7/70441
摘要： A method for minimizing rippling of features when imaged on a surface of a substrate using a mask. The method includes the steps of determining a deviation between a first representation of the design and a second representation of an image of the design at each of a plurality of evaluation points for each section of a plurality of sections of the design; determining an amount of modification of the design at each section based on an evaluation of the plurality of evaluation points; and modifying the design at each section by the amount determined in the previous step.
摘要翻译：一种当使用掩模在衬底的表面上成像时最小化特征波纹的方法。该方法包括以下步骤：在设计的多个部分的每个部分的多个评估点中的每一个处确定设计的第一表示和设计的图像的第二表示之间的偏差; 基于所述多个评价点的评价来确定每个部分处的所述设计的修改量; 并在每个部分修改设计在上一步确定的量。

2. 发明授权

US07349066B2 Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence 有权
标题翻译：用于执行基于模型的光学邻近校正因子分解邻域影响的装置，方法和计算机程序产品
公开(公告)号：US07349066B2
公开(公告)日：2008-03-25
申请号：US11122220
申请日：2005-05-05
申请人： Markus Franciscus Antonius Eurlings , Thomas Laidig , Uwe Hollerbach
发明人： Markus Franciscus Antonius Eurlings , Thomas Laidig , Uwe Hollerbach
IPC分类号： G03B27/70 , G03B27/42 , G06F17/50
CPC分类号： G03F1/36
摘要： Model Based Optical Proximity Correction (MOPC) biasing techniques may be utilized for optimizing a mask pattern. However, conventional MOPC techniques do not account for influence from neighboring features on a mask. This influence may be factored in the following manner—first, generating a predicted pattern from a target pattern and selecting a plurality of evaluation points at which biasing may be determined. Next, a set of multivariable equations are generated for each evaluation point, each equation representing influence of neighboring features on a mask. The equations are solved to determine that amount of bias at each evaluation point, and the mask is optimized accordingly. This process may be repeated until the mask pattern is further optimized.
摘要翻译：基于模型的光学邻近校正（MOPC）偏置技术可用于优化掩模图案。然而，传统的MOPC技术不能解释掩模上相邻特征的影响。这种影响可以以以下方式考虑：首先，从目标图案生成预测图案，并且选择可以确定偏置的多个评估点。接下来，为每个评估点生成一组多变量方程，每个方程表示相邻特征对掩模的影响。求解等式以确定每个评估点的偏差量，并相应地优化掩模。可以重复该过程，直到掩模图案进一步优化。

3. 发明授权

US07355681B2 Optical proximity correction using chamfers and rounding at corners 有权
标题翻译：使用倒角进行光学邻近校正，并在角落四舍五入
公开(公告)号：US07355681B2
公开(公告)日：2008-04-08
申请号：US11101649
申请日：2005-04-08
申请人： Thomas Laidig , Markus Franciscus Antonius Eurlings
发明人： Thomas Laidig , Markus Franciscus Antonius Eurlings
IPC分类号： G03B27/32 , G03B27/42 , G03F9/00
CPC分类号： G03F1/36
摘要： Disclosed is a method of optimizing a design to be formed on a substrate. The method includes approximating rounding of at least one corner of an image of the design; generating a representation of the design further to the approximate rounding of the at least one corner; generating an initial representation of a mask utilized to image the design based on the representation; and performing Optical Proximity Correction (OPC) further to the initial representation of the mask.
摘要翻译：公开了一种优化要在基板上形成的设计的方法。该方法包括近似设计图像的至少一个角的舍入; 产生所述设计的表示进一步到所述至少一个角的近似舍入; 生成用于基于所述表示对所述设计进行成像的掩模的初始表示; 并进一步执行光学近距校正（OPC）以进行掩模的初始表示。

4. 发明授权

US09250536B2 Lithographic apparatus and method 有权
公开(公告)号：US09250536B2
公开(公告)日：2016-02-02
申请号：US12076732
申请日：2008-03-21
申请人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Greevenbroek , Patricius Aloysius Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
发明人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Greevenbroek , Patricius Aloysius Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

5. 发明申请

US20130194562A1 Lithographic Apparatus and Device Manufacturing Method 审中-公开
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20130194562A1
公开(公告)日：2013-08-01
申请号：US13879193
申请日：2011-09-13
申请人： Hendrik Antony Johannes Neerhof , Markus Franciscus Antonius Eurlings
发明人： Hendrik Antony Johannes Neerhof , Markus Franciscus Antonius Eurlings
IPC分类号： G03F7/20
CPC分类号： G03F7/70133 , G03F7/70191 , G03F7/702 , G03F7/70525 , G03F7/70575 , G03F7/7085 , G03F7/70983
摘要： A lithographic apparatus comprising a source of EUV radiation, an illumination system configured to condition a radiation beam, and a projection system configured to project the radiation beam onto a substrate, wherein the apparatus further comprises a filter configured to prevent or reduce the transmission of unwanted radiation and an apparatus configured to detect damage of the filter, wherein the damage detection apparatus comprises an antenna configured to receive radio waves and an analysis apparatus configured to determine the presence of filter damage based upon the received radio waves.
摘要翻译：包括EUV辐射源的光刻设备，被配置为调节辐射束的照明系统以及被配置为将辐射束投影到衬底上的投影系统，其中所述设备还包括被配置为防止或减少不想要的辐射的传输的过滤器辐射和被配置为检测过滤器的损坏的装置，其中所述损坏检测装置包括被配置为接收无线电波的天线和被配置为基于所接收的无线电波来确定过滤器损坏的存在的分析装置。

6. 发明授权

US06875545B2 Method of removing assist features utilized to improve process latitude 有权
标题翻译：消除辅助功能的方法，以改善过程的纬度
公开(公告)号：US06875545B2
公开(公告)日：2005-04-05
申请号：US10305364
申请日：2002-11-27
申请人： Markus Franciscus Antonius Eurlings , Jang Fung Chen , Duan-Fu Stephen Hsu
发明人： Markus Franciscus Antonius Eurlings , Jang Fung Chen , Duan-Fu Stephen Hsu
IPC分类号： G03F1/00 , G03F7/20 , H01L21/027 , G02B31/00
CPC分类号： G03F7/70125 , G03F1/36 , G03F1/70 , G03F7/70441 , G03F7/70466
摘要： A method of transferring a lithographic pattern onto a substrate by use of a lithographic apparatus. The method includes the steps of: (1) defining features to be printed on the substrate; (2) determining which of the features require assist features to be disposed adjacent thereto in order for the features to be printed within defined resolution limits; (3) generating a mask containing the features to be printed and the assist features; (4) performing a first illumination process so as to print the features on the substrate, the first illumination process resulting in the partial printing of the assist features on the substrate; and (5) performing a second illumination process so as to reduce the amount of the assist features printed on the substrate; the second illumination process entails the step of performing a quadrapole illumination.
摘要翻译：通过使用光刻设备将光刻图案转印到基板上的方法。该方法包括以下步骤：（1）定义要印刷在基底上的特征; （2）确定哪些特征要求辅助特征与其邻近设置，以使特征被打印在限定的分辨率限度内; （3）产生包含要印刷的特征和辅助特征的掩模; （4）执行第一照明处理以便在所述基板上打印所述特征，所述第一照明处理导致所述辅助特征部分地印刷在所述基板上; 和（5）执行第二照明处理以减少印刷在基板上的辅助特征量; 第二照明处理需要执行四极照明的步骤。

7. 发明授权

US07316870B2 Device manufacturing method, mask set for use in the method, data set for controlling a programmable patterning device, method of generating a mask pattern and a computer program 失效
标题翻译：装置制造方法，该方法中使用的掩模组，用于控制可编程图案形成装置的数据组，生成掩模图案的方法和计算机程序
公开(公告)号：US07316870B2
公开(公告)日：2008-01-08
申请号：US10814802
申请日：2004-04-01
申请人： Markus Franciscus Antonius Eurlings , Jozef Maria Finders
发明人： Markus Franciscus Antonius Eurlings , Jozef Maria Finders
IPC分类号： G03F1/00 , G03C5/00
CPC分类号： G03F7/701 , G03F7/70125 , G03F7/70283 , G03F7/70466
摘要： Isolated dark features, e.g. contact holes or lines, are exposed in a double exposure, using different illumination settings in the two exposures.
摘要翻译：孤立的黑暗特征，例如接触孔或线，在双重曝光中曝光，在两次曝光中使用不同的照明设置。

8. 发明授权

US07224440B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07224440B2
公开(公告)日：2007-05-29
申请号：US11019525
申请日：2004-12-23
申请人： Stefan Geerte Kruijswijk , Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Heine Melle Mulder
发明人： Stefan Geerte Kruijswijk , Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Heine Melle Mulder
IPC分类号： G03B27/52
CPC分类号： G03F7/70108 , G03F7/70275
摘要： A lithographic apparatus includes an illumination system configured to provide a radiation beam; a patterning device configured to pattern the radiation beam to form a patterned radiation beam; and a projection system configured to project the patterned radiation beam onto a substrate. An optical assembly includes multiple optical elements two-dimensionally arranged between a radiation source and the patterning device to create a predetermined angular distribution of the radiation beam. In order to improve the uniformity of the radiation beam the optical elements are selected from a predetermined number of optical elements having different shapes and/or sizes.
摘要翻译：光刻设备包括被配置为提供辐射束的照明系统; 图案形成装置，其被配置成图案化所述辐射束以形成图案化的辐射束; 以及投影系统，被配置为将图案化的辐射束投影到基板上。光学组件包括在辐射源和图案形成装置之间二维布置的多个光学元件，以产生辐射束的预定角度分布。为了提高辐射束的均匀性，光学元件从具有不同形状和/或尺寸的预定数量的光学元件中选择。

9. 发明授权

US07148952B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07148952B2
公开(公告)日：2006-12-12
申请号：US10976314
申请日：2004-10-29
申请人： Markus Franciscus Antonius Eurlings , Johannes Jacobus Matheus Baselmans , Hako Botma , Jan Bruining , Marcel Mathijs Theodore Marie Dierichs , Antonius Johannes Josephus Van Dijsseldonk , Judocus Marie Dominicus Stoeldraijer
发明人： Markus Franciscus Antonius Eurlings , Johannes Jacobus Matheus Baselmans , Hako Botma , Jan Bruining , Marcel Mathijs Theodore Marie Dierichs , Antonius Johannes Josephus Van Dijsseldonk , Judocus Marie Dominicus Stoeldraijer
IPC分类号： G03B27/42
CPC分类号： G03F7/70075
摘要： The present invention provides a lithographic apparatus comprising an illumination system for providing a projection beam of radiation. The illumination system comprises at least one movable optical element (7), such that a projection beam of radiation (4) can be shifted around a central position. This ensures that inhomogeneities in the intensity distribution in the projection beam (4) will be smeared out, which in turn provides an improved homogeneity of the exposure of a surface to be illuminated by the system, such as a wafer or other substrate. The optical element (7) may comprise a motor movable mirror, prism, filter, lens, axicon, diffuser, diffractive optical array, optical integrator, etc. The invention further provides a device manufacturing method, using a lithographic apparatus according to the invention, wherein the optical element is moved, in order to provide an optimum homogeneity for the projection beam of radiation.
摘要翻译：本发明提供了一种包括用于提供投影射线束的照明系统的光刻设备。照明系统包括至少一个可移动光学元件（7），使得投影射线束（4）能够围绕中心位置移动。这确保了投影束（4）中的强度分布中的不均匀性将被涂抹，这反过来提供了由诸如晶片或其它基底的系统照射的表面的曝光的改进的均匀性。光学元件（7）可以包括电动机可移动镜，棱镜，滤镜，透镜，旋转三棱镜，漫射器，衍射光学阵列，光学积分器等。本发明还提供了一种使用根据本发明的光刻设备的器件制造方法，其中所述光学元件被移动，以便为所述投影射束提供最佳均匀性。

10. 发明授权

US07138212B2 Method and apparatus for performing model-based layout conversion for use with dipole illumination 有权
标题翻译：用于与偶极照明一起使用的基于模型的布局转换的方法和装置
公开(公告)号：US07138212B2
公开(公告)日：2006-11-21
申请号：US10705231
申请日：2003-11-12
申请人： Duan-Fu Stephen Hsu , Kurt E. Wampler , Markus Franciscus Antonius Eurlings , Jang Fung Chen , Noel Corcoran
发明人： Duan-Fu Stephen Hsu , Kurt E. Wampler , Markus Franciscus Antonius Eurlings , Jang Fung Chen , Noel Corcoran
IPC分类号： G01F9/00
CPC分类号： G03F7/705 , G03F1/36 , G03F1/70 , G03F7/70125 , G03F7/70441 , G03F7/70466
摘要： A method of generating complementary masks for use in a multiple-exposure lithographic imaging process. The method includes the steps of: identifying a target pattern having a plurality of features comprising horizontal and vertical edges; generating a horizontal mask based on the target pattern; generating a vertical mask based on the target pattern; performing a shielding step in which at least one of the vertical edges of the plurality of features in the target pattern is replaced by a shield in the horizontal mask, and in which at least one of the horizontal edges of the plurality of features in the target pattern is replaced by a shield in the vertical mask, where the shields have a width which is greater that the width of the corresponding feature in the target pattern; performing an assist feature placement step in which sub-resolution assist features are disposed parallel to at least one of the horizontal edges of the plurality of features in the horizontal mask, and are disposed parallel to at least one of the vertical edges of the plurality of features in the vertical mask, and performing a feature biasing step in which at least one of the horizontal edges of the plurality of features in the horizontal mask are adjusted such that the resulting feature accurately reproduces the target pattern, and at least one of the vertical edges of the plurality of features in the vertical mask are adjusted such that the resulting feature accurately reproduces the target pattern.
摘要翻译：一种产生用于多次曝光光刻成像过程的互补掩模的方法。该方法包括以下步骤：识别具有包括水平和垂直边缘的多个特征的目标图案; 基于目标图案生成水平掩模; 基于目标图案生成垂直掩模; 执行屏蔽步骤，其中目标图案中的多个特征的至少一个垂直边缘被水平掩模中的屏蔽替换，并且其中目标中的多个特征中的至少一个水平边缘图案由垂直掩模中的屏蔽代替，其中屏蔽具有大于目标图案中相应特征的宽度的宽度; 执行辅助特征放置步骤，其中副分辨率辅助特征平行于水平掩模中的多个特征中的至少一个水平边缘设置，并且平行于多个垂直边缘中的至少一个垂直边缘特征，并且执行特征偏置步骤，其中水平掩模中的多个特征的水平边缘中的至少一个被调整，使得所得到的特征精确地再现目标图案，并且垂直屏蔽中的至少一个垂直调整垂直掩模中的多个特征的边缘，使得所得到的特征精确地再现目标图案。

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