会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 9. 发明申请
    • PATTERNED MAGNETIC RECORDING DISK WITH HIGH BIT-ASPECT-RATIO AND MASTER MOLD FOR NANOIMPRINTING THE DISK
    • 具有高比特率和主模具的图形磁记录盘,用于纳米片
    • US20110235215A1
    • 2011-09-29
    • US13152254
    • 2011-06-02
    • Elizabeth Ann DobiszRicardo Ruiz
    • Elizabeth Ann DobiszRicardo Ruiz
    • G11B5/54G11B5/82B29C59/02
    • G11B5/855B82Y10/00B82Y40/00G03F7/0002G11B5/743G11B5/82
    • A method for making a master mold that is used in the nanoimprinting process to make patterned-media disks with patterned data islands uses guided self-assembly of a block copolymer into its components. Conventional or e-beam lithography is used to first form a pattern of generally radial stripes on a substrate, with the stripes being grouped into annular zones or bands. A block copolymer material is then deposited on the pattern, resulting in guided self-assembly of the block copolymer into its components to multiply the generally radial stripes into generally radial lines. Various methods, including conventional lithography, guided self-assembly of a second block copolymer, and e-beam lithography, are then used to form concentric rings over the generally radial lines. After etching and resist removal, the master mold has a pattern of either pillars or holes, depending on the method used.
    • 用于制造在纳米压印过程中制造具有图案化数据岛的图案化介质盘的主模具的方法使用嵌段共聚物向其组分的引导自组装。 使用常规或电子束光刻来首先在基底上形成大致径向条纹的图案,其中条纹被分组成环形区域或带。 然后将嵌段共聚物材料沉积在图案上,导致嵌段共聚物向其组分的引导自组装,以将大致径向的条纹乘以大致的径向线。 然后使用各种方法,包括常规光刻,第二嵌段共聚物的引导自组装和电子束光刻,以在大致径向线上形成同心环。 在蚀刻和抗蚀剂去除之后,主模具有任何柱或孔的图案,这取决于所使用的方法。
    • 10. 发明授权
    • Patterned magnetic recording disk with high bit-aspect-ratio and master mold for nanoimprinting the disk
    • 具有高比特宽比的图案磁记录磁盘和用于纳米压印磁盘的主模具
    • US08822047B2
    • 2014-09-02
    • US13152254
    • 2011-06-02
    • Elizabeth Ann DobiszRicardo Ruiz
    • Elizabeth Ann DobiszRicardo Ruiz
    • G11B5/64G11B5/82G11B5/855G11B5/74B82Y40/00G03F7/00B82Y10/00
    • G11B5/855B82Y10/00B82Y40/00G03F7/0002G11B5/743G11B5/82
    • A method for making a master mold that is used in the nanoimprinting process to make patterned-media disks with patterned data islands uses guided self-assembly of a block copolymer into its components. Conventional or e-beam lithography is used to first form a pattern of generally radial stripes on a substrate, with the stripes being grouped into annular zones or bands. A block copolymer material is then deposited on the pattern, resulting in guided self-assembly of the block copolymer into its components to multiply the generally radial stripes into generally radial lines. Various methods, including conventional lithography, guided self-assembly of a second block copolymer, and e-beam lithography, are then used to form concentric rings over the generally radial lines. After etching and resist removal, the master mold has a pattern of either pillars or holes, depending on the method used.
    • 用于制造在纳米压印过程中制造具有图案化数据岛的图案化介质盘的主模具的方法使用嵌段共聚物向其组分的引导自组装。 使用常规或电子束光刻来首先在基底上形成大致径向条纹的图案,其中条纹被分组成环形区域或带。 然后将嵌段共聚物材料沉积在图案上,导致嵌段共聚物向其组分的引导自组装,以将大致径向的条纹乘以大致的径向线。 然后使用各种方法,包括常规光刻,第二嵌段共聚物的引导自组装和电子束光刻,以在大致径向线上形成同心环。 在蚀刻和抗蚀剂去除之后,主模具有任何柱或孔的图案,这取决于所使用的方法。