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1. 发明申请

US20090066923A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20090066923A1
公开(公告)日：2009-03-12
申请号：US12289321
申请日：2008-10-24
申请人： Makoto Shibuta
发明人： Makoto Shibuta
IPC分类号： G03B27/52
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70525 , G03F7/70733 , G03F7/70991
摘要： An exposure apparatus which prevents damages due to leaked out liquid from expanding and can maintain exposure accuracy and measuring accuracy. The exposure apparatus includes a first stage which is movable relative to the projection optical system, a second stage which is movable relative to the projection optical system, and a liquid immersion system that is capable of forming a liquid immersion region of a liquid under the projection optical system. The first and second stages are moved in a state in which a first overhang portion provided at the first stage and a second overhang portion provided at the second stage are brought close to or in contact with each other, such that the liquid immersion region is moved from one of upper surfaces of the first and second overhang portions to the other of the upper surfaces of the first and second overhang portions.
摘要翻译：防止由于泄漏液体膨胀导致的损坏的曝光装置，并且可以保持曝光精度和测量精度。曝光装置包括可相对于投影光学系统移动的第一阶段，可相对于投影光学系统移动的第二阶段，以及能够在投影下形成液体的液浸区域的液浸系统光学系统。第一和第二阶段在设置在第一阶段的第一伸出部分和设置在第二阶段的第二突出部分彼此接近或接触的状态下移动，使得液浸区域移动从第一和第二突出部分的上表面之一到第一和第二伸出部分的上表面中的另一个。

2. 发明申请

US20080239275A1 Substrate holding apparatus, exposure apparatus, exposing method, and device fabricating method 有权
标题翻译：基板保持装置，曝光装置，曝光方法和装置制造方法
公开(公告)号：US20080239275A1
公开(公告)日：2008-10-02
申请号：US12155514
申请日：2008-06-05
申请人： Takeyuki MIZUTANI , Yuichi Shibazaki , Makoto Shibuta
发明人： Takeyuki MIZUTANI , Yuichi Shibazaki , Makoto Shibuta
IPC分类号： G03B27/60 , G03F7/20
CPC分类号： H01L21/6875 , G03F7/70341 , G03F7/707 , G03F7/70875 , H01L21/68714 , H01L21/68735 , Y10T279/11
摘要： The some aspects of the present invention provides a substrate holding apparatus that comprises: a base part; a support part that is formed on the base part and supports a rear surface of the substrate; a first circumferential wall that: is formed on the base part; has a first upper surface that opposes the rear surface of the substrate, which is supported by the support part; and surrounds a first space that is between the substrate, which is supported by the support part, and the base part; a second circumferential wall that: is formed on the base part; has a second upper surface that opposes the rear surface of the substrate, which is supported by the support part, with a gap interposed therebetween; and surrounds the first circumferential wall; a third circumferential wall that: is formed on the base part; has a third upper sure that opposes the rear surface of the substrate, which is supported by the support part; and surrounds the support part and the second circumferential wall; a fluid flow port that is capable of supplying gas to a second space that is between the first circumferential wall and the second circumferential wall; and a first suction port that suctions fluid from a third space that is between the second circumferential wall and the third circumferential wall.
摘要翻译：本发明的一些方面提供了一种基板保持装置，其包括：基部; 支撑部，其形成在所述基部上并支撑所述基板的后表面; 第一圆周壁，其形成在所述基部上; 具有与由所述支撑部支撑的所述基板的背面相对的第一上表面; 并且包围由所述支撑部支承的所述基板与所述基部之间的第一空间; 第二圆周壁，其形成在所述基部上; 具有与由所述支撑部支撑的所述基板的背面相对的第二上表面，其间夹有间隙; 并围绕第一圆周壁; 第三圆周壁，其形成在所述基部上; 具有与由支撑部支撑的基板的后表面相反的第三上限; 并围绕支撑部和第二周壁; 能够向第一周壁和第二周壁之间的第二空间供给气体的流体流通口; 以及从第二圆周壁和第三圆周壁之间的第三空间吸入流体的第一吸入口。

3. 发明授权

US09224632B2 Substrate holding apparatus, exposure apparatus, and device fabricating method 有权
标题翻译：基板保持装置，曝光装置和装置制造方法
公开(公告)号：US09224632B2
公开(公告)日：2015-12-29
申请号：US11792924
申请日：2005-12-14
申请人： Makoto Shibuta
发明人： Makoto Shibuta
IPC分类号： G03F7/00 , H01L21/683 , H01L21/687 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/707 , G03F7/70716 , G03F7/70875 , H01L21/6838 , H01L21/68735 , H01L21/6875
摘要： To provide a substrate holding apparatus that can rapidly recover liquid that has infiltrated the rear surface side of a substrate. A substrate holding apparatus comprises: a base; a first support part, which is formed on the base and supports a rear surface of a substrate to be processed; a first circumferential wall part, which is formed on the base and is provided so that it opposes the rear surface of the substrate to be processed and surrounds the first support part; and a first recovery port, which is provided on the outer side of the first circumferential wall part; wherein, the flow of a gas along the first circumferential wall part moves the liquid on the outer side of the first circumferential wall part to the first recovery port, where the liquid is recovered.
摘要翻译：提供一种能够快速地回收渗透到基板的背面侧的液体的基板保持装置。一种基板保持装置，包括：基座; 第一支撑部，其形成在基部上并支撑待处理基板的后表面; 第一圆周壁部，其形成在基部上并且设置成使得其与要处理的基板的后表面相对并且包围第一支撑部; 以及设置在所述第一周壁部的外侧的第一回收口，其特征在于，沿着所述第一周壁部的气体的流动将所述第一周壁部的外侧的液体移动到所述液体被回收的所述第一回收口。

4. 发明申请

US20090109413A1 Maintenance method, exposure method and apparatus, and device manufacturing method 审中-公开
标题翻译：维护方法，曝光方法和装置以及装置制造方法
公开(公告)号：US20090109413A1
公开(公告)日：2009-04-30
申请号：US12292621
申请日：2008-11-21
申请人： Yuichi Shibazaki , Takeyuki Mizutani , Go Ichinose , Makoto Shibuta
发明人： Yuichi Shibazaki , Takeyuki Mizutani , Go Ichinose , Makoto Shibuta
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03F7/70341
摘要： A maintenance method for performing maintenance of an exposure apparatus including a liquid immersion space-forming member which forms a liquid-immersion area by supplying liquid in a space between an optical member and a substrate; a liquid supply mechanism which supplies the liquid to the liquid-immersion space; a substrate stage which moves the substrate; and a measuring stage on which a reference mark is formed. To clean the liquid-immersion space-forming member, a cleaning liquid is supplied to a space between the measuring stage and the liquid-immersion space-forming member. The exposure apparatus is provided with various types of cleaning mechanisms for cleaning the liquid-immersion space-forming member. The liquid-immersion exposure can be performed while efficiently performing maintenance of the exposure apparatus.
摘要翻译：一种维护方法，用于通过在光学构件和基板之间的空间中供应液体来进行包括形成液浸区域的液浸空间形成构件的曝光装置的维护; 液体供给机构，其将液体供给到液浸空间; 移动基板的基板台; 以及其上形成有参考标记的测量台。为了清洗液浸空间形成部件，向测量台和液浸空间形成部件之间的空间供给清洗液。曝光装置设置有用于清洗液浸空间形成构件的各种类型的清洁机构。可以在有效地进行曝光装置的维护的同时进行浸液曝光。

5. 发明申请

US20080111984A1 Substrate Holding Apparatus, Exposure Apparatus, and Device Fabrication Method 有权
标题翻译：基板保持装置，曝光装置和装置制造方法
公开(公告)号：US20080111984A1
公开(公告)日：2008-05-15
申请号：US11792924
申请日：2005-12-14
申请人： Makoto Shibuta
发明人： Makoto Shibuta
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/707 , G03F7/70716 , G03F7/70875 , H01L21/6838 , H01L21/68735 , H01L21/6875
摘要： To provide a substrate holding apparatus that can rapidly recover liquid that has infiltrated the rear surface side of a substrate. A substrate holding apparatus comprises: a base; a first support part, which is formed on the base and supports a rear surface of a substrate to be processed; a first circumferential wall part, which is formed on the base and is provided so that it opposes the rear surface of the substrate to be processed and surrounds the first support part; and a first recovery port, which is provided on the outer side of the first circumferential wall part; wherein, the flow of a gas along the first circumferential wall part moves the liquid on the outer side of the first circumferential wall part to the first recovery port, where the liquid is recovered.
摘要翻译：提供一种能够快速地回收渗透到基板的背面侧的液体的基板保持装置。一种基板保持装置，包括：基座; 第一支撑部，其形成在基部上并支撑待处理基板的后表面; 第一圆周壁部，其形成在基部上并且设置成使得其与要处理的基板的后表面相对并且包围第一支撑部; 以及设置在所述第一周壁部的外侧的第一回收口，其特征在于，沿着所述第一周壁部的气体的流动将所述第一周壁部的外侧的液体移动到所述液体被回收的所述第一回收口。

6. 发明申请

US20080111978A1 Exposure Apparatus and Device Manufacturing Method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20080111978A1
公开(公告)日：2008-05-15
申请号：US11665273
申请日：2005-10-12
申请人： Makoto Shibuta
发明人： Makoto Shibuta
IPC分类号： G03B27/52
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70525 , G03F7/70733 , G03F7/70991
摘要： An exposure apparatus which prevents damages due to leaked out liquid from expanding and can maintain exposure accuracy and measuring accuracy. The exposure apparatus includes first and second stages (ST1, ST2) which can independently move within an XY-plane on an image plane side of a projection optical system (PL); a drive mechanism (SD) which moves the first stage and the second stage together with the stage being close to or in contact with each other; a liquid immersion mechanism (1) which forms a liquid immersion area on an upper plane of at least one of the stages of the first stage and the second stage; and a detecting device (60) which detects liquid leaked out from between the first stage and the second stage.
摘要翻译：防止由于泄漏液体膨胀导致的损坏的曝光装置，并且可以保持曝光精度和测量精度。曝光装置包括能够独立地在投影光学系统（PL）的像面侧的XY平面内移动的第一和第二平台（ST1，ST2）。驱动机构（SD），其使所述第一阶段和所述第二阶段与所述阶段彼此靠近或接触地移动; 液浸机构（1），其在所述第一阶段和所述第二阶段的至少一个阶段的上平面上形成液浸区域; 以及检测从第一阶段和第二阶段之间泄漏的液体的检测装置（60）。

7. 发明申请

US20120094238A1 SUBSTRATE HOLDING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：基板保持装置，曝光装置和装置制造方法
公开(公告)号：US20120094238A1
公开(公告)日：2012-04-19
申请号：US13334773
申请日：2011-12-22
申请人： Hiroyuki NAGASAKA , Makoto Shibuta , Katsushi Nakano , Yuichi Yoshida , Hiroaki Takaiwa
发明人： Hiroyuki NAGASAKA , Makoto Shibuta , Katsushi Nakano , Yuichi Yoshida , Hiroaki Takaiwa
IPC分类号： G03F7/20 , G03B27/58 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/707 , H01L21/6715 , H01L21/6838 , H01L21/68735 , H01L21/6875 , Y10T29/49002
摘要： To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus is provided with a base material, a first holding portion formed on the base material for holding the substrate, and a second holding portion formed on the base material for holding a plate member by surrounding the circumference of a processing substrate held by the first holding portion. The second holding portion holds the plate member so as to form a second space on the side of the rear surface of the plate member. On the rear surface of the plate member, an absorbing member is arranged for absorbing the liquid entered from a gap between the substrate held by the first holding portion and the plate member held by the second holding portion.
摘要翻译：提供一种能够防止液体进入基板的背面侧的基板保持装置。基板保持装置设置有基材，形成在用于保持基板的基材上的第一保持部和形成在基材上的第二保持部，用于通过围绕由第一保持部。第二保持部保持板构件，以在板构件的后表面侧形成第二空间。在板构件的后表面上设置吸收构件，用于吸收从由第一保持部保持的基板与由第二保持部保持的板构件之间的间隙进入的液体。

8. 发明申请

US20080043210A1 Exposure Apparatus and Device Manufacturing Method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20080043210A1
公开(公告)日：2008-02-21
申请号：US11629987
申请日：2005-06-21
申请人： Makoto Shibuta
发明人： Makoto Shibuta
IPC分类号： G03B27/42
CPC分类号： G03F7/70716 , G03F7/2041 , G03F7/70341 , G03F7/707 , G03F7/70866
摘要： An exposure apparatus that can prevent disadvantages due to a leaked liquid is provided. The exposure apparatus includes: a substrate holder (PH) that includes a peripheral wall portion (33) and supporting portions (34) located on an inside of the peripheral wall portion (33) and that supports a substrate (P) with the supporting portions (34) by negatively pressurizing a space (31) surrounded by the peripheral wall portion (33); and a recovery mechanism that includes a collection inlets (61) provided on the inside of the peripheral wall portion (33) and a vacuum system (63) connected to the collection inlets (61), in which a liquid penetrated from an outer periphery of the substrate (P) is sucked and recovered, in the state with an upper surface (33A) of the peripheral wall portion (33) and a back surface (Pb) of the substrate (P) being spaced at a first distance.
摘要翻译：提供了可以防止由于泄漏的液体引起的缺点的曝光装置。曝光装置包括：衬底保持器（PH），其包括周壁部分（33）和位于周壁部分（33）内侧的支撑部分（34），并且支撑部分（34）通过对由所述周壁部（33）包围的空间（31）进行负压; 以及回收机构，其包括设置在所述周壁部33的内部的收集入口61和与所述收集入口61连接的真空系统63，在周壁部33的上表面33A和基板P的背面Pb以第一距离隔开的状态下，将基板P吸引回收。

9. 发明授权

US09341959B2 Substrate holding device, exposure apparatus, and device manufacturing method 有权
标题翻译：基板保持装置，曝光装置和装置制造方法
公开(公告)号：US09341959B2
公开(公告)日：2016-05-17
申请号：US13334773
申请日：2011-12-22
申请人： Makoto Shibuta , Yuichi Yoshida , Hiroaki Takaiwa
发明人： Makoto Shibuta , Yuichi Yoshida , Hiroaki Takaiwa
IPC分类号： G03B27/52 , G03B27/58 , G03B27/60 , G03F7/20 , H01L21/67 , H01L21/683 , H01L21/687
CPC分类号： G03F7/70341 , G03F7/707 , H01L21/6715 , H01L21/6838 , H01L21/68735 , H01L21/6875 , Y10T29/49002
摘要： To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus is provided with a base material, a first holding portion formed on the base material for holding the substrate, and a second holding portion formed on the base material for holding a plate member by surrounding the circumference of a processing substrate held by the first holding portion. The second holding portion holds the plate member so as to form a second space on the side of the rear surface of the plate member. On the rear surface of the plate member, an absorbing member is arranged for absorbing the liquid entered from a gap between the substrate held by the first holding portion and the plate member held by the second holding portion.
摘要翻译：提供一种能够防止液体进入基板的背面侧的基板保持装置。基板保持装置设置有基材，形成在用于保持基板的基材上的第一保持部和形成在基材上的第二保持部，用于通过围绕由第一保持部。第二保持部保持板构件，以在板构件的后表面侧形成第二空间。在板构件的后表面上设置吸收构件，用于吸收从由第一保持部保持的基板与由第二保持部保持的板构件之间的间隙进入的液体。

10. 发明授权

US08384874B2 Immersion exposure apparatus and device manufacturing method to detect if liquid on base member 有权
标题翻译：浸没式曝光装置和装置制造方法，用于检测底座上的液体
公开(公告)号：US08384874B2
公开(公告)日：2013-02-26
申请号：US11632070
申请日：2005-07-11
申请人： Makoto Shibuta
发明人： Makoto Shibuta
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70691 , G03F7/70916
摘要： An exposure apparatus which prevents the damage due to the liquid having flowed out from spreading and enables satisfactory performances of the exposure processes and the measurement processes is provided. An exposure apparatus (EX) includes a movable table (PT), a base member (41) having an upper surface (41A) that guides the movement of the table (PT), and a detecting device (60) that detects whether there is a liquid on the upper surface (41A) of the base member (41).
摘要翻译：提供了一种防止由于液体流出而引起的损坏的曝光装置，并且能够实现令人满意的曝光处理和测量处理的性能。曝光装置（EX）包括可动台（PT），具有引导台（PT）的移动的上表面（41A）的基座构件（41），以及检测装置在所述基底构件（41）的上表面（41A）上的液体。

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