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    • 3. 发明申请
    • Array substrate for liquid crystal display device and the fabrication method of the same
    • 液晶显示装置用阵列基板及其制造方法
    • US20070235737A1
    • 2007-10-11
    • US11806979
    • 2007-06-05
    • Byung-chul AhnByoung-ho LimSoon-Sung YooYong-wan Kim
    • Byung-chul AhnByoung-ho LimSoon-Sung YooYong-wan Kim
    • H01L29/04
    • H01L27/1288H01L27/124H01L27/1255
    • The present invention discloses a four-mask method of manufacturing an array substrate of a liquid crystal display device and the liquid crystal display device having the same array substrate. The method includes forming a plurality of gate lines, gate electrodes and gate extension lines by depositing a first metallic material on a substrate and patterning the first metallic material with a first mask, the gate extension lines extending toward the opposite direction of the gate electrodes; forming a first insulating layer on the whole surface having gate lines, gate electrodes, and gate extension lines; forming a plurality of data lines, source electrodes, drain electrodes, and capacitor electrodes over the gate lines by depositing a semiconductor layer, an ohmic contact layer and a second metallic material sequentially on the first insulating layer, and patterning the second metallic material and the ohmic contact layer with a second mask; forming a passivation layer and a plurality of first and second contact holes by depositing a second insulating layer on the data lines, the source electrodes, the drain electrodes and the capacitor electrodes, and patterning the second insulating layer with a third mask, the first contact holes exposing a portion of the drain electrode, the second contact holes exposing a portion of the capacitor electrodes; and forming a plurality of pixel electrodes by depositing a transparent conductive layer on the passivation layer, and patterning the transparent conductive layer by a fourth mask, the pixel electrodes contacting the drain electrodes through the first contact holes and contacting the capacitor electrodes through the second contact holes.
    • 本发明公开了一种制造液晶显示装置的阵列基板的四掩模方法和具有相同阵列基板的液晶显示装置。 该方法包括通过在衬底上沉积第一金属材料并用第一掩模图案化第一金属材料来形成多条栅极线,栅电极和栅极延伸线,栅极延伸线朝向栅电极的相反方向延伸; 在具有栅极线,栅极电极和栅极延伸线的整个表面上形成第一绝缘层; 通过在第一绝缘层上依次沉积半导体层,欧姆接触层和第二金属材料,在栅极线上形成多个数据线,源电极,漏电极和电容器电极,并将第二金属材料和 具有第二掩模的欧姆接触层; 通过在数据线,源电极,漏电极和电容器电极上沉积第二绝缘层,并用第三掩模对第二绝缘层进行构图来形成钝化层和多个第一和第二接触孔,第一接触 露出一部分漏电极的第二接触孔暴露电容器电极的一部分; 以及通过在所述钝化层上沉积透明导电层并形成多个像素电极,以及通过第四掩模对所述透明导电层进行图案化,所述像素电极通过所述第一接触孔与所述漏电极接触并通过所述第二接触接触所述电容器电极 孔。
    • 4. 发明授权
    • Array substrate for liquid crystal display device and the fabrication method of the same
    • 液晶显示装置用阵列基板及其制造方法
    • US07381988B2
    • 2008-06-03
    • US11806979
    • 2007-06-05
    • Byung-chul AhnByoung-ho LimSoon-Sung YooYong-wan Kim
    • Byung-chul AhnByoung-ho LimSoon-Sung YooYong-wan Kim
    • H01L29/04H01L29/10H01L31/20H01L31/036H01L31/0376
    • H01L27/1288H01L27/124H01L27/1255
    • The present invention discloses a four-mask method of manufacturing an array substrate of a liquid crystal display device and the liquid crystal display device having the same array substrate. The method includes forming a plurality of gate lines, gate electrodes and gate extension lines by depositing a first metallic material on a substrate and patterning the first metallic material with a first mask, the gate extension lines extending toward the opposite direction of the gate electrodes; forming a first insulating layer on the whole surface having gate lines, gate electrodes, and gate extension lines; forming a plurality of data lines, source electrodes, drain electrodes, and capacitor electrodes over the gate lines by depositing a semiconductor layer, an ohmic contact layer and a second metallic material sequentially on the first insulating layer, and patterning the second metallic material and the ohmic contact layer with a second mask; forming a passivation layer and a plurality of first and second contact holes by depositing a second insulating layer on the data lines, the source electrodes, the drain electrodes and the capacitor electrodes, and patterning the second insulating layer with a third mask, the first contact holes exposing a portion of the drain electrode, the second contact holes exposing a portion of the capacitor electrodes; and forming a plurality of pixel electrodes by depositing a transparent conductive layer on the passivation layer, and patterning the transparent conductive layer by a fourth mask, the pixel electrodes contacting the drain electrodes through the first contact holes and contacting the capacitor electrodes through the second contact holes.
    • 本发明公开了一种制造液晶显示装置的阵列基板的四掩模方法和具有相同阵列基板的液晶显示装置。 该方法包括通过在衬底上沉积第一金属材料并用第一掩模图案化第一金属材料来形成多条栅极线,栅电极和栅极延伸线,栅极延伸线朝向栅电极的相反方向延伸; 在具有栅极线,栅极电极和栅极延伸线的整个表面上形成第一绝缘层; 通过在第一绝缘层上依次沉积半导体层,欧姆接触层和第二金属材料,在栅极线上形成多个数据线,源电极,漏电极和电容器电极,并将第二金属材料和 具有第二掩模的欧姆接触层; 通过在数据线,源电极,漏电极和电容器电极上沉积第二绝缘层,并用第三掩模对第二绝缘层进行构图来形成钝化层和多个第一和第二接触孔,第一接触 露出一部分漏电极的第二接触孔暴露电容器电极的一部分; 以及通过在所述钝化层上沉积透明导电层并形成多个像素电极,以及通过第四掩模对所述透明导电层进行图案化,所述像素电极通过所述第一接触孔与所述漏电极接触并通过所述第二接触接触所述电容器电极 孔。
    • 8. 发明授权
    • Array substrate for liquid crystal display and the fabrication method of the same
    • 液晶显示器用阵列基板及其制造方法
    • US06599786B1
    • 2003-07-29
    • US09657477
    • 2000-09-07
    • Byung-chul AhnByoung-ho LimSoon-sung YooYong-wan Kim
    • Byung-chul AhnByoung-ho LimSoon-sung YooYong-wan Kim
    • H01F2100
    • H01L27/1288H01L27/124H01L27/1255
    • A method of manufacturing an LCD array substrate and LCD made by that method are disclosed. A plurality of gate lines, gate electrodes and gate extension lines are formed by depositing and patterning a first metallic material using a first mask. A first insulating layer is then formed. A plurality of data lines, source electrodes, drain electrodes, and capacitor electrodes are then formed by depositing and patterning suitable materials using a second mask. A passivation layer is then formed and patterned to create first and second contact holes using a third mask. The first contact holes expose the drain electrodes, the second contact holes expose the capacitor electrodes. A plurality of pixel electrodes are then formed by depositing and patterning a transparent conductive layer using a fourth mask. The pixel electrodes contact the drain electrodes through the first contact holes and contact the capacitor electrodes through the second contact holes.
    • 公开了一种通过该方法制造LCD阵列基板和LCD的方法。 通过使用第一掩模沉积和图案化第一金属材料来形成多个栅极线,栅极电极和栅极延伸线。 然后形成第一绝缘层。 然后通过使用第二掩模沉积和图形合适的材料来形成多个数据线,源电极,漏电极和电容器电极。 然后形成钝化层并使用第三掩模形成图案以产生第一和第二接触孔。 第一接触孔露出漏电极,第二接触孔露出电容器电极。 然后通过使用第四掩模沉积和图案化透明导电层来形成多个像素电极。 像素电极通过第一接触孔接触漏电极,并通过第二接触孔与电容器电极接触。