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    • 4. 发明授权
    • Segmented MRAM memory array
    • 分段MRAM存储器阵列
    • US07203129B2
    • 2007-04-10
    • US10780171
    • 2004-02-16
    • Wen-Chin LinDanny D. TangLi-Shyue Lai
    • Wen-Chin LinDanny D. TangLi-Shyue Lai
    • G11C8/00
    • G11C11/16G11C2213/72G11C2213/74
    • In one example, an MRAM memory array includes a plurality of word lines, a plurality of bit lines crossing the word lines, and a plurality of first and second diodes, and magnetic tunnel junction memories. Each first diode includes a cathode, and an anode coupled to each bit line. Each second diode includes an anode, and a cathode coupled to each word line. The magnetic tunnel junction memories include a pinned layer, a free layer, and a non-magnetic layer. The non-magnetic layer is located between the pinned layer and the free layer. Each diode is positioned at crossing points of the bit lines and the word lines and connected between the first diode at the corresponding crossing bit line and the second diode at the corresponding crossing word line.
    • 在一个示例中,MRAM存储器阵列包括多个字线,与字线交叉的多个位线,以及多个第一和第二二极管以及磁性隧道结存储器。 每个第一二极管包括阴极和耦合到每个位线的阳极。 每个第二二极管包括阳极和耦合到每个字线的阴极。 磁性隧道结存储器包括钉扎层,自由层和非磁性层。 非磁性层位于被钉扎层和自由层之间。 每个二极管位于位线和字线的交叉点处,并连接在相应交叉位线处的第一二极管和相应交叉字线处的第二二极管之间。
    • 6. 发明授权
    • System and method for passing high energy particles through a mask
    • 将高能粒子通过掩模的系统和方法
    • US07151271B2
    • 2006-12-19
    • US10681541
    • 2003-10-08
    • Chao-Hsiung WangDenny TangWen-Chin LinLi-Shyue Lai
    • Chao-Hsiung WangDenny TangWen-Chin LinLi-Shyue Lai
    • A61N5/00G21G5/00
    • H01J37/3174B82Y10/00B82Y40/00
    • A method and system is disclosed for concentrating high energy particles on a predetermined area on a target semiconductor substrate. A high energy source for generating a predetermined amount of high energy particles, and an electro-magnetic radiation source for generating low energy beams are used together. The system also uses a mask set having at least one mask with at least one alignment area and at least one mask target area thereon, the mask target area passing more high energy particles then any other area of the mask. At least one protection shield is incorporated in the system for protecting the alignment area from being exposed to the high energy particles, wherein the mask is aligned with the predetermined target semiconductor substrate by passing the low energy beams through the alignment area, wherein the high energy particles generated by the high energy source pass through the mask target area to land on the predetermined area on the target semiconductor substrate.
    • 公开了一种用于将高能粒子集中在目标半导体衬底上的预定区域上的方法和系统。 用于产生预定量的高能粒子的高能量源和用于产生低能量束的电磁辐射源一起使用。 该系统还使用具有至少一个具有至少一个对准区域和至少一个掩模目标区域的掩模的掩模组,掩模目标区域通过更多的高能粒子,然后通过掩模的任何其它区域。 至少一个保护屏蔽被并入系统中,用于保护对准区域不暴露于高能粒子,其中通过使低能量束通过对准区域,掩模与预定目标半导体衬底对齐,其中高能量 由高能量源产生的粒子通过掩模对象区域落在目标半导体衬底上的预定区域上。
    • 10. 发明申请
    • Segmented MRAM memory array
    • 分段MRAM存储器阵列
    • US20050180203A1
    • 2005-08-18
    • US10780171
    • 2004-02-16
    • Wen-Chin LinDenny TangLi-Shyue Lai
    • Wen-Chin LinDenny TangLi-Shyue Lai
    • G11C11/14G11C11/16
    • G11C11/16G11C2213/72G11C2213/74
    • In one example, an MRAM memory array includes a plurality of word lines, a plurality of bit lines crossing the word lines, and a plurality of first and second diodes, and magnetic tunnel junction memories. Each first diode includes a cathode, and an anode coupled to each bit line. Each second diode includes an anode, and a cathode coupled to each word line. The magnetic tunnel junction memories include a pinned layer, a free layer, and a non-magnetic layer. The non-magnetic layer is located between the pinned layer and the free layer. Each diode is positioned at crossing points of the bit lines and the word lines and connected between the first diode at the corresponding crossing bit line and the second diode at the corresponding crossing word line.
    • 在一个示例中,MRAM存储器阵列包括多个字线,与字线交叉的多个位线,以及多个第一和第二二极管以及磁性隧道结存储器。 每个第一二极管包括阴极和耦合到每个位线的阳极。 每个第二二极管包括阳极和耦合到每个字线的阴极。 磁性隧道结存储器包括钉扎层,自由层和非磁性层。 非磁性层位于被钉扎层和自由层之间。 每个二极管位于位线和字线的交叉点处,并连接在相应交叉位线处的第一二极管和相应交叉字线处的第二二极管之间。