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1. 发明申请

US20050032248A1 Method for providing a liftoff process using a single layer resist and chemical mechanical polishing and sensor formed therewith 失效
标题翻译：提供使用单层抗蚀剂和化学机械抛光和传感器形成的提升工艺的方法
公开(公告)号：US20050032248A1
公开(公告)日：2005-02-10
申请号：US10633765
申请日：2003-08-04
申请人： Marie-Claire Cyrille , Kim Lee , Jui-Lung Li , Chun-Ming Wang
发明人： Marie-Claire Cyrille , Kim Lee , Jui-Lung Li , Chun-Ming Wang
IPC分类号： G11B5/39 , H01L21/00 , H01L21/302 , H01L21/461
CPC分类号： G11B5/3906
摘要： A method for providing a liftoff process using a single layer resist and chemical mechanical polishing and sensor formed therewith are disclosed. Chemical mechanical polishing is combined with liftoff using only a single resist layer to allow the removal of leftover fencing on the side of a lifted resist pattern.
摘要翻译：公开了一种使用单层抗蚀剂提供剥离工艺的方法和由其形成的化学机械抛光和传感器。化学机械抛光与仅使用单个抗蚀剂层的剥离相结合，以允许在提升的抗蚀剂图案侧面去除剩余的栅栏。

2. 发明授权

US07211195B2 Method for providing a liftoff process using a single layer resist and chemical mechanical polishing and sensor formed therewith 失效
标题翻译：提供使用单层抗蚀剂和化学机械抛光和传感器形成的提升工艺的方法
公开(公告)号：US07211195B2
公开(公告)日：2007-05-01
申请号：US10633765
申请日：2003-08-04
申请人： Marie-Claire Cyrille , Kim Y. Lee , Jui-Lung Li , Chun-Ming Wang
发明人： Marie-Claire Cyrille , Kim Y. Lee , Jui-Lung Li , Chun-Ming Wang
IPC分类号： B44C1/22
CPC分类号： G11B5/3906
摘要： A method for providing a liftoff process using a single layer resist and chemical mechanical polishing and sensor formed therewith are disclosed. Chemical mechanical polishing is combined with liftoff using only a single resist layer to allow the removal of leftover fencing on the side of a lifted resist pattern.
摘要翻译：公开了一种使用单层抗蚀剂提供剥离工艺的方法和由其形成的化学机械抛光和传感器。化学机械抛光与仅使用单个抗蚀剂层的剥离相结合，以允许在提升的抗蚀剂图案侧面去除剩余的栅栏。

3. 发明申请

US20070064353A1 Read sensor defined by lateral stack templates and method for fabrication 失效
标题翻译：读取由横向堆栈模板定义的传感器和制造方法
公开(公告)号：US20070064353A1
公开(公告)日：2007-03-22
申请号：US11231438
申请日：2005-09-20
申请人： David Heim , Kim Lee , Tsann Lin , Jih-Shiuan Luo , Chun-Ming Wang
发明人： David Heim , Kim Lee , Tsann Lin , Jih-Shiuan Luo , Chun-Ming Wang
IPC分类号： G11B5/127 , G11B5/33
CPC分类号： G11B5/398 , B82Y10/00 , B82Y25/00 , G11B5/3163 , G11B5/3932 , H01L43/12 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method is disclosed for fabricating a read sensor for a magnetic head for a hard disk drive having a read sensor stack and two lateral stacks. The method of fabrication includes forming lateral stacks on a gap layer, surrounding a groove to form a template. The read sensor stack is then formed in the groove, which defines the lateral dimensions of the read sensor stack, and lead layers are then formed on the lateral stacks. Also disclosed is a read head for a disk drive having a sensor stack defined by pre-established lateral stacks, and a disk drive having the read head.
摘要翻译：公开了一种用于制造用于具有读取传感器堆叠和两个横向堆叠的硬盘驱动器的磁头的读取传感器的方法。制造方法包括在间隙层上形成横向叠层，围绕凹槽形成模板。然后将读取的传感器堆叠形成在凹槽中，其限定读取的传感器堆叠的横向尺寸，然后在横向堆叠件上形成引线层。还公开了一种用于具有由预先建立的横向叠层定义的传感器堆叠的磁盘驱动器的读取头，以及具有读取磁头的磁盘驱动器。

4. 发明申请

US20050135019A1 Thin film head reader with lead overlay a method of fabrication thereof 失效
标题翻译：具有铅覆盖的薄膜头读取器其制造方法
公开(公告)号：US20050135019A1
公开(公告)日：2005-06-23
申请号：US11053118
申请日：2005-02-07
申请人： Howard Zolla , Edward Lee , Kim Lee , Tsann Lin , Chun-Ming Wang
发明人： Howard Zolla , Edward Lee , Kim Lee , Tsann Lin , Chun-Ming Wang
IPC分类号： G11B5/31 , G11B5/39 , G11B5/33 , G11B5/127
CPC分类号： B82Y25/00 , B82Y10/00 , G11B5/3116 , G11B5/313 , G11B5/3163 , G11B5/3903 , G11B5/3909 , G11B2005/3996 , Y10T29/49032 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A magnetoresistive sensor having a well defined track width and method of manufacture thereof.
摘要翻译：具有良好限定的轨道宽度的磁阻传感器及其制造方法。

5. 发明申请

US20060000795A1 Method for fabricating a pole tip in a magnetic transducer 有权
标题翻译：用于在磁换能器中制造极尖的方法
公开(公告)号：US20060000795A1
公开(公告)日：2006-01-05
申请号：US10882883
申请日：2004-06-30
申请人： Tsung Chen , David Druist , Quang Le , Kim Lee , Chun-Ming Wang , Howard Zolla
发明人： Tsung Chen , David Druist , Quang Le , Kim Lee , Chun-Ming Wang , Howard Zolla
IPC分类号： B44C1/22
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , Y10T29/49032
摘要： A method for fabricating a magnetic head with a trapezoidal shaped pole piece tip is described. The body of the main pole piece is deposited, then one or more layers for the pole piece tip are deposited. A bed material is deposited over the pole piece tip material. A void is formed in the bed material over the area for the pole piece tip. The void is filled with an ion-milling resistant material such as alumina preferably using atomic layer deposition or atomic layer chemical vapor deposition. The excess ion-milling resistant material and the bed material are removed. The result is an ion-milling mask formed over the area for the pole piece tip. Ion milling is then used to remove the unmasked material in the pole piece tip layer and to form a beveled pole piece tip and preferably a beveled face on the main pole piece.
摘要翻译：描述了制造具有梯形极片尖端的磁头的方法。沉积主极片的主体，然后沉积用于极片尖端的一个或多个层。床材料沉积在极片末端材料上。在用于极片尖端的区域上的床材料中形成空隙。空隙填充有耐离子碾磨材料，例如氧化铝，优选使用原子层沉积或原子层化学气相沉积。除去过量的抗离子碾磨材料和床料。结果是在极片尖端的区域上形成离子铣削掩模。然后使用离子铣削去除极片末端层中的未掩模材料，并且在主极片上形成斜面极片末端，并且优选地形成斜面。

6. 发明申请

US20050068672A1 Liftoff process for thin photoresist 失效
标题翻译：薄光刻胶的剥离工艺
公开(公告)号：US20050068672A1
公开(公告)日：2005-03-31
申请号：US10631579
申请日：2003-07-30
申请人： Kim Lee , Chun-Ming Wang
发明人： Kim Lee , Chun-Ming Wang
IPC分类号： G11B5/147 , G11B5/31 , H01L21/00 , H01L21/027 , H01L21/302 , H01L21/461
CPC分类号： G11B5/3163 , H01L21/0272 , Y10T29/49021
摘要： A method is invented for processing a thin-film head/semiconductor wafer. A layer of polymer is applied onto a wafer. A layer of dielectric material is added above the polymer layer. A layer of photoresist is added above the dielectric layer. The photoresist layer is patterned using a photolithography process. Exposed portions of the dielectric layer are removed. Exposed portions of the polymer layer are removed. Exposed portions of the wafer are removed. The polymer layer and any material thereabove is removed after hard bias/leads deposition.
摘要翻译：发明了一种用于处理薄膜头/半导体晶片的方法。将一层聚合物施加到晶片上。在聚合物层之上添加介电材料层。在介电层上方添加一层光致抗蚀剂。使用光刻工艺对光致抗蚀剂层进行图案化。除去介电层的露出部分。去除聚合物层的暴露部分。去除晶片的暴露部分。在硬偏压/引线沉积之后，去除聚合物层和其上的任何材料。

7. 发明申请

US20070139816A1 Magnetic transducer with milling mask 失效
标题翻译：具有铣削面罩的磁性换能器
公开(公告)号：US20070139816A1
公开(公告)日：2007-06-21
申请号：US11707524
申请日：2007-02-12
申请人： Tsung Chen , David Druist , Quang Le , Kim Lee , Chun-Ming Wang , Howard Zolla
发明人： Tsung Chen , David Druist , Quang Le , Kim Lee , Chun-Ming Wang , Howard Zolla
IPC分类号： B44C1/22 , G11B5/127
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , Y10T29/49032
摘要： A method for fabricating a magnetic head with a trapezoidal shaped pole piece tip is described. The body of the main pole piece is deposited; then one or more layers for the pole piece tip are deposited. A bed material is deposited over the pole piece tip material. A void is formed in the bed material over the area for the pole piece tip. The void is filled with an ion-milling resistant material such as alumina preferably using atomic layer deposition or atomic layer chemical vapor deposition. The excess ion-milling resistant material and the bed material are removed. The result is an ion-milling mask formed over the area for the pole piece tip. Ion milling is then used to remove the unmasked material in the pole piece tip layer and to form a beveled pole piece tip and preferably a beveled face on the main pole piece.
摘要翻译：描述了制造具有梯形极片尖端的磁头的方法。主极片的主体被沉积; 然后沉积用于极片尖端的一个或多个层。床材料沉积在极片末端材料上。在用于极片尖端的区域上的床材料中形成空隙。空隙填充有耐离子碾磨材料，例如氧化铝，优选使用原子层沉积或原子层化学气相沉积。除去过量的抗离子碾磨材料和床料。结果是在极片尖端的区域上形成离子铣削掩模。然后使用离子铣削去除极片末端层中的未掩模材料，并且在主极片上形成斜面极片末端，并且优选地形成斜面。

8. 发明授权

US08080443B2 Method of making pillars using photoresist spacer mask 有权
标题翻译：使用光刻胶掩模掩模制作柱的方法
公开(公告)号：US08080443B2
公开(公告)日：2011-12-20
申请号：US12289396
申请日：2008-10-27
申请人： Yung-Tin Chen , Chun-Ming Wang , Steven J. Radigan
发明人： Yung-Tin Chen , Chun-Ming Wang , Steven J. Radigan
IPC分类号： H01L21/44
CPC分类号： H01L21/0337
摘要： A method of making a device includes forming a first hard mask layer over an underlying layer, forming first features over the first hard mask layer, forming a first spacer layer over the first features, etching the first spacer layer to form a first spacer pattern and to expose top of the first features, removing the first features, patterning the first hard mask using the first spacer pattern as a mask to form first hard mask features, removing the first spacer pattern. The method also includes forming second features over the first hard mask features, forming a second spacer layer over the second features, etching the second spacer layer to form a second spacer pattern and to expose top of the second features, removing the second features, etching the first hard mask features using the second spacer pattern as a mask to form second hard mask features, and etching at least part of the underlying layer using the second hard mask features as a mask.
摘要翻译：制造器件的方法包括在下层上形成第一硬掩模层，在第一硬掩模层上形成第一特征，在第一特征上形成第一间隔层，蚀刻第一间隔层以形成第一间隔图案，为了暴露第一特征的顶部，去除第一特征，使用第一间隔图案作为掩模来图案化第一硬掩模以形成第一硬掩模特征，去除第一间隔图案。该方法还包括在第一硬掩模特征上形成第二特征，在第二特征上形成第二间隔层，蚀刻第二间隔层以形成第二间隔图案并暴露第二特征的顶部，去除第二特征，蚀刻第一硬掩模使用第二间隔图案作为掩模形成第二硬掩模特征，并且使用第二硬掩模特征作为掩模蚀刻至少部分下层。

9. 发明申请

US20110229805A1 PHOTOMASK WITH ASSIST FEATURES 有权
标题翻译：照片特点
公开(公告)号：US20110229805A1
公开(公告)日：2011-09-22
申请号：US12729088
申请日：2010-03-22
申请人： Chun-Ming Wang , Chen-Che Huang , Masaaki Higashitani
发明人： Chun-Ming Wang , Chen-Che Huang , Masaaki Higashitani
IPC分类号： G03F1/00 , H01L21/027
CPC分类号： G03F1/36
摘要： A photomask for exposure of a semiconductor wafer using dipole illumination and method of manufacturing the same is disclosed. A method of forming a pattern on a semiconductor using the photomask is also disclosed. The photomask may have an array of islands that are used for printing lines using dipole illumination. The photomask may have sub-resolution assist features (SRAF) to assist in printing the lines. The SRAF may include an array of holes.
摘要翻译：公开了一种用于使用偶极照明曝光半导体晶片的光掩模及其制造方法。还公开了使用光掩模在半导体上形成图案的方法。光掩模可以具有用于使用偶极照明打印线的岛阵列。光掩模可以具有辅助分辨率辅助特征（SRAF）以帮助印刷线。 SRAF可以包括一组孔。

10. 发明授权

US07933475B2 Method and apparatus for providing back-lighting in a display device 有权
标题翻译：在显示装置中提供背光的方法和装置
公开(公告)号：US07933475B2
公开(公告)日：2011-04-26
申请号：US12544184
申请日：2009-08-19
申请人： Chun-Ming Wang , Ming-Hau Tung , Surya Prakash Ganti
发明人： Chun-Ming Wang , Ming-Hau Tung , Surya Prakash Ganti
IPC分类号： G02F1/01 , G02B26/00 , G03F7/00
CPC分类号： G02B26/001
摘要： Methods and apparatus for providing lighting in a display are provided. In one embodiment, a microelectromechanical system (MEMS) is provided that includes a transparent substrate and a plurality of interferometric modulators. The interferometric modulators include an optical stack coupled to the transparent substrate, a reflective layer over the optical stack, and one or more posts to support the reflective layer and to provide a path for light from a backlight for lighting the display.
摘要翻译：提供了用于在显示器中提供照明的方法和装置。在一个实施例中，提供了包括透明基板和多个干涉式调制器的微机电系统（MEMS）。干涉式调制器包括耦合到透明衬底的光学叠层，光学叠层上的反射层，以及支撑反射层的一个或多个柱，以及为来自背光源的光提供用于点亮显示器的路径。

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