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1. 发明授权

US09416014B2 Method for producing trichlorosilane 有权
标题翻译：制备三氯硅烷的方法
公开(公告)号：US09416014B2
公开(公告)日：2016-08-16
申请号：US14929873
申请日：2015-11-02
申请人： MITSUBISHI MATERIALS CORPORATION
发明人： Toshiyuki Ishii , Hideo Ito , Yuji Shimizu
IPC分类号： C01B33/107 , B01J12/00 , B01J19/02 , B01J19/24
CPC分类号： C01B33/1071 , B01J12/007 , B01J19/02 , B01J19/243 , B01J2219/00135 , B01J2219/00155 , B01J2219/0272
摘要： An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism that heats the interior of the reaction vessel; a gas supply section that supplies the supply gas in the reaction vessel; and a gas discharge section that discharges the reaction product gas from the reaction vessel to the outside, wherein a reaction passageway is formed in the interior of the reaction vessel, in which a plurality of small spaces partitioned by a plurality of reaction tubular walls that have different inner diameters and are substantially concentrically disposed communicate by flow penetration sections formed alternately in lower portions and upper portions of the reaction tubular walls in order from the inside, and the gas supply section and the gas discharge section are connected to the reaction passageway.
摘要翻译：一种三氯硅烷的制造装置，包括：供给含有四氯化硅和氢气的供给气体的反应容器，生成含有三氯硅烷和氯化氢的反应生成气体; 加热反应容器内部的加热机构; 气体供给部，其供给反应容器内的供给气体; 以及气体排出部，其将反应产物气体从反应容器排出到外部，其中反应通道形成在反应容器的内部，其中多个由多个反应管壁分隔的小空间，其具有不同的内径并且基本上同心设置，由内部依次形成在反应管壁的下部和上部交替形成的流动穿透部分，气体供应部分和气体排出部分连接到反应通道。

2. 发明申请

US20160052791A1 Method for Producing Trichlorosilane 审中-公开
标题翻译：生产三氯硅烷的方法
公开(公告)号：US20160052791A1
公开(公告)日：2016-02-25
申请号：US14929873
申请日：2015-11-02
申请人： MITSUBISHI MATERIALS CORPORATION
发明人： Toshiyuki Ishii , Hideo Ito , Yuji Shimizu
IPC分类号： C01B33/107
CPC分类号： C01B33/1071 , B01J12/007 , B01J19/02 , B01J19/243 , B01J2219/00135 , B01J2219/00155 , B01J2219/0272
摘要： An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism that heats the interior of the reaction vessel; a gas supply section that supplies the supply gas in the reaction vessel; and a gas discharge section that discharges the reaction product gas from the reaction vessel to the outside, wherein a reaction passageway is formed in the interior of the reaction vessel, in which a plurality of small spaces partitioned by a plurality of reaction tubular walls that have different inner diameters and are substantially concentrically disposed communicate by flow penetration sections formed alternately in lower portions and upper portions of the reaction tubular walls in order from the inside, and the gas supply section and the gas discharge section are connected to the reaction passageway.
摘要翻译：一种三氯硅烷的制造装置，包括：供给含有四氯化硅和氢气的供给气体的反应容器，生成含有三氯硅烷和氯化氢的反应生成气体; 加热反应容器内部的加热机构; 气体供给部，其供给反应容器内的供给气体; 以及气体排出部，其将反应产物气体从反应容器排出到外部，其中反应通道形成在反应容器的内部，其中多个由多个反应管壁分隔的小空间，其具有不同的内径并且基本上同心设置，由内部依次形成在反应管壁的下部和上部交替形成的流动穿透部分，气体供应部分和气体排出部分连接到反应通道。

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