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1. 发明授权

US07840057B2 Simultaneous computation of multiple points on one or multiple cut lines 有权
标题翻译：在一条或多条切割线上同时计算多个点
公开(公告)号：US07840057B2
公开(公告)日：2010-11-23
申请号：US11874281
申请日：2007-10-18
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06K9/00 , G06F17/50
CPC分类号： G03F1/36
摘要： Methods, and program storage devices, for performing model-based optical proximity correction by providing a region of interest (ROI) having an interaction distance and locating at least one polygon within the ROI. A cut line of sample points representative of a set of vertices, or plurality of cut lines, are generated within the ROI across at least one lateral edge of the polygon(s). An angular position, and first and second portions of the cut line residing on opposing sides of an intersection between the cut line and the lateral edge of the polygon are determined, followed by generating a new ROI by extending the original ROI beyond its interaction distance based on such angular position, and first and second portions of the cut line. In this manner, a variety of new ROIs may be generated, in a variety of different directions, to ultimately correct for optical proximity.
摘要翻译：方法和程序存储设备，用于通过提供具有交互距离的感兴趣区域（ROI）和定位ROI内的至少一个多边形来执行基于模型的光学邻近度校正。在多边形的至少一个侧边缘上，在ROI内产生代表一组顶点或多个切割线的采样点的切割线。确定角位置，并且切割线的位于切割线和多边形的侧边缘之间的交叉点的相对侧上的切割线的第一和第二部分，然后通过将原始ROI延伸超过其相互作用距离来生成新的ROI 在这种角度位置上，以及切割线的第一和第二部分。以这种方式，可以在各种不同的方向上产生各种新的ROI，以最终校正光学邻近度。

2. 发明授权

US07131104B2 Fast and accurate optical proximity correction engine for incorporating long range flare effects 有权
标题翻译：快速准确的光学邻近校正引擎，用于引入远射闪光效果
公开(公告)号：US07131104B2
公开(公告)日：2006-10-31
申请号：US10844794
申请日：2004-05-13
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman , Zheng Chen , Maharaj Mukherjee
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman , Zheng Chen , Maharaj Mukherjee
IPC分类号： G06F17/50
CPC分类号： G03F1/36 , G03F1/70
摘要： A method is described for performing model-based optical proximity corrections on a mask layout used in an optical lithography process having a plurality of mask shapes. Model-based optical proximity correction is performed by computing the image intensity on selected evaluation points on the mask layout. The image intensity to be computed includes optical flare and stray light effects due to the interactions between the shapes on the mask layout. The computation of the image intensity involves sub-dividing the mask layout into a plurality of regions, each region at an increasing distance from the evaluation point. The contributions of the optical flare and stray light effects due to mask shapes in each of the regions are then determined. Finally, all the contributions thus obtained are combined to obtain the final computation of the image intensity at the selected point.
摘要翻译：描述了一种用于在具有多个掩模形状的光学光刻工艺中使用的掩模布局上执行基于模型的光学邻近校正的方法。基于模型的光学邻近校正通过在掩模布局上的所选评估点上计算图像强度来执行。要计算的图像强度由于掩模布局上的形状之间的相互作用而包括光学耀斑和杂散光效应。图像强度的计算涉及将掩模布局分成多个区域，每个区域距离评估点增加的距离。然后确定由于每个区域中的掩模形状引起的光学耀斑和杂散光效应的贡献。最后，将所得到的所有贡献结合起来，以获得所选点处图像强度的最终计算。

3. 发明授权

US07010776B2 Extending the range of lithographic simulation integrals 有权
标题翻译：扩展光刻模拟积分的范围
公开(公告)号：US07010776B2
公开(公告)日：2006-03-07
申请号：US10694466
申请日：2003-10-27
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06F17/50
CPC分类号： G03F1/36 , G03F1/70
摘要： A method for calculating long-range image contributions from mask polygons. An algorithm is introduced having application to Optical Proximity Correction in optical lithography. A finite integral for each sector of a polygon replaces an infinite integral. Integrating over two triangles, rather than integrating on the full sector, achieves a finite integral. An analytical approach is presented for a power law kernel to reduce the numerical integration of a sector to an analytical expression evaluation. The mask polygon is divided into regions to calculate interaction effects, such as intermediate-range and long-range effects, by truncating the mask instead of truncating the kernel function.
摘要翻译：一种用于从掩模多边形计算长距离图像贡献的方法。引入了一种应用于光学光刻中的光学邻近校正的算法。多边形的每个扇区的有限积分代替无限积分。整合在两个三角形上，而不是整体上整合，实现了一个有限积分。针对幂律内核提出了一种分析方法，以减少一个部门与分析表达式评估的数值整合。掩模多边形被划分为区域，以通过截断掩码而不是截断内核函数来计算交互效应，例如中间范围和远程效果。

4. 发明授权

US07343271B2 Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flare 有权
标题翻译：将相位图并入基于快速模型的光学邻近校正模拟内核，以解决近距离和中等范围的闪光
公开(公告)号：US07343271B2
公开(公告)日：2008-03-11
申请号：US10694465
申请日：2003-10-27
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06F7/60 , G06F17/50 , G06F19/00 , G06K9/00
CPC分类号： G03F7/70441 , G03F1/36 , G03F1/70 , G03F7/705
摘要： A first method to compute a phase map within an optical proximity correction simulation kernel utilizes simulated wavefront information from randomly generated data. A second method uses measured data from optical tools. A phase map is created by analytically embedding a randomly generated two-dimensional array of complex numbers of wavefront information, and performing an inverse Fourier Transform on the resultant array. A filtering function requires the amplitude of each element of the array to be multiplied by a Gaussian function. A power law is then applied to the array. The elements of the array are shuffled, and converted from the phasor form to real/imaginary form. A two-dimensional Fast Fourier Transform is applied. The array is then unshuffled, and converted back to phasor form.
摘要翻译：计算光学邻近校正模拟核心内的相位图的第一种方法利用来自随机产生的数据的模拟波阵面信息。第二种方法使用来自光学工具的测量数据。通过分析地嵌入复数数目的波阵面信息的随机生成的二维阵列并在所得到的阵列上执行逆傅里叶变换来创建相位图。滤波函数要求阵列的每个元素的幅度乘以高斯函数。然后将幂律应用于阵列。数组的元素被洗牌，并从相量形式转换为实数/虚数形式。应用二维快速傅立叶变换。然后数组被清洗，并转换回到相量形式。

5. 发明授权

US07761839B2 Performance in model-based OPC engine utilizing efficient polygon pinning method 失效
标题翻译：在基于模型的OPC引擎中使用高效多边形钉扎方法的性能
公开(公告)号：US07761839B2
公开(公告)日：2010-07-20
申请号：US11874274
申请日：2007-10-18
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： Methods, and a program storage device for executing such methods, for performing model-based optical proximity correction by providing a mask matrix having a region of interest (ROI) and locating a plurality of points of interest within the mask matrix. A first polygon having a number of vertices representative of the located points of interest is computed, followed by determining a spatial relation between its vertices and the ROI. The vertices of the first polygon are then pinned to boundaries of and within the ROI such that a second polygon is formed on the ROI. The process is repeated for all vertices of the first polygon such that the second polygon is collapsed onto the ROI. This collapsed second polygon is then used to correct for optical proximity.
摘要翻译：方法和用于执行这种方法的程序存储装置，用于通过提供具有感兴趣区域（ROI）的掩模矩阵并且在掩模矩阵内定位多个感兴趣点来执行基于模型的光学邻近校正。计算具有代表所述定位的兴趣点的顶点数的第一多边形，然后确定其顶点和ROI之间的空间关系。然后将第一多边形的顶点固定在ROI的边界和内部，使得在ROI上形成第二多边形。对第一多边形的所有顶点重复该过程，使得第二多边形折叠到ROI上。然后使用这个折叠的第二个多边形来校正光学接近度。

6. 发明授权

US08073288B2 Rendering a mask using coarse mask representation 有权
标题翻译：使用粗糙掩码表示渲染掩模
公开(公告)号：US08073288B2
公开(公告)日：2011-12-06
申请号：US12015084
申请日：2008-01-16
申请人： Mark A. Lavin , Maharaj Mukherjee , Alan E. Rosenbluth
发明人： Mark A. Lavin , Maharaj Mukherjee , Alan E. Rosenbluth
IPC分类号： G06K9/20
CPC分类号： G03F7/705 , G03F1/36
摘要： A method, system and computer program product for rendering a mask are disclosed. A method of rendering a mask may comprise: providing an initial mask design for a photolithographic process, the initial mask design including polygons; initially rendering the initial mask design as a coarse mask representation in a pixel based image calculation; identifying an overhang portion; and rendering the overhang portion using a set of subpixels whose artifacts from spatial-localization lie outside a practical resolution of a pseudo lens having a numerical aperture larger than that of a projection lens used in the photolithographic process; and updating the initial rendering based on the overhang portion rendering.
摘要翻译：公开了一种用于渲染掩模的方法，系统和计算机程序产品。渲染掩模的方法可以包括：提供用于光刻工艺的初始掩模设计，初始掩模设计包括多边形; 最初在基于像素的图像计算中将初始掩模设计呈现为粗糙掩模表示; 识别突出部分; 并且使用一组子空间渲染悬伸部分，其中来自空间定位的伪像位于具有大于在光刻工艺中使用的投影透镜的数值孔径的假透镜的实际分辨率之外; 并基于突出部分呈现来更新初始呈现。

7. 发明授权

US07774737B2 Performance in model-based OPC engine utilizing efficient polygon pinning method 失效
公开(公告)号：US07774737B2
公开(公告)日：2010-08-10
申请号：US11756883
申请日：2007-06-01
申请人： Gregg M Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： Methods, and a program storage device for executing such methods, for performing model-based optical proximity correction by providing a mask matrix having a region of interest (ROI) and locating a plurality of points of interest within the mask matrix. A first polygon having a number of vertices representative of the located points of interest is computed, followed by determining a spatial relation between its vertices and the ROI. The vertices of the first polygon are then pinned to boundaries of and within the ROI such that a second polygon is formed on the ROI. The process is repeated for all vertices of the first polygon such that the second polygon is collapsed onto the ROI. This collapsed second polygon is then used to correct for optical proximity.

8. 发明申请

US20090180711A1 RENDERING A MASK USING COARSE MASK REPRESENTATION 有权
标题翻译：使用粗糙表示渲染一个掩码
公开(公告)号：US20090180711A1
公开(公告)日：2009-07-16
申请号：US12015084
申请日：2008-01-16
申请人： Mark A. Lavin , Maharaj Mukherjee , Alan E. Rosenbluth
发明人： Mark A. Lavin , Maharaj Mukherjee , Alan E. Rosenbluth
IPC分类号： G06K9/36
CPC分类号： G03F7/705 , G03F1/36
摘要： A method, system and computer program product for rendering a mask are disclosed. A method of rendering a mask may comprise: providing an initial mask design for a photolithographic process, the initial mask design including polygons; initially rendering the initial mask design as a coarse mask representation in a pixel based image calculation; identifying an overhang portion; and rendering the overhang portion using a set of subpixels whose artifacts from spatial-localization lie outside a practical resolution of a pseudo lens having a numerical aperture larger than that of a projection lens used in the photolithographic process; and updating the initial rendering based on the overhang portion rendering.
摘要翻译：公开了一种用于渲染掩模的方法，系统和计算机程序产品。渲染掩模的方法可以包括：提供用于光刻工艺的初始掩模设计，初始掩模设计包括多边形; 最初在基于像素的图像计算中将初始掩模设计呈现为粗糙掩模表示; 识别突出部分; 并且使用一组子空间渲染悬伸部分，其中来自空间定位的伪像位于具有大于在光刻工艺中使用的投影透镜的数值孔径的假透镜的实际分辨率之外; 并基于突出部分呈现来更新初始呈现。

9. 发明授权

US07366342B2 Simultaneous computation of multiple points on one or multiple cut lines 有权
标题翻译：在一条或多条切割线上同时计算多个点
公开(公告)号：US07366342B2
公开(公告)日：2008-04-29
申请号：US10694299
申请日：2003-10-27
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06K9/00
CPC分类号： G03F1/36
摘要： Methods, and program storage devices, for performing model-based optical proximity correction by providing a region of interest (ROI) having an interaction distance and locating at least one polygon within the ROI. A cut line of sample points representative of a set of vertices, or plurality of cut lines, are generated within the ROI across at least one lateral edge of the polygon(s). An angular position, and first and second portions of the cut line residing on opposing sides of an intersection between the cut line and the lateral edge of the polygon are determined, followed by generating a new ROI by extending the original ROI beyond its interaction distance based on such angular position, and first and second portions of the cut line. In this manner, a variety of new ROIs may be generated, in a variety of different directions, to ultimately correct for optical proximity.
摘要翻译：方法和程序存储设备，用于通过提供具有交互距离的感兴趣区域（ROI）和定位ROI内的至少一个多边形来执行基于模型的光学邻近度校正。在多边形的至少一个侧边缘上，在ROI内产生代表一组顶点或多个切割线的采样点的切割线。确定角位置，并且切割线的切割线的第一和第二部分位于切割线和多边形的侧边缘之间的交叉点的相对侧上，随后通过将原始ROI延伸超过其相互作用距离来生成新的ROI 在这种角度位置上，以及切割线的第一和第二部分。以这种方式，可以在各种不同的方向上产生各种新的ROI，以最终校正光学邻近度。

10. 发明授权

US07287239B2 Performance in model-based OPC engine utilizing efficient polygon pinning method 有权
标题翻译：在基于模型的OPC引擎中使用高效多边形钉扎方法的性能
公开(公告)号：US07287239B2
公开(公告)日：2007-10-23
申请号：US10694473
申请日：2003-10-27
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： Methods, and a program storage device for executing such methods, for performing model-based optical proximity correction by providing a mask matrix having a region of interest (ROI) and locating a plurality of points of interest within the mask matrix. A first polygon having a number of vertices representative of the located points of interest is computed, followed by determining a spatial relation between its vertices and the ROI. The vertices of the first polygon are then pinned to boundaries of and within the ROI such that a second polygon is formed on the ROI. The process is repeated for all vertices of the first polygon such that the second polygon is collapsed onto the ROI. This collapsed second polygon is then used to correct for optical proximity.
摘要翻译：方法和用于执行这种方法的程序存储装置，用于通过提供具有感兴趣区域（ROI）的掩模矩阵并且在掩模矩阵内定位多个感兴趣点来执行基于模型的光学邻近校正。计算具有代表所述定位的兴趣点的顶点数的第一多边形，然后确定其顶点和ROI之间的空间关系。然后将第一多边形的顶点固定在ROI的边界和内部，使得在ROI上形成第二多边形。对第一多边形的所有顶点重复该过程，使得第二多边形折叠到ROI上。然后使用这个折叠的第二个多边形来校正光学接近度。

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