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1. 发明申请

US20080221996A1 Non-intrusive advertising using a mobile terminal 审中-公开
标题翻译：使用移动终端的非侵入式广告
公开(公告)号：US20080221996A1
公开(公告)日：2008-09-11
申请号：US12071803
申请日：2008-02-26
申请人： Mark S. Lucas , Ryan J. Eller , Scott Hudson , Lewis Thomas
发明人： Mark S. Lucas , Ryan J. Eller , Scott Hudson , Lewis Thomas
IPC分类号： G06Q30/00
CPC分类号： H04M1/72566 , G06Q30/0267 , G06Q30/0277 , H04M1/72544
摘要： Methods and apparatus useful for non-intrusive advertising on a mobile wireless communications terminal are disclosed. A method may include storing, according to a timed schedule, a plurality of files containing data representative of a plurality of advertising images in a memory of the mobile wireless communications terminal; and selecting, upon occurrence of a predefined event, one of the plurality of files for display as wallpaper on a display screen of the mobile wireless communications terminal. A method may include waiting for an occurrence of a event; determining, upon the occurrence of the event, if a contraindicated condition is present in the mobile wireless communications terminal, and if the contraindicated condition is not present: performing a first set of actions, but if the contraindicated condition is present: waiting for another occurrence of the predefined event.
摘要翻译：公开了用于移动无线通信终端上的非侵入式广告的方法和装置。一种方法可以包括根据定时调度将包含表示多个广告图像的数据的多个文件存储在移动无线通信终端的存储器中; 以及在发生预定义事件时，在所述移动无线通信终端的显示屏幕上选择所述多个文件中的一个作为壁纸显示。方法可以包括等待事件的发生; 确定在事件发生时，如果移动无线通信终端中存在禁忌症状况，并且如果不存在禁忌症状：执行第一组动作，但是如果存在禁忌症状：等待另一次发生的预定义事件。

2. 发明授权

US06483572B2 Reticle alignment system for use in lithography 有权
标题翻译：光刻对准系统
公开(公告)号：US06483572B2
公开(公告)日：2002-11-19
申请号：US09989097
申请日：2001-11-20
申请人： Craig R. Simpson , Mark S. Lucas
发明人： Craig R. Simpson , Mark S. Lucas
IPC分类号： G03B2742
CPC分类号： G03F7/7085 , G03F7/70666 , G03F9/7088
摘要： Misalignment errors in a lithographic system resulting from the effect of environmental changes on the lens system itself are detected and corrected. A fiducial on the reticle adjacent to its working area is projected through the lens. A metrology plate carried by the lens holds reference mirrors and detectors. The reference mirrors receive the resultant image and reflect it to detectors in a reflected image plane. This provides feedback to the reticle alignment system as to the extent of misalignment, if any. Correction is made by moving the reticle until alignment is achieved and detected. This motion is achieved by using a reticle chuck with linear motors.
摘要翻译：检测并校正由环境变化对透镜系统本身的影响而产生的光刻系统中的对准误差。在其工作区域附近的标线板上的基准通过透镜投影。透镜携带的计量板保持参考镜和检测器。参考镜接收所得到的图像并将其反射到反射图像平面中的检测器。如果有的话，这可以向分划线校准系统提供关于不对准程度的反馈。通过移动光罩进行校正，直到对准被实现和检测。该运动通过使用带线性电动机的光罩卡盘来实现。

3. 发明授权

US5677758A Lithography System using dual substrate stages 失效
标题翻译：平版印刷系统使用双基板阶段
公开(公告)号：US5677758A
公开(公告)日：1997-10-14
申请号：US386266
申请日：1995-02-09
申请人： Robert A. McEachern , Mark S. Lucas , Craig R. Simpson
发明人： Robert A. McEachern , Mark S. Lucas , Craig R. Simpson
IPC分类号： G03F7/20 , G03B27/62 , B65G1/06
CPC分类号： G03F7/70733 , G03F7/70716 , Y10S414/136 , Y10S414/141
摘要： Two lithographic substrate stages are used in a single lithographic system. While a substrate on one stage is being exposed, a second substrate is being loaded, unloaded, or aligned on a second stage. After exposure, the first stage is unloaded, reloaded, and the newly-loaded substrate is aligned, while the second substrate on the second stage is being exposed. The two stages are thus used alternately in different steps of the process. One of the steps is being performed on one stage while a different step is being performed on the other stage. The substrates on both stages are, therefore, being acted upon simultaneously. The two stages are carried on a single linear motor platen, and moved about the platen by use of linear motors. The two stages alternately both move in clockwise directions about the platen, or both move in counterclockwise directions. When both move in clockwise directions, the first stage is moving to the exposure position, and the second stage is moving to the unload/load/align station. When they both move in counterclockwise directions, the second stage is moving to the exposure position and the first stage is moving to the unload/load/align station.
摘要翻译：在单个光刻系统中使用两个光刻基片台。当一个台上的基板被暴露时，在第二台上装载，卸载或对准第二基板。曝光后，第一阶段被卸载，重新加载，并且新装载的基板对准，而第二阶段上的第二基板被曝光。因此，两个阶段在该过程的不同步骤中交替使用。其中一个步骤是在一个阶段执行，而另一个阶段正在执行不同的步骤。因此，在两个阶段上的基底被同时作用。这两个阶段在单个线性电动机压板上承载，并通过使用线性电动机在压板周围移动。两个阶段交替地沿着平台的顺时针方向移动，或者两者在逆时针方向上移动。当两者均沿顺时针方向移动时，第一级移动到曝光位置，第二级移动到卸载/加载/对准站。当它们都沿逆时针方向移动时，第二阶段正在移动到曝光位置，并且第一阶段正在移动到卸载/加载/对准站。

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