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    • 2. 发明申请
    • Semiconductor laser device
    • 半导体激光器件
    • US20030052315A1
    • 2003-03-20
    • US10230988
    • 2002-08-30
    • Mitsui Chemicals, Inc.
    • Tsuyoshi FujimotoKiyofumi MuroTakeshi Koiso
    • H01L029/06
    • H01S5/2231H01S5/2077H01S5/222
    • A real index guided semiconductor laser device includes an optical waveguide layer at least on one side of an active layer that has a band gap energy not less than that of the active layer; a cladding layer on an outer side of the optical waveguide layer that has a band gap energy not less than that of the optical waveguide layer; a refractive index control layer having a striped window, buried in the optical waveguide layer by selective growth; and a semiconductor layer formed in the optical waveguide layer by selective growth prior to the selective growth of the refractive index control layer. In a laminated portion including the semiconductor layer and the refractive index control layer, a change in effective refractive index due to a change in thickness of the semiconductor layer is smaller than that of the refractive index control layer.
    • 实际的折射率引导半导体激光器件包括:有源层的至少一侧的光波导层,其具有不小于有源层的带隙能量; 在光波导层的外侧具有不小于光波导层的带隙能量的包层; 折射率控制层,其具有通过选择性生长掩埋在所述光波导层中的条纹窗口; 以及通过在折射率控制层的选择性生长之前的选择性生长而形成在光波导层中的半导体层。 在包括半导体层和折射率控制层的层叠部分中,由于半导体层的厚度变化引起的有效折射率的变化小于折射率控制层的变化。