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1. 发明申请

US20070211233A1 Lithographic apparatus, control system and device manufacturing method 有权
标题翻译：光刻设备，控制系统和器件制造方法
公开(公告)号：US20070211233A1
公开(公告)日：2007-09-13
申请号：US11373493
申请日：2006-03-13
申请人： Marcus Van De Kerkhof , Johannes Jacobs , Tammo Uitterdijk , Nicolas Lallemant
发明人： Marcus Van De Kerkhof , Johannes Jacobs , Tammo Uitterdijk , Nicolas Lallemant
IPC分类号： G03B27/52
CPC分类号： G03F7/70858 , G03F7/70258 , G03F7/70341 , G03F7/705 , G03F7/70575 , G03F7/706
摘要： Lithographic Apparatus, Control System and Device Manufacturing Method An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.
摘要翻译：光刻设备，控制系统和设备制造方法公开了一种浸没式光刻设备，其具有测量系统或预测系统，用于分别测量和/或预测与浸液的温度波动相关的影响，以及用于基于由测量系统和/或预测系统获得的测量和/或预测，分别控制与浸液的温度相关联的或另一效应。还公开了一种相关的控制系统和设备制造方法。

2. 发明申请

US20080063846A1 POLYOLEFIN FILM, TAPE OR YARN 审中-公开
标题翻译： POLYOLEFIN膜，胶带或纱线
公开(公告)号：US20080063846A1
公开(公告)日：2008-03-13
申请号：US11926910
申请日：2007-10-29
申请人： Joachim Loos , Johannes Jacobs , Antonius Andreas Peijs , Tilo Schimanski
发明人： Joachim Loos , Johannes Jacobs , Antonius Andreas Peijs , Tilo Schimanski
IPC分类号： B32B7/02 , D01D5/12 , D02G3/00 , D03D15/00
CPC分类号： B32B27/327 , B29C48/05 , B29C48/08 , B29C48/18 , B29C48/91 , B29C48/911 , B29C55/023 , B29C55/065 , B29K2023/00 , B29K2223/00 , B32B7/02 , B32B27/08 , B32B27/32 , B32B37/153 , B32B2250/242 , B32B2250/40 , B32B2307/516 , B32B2307/704 , B32B2323/04 , B32B2323/10 , B32B2405/00 , D01D5/253 , D01D5/426 , D01F8/06 , Y10S428/91 , Y10T428/24942 , Y10T428/2495 , Y10T428/249921 , Y10T428/2929 , Y10T428/31913 , Y10T442/3033 , Y10T442/3146 , Y10T442/3154 , Y10T442/608 , Y10T442/641 , Y10T442/656
摘要： The invention is directed to monoaxially drawn polyolefin multilayer film, tape or yarn of the AB or ABA type, having a stretch ratio of more than 12, having an E-modulus of at least 10 GPa, substantially consisting of a central layer (B) of a polyolefin selected from polyethylene and polypropylene, and one or two other layers (A) of a polyolefin from the same class as the material of the central layer B, the DSC melting point of the material of the said other layers (A) being lower than the DSC melting point of the material of the said central layer (B), wherein the central layer (B) is between 50 and 99 wt. % of the material and the other layers (A) between 1 and 50 wt. %. The present invention further relates to a method of manufacturing such a tape, film or yarn.
摘要翻译：本发明涉及AB或ABA型的单轴拉伸聚烯烃多层膜，带或纱线，其拉伸比大于12，具有至少10GPa的E模量，基本上由中心层（B）组成，的选自聚乙烯和聚丙烯的聚烯烃和与中心层B的材料相同类别的一个或两个其它层（A）的聚烯烃，所述其它层（A）的材料的DSC熔点为低于所述中心层（B）的材料的DSC熔点，其中中心层（B）为50至99重量％。材料和其它层（A）的％为1至50wt。％。本发明还涉及制造这种带，膜或纱线的方法。

3. 发明申请

US20070070315A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20070070315A1
公开(公告)日：2007-03-29
申请号：US11454129
申请日：2006-06-16
申请人： Johannes Jacobs , Igor Bouchoms , Nicolaas Kate , Nicolaas Kemper , Martinus Leenders , Erik Loopstra , Joost Ottens , Martinus Verhagen , Yucel Kok , Johannes Van Es , Herman Boom , Franciscus Janssen
发明人： Johannes Jacobs , Igor Bouchoms , Nicolaas Kate , Nicolaas Kemper , Martinus Leenders , Erik Loopstra , Joost Ottens , Martinus Verhagen , Yucel Kok , Johannes Van Es , Herman Boom , Franciscus Janssen
IPC分类号： G03B27/42
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.
摘要翻译：使用或具有包括关于衬底的位置，速度和/或加速度的信息的时间表来公开用于维持衬底和浸没式光刻设备的热平衡的方法和设备; 以及响应于时间表中的信息，用于减少局部蒸发和/或增加局部冷凝的蒸发控制器和/或冷凝控制器。从基材表面蒸发液体将其冷却下来，同时在其底部表面上冷凝液体局部加热基材。

4. 发明申请

US20060268246A1 Lithographic device, device manufacturing method and device manufactured thereby 有权
标题翻译：平版印刷装置，装置制造方法和由此制造的装置
公开(公告)号：US20060268246A1
公开(公告)日：2006-11-30
申请号：US11391731
申请日：2006-03-29
申请人： Johannes Jacobs , Vadim Banine , Barrie Brewster , Vladimir Ivanov , Bastiaan Mertens , Johannes Moors , Robert Livesey , Baastiaan Wolschrijn
发明人： Johannes Jacobs , Vadim Banine , Barrie Brewster , Vladimir Ivanov , Bastiaan Mertens , Johannes Moors , Robert Livesey , Baastiaan Wolschrijn
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70908
摘要： A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.
摘要翻译：光刻设备被配置为将图案从图案形成装置投影到基板上。该装置包括在装置的至少两个不同区域之间延伸的气体净化密封孔，以及构造成为密封孔提供一种或多种选自包括氢，氘，重氢，氘代氢和氩和氢的混合物。

5. 发明授权

US08519179B2 Method of measuring entry of water into phosgene-conducting plants 有权
标题翻译：测量进入光气植物的水的方法
公开(公告)号：US08519179B2
公开(公告)日：2013-08-27
申请号：US13380357
申请日：2010-06-23
申请人： Heiner Schelling , Ulrich Penzel , Eckhard Stroefer , Dirk Hablawetz , Dave Beckwith , Kai Thiele , Johannes Jacobs , Matthias Eiermann , Uwe Storck , Jon S. Speier , Thomas Grzanka , William Portwood
发明人： Heiner Schelling , Ulrich Penzel , Eckhard Stroefer , Dirk Hablawetz , Dave Beckwith , Kai Thiele , Johannes Jacobs , Matthias Eiermann , Uwe Storck , Jon S. Speier , Thomas Grzanka , William Portwood
IPC分类号： C07C263/00
CPC分类号： B01J19/002 , B01J2219/00006 , B01J2219/00186 , B01J2219/00202 , B01J2219/00209 , C07C263/10 , C07C2601/14 , G01N17/00 , C07C265/14
摘要： The invention relates to a method of measuring entry of water and resulting corrosion in plants for producing isocyanates by reacting phosgene with one or more primary amines in a solvent. The invention further relates to an apparatus for producing such isocyanates, in the work-up section of which probes for monitoring corrosion are arranged in defined places.
摘要翻译：本发明涉及一种测量植物中水分进入和产生腐蚀的方法，用于通过光气与一种或多种伯胺在溶剂中反应制备异氰酸酯。本发明还涉及一种用于制造这种异氰酸酯的装置，在其上述检查部分中，用于监测腐蚀的探针被布置在限定的位置。

6. 发明申请

US20060187427A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060187427A1
公开(公告)日：2006-08-24
申请号：US11062763
申请日：2005-02-22
申请人： Marco Stavenga , Martinus Verhagen , Johannes Jacobs , Hans Jansen
发明人： Marco Stavenga , Martinus Verhagen , Johannes Jacobs , Hans Jansen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/709
摘要： Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume/damper to compensate for pressure fluctuation.
摘要翻译：公开了各种类型的压力调节装置，以减少光刻设备的液体供应系统中的压力梯度，液体供应系统具有液体限制结构，其被配置为至少部分地限制液体在投影系统和基板台之间的液体光刻设备高压梯度可能导致液体供应系统和/或液体限制结构中的颗粒污染。压力梯度可以通过例如在一个或多个阀门中使用缓慢的切换，绕过或通过一个或多个阀门的泄放流量来减少，而不是或者除了切换阀门之外将液体转移到排水管，用于防止冲击波的压力调节器或限流器，以及用于补偿压力波动的缓冲体积/阻尼器。

7. 发明申请

US20060059501A1 Method of manufacturing an optical data storage medium, optical data storage medium and apparatus for performing said method 失效
标题翻译：光学数据存储介质的制造方法，光学数据存储介质以及用于执行所述方法的装置
公开(公告)号：US20060059501A1
公开(公告)日：2006-03-16
申请号：US10541977
申请日：2003-11-04
申请人： Petrus Helena Vromans , Katerina Musialkova , Fransiscus Sophia Van De Kerkhof , Erik Prins , Johannes Jacobs
发明人： Petrus Helena Vromans , Katerina Musialkova , Fransiscus Sophia Van De Kerkhof , Erik Prins , Johannes Jacobs
IPC分类号： G11B7/24
CPC分类号： G11B7/266 , B05D1/005 , B05D3/0209 , B05D3/0254 , B05D3/0263 , B05D3/067 , G03F7/162
摘要： A method of manufacturing an optical data storage medium, comprising at least one substrate (11) and a plurality of layers deposited on the substrate (11) is described. The medium includes at least one of a transparent spacer layer and transparent cover layer (12). The layer (12) is provided by applying a liquid onto the rotating substrate (11) and rotating the substrate (11) further in order to spread out the liquid into a layer substantially uniformly between an inner radius ri and an outer radius ro, and solidifying the liquid layer (12) by means of exposure to UV radiation. After applying the liquid onto the rotating substrate the liquid layer (12) is heated by heating means (14) in such a way that the temperature rise of the liquid layer (12) at ri has a value dTri, while the temperature rise of the liquid layer (12) between ri and ro gradually increases, and the temperature rise of the liquid layer (12) at ro has a value dTro>dTri. In this way the spacer layer or cover layer has a variation in thickness smaller than +/−1 μm, measured over the information storage area. Further a medium manufactured using said method and an apparatus for performing the method are described.
摘要翻译：描述了一种制造光学数据存储介质的方法，其包括至少一个衬底（11）和沉积在衬底（11）上的多个层。介质包括透明间隔层和透明覆盖层（12）中的至少一个。通过将液体施加到旋转基板（11）上并进一步旋转基板（11）以便将液体基本上均匀地分布在内半径ri和外半径ro之间的层中来提供层（12），以及通过暴露于UV辐射来固化液体层（12）。在将液体施加到旋转基板上之后，通过加热装置（14）将液体层（12）加热，使得在ri处的液体层（12）的温度升高值为dTri，同时温度升高 ri和ro之间的液体层（12）逐渐增加，并且在ro处的液体层（12）的温度升高值为dTro> dTri。以这种方式，在信息存储区域上测量的间隔层或覆盖层具有小于+/-1μm的厚度变化。此外，描述使用所述方法制造的介质和用于执行该方法的装置。

8. 发明申请

US20060033898A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060033898A1
公开(公告)日：2006-02-16
申请号：US11205325
申请日：2005-08-17
申请人： Theodorus Cadee , Johannes Jacobs , Nicolaas Kate , Erik Loopstra , Aschwin Lodewijk Vermeer , Jeroen Maria Mertens , Christianus De Mol , Marcel Hubertus Muitjens , Antonius Van Der Net , Joost Ottens , Johannes Quaedackers , Maria Reuhman-Huisken , Marco Stavenga , Patricius Tinnemans , Martinus Verhagen , Jacobus Johannus Hendricus Verspay , Frederik De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Smeets , Bart Schoondermark , Franciscus Janssen , Michel Riepen
发明人： Theodorus Cadee , Johannes Jacobs , Nicolaas Kate , Erik Loopstra , Aschwin Lodewijk Vermeer , Jeroen Maria Mertens , Christianus De Mol , Marcel Hubertus Muitjens , Antonius Van Der Net , Joost Ottens , Johannes Quaedackers , Maria Reuhman-Huisken , Marco Stavenga , Patricius Tinnemans , Martinus Verhagen , Jacobus Johannus Hendricus Verspay , Frederik De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Smeets , Bart Schoondermark , Franciscus Janssen , Michel Riepen
IPC分类号： G03B27/42
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
摘要翻译：公开了一种光刻设备，其具有液体供应系统，其配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件，以及一个或多个元件以控制和/或补偿来自基底的液体的蒸发。

9. 发明授权

US08431746B2 Method for producing diphenylmethane diamine 有权
标题翻译：二苯甲烷二胺的制备方法
公开(公告)号：US08431746B2
公开(公告)日：2013-04-30
申请号：US12992472
申请日：2009-05-20
申请人： Johannes Jacobs
发明人： Johannes Jacobs
IPC分类号： C07C211/50 , C07C209/82 , C07C209/86
CPC分类号： C07C209/78 , C07C209/84 , C07C211/53
摘要： The invention relates to a process for preparing mixtures of diphenylmethanediamine and polyphenylenepolymethylenepolyamines, which comprises the steps a) reaction of aniline with formaldehyde in the presence of hydrochloric acid, b) neutralization of the reaction mixture formed in step a) c) separation of the organic phase from the aqueous phase, d) work-up of the organic phase, e) work-up of the aqueous phase, wherein step e) comprises at least the steps e1) extraction of the aqueous phase with an organic solvent, e2) stripping of the aqueous phase obtained in step e1), e3) absorption of the solution obtained from step e2).
摘要翻译：本发明涉及一种制备二苯基甲二胺和聚亚苯基多亚甲基多胺的混合物的方法，其包括以下步骤：a）在盐酸存在下苯胺与甲醛反应，b）中和步骤a）中形成的反应混合物，c）分离有机相和水相，d）有机相的后处理，e）水相的后处理，其中步骤e）至少包括步骤e1）用有机溶剂萃取水相，e2）汽提的步骤e1）中获得的水相，e3）从步骤e2）获得的溶液的吸收。

10. 发明申请

US20120142960A1 METHOD FOR PURIFYING MIXTURES COMPRISING 4,4'-METHYLENEDIPHENYL DIISOCYANATE 有权
标题翻译：净化包含4,4'-亚甲基二苯基二异氰酸酯的混合物的方法
公开(公告)号：US20120142960A1
公开(公告)日：2012-06-07
申请号：US13296665
申请日：2011-11-15
申请人： Michael BOCK , Johannes Jacobs , Kai Thiele , Anne-Kathrin Merten
发明人： Michael BOCK , Johannes Jacobs , Kai Thiele , Anne-Kathrin Merten
IPC分类号： C07C263/20
CPC分类号： C07C263/20 , C07C265/14
摘要： The invention relates to a method for purifying mixtures comprising 4,4′-methylenediphenyl diisocyanate, which comprises purifying by distillation a mixture I comprising 4,4′-methylenediphenyl diisocyanate having a hydrolyzable chlorine content as specified in ASTM D4663-10 of greater than 100 ppm by means of a column K1, wherein the gaseous stream comprising the mixture I is brought into contact in the column K1 with at least one liquid compound A which has the same or higher boiling point than 4,4′-methylenediphenyl diisocyanate and which has a hydrolyzable chlorine content as specified in ASTM D4663-10 of a maximum of 100 ppm, and wherein the gaseous stream O obtained at the top of the column comprises 4,4′-methylenediphenyl diisocyanate has a hydrolyzable chlorine content as specified in ASTM D4663-10 of a maximum of 100 ppm.
摘要翻译：本发明涉及一种用于纯化包含4,4'-亚甲基二苯基二异氰酸酯的混合物的方法，其包括通过蒸馏纯化包含如ASTM D4663-10中规定的可水解氯含量的4,4'-亚甲基二苯基二异氰酸酯的混合物I大于100 通过柱K1，其中包含混合物I的气流在柱K1中与至少一种液体化合物A接触，该液体化合物A具有与4,4'-亚甲基二苯基二异氰酸酯相同或更高的沸点， ASTM D4663-10中规定的可水解氯含量最高为100ppm，其中在塔顶获得的气流O包含4,4'-亚甲基二苯基二异氰酸酯，其具有如ASTM D4663- 10最大为100 ppm。

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