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1. 发明申请

US20120108067A1 Edge Bead Remover For Coatings 审中-公开
标题翻译：用于涂料的边缘珠去除剂
公开(公告)号：US20120108067A1
公开(公告)日：2012-05-03
申请号：US12915950
申请日：2010-10-29
申请人： Mark O. Neisser , Srinivasan Chakrapani , Munirathna Padmanaban , Ralph R. Dammel
发明人： Mark O. Neisser , Srinivasan Chakrapani , Munirathna Padmanaban , Ralph R. Dammel
IPC分类号： H01L21/311 , G03F7/42
CPC分类号： G03F7/168 , C11D3/373 , C11D3/3765 , C11D3/43 , C11D7/5022 , C11D11/0047 , G03F7/2041
摘要： The invention relates to an edge bead remover composition for an organic film disposed on a substrate surface, comprising an organic solvent and at least one polymer having a contact angle with water greater than 70°. The invention also relates to a process for using the composition as an edge bead remover for an organic film.
摘要翻译：本发明涉及一种用于有机膜的边缘珠粒去除组合物，其用于设置在基材表面上，包括有机溶剂和至少一种与水的接触角大于70°的聚合物。本发明还涉及使用该组合物作为有机膜的边缘珠去除剂的方法。

2. 发明授权

US08632948B2 Positive-working photoimageable bottom antireflective coating 有权
标题翻译：正面工作的可光成像底部抗反射涂层
公开(公告)号：US08632948B2
公开(公告)日：2014-01-21
申请号：US12570923
申请日：2009-09-30
申请人： Munirathna Padmanaban , Srinivasan Chakrapani , Francis M. Houlihan , Shinji Miyazaki , Edward Ng , Mark O. Neisser
发明人： Munirathna Padmanaban , Srinivasan Chakrapani , Francis M. Houlihan , Shinji Miyazaki , Edward Ng , Mark O. Neisser
IPC分类号： G03F7/039 , G03F7/30 , C08F20/20
CPC分类号： G03F7/091
摘要： The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.
摘要翻译：本发明涉及能够在碱性水溶液中通过显影形成图案的可光成像抗反射涂料组合物，其包含（i）可溶于涂布溶剂中的聚合物A，其包含发色团，交联部分和任选的可裂解基团，在酸或热条件下产生有助于聚合物在碱性水溶液中的溶解度的功能; （ii）至少一种光致酸发生剂; （iii）交联剂; （iv）任选的热酸产生剂; （v）聚合物B，其在显影前可溶于碱性水溶液，其中聚合物B与聚合物A不可混溶并可溶于涂布溶剂中; （vi）涂料溶剂组合物，和（vii）任选的猝灭剂。本发明还涉及用于对抗反射涂层进行成像的方法。

3. 发明申请

US20110076626A1 Positive-Working Photoimageable Bottom Antireflective Coating 有权
标题翻译：正面照相底部防反射涂层
公开(公告)号：US20110076626A1
公开(公告)日：2011-03-31
申请号：US12570923
申请日：2009-09-30
申请人： Munirathna Padmanaban , Srinivasan Chakrapani , Francis M. Houlihan , Shinji Miyazaki , Edward Ng , Mark O. Neisser
发明人： Munirathna Padmanaban , Srinivasan Chakrapani , Francis M. Houlihan , Shinji Miyazaki , Edward Ng , Mark O. Neisser
IPC分类号： G03F7/00 , G03C1/00
CPC分类号： G03F7/091
摘要： The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.
摘要翻译：本发明涉及能够在碱性水溶液中通过显影形成图案的可光成像抗反射涂料组合物，其包含（i）可溶于涂布溶剂中的聚合物A，其包含发色团，交联部分和任选的可裂解基团，在酸或热条件下产生有助于聚合物在碱性水溶液中的溶解度的功能; （ii）至少一种光致酸发生剂; （iii）交联剂; （iv）任选的热酸产生剂; （v）聚合物B，其在显影前可溶于碱性水溶液，其中聚合物B与聚合物A不可混溶并可溶于涂布溶剂中; （vi）涂料溶剂组合物，和（vii）任选的猝灭剂。本发明还涉及用于对抗反射涂层进行成像的方法。

4. 发明授权

US06844131B2 Positive-working photoimageable bottom antireflective coating 有权
标题翻译：正面工作的可光成像底部抗反射涂层
公开(公告)号：US06844131B2
公开(公告)日：2005-01-18
申请号：US10042532
申请日：2002-01-09
申请人： Joseph E. Oberlander , Ralph R. Dammel , Shuji Ding-Lee , Mark O. Neisser , Medhat A. Toukhy
发明人： Joseph E. Oberlander , Ralph R. Dammel , Shuji Ding-Lee , Mark O. Neisser , Medhat A. Toukhy
IPC分类号： G03F7/11 , A61P29/00 , G03F7/004 , G03F7/039 , G03F7/09
CPC分类号： G03F7/09 , G03F7/0392 , G03F7/091 , Y10S430/106
摘要： The present invention relates to a novel absorbing, photoimageable and aqueous developable positive-working antireflective coating composition comprising a photoacid generator and a polymer comprising at least one unit with an acid labile group and at least one unit with an absorbing chromophore. The invention further relates to a process for using such a composition. The present invention also relates to a novel absorbing, photoimageable and aqueous alkali developable positive-working antireflective coating composition comprising a polymer comprising at least one unit with an acid labile group, a dye and a photoacid generator. The invention further relates to a process for using such a composition. The invention also relates to a novel process for forming a positive image with a positive photoresist and a novel photoimageable and aqueous developable positive-working antireflective coating composition, where the antireflective coating comprises a polymer comprising an acid labile group. The invention further relates to such a composition. The invention also relates to a process for imaging a photoimageable antireflective coating composition.
摘要翻译：本发明涉及一种新颖的吸收光可成像和水性显影正性抗反射涂料组合物，其包含光酸产生剂和包含至少一个具有酸不稳定基团的单元和至少一个具有吸收发色团的单元的聚合物。本发明还涉及一种使用这种组合物的方法。本发明还涉及一种新型的吸收，可光成像和水性碱显影正性抗反射涂料组合物，其包含含有至少一个具有酸不稳定基团的单元，染料和光致酸产生剂的聚合物。本发明还涉及使用这种组合物的方法。本发明还涉及一种用正性光致抗蚀剂形成正像的新方法，以及一种新型可光成像和水性可显影正性抗反射涂料组合物，其中抗反射涂层包含含酸不稳定基团的聚合物。本发明还涉及这种组合物。本发明还涉及一种用于对可光成象抗反射涂层组合物进行成像的方法。

5. 发明授权

US06800415B2 Negative-acting aqueous photoresist composition 有权
标题翻译：负性水性光致抗蚀剂组合物
公开(公告)号：US06800415B2
公开(公告)日：2004-10-05
申请号：US09966958
申请日：2001-09-28
申请人： Ping-Hung Lu , Mark O. Neisser , Ralph R. Dammel , Hengpeng Wu
发明人： Ping-Hung Lu , Mark O. Neisser , Ralph R. Dammel , Hengpeng Wu
IPC分类号： G03C173
CPC分类号： G03F7/0382 , Y10S430/106 , Y10S430/11 , Y10S430/111 , Y10S430/115 , Y10S430/122 , Y10S430/128
摘要： The invention relates to a novel negative, aqueous photoresist composition comprising a polyvinylacetal polymer, a water-soluble photoactive compound and a crosslinking agent. The water-soluble photoactive compound is preferably a sulfonium salt. The invention also relates to forming a negative image from the novel photoresist composition.
摘要翻译：本发明涉及包含聚乙烯醇缩醛聚合物，水溶性光敏化合物和交联剂的新型负性水性光致抗蚀剂组合物。水溶性光活性化合物优选为锍盐。本发明还涉及从新型光致抗蚀剂组合物形成负像。

6. 发明授权

US08524441B2 Silicon-based antireflective coating compositions 失效
标题翻译：硅系抗反射涂料组合物
公开(公告)号：US08524441B2
公开(公告)日：2013-09-03
申请号：US12449735
申请日：2008-02-25
申请人： Ruzhi Zhang , WooKyu Kim , David J. Abdallah , PingHung Lu , Mark O. Neisser , Ralph R. Dammel , Ari Karkkainen
发明人： Ruzhi Zhang , WooKyu Kim , David J. Abdallah , PingHung Lu , Mark O. Neisser , Ralph R. Dammel , Ari Karkkainen
IPC分类号： C09D183/04
CPC分类号： C08G77/045 , C09D183/04 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3124
摘要： A polymer comprising a siloxane polymer having at least one Si—OH group and at least one Si—OR group, where R is condensation stabilizing group optionally having a reactive functional group, wherein the siloxane polymer, when placed into a solvent, has a weight average molecular weight increase of less than or equal to 50% after aging for one week at 40° C. as measured by GPC is provided.
摘要翻译：包含具有至少一个Si-OH基团和至少一个Si-OR基团的硅氧烷聚合物的聚合物，其中R是任选具有反应性官能团的缩合稳定基团，其中所述硅氧烷聚合物在置于溶剂中时具有重量提供了通过GPC测量的在40℃下老化1周后的平均分子量增加小于或等于50％。

7. 发明授权

US07816071B2 Process of imaging a photoresist with multiple antireflective coatings 失效
标题翻译：用多个抗反射涂层成像光致抗蚀剂的工艺
公开(公告)号：US07816071B2
公开(公告)日：2010-10-19
申请号：US11338462
申请日：2006-01-24
申请人： David J. Abdallah , Mark O. Neisser , Ralph R. Dammel , Georg Pawlowski , John Biafore , Andrew R. Romano
发明人： David J. Abdallah , Mark O. Neisser , Ralph R. Dammel , Georg Pawlowski , John Biafore , Andrew R. Romano
IPC分类号： G03F7/00
CPC分类号： G03F7/091 , Y10S430/151
摘要： A process for imaging a photoresist comprising the steps of, a) forming a stack of multiple layers of organic antireflective coatings on a substrate; b) forming a coating of a photoresist over the upper layer of the stack of multiple layers of organic antireflective coatings; c) imagewise exposing the photoresist with an exposure equipment; and, d) developing the coating with a developer.
摘要翻译：一种用于对光致抗蚀剂进行成像的方法，包括以下步骤：a）在衬底上形成多层有机抗反射涂层的叠层; b）在多层有机抗反射涂层的堆叠的上层上形成光致抗蚀剂的涂层; c）用曝光设备成像曝光光致抗蚀剂; 和d）用显影剂显影涂层。

8. 发明授权

US07824844B2 Solvent mixtures for antireflective coating compositions for photoresists 有权
标题翻译：用于光致抗蚀剂的抗反射涂料组合物的溶剂混合物
公开(公告)号：US07824844B2
公开(公告)日：2010-11-02
申请号：US11624744
申请日：2007-01-19
申请人： Zhong Xiang , Hengpeng Wu , Hong Zhuang , Eleazar Gonzalez , Mark O. Neisser
发明人： Zhong Xiang , Hengpeng Wu , Hong Zhuang , Eleazar Gonzalez , Mark O. Neisser
IPC分类号： G03F7/40 , G03F7/30 , G03F7/11 , C08F8/30 , H01L21/027
CPC分类号： G03F7/091 , C09D7/20 , G03F7/0048
摘要： The invention relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least one primary organic solvent and at least one secondary organic solvent selected from any of structures 1, 2 and 3, where, R1, R3, and R4, are selected from H and C1-C6 alkyl, and R2, R5, R6, R7, R8, and R9 are selected from C1-C6 alkyl, and n=1-5. The invention also relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least 2 organic solvents, and where the antireflective coating composition has a liquid particle count at 0.2 micron of less than 100/ml after accelerated aging.
摘要翻译：本发明涉及一种抗反射涂料组合物，其能够涂覆在光致抗蚀剂层下面，其中抗反射涂料组合物包含聚合物交联剂和溶剂混合物，其中溶剂混合物包含至少一种主要有机溶剂和至少一种选择的二级有机溶剂其中R 1，R 3和R 4选自H和C 1 -C 6烷基，R 2，R 5，R 6，R 7，R 8和R 9选自C 1 -C 6烷基， n = 1-5。本发明还涉及能够涂覆在光致抗蚀剂层下面的抗反射涂料组合物，其中抗反射涂料组合物包含聚合物交联剂和溶剂混合物，其中溶剂混合物包含至少2种有机溶剂，并且其中抗反射涂料组合物具有在加速老化后，0.2微米的液体颗粒数小于100 / ml。

9. 发明申请

US20070298349A1 Antireflective Coating Compositions Comprising Siloxane Polymer 审中-公开
标题翻译：包含硅氧烷聚合物的抗反射涂料组合物
公开(公告)号：US20070298349A1
公开(公告)日：2007-12-27
申请号：US11425813
申请日：2006-06-22
申请人： Ruzhi Zhang , Mark O. Neisser , Woo-Kyu Kim , David J. Abdallah , Francis Houlihan , Ping-Hung Lu , Hong Zhuang
发明人： Ruzhi Zhang , Mark O. Neisser , Woo-Kyu Kim , David J. Abdallah , Francis Houlihan , Ping-Hung Lu , Hong Zhuang
IPC分类号： G03C1/00
CPC分类号： C09D183/04 , G03F7/038 , G03F7/0757 , G03F7/091 , H01L21/02126 , H01L21/02216 , H01L21/02282
摘要： The present invention relates to a novel antireflective coating composition for forming an underlayer for a photoresist comprising an acid generator and a novel siloxane polymer, where the siloxane polymer comprises at least one absorbing chromophore and at least one self-crosslinking functionality of structure (1), where m is 0 or 1, W and W′ are independently a valence bond or a connecting group linking the cyclic ether to the silicon of the polymer and L is selected from hydrogen, W′ and W, or L and W′ are combined to comprise a cycloaliphatic linking group linking the cyclic ether to the silicon of the polymer. The invention also relates to a process for imaging the photoresist coated over the novel antireflective coating composition and provides good lithographic results. The invention further relates to a novel siloxane polymer, where the siloxane polymer comprises at least one absorbing chromophore and at least one self-crosslinking functionality of structure (1).
摘要翻译：本发明涉及一种用于形成光致抗蚀剂底层的新型抗反射涂料组合物，其包含酸产生剂和新型硅氧烷聚合物，其中硅氧烷聚合物包含至少一种吸收发色团和至少一种结构（1）的自交联官能团，其中m为0或1，W和W'独立地为价键或连接环状醚与聚合物硅的连接基团，L选自氢，W'和W，或L和W'组合包括将环醚与聚合物的硅连接的脂环族连接基团。本发明还涉及一种用于对涂覆在新型抗反射涂料组合物上的光致抗蚀剂进行成像的方法，并提供良好的光刻结果。本发明还涉及新的硅氧烷聚合物，其中硅氧烷聚合物包含至少一种吸收发色团和至少一种结构（1）的自交联官能团。

10. 发明授权

US5795685A Simple repair method for phase shifting masks 失效
标题翻译：相位掩模的简单修复方法
公开(公告)号：US5795685A
公开(公告)日：1998-08-18
申请号：US783631
申请日：1997-01-14
申请人： Lars W. Liebmann , Burn Jeng Lin , Mark O. Neisser
发明人： Lars W. Liebmann , Burn Jeng Lin , Mark O. Neisser
IPC分类号： G03F1/26 , G03F1/72 , H01L21/027 , G03F9/00
CPC分类号： G03F1/26 , G03F1/72
摘要： A method and apparatus for correcting defects in a phase shift mask to be used in photolithography. More specifically, the method of the invention includes creating a second repair mask which contains phase shifters. Regions surrounding the defects on the first mask are made opaque. The design circuitry located in these defective regions is copied onto the second mask. During a second exposure the design circuitry is placed onto the semiconductor wafer. Therefore, this method and apparatus provides an inexpensive solution to a difficult problem.
摘要翻译：一种用于校正用于光刻中的相移掩模中的缺陷的方法和装置。更具体地，本发明的方法包括创建包含移相器的第二修复掩模。围绕第一掩模上的缺陷的区域变得不透明。位于这些缺陷区域中的设计电路被复制到第二掩模上。在第二曝光期间，将设计电路放置在半导体晶片上。因此，该方法和装置为困难的问题提供了便宜的解决方案。

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