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1. 发明授权

US09625557B2 Work function calibration of a non-contact voltage sensor 有权
公开(公告)号：US09625557B2
公开(公告)日：2017-04-18
申请号：US14285059
申请日：2014-05-22
申请人： M. Brandon Steele , Steven R. Soss
发明人： M. Brandon Steele , Steven R. Soss
IPC分类号： G01R35/00 , G01R31/265
CPC分类号： G01R35/005 , G01R31/265
摘要： A method and a system for calibrating the work function or surface potential of a non-contact voltage sensor probe tip. The method includes preparing one or more reference sample surfaces and a reference non-contact voltage sensor probe tip to have stable surface potentials, measuring the voltage between the reference samples and the reference sensor probe tip, measuring the voltage between a point on a non-reference sample surface and the reference sensor probe tip, measuring the voltage between the same point on the non-reference sample surface and a non-reference non-contact voltage sensor probe tip, and determining a surface potential correction factor for the non-reference, non-contact voltage sensor.

2. 发明申请

US20150338494A1 WORK FUNCTION CALIBRATION OF A NON-CONTACT VOLTAGE SENSOR 有权
标题翻译：非接触式电压传感器的工作功能校准
公开(公告)号：US20150338494A1
公开(公告)日：2015-11-26
申请号：US14285059
申请日：2014-05-22
申请人： M. Brandon Steele , Steven R. Soss
发明人： M. Brandon Steele , Steven R. Soss
IPC分类号： G01R35/00 , G01R31/265
CPC分类号： G01R35/005 , G01R31/265
摘要： A method and a system for calibrating the work function or surface potential of a non-contact voltage sensor probe tip are provided. The method includes preparing one or more reference sample surfaces and a reference non-contact voltage sensor probe tip to have stable surface potentials, measuring the voltage between the reference samples and the reference sensor probe tip, measuring the voltage between a point on a non-reference sample surface and the reference sensor probe tip, measuring the voltage between the same point on the non-reference sample surface and a non-reference non-contact voltage sensor probe tip, and determining a surface potential correction factor for the non-reference, non-contact voltage sensor.
摘要翻译：提供了用于校准非接触式电压传感器探针尖端的功函数或表面电位的方法和系统。该方法包括制备一个或多个参考样品表面和参考非接触电压传感器探针尖端以具有稳定的表面电位，测量参考样品和参考传感器探针尖端之间的电压，测量非极性点之间的电压，参考样品表面和参考传感器探针尖端，测量非参考样品表面上的相同点和非参考非接触电压传感器探针尖端之间的电压，以及确定非参考的表面电位校正因子，非接触式电压传感器。

3. 发明申请

US20080217530A1 Semiconductor inspection system and apparatus utilizing a non-vibrating contact potential difference sensor and controlled illumination 失效
标题翻译：采用非振动接触电位差传感器和受控照明的半导体检查系统和装置
公开(公告)号：US20080217530A1
公开(公告)日：2008-09-11
申请号：US11715149
申请日：2007-03-07
申请人： Jeffrey Alan Hawthorne , M. Brandon Steele , Yeyuan Yang , Mark Schulze
发明人： Jeffrey Alan Hawthorne , M. Brandon Steele , Yeyuan Yang , Mark Schulze
IPC分类号： G01N23/00
CPC分类号： G01N27/002 , G01R31/2648 , G01R31/2656
摘要： A method and system for identifying a defect or contamination on the surface of a semiconductor or in a semiconductor. The method and system involves providing a semiconductor with a surface, such as a semiconductor wafer, providing a non-vibrating contact potential difference sensor, providing a source of illumination with controllable intensity or distribution of wavelengths, using the illumination source to provide controlled illumination of the surface of the wafer under or near the non-vibrating contact potential sensor probe tip, using the non-vibrating contact potential difference sensor to scan the wafer surface during controlled illumination, generating data representative of changes in contact potential difference across the wafer surface, and processing that data to identify a pattern characteristic of a defect or contamination.
摘要翻译：一种用于识别半导体或半导体表面上的缺陷或污染的方法和系统。该方法和系统包括提供具有诸如半导体晶片的表面的半导体，提供非振动接触电位差传感器，使用照明源提供具有可控的强度或波长分布的照明源，以提供受控照明在非振动接触电位传感器探针尖端下或附近的晶片表面，使用非振动接触电位差传感器在受控照明期间扫描晶片表面，产生代表晶片表面的接触电位差的变化的数据，并处理该数据以识别缺陷或污染的图案特征。

4. 发明授权

US07103482B2 Inspection system and apparatus 有权
标题翻译：检验系统和仪器
公开(公告)号：US07103482B2
公开(公告)日：2006-09-05
申请号：US10710836
申请日：2004-08-05
申请人： M. Brandon Steele , Jeffrey Alan Hawthorne , Chunho Kim , David C. Sowell
发明人： M. Brandon Steele , Jeffrey Alan Hawthorne , Chunho Kim , David C. Sowell
IPC分类号： G01B5/28 , H01L21/00 , B08B6/00
CPC分类号： G01N27/002 , G01N2033/0095
摘要： A method and system for identifying a defect or contamination on a surface of a material. The method and system involves providing a material, such as a semiconductor wafer, using a non-vibrating contact potential difference sensor to scan the wafer, generate contact potential difference data and processing that data to identify a pattern characteristic of the defect or contamination.
摘要翻译：用于识别材料表面上的缺陷或污染的方法和系统。该方法和系统包括使用非振动接触电位差传感器来提供诸如半导体晶片的材料来扫描晶片，产生接触电位差数据并处理该数据以识别缺陷或污染的图案特征。

5. 发明授权

US07379826B2 Semiconductor wafer inspection system 有权
标题翻译：半导体晶圆检测系统
公开(公告)号：US07379826B2
公开(公告)日：2008-05-27
申请号：US11504486
申请日：2006-08-15
申请人： M. Brandon Steele , Jeffrey Alan Hawthorne
发明人： M. Brandon Steele , Jeffrey Alan Hawthorne
IPC分类号： G01B5/28
CPC分类号： G01N27/002 , G01N2033/0095
摘要： A method and system for identifying a defect or contamination on a surface of a material. The method and system involves providing a material, such as a semiconductor wafer, using a non-vibrating contact potential difference sensor to scan the wafer, generate contact potential difference data and processing that data to identify a pattern characteristic of the defect or contamination.
摘要翻译：用于识别材料表面上的缺陷或污染的方法和系统。该方法和系统包括使用非振动接触电位差传感器来提供诸如半导体晶片的材料来扫描晶片，产生接触电位差数据并处理该数据以识别缺陷或污染的图案特征。

6. 发明授权

US06957154B2 Semiconductor wafer inspection system 失效
标题翻译：半导体晶圆检测系统
公开(公告)号：US06957154B2
公开(公告)日：2005-10-18
申请号：US10631469
申请日：2003-07-29
申请人： M. Brandon Steele , Jeffrey Alan Hawthorne
发明人： M. Brandon Steele , Jeffrey Alan Hawthorne
IPC分类号： G01N27/00 , G01N33/00 , G01B5/28 , B08B6/00 , H01L21/00
CPC分类号： G01N27/002 , G01N2033/0095
摘要： A method and system for identifying a defect or contamination on a surface of a material. The method and system involves providing a material, such as a semiconductor wafer, using a non-vibrating contact potential difference sensor to scan the wafer, generate contact potential difference data and processing that data to identify a pattern characteristic of the defect or contamination.
摘要翻译：用于识别材料表面上的缺陷或污染的方法和系统。该方法和系统包括使用非振动接触电位差传感器来提供诸如半导体晶片的材料来扫描晶片，产生接触电位差数据并处理该数据以识别缺陷或污染的图案特征。

7. 发明授权

US07308367B2 Wafer inspection system 有权
标题翻译：晶圆检查系统
公开(公告)号：US07308367B2
公开(公告)日：2007-12-11
申请号：US10771628
申请日：2004-02-03
申请人： M. Brandon Steele , Jeffrey Alan Hawthorne , Chunho Kim , David C. Sowell
发明人： M. Brandon Steele , Jeffrey Alan Hawthorne , Chunho Kim , David C. Sowell
IPC分类号： G01B5/28
CPC分类号： G01N27/002 , G01N2033/0095
摘要： A method and system for identifying a defect or contamination on a surface of a material. The method and system involves providing a material, such as a semiconductor wafer, using a non-vibrating contact potential difference sensor to scan the wafer, generate contact potential difference data and processing that data to identify a pattern characteristic of the defect or contamination.
摘要翻译：用于识别材料表面上的缺陷或污染的方法和系统。该方法和系统包括使用非振动接触电位差传感器来提供诸如半导体晶片的材料来扫描晶片，产生接触电位差数据并处理该数据以识别缺陷或污染的图案特征。

8. 发明授权

US07107158B2 Inspection system and apparatus 有权
公开(公告)号：US07107158B2
公开(公告)日：2006-09-12
申请号：US11078255
申请日：2005-03-11
申请人： M. Brandon Steele , Jeffrey Alan Hawthorne
发明人： M. Brandon Steele , Jeffrey Alan Hawthorne
IPC分类号： G01B5/28 , H01L21/00 , B08B6/00
CPC分类号： G01R31/312 , G01N27/002 , G01N2033/0095
摘要： A method and system for identifying a defect or contamination on a surface of a sample. The system operates by detecting changes in work function across a surface via both vCPD and nvCPD. It utilizes a non-vibrating contact potential difference (nvCPD) sensor for imaging work function variations over an entire sample. The data is differential in that it represents changes in the work function (or geometry or surface voltage) across the surface of a sample. A vCPD probe is used to determine absolute CPD data for specific points on the surface of the sample. The combination of vibrating and non-vibrating CPD measurement modes allows the rapid imaging of whole-sample uniformity, and the ability to detect the absolute work function at one or more points.

9. 发明授权

US07092826B2 Semiconductor wafer inspection system 有权
标题翻译：半导体晶圆检测系统
公开(公告)号：US07092826B2
公开(公告)日：2006-08-15
申请号：US11156088
申请日：2005-06-17
申请人： M. Brandon Steele , Jeffrey Alan Hawthorne
发明人： M. Brandon Steele , Jeffrey Alan Hawthorne
IPC分类号： G01B5/28 , H01L21/00 , B08B6/00
CPC分类号： G01N27/002 , G01N2033/0095
摘要： A method and system for identifying a defect or contamination on a surface of a material. The method and system involves providing a material, such as a semiconductor wafer, using a non-vibrating contact potential difference sensor to scan the wafer, generate contact potential difference data and processing that data to identify a pattern characteristic of the defect or contamination.
摘要翻译：用于识别材料表面上的缺陷或污染的方法和系统。该方法和系统包括使用非振动接触电位差传感器来提供诸如半导体晶片的材料来扫描晶片，产生接触电位差数据并处理该数据以识别缺陷或污染的图案特征。

10. 发明授权

US07659734B2 Semiconductor inspection system and apparatus utilizing a non-vibrating contact potential difference sensor and controlled illumination 失效
标题翻译：采用非振动接触电位差传感器和受控照明的半导体检查系统和装置
公开(公告)号：US07659734B2
公开(公告)日：2010-02-09
申请号：US11715149
申请日：2007-03-07
申请人： Jeffrey Alan Hawthorne , M. Brandon Steele , Yeyuan Yang , Mark Schulze
发明人： Jeffrey Alan Hawthorne , M. Brandon Steele , Yeyuan Yang , Mark Schulze
IPC分类号： G01R31/26
CPC分类号： G01N27/002 , G01R31/2648 , G01R31/2656
摘要： A method and system for identifying a defect or contamination on the surface of a semiconductor or in a semiconductor. The method and system involves providing a semiconductor with a surface, such as a semiconductor wafer, providing a non-vibrating contact potential difference sensor, providing a source of illumination with controllable intensity or distribution of wavelengths, using the illumination source to provide controlled illumination of the surface of the wafer under or near the non-vibrating contact potential sensor probe tip, using the non-vibrating contact potential difference sensor to scan the wafer surface during controlled illumination, generating data representative of changes in contact potential difference across the wafer surface, and processing that data to identify a pattern characteristic of a defect or contamination.
摘要翻译：一种用于识别半导体或半导体表面上的缺陷或污染的方法和系统。该方法和系统包括提供具有诸如半导体晶片的表面的半导体，提供非振动接触电位差传感器，使用照明源提供具有可控的强度或波长分布的照明源，以提供受控照明在非振动接触电位传感器探针尖端下或附近的晶片表面，使用非振动接触电位差传感器在受控照明期间扫描晶片表面，产生代表晶片表面的接触电位差的变化的数据，并处理该数据以识别缺陷或污染的图案特征。

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