专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20080076656A1 ALKALI FREE GLASS AND PROCESS FOR ITS PRODUCTION 失效
标题翻译：阿尔卡利免费玻璃及其生产工艺
公开(公告)号：US20080076656A1
公开(公告)日：2008-03-27
申请号：US11934138
申请日：2007-11-02
申请人： Kazuhiro SUZUKI , Manabu Nishizawa , Seiji Miyazaki , Junichiro Kase , Kei Maeda
发明人： Kazuhiro SUZUKI , Manabu Nishizawa , Seiji Miyazaki , Junichiro Kase , Kei Maeda
IPC分类号： C03C3/091
CPC分类号： C03B5/225 , C03C3/118
摘要： To provide an alkali free glass which is suitable as a glass substrate for LCD and has few defects of bubbles and an undissolved starting material, and a process for producing an alkali free glass which can readily lower the defects in bubbles and an undissolved starting material. An alkali free glass with a matrix composition comprising SiO2, Al2O3, B2O3, MgO, CaO, SrO and BaO and containing substantially no alkali metal oxide, of which the temperature at which the viscosity becomes 102 dPa·s, is at most 1,600° C. and which contains sulfur in an amount of from 0.001 to 0.1% as calculated as SO3, as represented by the mass percentage, per 100% of the total amount of the above matrix composition, and a process for producing a glass which comprises preparing a starting material and melting it so that a sulfate be incorporated to the starting material in an amount of from 0.01 to 5% as calculated as SO3, as represented by the mass percentage, per 100% of the total amount of the above matrix composition.
摘要翻译：为了提供适合作为LCD的玻璃基板并且几乎没有气泡和未溶解的原料的无碱玻璃，以及可以容易地降低气泡缺陷和未溶解的原料的无碱玻璃的制造方法。具有基质组合物的无碱玻璃，其包含SiO 2，Al 2 O 3，B 2 O 3 > 3，MgO，CaO，SrO和BaO，并且基本上不含碱金属氧化物，其粘度达到10psa.s的温度为至多1600℃ 并且其含有以SO 3计算的0.001至0.1％的硫，以质量百分比表示，相对于上述基质组合物的总量的100％，以及工艺用于制备玻璃，其包括制备原料并使其熔融，使得硫酸盐以SO 3计算的0.01至5％的量掺入原料中，如质量百分比，每100％的上述基质组合物的总量。

2. 发明授权

US07670975B2 Alkali free glass and process for its production 失效
标题翻译：碱性免费玻璃及其生产工艺
公开(公告)号：US07670975B2
公开(公告)日：2010-03-02
申请号：US11934138
申请日：2007-11-02
申请人： Kazuhiro Suzuki , Manabu Nishizawa , Seiji Miyazaki , Junichiro Kase , Kei Maeda
发明人： Kazuhiro Suzuki , Manabu Nishizawa , Seiji Miyazaki , Junichiro Kase , Kei Maeda
IPC分类号： C03C3/091 , C03C3/085 , C03C3/087
CPC分类号： C03B5/225 , C03C3/118
摘要： To provide an alkali free glass which is suitable as a glass substrate for LCD and has few defects of bubbles and an undissolved starting material, and a process for producing an alkali free glass which can readily lower the defects in bubbles and an undissolved starting material.An alkali free glass with a matrix composition comprising SiO2, Al2O3, B2O3, MgO, CaO, SrO and BaO and containing substantially no alkali metal oxide, of which the temperature at which the viscosity becomes 102 dPa·s, is at most 1,600° C. and which contains sulfur in an amount of from 0.001 to 0.1% as calculated as SO3, as represented by the mass percentage, per 100% of the total amount of the above matrix composition, and a process for producing a glass which comprises preparing a starting material and melting it so that a sulfate be incorporated to the starting material in an amount of from 0.01 to 5% as calculated as SO3, as represented by the mass percentage, per 100% of the total amount of the above matrix composition.
摘要翻译：为了提供适合作为LCD的玻璃基板并且几乎没有气泡和未溶解的原料的无碱玻璃，以及可以容易地降低气泡缺陷和未溶解的原料的无碱玻璃的制造方法。具有SiO 2，Al 2 O 3，B 2 O 3，MgO，CaO，SrO和BaO的基本组成的无碱玻璃，并且基本上不含粘度为102dPa·s的温度的碱金属氧化物，其最高为1600℃ 并且其含有以SO 3计算的0.001至0.1％的硫，以质量百分比表示，相对于上述基质组合物的总量的100％，以及制备玻璃的方法，包括制备起始原料并使其熔融，使得按照如上述基质组合物的总量的100％以质量百分比表示的按SO 3计算的量为0.01至5％的原料中加入硫酸盐。

3. 发明授权

US07838451B2 Alkali-free glass and liquid crystal display panel 有权
标题翻译：无碱玻璃和液晶显示面板
公开(公告)号：US07838451B2
公开(公告)日：2010-11-23
申请号：US11472352
申请日：2006-06-22
申请人： Manabu Nishizawa , Junichiro Kase , Kazuhiro Suzuki , Kei Maeda
发明人： Manabu Nishizawa , Junichiro Kase , Kazuhiro Suzuki , Kei Maeda
IPC分类号： C03C3/089 , C03C3/091
CPC分类号： C03C3/091 , G02F2001/133302
摘要： To provide an alkali-free glass excellent in the properties for glass substrates to be used for display, excellent in the resistance to reduction, and suitable for forming by a float process.An alkali-free glass consisting essentially of, as represented by mol %: SiO2at least 60% and less than 66%, Al2O30 to 12%, B2O35 to 10%, MgO0 to 18%, CaO0 to 18%, SrO0 to 18%, BaO0 to 6%, CaO + SrO10 to 25%, MgO + CaO + SrO + BaO15.5 to 30% and containing substantially no alkali metal oxide.
摘要翻译：为了提供用于显示的玻璃基板的特性优异的无碱玻璃，耐还原性优异，适用于浮法成型。基本上由以摩尔％表示的无碱玻璃：SiO 2至少60％且小于66％，Al 2 O 3 0至12％，B 2 O 3 5至10％，MgO 0至18％，CaO 0至18％ SrO 0〜18％，BaO 0〜6％，CaO + SrO 10〜25％，MgO + CaO + SrO + BaO 15.5〜30％，基本上不含碱金属氧化物。

4. 发明申请

US20070027019A1 Alkali - free glass and liquid crystal display panel 有权
公开(公告)号：US20070027019A1
公开(公告)日：2007-02-01
申请号：US11472352
申请日：2006-06-22
申请人： Manabu Nishizawa , Junichiro Kase , Kazuhiro Suzuki , Kei Maeda
发明人： Manabu Nishizawa , Junichiro Kase , Kazuhiro Suzuki , Kei Maeda
IPC分类号： C03C3/089 , C03C3/091
CPC分类号： C03C3/091 , G02F2001/133302
摘要： To provide an alkali-free glass excellent in the properties for glass substrates to be used for display, excellent in the resistance to reduction, and suitable for forming by a float process. An alkali-free glass consisting essentially of, as represented by mol %: SiO2at least 60% and less than 66%, Al2O30 to 12%, B2O35 to 10%, MgO0 to 18%, CaO0 to 18%, SrO0 to 18%, BaO0 to 6%, CaO + SrO10 to 25%, MgO + CaO + SrO + BaO15.5 to 30% and containing substantially no alkali metal oxide.

5. 发明申请

US20080127679A1 PROCESS FOR PRODUCING ALKALI FREE GLASS AND ALKALI FREE GLASS PLATE 审中-公开
公开(公告)号：US20080127679A1
公开(公告)日：2008-06-05
申请号：US11969532
申请日：2008-01-04
申请人： Manabu Nishizawa , Junichiro Kase , Kenta Saito , Kei Maeda , Syuji Matsumoto
发明人： Manabu Nishizawa , Junichiro Kase , Kenta Saito , Kei Maeda , Syuji Matsumoto
IPC分类号： C03B5/225 , C03C3/091
CPC分类号： C03B5/225 , C03B5/2252 , C03C1/004 , C03C3/091 , Y02P40/57
摘要： To provide a process for producing and alkali free glass for effectively suppressing bubbles, and an alkali free glass produced by the process, which is suitable as a glass substrate for flat panel displays and has few bubbles.A process for producing an alkali free glass containing substantially no alkali metal oxide, which comprises melting a glass starting material having a matrix composition of the following composition, and subjecting the molten glass to a treatment process of removing bubbles under reduced pressure, stirring or transferring under a condition where the molten glass is in contact with a platinum member, wherein the starting material is prepared so as to contain SnO2 in an amount of from 0.01 to 2.0% per 100% of the total amount of the above matrix composition; the starting material is melted under heating at from 1,500 to 1,650° C.; then bubbles contained in the molten glass are permitted to rise to the surface of the molten glass, together with oxygen bubbles generated by a reduction reaction in which SnO2 in the molten glass is reduced to SnO; and in the above treatment process, the oxygen bubbles generated at the interface between the molten glass and the platinum member are permitted to be absorbed by an oxidation reaction in which SnO is oxidized to SnO2, under a condition where the molten glass is from 1,300 to 1,500° C.Composition as represented by the mass percentage: SiO258.4 to 66.0%, Al2O315.3 to 22.0%, B2O3 5.0 to 12.0%, MgO 0 to 6.5%, CaO 0 to 7.0%, SrO 4 to 12.5%, BaO 0 to 2.0%, MgO + CaO + SrO + BaO 9.0 to 18.0%.

6. 发明授权

US5882371A Method for heat-treating a glass substrate 失效
标题翻译：玻璃基板的热处理方法
公开(公告)号：US5882371A
公开(公告)日：1999-03-16
申请号：US891032
申请日：1997-07-10
申请人： Seiji Miyazaki , Manabu Nishizawa , Kei Maeda
发明人： Seiji Miyazaki , Manabu Nishizawa , Kei Maeda
IPC分类号： C03B25/08 , C03B29/08 , C03B32/00
CPC分类号： C03B25/08 , C03B29/08
摘要： In each of the second and subsequent heat treatments, in a case where a glass substrate shrinks by heat treatment at the same average cooling rate as the average cooling rate in the immediately preceding heat treatment, the average cooling rate is set to be larger than that in the immediately preceding heat treatment, and inversely, in a case where the glass substrate extends, the average cooling rate is set to be smaller than that in the immediately preceding heat treatment.
摘要翻译：在第二次和随后的热处理中，在玻璃基板以与之前的热处理中的平均冷却速度相同的平均冷却速度通过热处理收缩的情况下，将平均冷却速度设定为大于在刚刚进行的热处理中，相反地，在玻璃基板延伸的情况下，将平均冷却速度设定为小于刚刚进行热处理时的平均冷却速度。

7. 发明授权

US08236717B2 Glass plate for substrate 失效
标题翻译：基板玻璃板
公开(公告)号：US08236717B2
公开(公告)日：2012-08-07
申请号：US13243641
申请日：2011-09-23
申请人： Manabu Nishizawa , Yuya Shimada , Junichiro Kase
发明人： Manabu Nishizawa , Yuya Shimada , Junichiro Kase
IPC分类号： C03C3/085 , C03C3/091
CPC分类号： C03C3/085 , C03C3/087 , C03C3/091
摘要： Provided is a glass plate for a substrate, which comprises, as a glass matrix composition as represented by mass % based on oxide: SiO2: 70 to 80, Al2O3: 0.1 to 5, B2O3: 0 to 3, MgO: 9.5 to 12, where the amount of CaO+SrO+BaO is 0 to 2, and the amount of Na2O+K2O is 12.5 to 15.5, which has a density of at most 2.5 g/cm3, has an average coefficient of thermal expansion from 50 to 350° C. of more than 75×10−7/° C. and at most 87×10−7/° C., has a glass transition point of at least 560° C., has a brittleness of at most 6.5 μm−1/2, and has a heat shrinkage (C)of at most 20 ppm.
摘要翻译：本发明提供一种基板用玻璃板，其特征在于，以氧化物质量％表示的玻璃基质组合物：SiO 2：70〜80，Al 2 O 3：0.1〜5，B 2 O 3 :0〜3，MgO：9.5〜12，其中CaO + SrO + BaO的量为0〜2，Na2O + K2O的含量为12.5〜15.5，密度为2.5g / cm 3以下，平均热膨胀系数为50〜350℃ 大于75×10-7 /℃，最多为87×10-7 /℃，玻璃化转变温度至少为560℃，其脆性至多为6.5μm-1 / 2，热收缩率（C）为20ppm以下。

8. 发明申请

US20060003884A1 Alkali free glass 审中-公开
标题翻译：碱性免费玻璃
公开(公告)号：US20060003884A1
公开(公告)日：2006-01-05
申请号：US11221755
申请日：2005-09-09
申请人： Manabu Nishizawa , Junichiro Kase
发明人： Manabu Nishizawa , Junichiro Kase
IPC分类号： C03C3/078 , C03C3/091 , C03C3/087
CPC分类号： C03C3/091
摘要： To present an alkali free glass capable of reducing compaction caused by heat treatment, without significantly increasing the strain point. An alkali free glass characterized in that the ratio (Δan-st/α50-350) of the equilibrium density curve gradient Δan-st (ppm/° C.) in a temperature range of from about the annealing point (Tan) to about the strain point (Tst) to the average linear expansion coefficient α50-350 (×10−6/° C.) in a range of from 50 to 350° C., is at least 0 and less than 3.64.
摘要翻译：提供能够减少由热处理引起的压实的无碱玻璃，而不显着增加应变点。一种无碱玻璃，其特征在于，平衡密度曲线梯度ΔA-s的比值（ΔA/α/α/α50-350℃）在大约退火点（T SUB）至约应变点（T SUB）之间的温度范围内的平均线膨胀系数（ppm /℃）在50至350℃的范围内的系数α50-350（x 10 -6 -6℃）为至少0且小于3.64。

9. 发明授权

US06537937B1 Alkali-free glass 有权
标题翻译：无碱玻璃
公开(公告)号：US06537937B1
公开(公告)日：2003-03-25
申请号：US09631113
申请日：2000-08-02
申请人： Manabu Nishizawa , Yasumasa Nakao , Akio Koike , Junichiro Kase
发明人： Manabu Nishizawa , Yasumasa Nakao , Akio Koike , Junichiro Kase
IPC分类号： C03C3091
CPC分类号： C03C3/091
摘要： An alkali-free glass consisting essentially of: SiO2 64 to 76 mol %, Al2O3 5 to 14 mol %, B2O3 5 to 16 mol %, MgO 1 to 16.5 mol %, CaO 0 to 14 mol %, SrO 0 to 6 mol %, and BaO 0 to 2 mol %.
摘要翻译：一种基本上由...组成的无碱玻璃

10. 发明授权

US08324123B2 Glass plate, process for producing it, and process for producing TFT panel 有权
标题翻译：玻璃板，其制造方法以及TFT面板的制造方法
公开(公告)号：US08324123B2
公开(公告)日：2012-12-04
申请号：US12693482
申请日：2010-01-26
申请人： Yuya Shimada , Manabu Nishizawa , Junichiro Kase
发明人： Yuya Shimada , Manabu Nishizawa , Junichiro Kase
IPC分类号： C03C3/085 , C03C3/087 , C03B18/02
CPC分类号： C03C3/087 , C03C3/091 , G02F2001/133302 , G02F2201/54 , G02F2202/09
摘要： To provide a glass plate which has a low B2O3 content and which can be used as a glass plate for e.g. an LCD panel.A glass plate which comprises, as a glass matrix composition as represented by mass % based on oxide, from 53 to 74 mass % of SiO2, from 15 to 23 mass % of Al2O3, from 0 to 3 mass % of B2O3, from 2 to 17 mass % of MgO, from 0 to 12 mass % of CaO, from 0 to 6 mass % of SrO, from 6 to 28 mass % of MgO+CaO+SrO, from 0 to 9 mass % of Na2O, from 0 to 6 mass % of K2O and from 0.8 to 11 mass % of Na2O+K2O, contains from 100 to 500 ppm of SO3, has an average coefficient of thermal expansion from 50 to 350° C. of at most 60×10−7/° C., and has a strain point of at least 600° C.
摘要翻译：提供具有低B 2 O 3含量的玻璃板，并可用作例如玻璃板的玻璃板。一个液晶面板。玻璃板，其以基于氧化物的质量％表示的玻璃基质组合物，53〜74质量％的SiO 2，15〜23质量％的Al 2 O 3，0〜3质量％的B 2 O 3，2〜 0〜12质量％的MgO，0〜6质量％的SrO，6〜28质量％的MgO + CaO + SrO，0〜9质量％的Na 2 O，0〜6 K 2 O的质量％和Na 2 O + K 2 O的0.8〜11质量％含有100〜500ppm的SO 3，平均热膨胀系数为50〜350℃，为60×10 -7 /℃以下并具有至少600℃的应变点。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式