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1. 发明授权

US08278726B2 Controlling electromechanical behavior of structures within a microelectromechanical systems device 失效
标题翻译：控制微机电系统设备内结构的机电行为
公开(公告)号：US08278726B2
公开(公告)日：2012-10-02
申请号：US12861778
申请日：2010-08-23
申请人： Mark W. Miles , John Batey , Clarence Chui , Manish Kothari , Ming-Hau Tung
发明人： Mark W. Miles , John Batey , Clarence Chui , Manish Kothari , Ming-Hau Tung
IPC分类号： H01L29/84
CPC分类号： B81B3/0086 , B81C2201/0109 , B81C2201/014 , B81C2201/053 , G02B26/001
摘要： In one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer by at least reducing charge build up thereon during activation of the microelectromechanical systems device.
摘要翻译：在一个实施例中，本发明提供一种用于制造微机电系统装置的方法。该方法包括制造包括具有特征机电响应的膜的第一层和特征光学响应，其中特征光学响应是期望的，并且特征机电响应是不期望的; 以及通过在所述微机电系统装置的启动期间至少减少其上的电荷积累来修改所述第一层的特征机电响应。

2. 发明授权

US08120125B2 MEMS devices having overlying support structures 有权
标题翻译：具有上覆支撑结构的MEMS器件
公开(公告)号：US08120125B2
公开(公告)日：2012-02-21
申请号：US13012538
申请日：2011-01-24
申请人： Teruo Sasagawa , SuryaPrakash Ganti , Mark W. Miles , Clarence Chui , Manish Kothari , Ming-Hau Tung
发明人： Teruo Sasagawa , SuryaPrakash Ganti , Mark W. Miles , Clarence Chui , Manish Kothari , Ming-Hau Tung
IPC分类号： H01L29/82
CPC分类号： G02B26/001 , B81B3/007 , B81B2201/047 , B81B2203/0307 , B81B2203/053
摘要： Embodiments of MEMS devices comprise a conductive movable layer spaced apart from a conductive fixed layer by a gap, and supported by rigid support structures, or rivets, overlying depressions in the conductive movable layer, or by posts underlying depressions in the conductive movable layer. In certain embodiments, portions of the rivet structures extend through the movable layer and contact underlying layers. In other embodiments, the material used to form the rigid support structures may also be used to passivate otherwise exposed electrical leads in electrical connection with the MEMS devices, protecting the electrical leads from damage or other interference.
摘要翻译： MEMS器件的实施例包括通过间隙与导电固定层间隔开的导电可移动层，并且由导电可移动层中的上凹部的刚性支撑结构或铆钉支撑，或由导电可移动层中的凹陷下方的柱支撑。在某些实施例中，铆钉结构的部分延伸穿过可移动层并接触下面的层。在其他实施例中，用于形成刚性支撑结构的材料也可以用于钝化与MEMS装置电连接的其它暴露的电引线，保护电引线免受损坏或其他干扰。

3. 发明申请

US20090279173A1 APPARATUS AND METHODS FOR PROVIDING A STATIC INTERFEROMETRIC DISPLAY DEVICE 有权
标题翻译：用于提供静态干涉显示装置的装置和方法
公开(公告)号：US20090279173A1
公开(公告)日：2009-11-12
申请号：US12116524
申请日：2008-05-07
申请人： Clarence Chui , Mark W. Miles , Manish Kothari
发明人： Clarence Chui , Mark W. Miles , Manish Kothari
IPC分类号： G02B27/00 , C23C14/34
CPC分类号： G02B26/001 , G02B5/201 , G02B5/223 , Y10T428/249921
摘要： Disclosed are apparatus and methods for fabricating a static interferometric display device. A plurality of sputtering modules is used to form static interferometric elements on a substrate. These elements each have a plurality of interferometric sub-elements that each has an interferometric stack. A first sub-element of each element is formed so that an interferometric modulation of light due to the first element's stack transmits at a first color, and a second sub-element of each element is formed so that a second color is transmitted. The sub-elements of each element are arranged with respect to each other so that all of the elements appear as a third color to a user if all the sub-elements of each element are left unmasked. A printing system is then used to mask one or more sub-elements of one or more elements so as to form, with the elements, a static image having multiple colors.
摘要翻译：公开了用于制造静态干涉式显示装置的装置和方法。多个溅射模块用于在衬底上形成静态干涉测量元件。这些元件各自具有多个具有干涉式叠层的干涉子元件。每个元件的第一子元件被形成为使得由于第一元件的堆叠而导致的光的干涉调制以第一颜色发送，并且每个元件的第二子元件被形成为使得第二颜色被传输。每个元素的子元素相对于彼此布置，使得如果将每个元素的所有子元素保持未屏蔽，则所有元素在用户身上显示为第三种颜色。然后使用打印系统来掩蔽一个或多个元件的一个或多个子元件，以便与元件形成具有多种颜色的静态图像。

4. 发明授权

US07550794B2 Micromechanical systems device comprising a displaceable electrode and a charge-trapping layer 有权
标题翻译：微机械系统装置包括位移电极和电荷捕获层
公开(公告)号：US07550794B2
公开(公告)日：2009-06-23
申请号：US10251196
申请日：2002-09-20
申请人： Mark W. Miles , John Batey , Clarence Chui , Manish Kothari
发明人： Mark W. Miles , John Batey , Clarence Chui , Manish Kothari
IPC分类号： H01L27/20 , H01L29/84
CPC分类号： G02B26/001 , B81B3/0035
摘要： In one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer by at least reducing charge build up thereon during activation of the microelectromechanical systems device.
摘要翻译：在一个实施例中，本发明提供一种用于制造微机电系统装置的方法。该方法包括制造包括具有特征机电响应的膜的第一层和特征光学响应，其中特征光学响应是期望的，并且特征机电响应是不期望的; 以及通过在所述微机电系统装置的启动期间至少减少其上的电荷积累来修改所述第一层的特征机电响应。

5. 发明授权

US08344470B2 Electromechanical devices having support structures 有权
标题翻译：具有支撑结构的机电装置
公开(公告)号：US08344470B2
公开(公告)日：2013-01-01
申请号：US13099221
申请日：2011-05-02
申请人： Jeffrey B. Sampsell , Clarence Chui , Manish Kothari , Mark W. Miles , Teruo Sasagawa , Wonsuk Chung , Ming-Hau Tung
发明人： Jeffrey B. Sampsell , Clarence Chui , Manish Kothari , Mark W. Miles , Teruo Sasagawa , Wonsuk Chung , Ming-Hau Tung
IPC分类号： H01L31/0232
CPC分类号： G02B26/001 , B81B3/007 , B81B2201/047 , B81B2203/0307 , B81B2203/053
摘要： Embodiments of MEMS devices comprise a conductive movable layer spaced apart from a conductive fixed layer by a gap, and supported by rigid support structures, or rivets, overlying depressions in the conductive movable layer, or by posts underlying depressions in the conductive movable layer. In certain embodiments, both rivets and posts may be used. In certain embodiments, these support structures are formed from rigid inorganic materials, such as metals or oxides. In certain embodiments, etch barriers may also be deposited to facilitate the use of materials in the formation of support structures which are not selectively etchable with respect to other components within the MEMS device.
摘要翻译： MEMS器件的实施例包括通过间隙与导电固定层间隔开的导电可移动层，并且由导电可移动层中的上凹部的刚性支撑结构或铆钉支撑，或由导电可移动层中的凹陷下方的柱支撑。在某些实施例中，可以使用铆钉和柱。在某些实施方案中，这些支撑结构由诸如金属或氧化物的刚性无机材料形成。在某些实施例中，还可以沉积蚀刻阻挡层以促进材料在形成相对于MEMS器件内的其它部件不能选择性蚀刻的支撑结构的形成中的使用。

6. 发明授权

US07781850B2 Controlling electromechanical behavior of structures within a microelectromechanical systems device 有权
标题翻译：控制微机电系统设备内结构的机电行为
公开(公告)号：US07781850B2
公开(公告)日：2010-08-24
申请号：US11090911
申请日：2005-03-25
申请人： Mark W. Miles , John Batey , Clarence Chui , Manish Kothari , Ming-Hau Tung
发明人： Mark W. Miles , John Batey , Clarence Chui , Manish Kothari , Ming-Hau Tung
IPC分类号： H01L27/14
CPC分类号： B81B3/0086 , B81C2201/0109 , B81C2201/014 , B81C2201/053 , G02B26/001
摘要： In one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer by at least reducing charge build up thereon during activation of the microelectromechanical systems device.
摘要翻译：在一个实施例中，本发明提供一种用于制造微机电系统装置的方法。该方法包括制造包括具有特征机电响应的膜的第一层和特征光学响应，其中特征光学响应是期望的，并且特征机电响应是不期望的; 以及通过在所述微机电系统装置的启动期间至少减少其上的电荷积累来修改所述第一层的特征机电响应。

7. 发明授权

US07672035B2 Separable modulator 失效
公开(公告)号：US07672035B2
公开(公告)日：2010-03-02
申请号：US12325964
申请日：2008-12-01
申请人： Jeffrey B. Sampsell , Mark W. Miles , Clarence Chui , Manish Kothari
发明人： Jeffrey B. Sampsell , Mark W. Miles , Clarence Chui , Manish Kothari
IPC分类号： G02B26/00
CPC分类号： B82Y20/00 , G01J3/26 , G02B6/12 , G02B26/001 , G02B2006/12104 , G02F1/13725 , G02F1/216 , G02F2203/03 , G09G3/3466
摘要： A separable modulator architecture is disclosed. The modulator has a mirror suspended from a flexible layer over a cavity. The flexible layer also forms supports and support posts for the mirror. An alternative separable modulator architecture has a mirror suspended over a cavity. The modulator is supported by supports and support posts. The support posts comprise a flexible layer over support post plugs. A bus structure may be formed upon the flexible layer arranged over the support posts.

8. 发明申请

US20090323168A1 ELECTROMECHANICAL DEVICES AND METHODS OF FABRICATING SAME 有权
标题翻译：电动装置及其制造方法
公开(公告)号：US20090323168A1
公开(公告)日：2009-12-31
申请号：US12489250
申请日：2009-06-22
申请人： Mark W. Miles , John Batey , Clarence Chui , Manish Kothari
发明人： Mark W. Miles , John Batey , Clarence Chui , Manish Kothari
IPC分类号： G02B26/00 , H01L21/28 , H01L21/302 , H01L23/00
CPC分类号： G02B26/001 , B81B3/0035
摘要： In one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer by at least reducing charge build up thereon during activation of the micro electromechanical systems device.
摘要翻译：在一个实施例中，本发明提供一种用于制造微机电系统装置的方法。该方法包括制造包括具有特征机电响应的膜的第一层和特征光学响应，其中特征光学响应是期望的，并且特征机电响应是不期望的; 以及通过在所述微机电系统装置的启动期间至少减少其上积累的电荷来修改所述第一层的特征机电响应。

9. 发明授权

US07852544B2 Separable modulator 有权
标题翻译：可分离调制器
公开(公告)号：US07852544B2
公开(公告)日：2010-12-14
申请号：US12715220
申请日：2010-03-01
申请人： Jeffrey Brian Sampsell , Mark W. Miles , Clarence Chui , Manish Kothari
发明人： Jeffrey Brian Sampsell , Mark W. Miles , Clarence Chui , Manish Kothari
IPC分类号： G02B26/00
CPC分类号： B82Y20/00 , G01J3/26 , G02B6/12 , G02B26/001 , G02B2006/12104 , G02F1/13725 , G02F1/216 , G02F2203/03 , G09G3/3466
摘要： A separable modulator architecture is disclosed. The modulator has a mirror suspended from a flexible layer over a cavity. The flexible layer also forms supports and support posts for the mirror. An alternative separable modulator architecture has a mirror suspended over a cavity. The modulator is supported by supports and support posts. The support posts comprise a flexible layer over support post plugs. A bus structure may be formed upon the flexible layer arranged over the support posts.
摘要翻译：公开了一种可分离调制器架构。调制器具有从空腔上的柔性层悬挂的反射镜。柔性层还形成用于镜子的支撑和支撑柱。另一种可分离的调制器架构具有悬挂在空腔上的反射镜。调制器由支持和支持柱支持。支撑柱包括在支撑柱塞上的柔性层。总线结构可以形成在布置在支撑柱上的柔性层上。

10. 发明申请

US20090080060A1 SEPARABLE MODULATOR 失效
标题翻译：可分离调制器
公开(公告)号：US20090080060A1
公开(公告)日：2009-03-26
申请号：US12325964
申请日：2008-12-01
申请人： Jeffrey Brian Sampsell , Mark W. Miles , Clarence Chui , Manish Kothari
发明人： Jeffrey Brian Sampsell , Mark W. Miles , Clarence Chui , Manish Kothari
IPC分类号： G02B26/00 , G02F1/21
CPC分类号： B82Y20/00 , G01J3/26 , G02B6/12 , G02B26/001 , G02B2006/12104 , G02F1/13725 , G02F1/216 , G02F2203/03 , G09G3/3466
摘要： A separable modulator architecture is disclosed. The modulator has a mirror suspended from a flexible layer over a cavity. The flexible layer also forms supports and support posts for the mirror. An alternative separable modulator architecture has a mirror suspended over a cavity. The modulator is supported by supports and support posts. The support posts comprise a flexible layer over support post plugs. A bus structure may be formed upon the flexible layer arranged over the support posts.
摘要翻译：公开了一种可分离调制器架构。调制器具有从空腔上的柔性层悬挂的反射镜。柔性层还形成用于镜子的支撑和支撑柱。另一种可分离的调制器架构具有悬挂在空腔上的反射镜。调制器由支持和支持柱支持。支撑柱包括在支撑柱塞上的柔性层。总线结构可以形成在布置在支撑柱上的柔性层上。

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