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1. 发明授权

US06859324B2 Optical demultiplexer/multiplexer architecture 有权
标题翻译：光解复用器/多路复用器架构
公开(公告)号：US06859324B2
公开(公告)日：2005-02-22
申请号：US10207788
申请日：2002-07-31
申请人： Mark Meyers , David T. Neilson , Stuart T. Stanton
发明人： Mark Meyers , David T. Neilson , Stuart T. Stanton
IPC分类号： G02B6/34 , G02B13/08 , G02B27/10 , G02B6/28
CPC分类号： G02B6/2931 , G02B6/29311 , G02B6/29313 , G02B6/29373 , G02B6/2938 , G02B13/08
摘要： The optical demuxplixer/multiplexer architecture includes an anamorphic optical system that decouples first characteristics of a beam passing through the anamorphic optical system from at least second characteristics of the beam.
摘要翻译：光学解复用器/多路复用器架构包括变形光学系统，其将通过变形光学系统的光束的第一特性与光束的至少第二特性分离。

2. 发明授权

US5684566A Illumination system and method employing a deformable mirror and diffractive optical elements 失效
$Illumination system and method employing a deformable mirror and diffractive optical elements$
标题翻译：采用可变形镜和衍射光学元件的照明系统和方法
公开(公告)号：US5684566A
公开(公告)日：1997-11-04
申请号：US449005
申请日：1995-05-24
申请人： Stuart T. Stanton
发明人： Stuart T. Stanton
IPC分类号： G02B26/06 , G02B27/48 , G03F7/20 , H01L21/027 , G03B27/72 , H01L21/30
CPC分类号： G03F7/702 , G02B26/06 , G02B26/0825 , G02B27/48 , G03F7/70141 , G03F7/70266 , G03F7/70358
摘要： An illumination system for use in photolithography using a laser or radiation beam source. A deformable mirror is used to shape the beam of laser radiation to obtain global uniformity. A profile sensing means is used to detect any global non-uniformities. The output of this sensing means is fed to a controller for calculating a mirror contour and controlling actuators that shape the deformable mirror to obtain a globally uniform intensity. A diffractive or diffusive optical element, such as a microlens array, eliminates local non-uniformities. Movement of this element eliminates speckle caused by interference due to the coherent beam source. A uniform intensity profile and appropriate angular spread is achieved with very little transmission loss and is automatically compensated for degraded or changing source performance. The illumination system is particularly applicable to a scanning photolithography process as used in the manufacture of semiconductor substrates.
摘要翻译：一种用于使用激光或辐射束源的光刻的照明系统。使用可变形反射镜来形成激光辐射束以获得全局均匀性。轮廓检测装置用于检测任何全局不均匀性。该感测装置的输出被馈送到用于计算镜轮廓的控制器，并且控制形成可变形反射镜以获得全局均匀强度的致动器。衍射或漫射光学元件，例如微透镜阵列，消除了局部不均匀性。该元件的移动消除了由于相干光束源引起的干扰造成的斑点。以非常小的传输损耗实现均匀的强度分布和适当的角度扩展，并自动补偿降低或改变的源性能。照明系统特别适用于半导体衬底的制造中使用的扫描光刻工艺。

3. 发明授权

US06528799B1 Device and method for suppressing space charge induced aberrations in charged-particle projection lithography systems 有权
标题翻译：用于抑制带电粒子投影光刻系统中的空间电荷诱导像差的装置和方法
公开(公告)号：US06528799B1
公开(公告)日：2003-03-04
申请号：US09692150
申请日：2000-10-20
申请人： Victor Katsap , James A. Liddle , Masis Mkrtchyan , Stuart T. Stanton
发明人： Victor Katsap , James A. Liddle , Masis Mkrtchyan , Stuart T. Stanton
IPC分类号： H01J37063
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/065 , H01J37/153 , H01J37/3174 , H01J2237/0656 , Y10S977/881 , Y10S977/887
摘要： An electron beam lithographic apparatus has an electron gun providing a beam of accelerated electrons, a mask stage adapted to hold a mask in a path of the beam of accelerated electrons, and a workpiece stage adapted to hold a workpiece in a path of electrons that have passed through the mask. The electron gun has a cathode having an electron emission surface, an anode adapted to be connected to a high-voltage power supply to provide an electric field between the cathode and the anode to accelerate electrons emitted from the cathode toward the anode, and a current-density-profile control grid disposed between the anode and the cathode. The current-density-profile control grid is configured to provide an electron gun that produces an electron beam having a non-uniform current density profile. A method of producing a micro-device includes generating a beam of charged particles having a non-uniform charged-particle current density, illuminating a mask with the beam of charged particles, and exposing a workpiece with charged particles from the beam of charged particles.
摘要翻译：电子束光刻设备具有提供加速电子束的电子枪，适于将加速电子束的路径中的掩模保持的掩模台，以及适于将工件保持在具有穿过面具。电子枪具有具有电子发射表面的阴极，适于连接到高压电源的阳极，以在阴极和阳极之间提供电场，以加速从阴极向阳极发射的电子，以及电流设置在阳极和阴极之间的密度分布控制网格。电流密度分布控制网格被配置为提供产生具有不均匀电流密度分布的电子束的电子枪。微型器件的制造方法包括：生成具有不均匀带电粒子电流密度的带电粒子束，用带电粒子束照射掩模，以及从带电粒子束带电的带电粒子露出工件。

4. 发明授权

US06469793B1 Multi-channel grating interference alignment sensor 有权
标题翻译：多通道光栅干涉对准传感器
公开(公告)号：US06469793B1
公开(公告)日：2002-10-22
申请号：US09371337
申请日：1999-08-10
申请人： Stuart T. Stanton
发明人： Stuart T. Stanton
IPC分类号： G01B902
CPC分类号： G03F9/7065 , G03F9/70 , G03F9/7092
摘要： An alignment sensor having a fixed reference grating and a movable wafer grating receiving electromagnetic radiation from a coherent illumination source. The illumination source is split into two beams by a beamsplitter. One beam is directed to a fixed reference grating and the diffracted orders are collected. The other beam from the beamsplitter is directed to a movable wafer grating. The diffracted orders from the movable wafer grating are collected and caused to interfere with the diffracted orders from the fixed reference grating, causing a phase shift indicative of the wafer movement or misalignment with respect to the fixed reference grating. Multiple channels having discrete wavelengths or colors are used to optimize detection and alignment irrespective of wafer processing variables. A polarization fixture on the illumination source and a central polarizing portion on the beamsplitter is used to provide contrast optimization, or alternately a latent image metrology mode. The alignment sensor improves alignment accuracy irrespective of processing variables and provides flexibility improving efficiency in the manufacture of semiconductor devices.
摘要翻译：具有固定参考光栅的对准传感器和从相干照明光源接收电磁辐射的可移动晶片光栅。照明源由分束器分成两束。一个光束被引导到固定的参考光栅，并且收集衍射级。来自分束器的另一个光束被引导到可移动的晶片光栅。来自可移动晶片光栅的衍射级被收集并且导致干扰来自固定参考光栅的衍射级，引起指示相对于固定参考光栅的晶片运动或未对准的相移。使用具有离散波长或颜色的多个通道用于优化检测和对准，而与晶片处理变量无关。照明源上的偏振夹具和分束器上的中心偏振部分用于提供对比度优化，或者替代地潜像测量模式。无论处理变量如何，对准传感器都能提高对准精度，提供提高半导体器件制造效率的灵活性。

5. 发明授权

US07305333B2 Projection electron beam lithography apparatus and method employing an estimator 有权
标题翻译：投影电子束光刻设备和采用估计器的方法
公开(公告)号：US07305333B2
公开(公告)日：2007-12-04
申请号：US11328876
申请日：2006-01-10
申请人： Stuart T. Stanton
发明人： Stuart T. Stanton
IPC分类号： G06F17/50
CPC分类号： B82Y10/00 , B82Y40/00 , G05B13/04 , G05B13/048 , H01J37/304 , H01J37/3174
摘要： A process and method for projection beam lithography which utilizes an estimator, such as a Kalman filter to control electron beam placement. The Kalman filter receives predictive information from a model and measurement information from a projection electron beam lithography tool and compensates for factors which cause beam placement error such as wafer heating and beam drift. The process and method may also utilize an adaptive Kalman filter to control electron beam placement. The adaptive Kalman filter receives predictive information from a number of models and measurement information from a projection electron beam lithography tool and compensates for factors which cause beam placement error such as heating and beam drift. The Kalman filter may be implemented such that real-time process control may be achieved.
摘要翻译：用于投影光束光刻的过程和方法，其利用诸如卡尔曼滤波器的估计器来控制电子束放置。卡尔曼滤波器从投影电子束光刻工具接收来自模型的预测信息和测量信息，并且补偿导致光束放置误差的因素，例如晶片加热和光束漂移。该方法和方法还可以利用自适应卡尔曼滤波器来控制电子束放置。自适应卡尔曼滤波器从投影电子束光刻工具接收来自多个模型和测量信息的预测信息，并且补偿引起诸如加热和光束偏移的光束放置误差的因素。可以实现卡尔曼滤波器，使得可以实现实时过程控制。

6. 发明授权

US07050957B2 Projection electron beam lithography apparatus and method employing an estimator 有权
公开(公告)号：US07050957B2
公开(公告)日：2006-05-23
申请号：US09940512
申请日：2001-08-29
申请人： Stuart T. Stanton
发明人： Stuart T. Stanton
IPC分类号： G06F17/50
CPC分类号： B82Y10/00 , B82Y40/00 , G05B13/04 , G05B13/048 , H01J37/304 , H01J37/3174
摘要： A process and method for projection beam lithography which utilizes an estimator, such as a Kalman filter to control electron beam placement. The Kalman filter receives predictive information from a model and measurement information from a projection electron beam lithography tool and compensates for factors which cause beam placement error such as wafer heating and beam drift. The process and method may also utilize an adaptive Kalman filter to control electron beam placement. The adaptive Kalman filter receives predictive information from a number of models and measurement information from a projection electron beam lithography tool and compensates for factors which cause beam placement error such as heating and beam drift. The Kalman filter may be implemented such that real-time process control may be achieved.

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