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1. 发明申请

US20110292512A1 PRINTABLE STATIC INTERFEROMETRIC IMAGES 失效
标题翻译：可打印的静态干涉图像
公开(公告)号：US20110292512A1
公开(公告)日：2011-12-01
申请号：US13207874
申请日：2011-08-11
申请人： Mark W. Miles , Brian W. Arbuckle , Ion Bita , Manish Kothari , Patrick F. Brinkley , Gang Xu , Nassim Khonsari , Jonathan C. Griffiths
发明人： Mark W. Miles , Brian W. Arbuckle , Ion Bita , Manish Kothari , Patrick F. Brinkley , Gang Xu , Nassim Khonsari , Jonathan C. Griffiths
IPC分类号： G02B1/10
CPC分类号： G02B5/288 , B41M3/003 , G02B5/26 , Y10S359/90
摘要： Methods of fabricating a static interferometric image device and static interferometric image device formed by the same are disclosed. In one embodiment, a method includes providing a substrate. A plurality of liquid layers are formed over the substrate by an inkjet process such that the layers are lateral to one another. The liquid layers contain a solidifiable material or particles. Then, the plurality of liquid layers are solidified to form a plurality of solid layers. In some embodiments, the substrate includes pre-defined cavities, and the liquid layers are formed in the cavities. In other embodiments, the substrate includes a substantially planar, stepped, or continuously transitioning surface, and the liquid layers are formed on the surface. The inkjet process provides optical fillers or spacers for defining interferometric gaps between absorbers and reflectors in the display device, based at least partially on an image that the display device is designed to display.
摘要翻译：公开了制造静态干涉图像装置和由其形成的静态干涉图像装置的方法。在一个实施例中，一种方法包括提供衬底。通过喷墨工艺在基板上形成多个液体层，使得这些层彼此横向。液体层含有可凝固的材料或颗粒。然后，使多个液体层固化，形成多个固体层。在一些实施例中，衬底包括预定义的空腔，并且在空腔中形成液体层。在其他实施例中，衬底包括基本平坦的，阶梯式的或连续的过渡表面，并且液体层形成在表面上。喷墨处理至少部分地基于显示设备被设计为显示的图像来提供用于在显示设备中的吸收体和反射器之间的干涉间隙的光学填充物或间隔物。

2. 发明申请

US20090279174A1 PRINTABLE STATIC INTERFEROMETRIC IMAGES 有权
标题翻译：可打印的静态干涉图像
公开(公告)号：US20090279174A1
公开(公告)日：2009-11-12
申请号：US12116791
申请日：2008-05-07
申请人： Mark W. Miles , Brian W. Arbuckle , Ion Bita , Manish Kothari , Patrick F. Brinkley , Gang Xu , Nassim Khonsari , Jonathan C. Griffiths
发明人： Mark W. Miles , Brian W. Arbuckle , Ion Bita , Manish Kothari , Patrick F. Brinkley , Gang Xu , Nassim Khonsari , Jonathan C. Griffiths
IPC分类号： G02B1/10 , G02B5/00 , B05D5/06
CPC分类号： G02B5/288 , B41M3/003 , G02B5/26 , Y10S359/90
摘要： Methods of fabricating a static interferometric image device and static interferometric image device formed by the same are disclosed. In one embodiment, a method includes providing a substrate. A plurality of liquid layers are formed over the substrate by an inkjet process such that the layers are lateral to one another. The liquid layers contain a solidifiable material or particles. Then, the plurality of liquid layers are solidified to form a plurality of solid layers. In some embodiments, the substrate includes pre-defined cavities, and the liquid layers are formed in the cavities. In other embodiments, the substrate includes a substantially planar, stepped, or continuously transitioning surface, and the liquid layers are formed on the surface. The inkjet process provides optical fillers or spacers for defining interferometric gaps between absorbers and reflectors in the display device, based at least partially on an image that the display device is designed to display.
摘要翻译：公开了制造静态干涉图像装置和由其形成的静态干涉图像装置的方法。在一个实施例中，一种方法包括提供衬底。通过喷墨工艺在基板上形成多个液体层，使得这些层彼此横向。液体层含有可凝固的材料或颗粒。然后，使多个液体层固化，形成多个固体层。在一些实施例中，衬底包括预定义的空腔，并且在空腔中形成液体层。在其他实施例中，衬底包括基本平坦的，阶梯式的或连续的过渡表面，并且液体层形成在表面上。喷墨处理至少部分地基于显示设备被设计为显示的图像来提供用于在显示设备中的吸收体和反射器之间的干涉间隙的光学填充物或间隔物。

3. 发明授权

US08310758B2 Printable static interferometric images 失效
标题翻译：可打印的静态干涉图像
公开(公告)号：US08310758B2
公开(公告)日：2012-11-13
申请号：US13207874
申请日：2011-08-11
申请人： Mark W. Miles , Brian W. Arbuckle , Ion Bita , Manish Kothari , Patrick F. Brinkley , Gang Xu , Nassim Khonsari , Jonathan C. Griffiths
发明人： Mark W. Miles , Brian W. Arbuckle , Ion Bita , Manish Kothari , Patrick F. Brinkley , Gang Xu , Nassim Khonsari , Jonathan C. Griffiths
IPC分类号： G02B1/10
CPC分类号： G02B5/288 , B41M3/003 , G02B5/26 , Y10S359/90
摘要： A static interferometric image device including a plurality of solidified liquid layers is formed over a substrate by an inkjet process such that the layers are lateral to one another. In some embodiments, the substrate includes pre-defined cavities, and the liquid layers are formed in the cavities. In other embodiments, the substrate includes a substantially planar, stepped, or continuously transitioning surface, and the solidified liquid layers are formed on the surface. Optical fillers or spacers are provided for defining interferometric gaps between absorbers and reflectors in the display device, based at least partially on an image that the display device is designed to display.
摘要翻译：包括多个固化液体层的静态干涉图像装置通过喷墨处理在基板上形成，使得这些层彼此横向。在一些实施例中，衬底包括预定义的空腔，并且在空腔中形成液体层。在其它实施例中，衬底包括基本平坦的，阶梯式的或连续的过渡表面，并且固化的液体层形成在表面上。至少部分地基于显示设备被设计为显示的图像，提供光学填充物或间隔物，用于在显示装置中的吸收体和反射体之间限定干涉间隙。

4. 发明授权

US08023191B2 Printable static interferometric images 有权
标题翻译：可打印的静态干涉图像
公开(公告)号：US08023191B2
公开(公告)日：2011-09-20
申请号：US12116791
申请日：2008-05-07
申请人： Mark W. Miles , Brian W. Arbuckle , Ion Bita , Manish Kothari , Patrick F. Brinkley , Gang Xu , Nassim Khonsari , Jonathan C. Griffiths
发明人： Mark W. Miles , Brian W. Arbuckle , Ion Bita , Manish Kothari , Patrick F. Brinkley , Gang Xu , Nassim Khonsari , Jonathan C. Griffiths
IPC分类号： G02B5/28 , G03C5/00
CPC分类号： G02B5/288 , B41M3/003 , G02B5/26 , Y10S359/90
摘要： Methods of fabricating a static interferometric image device and static interferometric image device formed by the same are disclosed. In one embodiment, a method includes providing a substrate. A plurality of liquid layers are formed over the substrate by an inkjet process such that the layers are lateral to one another. The liquid layers contain a solidifiable material or particles. Then, the plurality of liquid layers are solidified to form a plurality of solid layers. In some embodiments, the substrate includes pre-defined cavities, and the liquid layers are formed in the cavities. In other embodiments, the substrate includes a substantially planar, stepped, or continuously transitioning surface, and the liquid layers are formed on the surface. The inkjet process provides optical fillers or spacers for defining interferometric gaps between absorbers and reflectors in the display device, based at least partially on an image that the display device is designed to display.
摘要翻译：公开了制造静态干涉图像装置和由其形成的静态干涉图像装置的方法。在一个实施例中，一种方法包括提供衬底。通过喷墨工艺在基板上形成多个液体层，使得这些层彼此横向。液体层含有可凝固的材料或颗粒。然后，使多个液体层固化，形成多个固体层。在一些实施例中，衬底包括预定义的空腔，并且在空腔中形成液体层。在其他实施例中，衬底包括基本平坦的，阶梯式的或连续的过渡表面，并且液体层形成在表面上。喷墨处理至少部分地基于显示设备被设计为显示的图像来提供用于在显示设备中的吸收体和反射器之间的干涉间隙的光学填充物或间隔物。

5. 发明授权

US07184202B2 Method and system for packaging a MEMS device 有权
标题翻译：用于封装MEMS器件的方法和系统
公开(公告)号：US07184202B2
公开(公告)日：2007-02-27
申请号：US11045800
申请日：2005-01-28
申请人： Mark W. Miles , Jeffrey B. Sampsell , Lauren Palmateer , Brian W. Arbuckle , Philip D. Floyd
发明人： Mark W. Miles , Jeffrey B. Sampsell , Lauren Palmateer , Brian W. Arbuckle , Philip D. Floyd
IPC分类号： G02F1/00
CPC分类号： B81C1/0023 , G02B26/001 , Y10T29/49002
摘要： A MEMS-based display device is described, wherein an array of interferometric modulators are configured to reflect light through a transparent substrate. The transparent substrate is sealed to a backplate and the backplate can contain electronic circuitry for controlling the array of interferometric modulators. The backplate can provide physical support for device components, such as electronic components which can be used to control the state of the display. The backplate can also be utilized as a primary structural support for the device.
摘要翻译：描述了基于MEMS的显示装置，其中干涉式调制器的阵列被配置为将光反射通过透明基板。透明基板被密封到背板，并且背板可以包含用于控制干涉式调制器阵列的电子电路。背板可以为诸如可用于控制显示器状态的电子部件等设备组件提供物理支持。背板也可以用作设备的主要结构支撑。

6. 发明授权

US08278726B2 Controlling electromechanical behavior of structures within a microelectromechanical systems device 失效
标题翻译：控制微机电系统设备内结构的机电行为
公开(公告)号：US08278726B2
公开(公告)日：2012-10-02
申请号：US12861778
申请日：2010-08-23
申请人： Mark W. Miles , John Batey , Clarence Chui , Manish Kothari , Ming-Hau Tung
发明人： Mark W. Miles , John Batey , Clarence Chui , Manish Kothari , Ming-Hau Tung
IPC分类号： H01L29/84
CPC分类号： B81B3/0086 , B81C2201/0109 , B81C2201/014 , B81C2201/053 , G02B26/001
摘要： In one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer by at least reducing charge build up thereon during activation of the microelectromechanical systems device.
摘要翻译：在一个实施例中，本发明提供一种用于制造微机电系统装置的方法。该方法包括制造包括具有特征机电响应的膜的第一层和特征光学响应，其中特征光学响应是期望的，并且特征机电响应是不期望的; 以及通过在所述微机电系统装置的启动期间至少减少其上的电荷积累来修改所述第一层的特征机电响应。

7. 发明授权

US08120125B2 MEMS devices having overlying support structures 有权
标题翻译：具有上覆支撑结构的MEMS器件
公开(公告)号：US08120125B2
公开(公告)日：2012-02-21
申请号：US13012538
申请日：2011-01-24
申请人： Teruo Sasagawa , SuryaPrakash Ganti , Mark W. Miles , Clarence Chui , Manish Kothari , Ming-Hau Tung
发明人： Teruo Sasagawa , SuryaPrakash Ganti , Mark W. Miles , Clarence Chui , Manish Kothari , Ming-Hau Tung
IPC分类号： H01L29/82
CPC分类号： G02B26/001 , B81B3/007 , B81B2201/047 , B81B2203/0307 , B81B2203/053
摘要： Embodiments of MEMS devices comprise a conductive movable layer spaced apart from a conductive fixed layer by a gap, and supported by rigid support structures, or rivets, overlying depressions in the conductive movable layer, or by posts underlying depressions in the conductive movable layer. In certain embodiments, portions of the rivet structures extend through the movable layer and contact underlying layers. In other embodiments, the material used to form the rigid support structures may also be used to passivate otherwise exposed electrical leads in electrical connection with the MEMS devices, protecting the electrical leads from damage or other interference.
摘要翻译： MEMS器件的实施例包括通过间隙与导电固定层间隔开的导电可移动层，并且由导电可移动层中的上凹部的刚性支撑结构或铆钉支撑，或由导电可移动层中的凹陷下方的柱支撑。在某些实施例中，铆钉结构的部分延伸穿过可移动层并接触下面的层。在其他实施例中，用于形成刚性支撑结构的材料也可以用于钝化与MEMS装置电连接的其它暴露的电引线，保护电引线免受损坏或其他干扰。

8. 发明申请

US20090279173A1 APPARATUS AND METHODS FOR PROVIDING A STATIC INTERFEROMETRIC DISPLAY DEVICE 有权
标题翻译：用于提供静态干涉显示装置的装置和方法
公开(公告)号：US20090279173A1
公开(公告)日：2009-11-12
申请号：US12116524
申请日：2008-05-07
申请人： Clarence Chui , Mark W. Miles , Manish Kothari
发明人： Clarence Chui , Mark W. Miles , Manish Kothari
IPC分类号： G02B27/00 , C23C14/34
CPC分类号： G02B26/001 , G02B5/201 , G02B5/223 , Y10T428/249921
摘要： Disclosed are apparatus and methods for fabricating a static interferometric display device. A plurality of sputtering modules is used to form static interferometric elements on a substrate. These elements each have a plurality of interferometric sub-elements that each has an interferometric stack. A first sub-element of each element is formed so that an interferometric modulation of light due to the first element's stack transmits at a first color, and a second sub-element of each element is formed so that a second color is transmitted. The sub-elements of each element are arranged with respect to each other so that all of the elements appear as a third color to a user if all the sub-elements of each element are left unmasked. A printing system is then used to mask one or more sub-elements of one or more elements so as to form, with the elements, a static image having multiple colors.
摘要翻译：公开了用于制造静态干涉式显示装置的装置和方法。多个溅射模块用于在衬底上形成静态干涉测量元件。这些元件各自具有多个具有干涉式叠层的干涉子元件。每个元件的第一子元件被形成为使得由于第一元件的堆叠而导致的光的干涉调制以第一颜色发送，并且每个元件的第二子元件被形成为使得第二颜色被传输。每个元素的子元素相对于彼此布置，使得如果将每个元素的所有子元素保持未屏蔽，则所有元素在用户身上显示为第三种颜色。然后使用打印系统来掩蔽一个或多个元件的一个或多个子元件，以便与元件形成具有多种颜色的静态图像。

9. 发明授权

US07550794B2 Micromechanical systems device comprising a displaceable electrode and a charge-trapping layer 有权
标题翻译：微机械系统装置包括位移电极和电荷捕获层
公开(公告)号：US07550794B2
公开(公告)日：2009-06-23
申请号：US10251196
申请日：2002-09-20
申请人： Mark W. Miles , John Batey , Clarence Chui , Manish Kothari
发明人： Mark W. Miles , John Batey , Clarence Chui , Manish Kothari
IPC分类号： H01L27/20 , H01L29/84
CPC分类号： G02B26/001 , B81B3/0035
摘要： In one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer by at least reducing charge build up thereon during activation of the microelectromechanical systems device.
摘要翻译：在一个实施例中，本发明提供一种用于制造微机电系统装置的方法。该方法包括制造包括具有特征机电响应的膜的第一层和特征光学响应，其中特征光学响应是期望的，并且特征机电响应是不期望的; 以及通过在所述微机电系统装置的启动期间至少减少其上的电荷积累来修改所述第一层的特征机电响应。

10. 发明授权

US08344470B2 Electromechanical devices having support structures 有权
标题翻译：具有支撑结构的机电装置
公开(公告)号：US08344470B2
公开(公告)日：2013-01-01
申请号：US13099221
申请日：2011-05-02
申请人： Jeffrey B. Sampsell , Clarence Chui , Manish Kothari , Mark W. Miles , Teruo Sasagawa , Wonsuk Chung , Ming-Hau Tung
发明人： Jeffrey B. Sampsell , Clarence Chui , Manish Kothari , Mark W. Miles , Teruo Sasagawa , Wonsuk Chung , Ming-Hau Tung
IPC分类号： H01L31/0232
CPC分类号： G02B26/001 , B81B3/007 , B81B2201/047 , B81B2203/0307 , B81B2203/053
摘要： Embodiments of MEMS devices comprise a conductive movable layer spaced apart from a conductive fixed layer by a gap, and supported by rigid support structures, or rivets, overlying depressions in the conductive movable layer, or by posts underlying depressions in the conductive movable layer. In certain embodiments, both rivets and posts may be used. In certain embodiments, these support structures are formed from rigid inorganic materials, such as metals or oxides. In certain embodiments, etch barriers may also be deposited to facilitate the use of materials in the formation of support structures which are not selectively etchable with respect to other components within the MEMS device.
摘要翻译： MEMS器件的实施例包括通过间隙与导电固定层间隔开的导电可移动层，并且由导电可移动层中的上凹部的刚性支撑结构或铆钉支撑，或由导电可移动层中的凹陷下方的柱支撑。在某些实施例中，可以使用铆钉和柱。在某些实施方案中，这些支撑结构由诸如金属或氧化物的刚性无机材料形成。在某些实施例中，还可以沉积蚀刻阻挡层以促进材料在形成相对于MEMS器件内的其它部件不能选择性蚀刻的支撑结构的形成中的使用。

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