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    • 2. 发明授权
    • Alkali-free glass substrate, method for producing it and liquid crystal display panel
    • 无碱玻璃基板,其制造方法和液晶显示面板
    • US07754631B2
    • 2010-07-13
    • US12349559
    • 2009-01-07
    • Terutaka MaeharaManabu NishizawaJunichiro KaseSyuji Matsumoto
    • Terutaka MaeharaManabu NishizawaJunichiro KaseSyuji Matsumoto
    • C03C3/087C03C3/091C03C3/083C03C3/085C03C3/078
    • C03C3/091G02F2001/133302G02F2202/09
    • To provide an alkali-free glass substrate, which has a high Young's modulus, a low linear expansion coefficient, a high strain point and a low density, does not devitrify in the float forming process and is excellent in acid resistance.An alkali-free glass substrate, which contains neither alkali component nor BaO and consists essentially of, as represented by mol % based on oxide, from 57.0 to 65.0% of SiO2, from 10.0 to 12.0% of Al2O3, from 6.0 to 9.0% of B2O3, from 5.0 to 10.0% of MgO, from 5.0 to 10.0% of CaO and from 2.5 to 5.5% of SrO, provided that MgO+CaO+SrO is from 16.0 to 19.0%, MgO/(MgO+CaO+SrO)≧0.40, and B2O3/(SiO2+Al2O3+B2O3)≦0.12; wherein Young's modulus ≧75 GPa; the linear expansion coefficient at from 50 to 350° C. is from 30×10−7/° C. to 40×10−7/° C.; the strain point ≧640° C.; the temperature T2 (the viscosity η satisfies log η=2)≦1,620° C.; the temperature T4 (the viscosity η satisfies log η=4)≦1,245° C.; the devitrification temperature ≦T4; and weight loss per unit area is at most 0.6 mg/cm2, when immersed in 0.1N HCl at 90° C. for 20 hours.
    • 为了提供具有高杨氏模量,低线膨胀系数,高应变点和低密度的无碱玻璃基板,在浮法成形工艺中不会失透,并且耐酸性优异。 不含碱成分和BaO的碱性玻璃基材,其基本上由氧化物的摩尔%表示,SiO 2为57.0〜65.0%,Al 2 O 3为10.0〜12.0%,Al 2 O 3为6.0〜9.0% B 2 O 3,MgO 5.0〜10.0%,CaO 5.0〜10.0%,SrO 2.5〜5.5%,MgO + CaO + SrO为16.0〜19.0%,MgO /(MgO + CaO + SrO)≥ 0.40和B2O3 /(SiO2 + Al2O3 + B2O3)≦̸ 0.12; 其中杨氏模量≥75GPa; 50〜350℃的线膨胀系数为30×10 -7 /℃至40×10 -7 /℃。 应变点≧640℃。 温度T2(粘度&eegr;满足log&eegr = 2)≦̸ 1,620℃。 温度T4(粘度&eegr;满足log&eegr; = 4)≦̸ 1,245℃; 失透温度≦̸ T4; 当在90℃下浸入0.1N HCl中20小时时,每单位面积的重量损失为0.6mg / cm 2以下。
    • 3. 发明申请
    • ALKALI-FREE GLASS SUBSTRATE, METHOD FOR PRODUCING IT AND LIQUID CRYSTAL DISPLAY PANEL
    • 无碱玻璃基材,其制造方法和液晶显示面板
    • US20090176640A1
    • 2009-07-09
    • US12349559
    • 2009-01-07
    • Terutaka MaeharaManabu NishizawaJunichiro KaseSyuji Matsumoto
    • Terutaka MaeharaManabu NishizawaJunichiro KaseSyuji Matsumoto
    • C03C3/091C03B18/00
    • C03C3/091G02F2001/133302G02F2202/09
    • To provide an alkali-free glass substrate, which has a high Young's modulus, a low linear expansion coefficient, a high strain point and a low density, does not devitrify in the float forming process and is excellent in acid resistance.An alkali-free glass substrate, which contains neither alkali component nor BaO and consists essentially of, as represented by mol % based on oxide, from 57.0 to 65.0% of SiO2, from 10.0 to 12.0% of Al2O3, from 6.0 to 9.0% of B2O3, from 5.0 to 10.0% of MgO, from 5.0 to 10.0% of CaO and from 2.5 to 5.5% of SrO, provided that MgO+CaO+SrO is from 16.0 to 19.0%, MgO/(MgO+CaO+SrO)≧0.40, and B2O3/(SiO2+Al2O3+B2O3)≦0.12; wherein Young's modulus ≧75 GPa; the linear expansion coefficient at from 50 to 350° C. is from 30×10−7/° C. to 40×10−7/° C.; the strain point ≧640° C.; the temperature T2 (the viscosity η satisfies log η=2)≦1,620° C.; the temperature T4 (the viscosity η satisfies log η=4)≦1,245° C.; the devitrification temperature ≦T4; and weight loss per unit area is at most 0.6 mg/cm2, when immersed in 0.1N HCl at 90° C. for 20 hours.
    • 为了提供具有高杨氏模量,低线膨胀系数,高应变点和低密度的无碱玻璃基板,在浮法成形工艺中不会失透,并且耐酸性优异。 不含碱成分和BaO的碱性玻璃基材,其基本上由氧化物的摩尔%表示,SiO 2为57.0〜65.0%,Al 2 O 3为10.0〜12.0%,Al 2 O 3为6.0〜9.0% B2O3为5.0〜10.0%,CaO为5.0〜10.0%,SrO为2.5〜5.5%,MgO + CaO + SrO为16.0〜19.0%,MgO /(MgO + CaO + SrO) = 0.40,B2O3 /(SiO2 + Al2O3 + B2O3)= 0.12; 其中杨氏模量> 75GPa; 在50至350℃的线性膨胀系数为30×10 -7 /℃至40×10 -7 /℃。 应变点> = 640°C。 温度T2(粘度eta满足log eta = 2)= 1,620℃。 温度T4(粘度eta满足log eta = 4)<= 1,245℃。 失透温度<= T4; 当在90℃下浸入0.1N HCl中20小时时,每单位面积的重量损失为0.6mg / cm 2以下。
    • 4. 发明申请
    • ALKALI FREE GLASS AND PROCESS FOR ITS PRODUCTION
    • 阿尔卡利免费玻璃及其生产工艺
    • US20080076656A1
    • 2008-03-27
    • US11934138
    • 2007-11-02
    • Kazuhiro SUZUKIManabu NishizawaSeiji MiyazakiJunichiro KaseKei Maeda
    • Kazuhiro SUZUKIManabu NishizawaSeiji MiyazakiJunichiro KaseKei Maeda
    • C03C3/091
    • C03B5/225C03C3/118
    • To provide an alkali free glass which is suitable as a glass substrate for LCD and has few defects of bubbles and an undissolved starting material, and a process for producing an alkali free glass which can readily lower the defects in bubbles and an undissolved starting material. An alkali free glass with a matrix composition comprising SiO2, Al2O3, B2O3, MgO, CaO, SrO and BaO and containing substantially no alkali metal oxide, of which the temperature at which the viscosity becomes 102 dPa·s, is at most 1,600° C. and which contains sulfur in an amount of from 0.001 to 0.1% as calculated as SO3, as represented by the mass percentage, per 100% of the total amount of the above matrix composition, and a process for producing a glass which comprises preparing a starting material and melting it so that a sulfate be incorporated to the starting material in an amount of from 0.01 to 5% as calculated as SO3, as represented by the mass percentage, per 100% of the total amount of the above matrix composition.
    • 为了提供适合作为LCD的玻璃基板并且几乎没有气泡和未溶解的原料的无碱玻璃,以及可以容易地降低气泡缺陷和未溶解的原料的无碱玻璃的制造方法。 具有基质组合物的无碱玻璃,其包含SiO 2,Al 2 O 3,B 2 O 3 > 3,MgO,CaO,SrO和BaO,并且基本上不含碱金属氧化物,其粘度达到10psa.s的温度为至多1600℃ 并且其含有以SO 3计算的0.001至0.1%的硫,以质量百分比表示,相对于上述基质组合物的总量的100%,以及工艺 用于制备玻璃,其包括制备原料并使其熔融,使得硫酸盐以SO 3计算的0.01至5%的量掺入原料中,如质量 百分比,每100%的上述基质组合物的总量。
    • 6. 发明授权
    • Alkali free glass and process for its production
    • 碱性免费玻璃及其生产工艺
    • US07670975B2
    • 2010-03-02
    • US11934138
    • 2007-11-02
    • Kazuhiro SuzukiManabu NishizawaSeiji MiyazakiJunichiro KaseKei Maeda
    • Kazuhiro SuzukiManabu NishizawaSeiji MiyazakiJunichiro KaseKei Maeda
    • C03C3/091C03C3/085C03C3/087
    • C03B5/225C03C3/118
    • To provide an alkali free glass which is suitable as a glass substrate for LCD and has few defects of bubbles and an undissolved starting material, and a process for producing an alkali free glass which can readily lower the defects in bubbles and an undissolved starting material.An alkali free glass with a matrix composition comprising SiO2, Al2O3, B2O3, MgO, CaO, SrO and BaO and containing substantially no alkali metal oxide, of which the temperature at which the viscosity becomes 102 dPa·s, is at most 1,600° C. and which contains sulfur in an amount of from 0.001 to 0.1% as calculated as SO3, as represented by the mass percentage, per 100% of the total amount of the above matrix composition, and a process for producing a glass which comprises preparing a starting material and melting it so that a sulfate be incorporated to the starting material in an amount of from 0.01 to 5% as calculated as SO3, as represented by the mass percentage, per 100% of the total amount of the above matrix composition.
    • 为了提供适合作为LCD的玻璃基板并且几乎没有气泡和未溶解的原料的无碱玻璃,以及可以容易地降低气泡缺陷和未溶解的原料的无碱玻璃的制造方法。 具有SiO 2,Al 2 O 3,B 2 O 3,MgO,CaO,SrO和BaO的基本组成的无碱玻璃,并且基本上不含粘度为102dPa·s的温度的碱金属氧化物,其最高为1600℃ 并且其含有以SO 3计算的0.001至0.1%的硫,以质量百分比表示,相对于上述基质组合物的总量的100%,以及制备玻璃的方法,包括制备 起始原料并使其熔融,使得按照如上述基质组合物的总量的100%以质量百分比表示的按SO 3计算的量为0.01至5%的原料中加入硫酸盐。