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    • 4. 发明授权
    • High speed detection of shunt defects in photovoltaic and optoelectronic devices
    • 光电和光电器件分流缺陷的高速检测
    • US08278937B2
    • 2012-10-02
    • US12658489
    • 2010-02-08
    • Leonid A. VasilyevJohn M. SchmidtJames E. HudsonGregory S. Horner
    • Leonid A. VasilyevJohn M. SchmidtJames E. HudsonGregory S. Horner
    • G01R31/02
    • G01R31/2656G01N21/66H02S50/10
    • The current invention provides a shunt defect detection device that includes a device under test (DUT) that is fixedly held by a thermally isolating mount, a power source disposed to provide a directional bias condition to the DUT, a probe disposed to provide a localized power to the DUT from the power source, an emission detector disposed to measure a temporal emission from the DUT when in the directional bias condition, where the measured temporal emission is output as temporal data from the emission detector to a suitably programmed computer that uses the temporal data to determine a heating rate of the DUT and is disposed to estimate an overheat risk level of the DUT, where an output from the computer designates the DUT a pass status, an uncertain status, a fail status or a process to bin status according to the overheat risk level.
    • 本发明提供了一种并联缺陷检测装置,其包括由热隔离安装座固定地保持的被测器件(DUT),被设置为向DUT提供定向偏置状态的电源,设置成提供局部电源的探针 从发射检测器输出到来自电源的DUT,发射检测器被设置成在定向偏置条件下测量来自DUT的时间发射,其中测量的时间发射作为时间数据从发射检测器输出到使用时间的适当编程的计算机 数据以确定DUT的加热速率,并且被设置为估计DUT的过热风险水平,其中来自计算机的输出指定DUT通过状态,不确定状态,故障状态或根据 过热风险等级。
    • 5. 发明授权
    • Measurement of film thickness by inelastic electron scattering
    • 通过非弹性电子散射测量膜厚度
    • US06399944B1
    • 2002-06-04
    • US09350701
    • 1999-07-09
    • Leonid A. VasilyevCharles E. Bryson, IIIRobert LinderSergey BorodyanskyDmitri Klyachko
    • Leonid A. VasilyevCharles E. Bryson, IIIRobert LinderSergey BorodyanskyDmitri Klyachko
    • H01J37073
    • G01B15/02
    • A method and apparatus for measuring the thickness of a thin coating, having a thickness on the order of 1 to 10 nm, of one material formed over a substrate of another material of significantly different atomic number, for example, a carbon coating on a ferromagnetic substrate. A primary radiation source, for example, of electrons or X-ray, creates low-energy secondary electrons in the substrate. The intensity of inelastically scattered electrons generally increases with film thickness. The secondary electron spectrum measured for a test sample is compared with the spectra for a plurality of similar reference samples of the same set of compositions, and a test thickness is thereby determined. The method may be practice on conventional electron spectrometers with the addition of some programmed analysis. Various techniques are available for extracting the data and comparing the test and reference data.
    • 用于测量厚度在1至10nm数量级的薄涂层的厚度的方法和装置,其形成在具有显着不同原子序数的另一材料的基底上形成的一种材料,例如在铁磁性材料上的碳涂层 基质。 主要的辐射源,例如电子或X射线,在衬底中产生低能二次电子。 非弹性散射的电子的强度通常随膜厚增加。 将测试样品测量的二次电子光谱与同一组合物组合的多个相似参考样品的光谱进行比较,由此确定测试厚度。 该方法可以在常规电子分光计上进行实践,并加上一些程序化分析。 各种技术可用于提取数据并比较测试和参考数据。