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1. 发明授权

US06399944B1 Measurement of film thickness by inelastic electron scattering 有权
标题翻译：通过非弹性电子散射测量膜厚度
公开(公告)号：US06399944B1
公开(公告)日：2002-06-04
申请号：US09350701
申请日：1999-07-09
申请人： Leonid A. Vasilyev , Charles E. Bryson, III , Robert Linder , Sergey Borodyansky , Dmitri Klyachko
发明人： Leonid A. Vasilyev , Charles E. Bryson, III , Robert Linder , Sergey Borodyansky , Dmitri Klyachko
IPC分类号： H01J37073
CPC分类号： G01B15/02
摘要： A method and apparatus for measuring the thickness of a thin coating, having a thickness on the order of 1 to 10 nm, of one material formed over a substrate of another material of significantly different atomic number, for example, a carbon coating on a ferromagnetic substrate. A primary radiation source, for example, of electrons or X-ray, creates low-energy secondary electrons in the substrate. The intensity of inelastically scattered electrons generally increases with film thickness. The secondary electron spectrum measured for a test sample is compared with the spectra for a plurality of similar reference samples of the same set of compositions, and a test thickness is thereby determined. The method may be practice on conventional electron spectrometers with the addition of some programmed analysis. Various techniques are available for extracting the data and comparing the test and reference data.
摘要翻译：用于测量厚度在1至10nm数量级的薄涂层的厚度的方法和装置，其形成在具有显着不同原子序数的另一材料的基底上形成的一种材料，例如在铁磁性材料上的碳涂层基质。主要的辐射源，例如电子或X射线，在衬底中产生低能二次电子。非弹性散射的电子的强度通常随膜厚增加。将测试样品测量的二次电子光谱与同一组合物组合的多个相似参考样品的光谱进行比较，由此确定测试厚度。该方法可以在常规电子分光计上进行实践，并加上一些程序化分析。各种技术可用于提取数据并比较测试和参考数据。

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