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    • 6. 发明授权
    • Structure and method for an electronic assembly
    • 电子组件的结构和方法
    • US06496370B2
    • 2002-12-17
    • US09836564
    • 2001-04-17
    • Joseph E. GeusicLeonard ForbesKie Y. Ahn
    • Joseph E. GeusicLeonard ForbesKie Y. Ahn
    • H05K720
    • H01L23/473H01L2924/0002H05K1/0272H01L2924/00
    • An electronic assembly is provided. The electronic assembly includes a semiconductor interposer having first and second surfaces. The semiconductor interposer also has cooling channels passing through the interposer between the first and second surfaces. The electronic assembly has at least one semiconductor chip disposed outwardly from the first surface of the semiconductor interposer and at least one semiconductor chip disposed outwardly from the second surface of the semiconductor interposer. The electronic assembly also has a number of electrical connections through the semiconductor interposer wherein the number of electrical connections couple the semiconductor chips disposed outwardly from the first and second surfaces of the semiconductor interposer.
    • 提供电子组件。 电子组件包括具有第一和第二表面的半导体插入器。 半导体插入器还具有通过第一和第二表面之间的插入件的冷却通道。 电子组件具有从半导体插入件的第一表面向外设置的至少一个半导体芯片和从半导体插入器的第二表面向外设置的至少一个半导体芯片。 电子组件还具有通过半导体插入器的多个电连接,其中电连接的数量耦合从半导体插入器的第一和第二表面向外设置的半导体芯片。
    • 10. 发明授权
    • Method of fabricating transistor with silicon oxycarbide gate
    • 用硅碳化硅栅制造晶体管的方法
    • US06309907B1
    • 2001-10-30
    • US09138294
    • 1998-08-21
    • Leonard ForbesJoseph E. GeusicKie Y. Ahn
    • Leonard ForbesJoseph E. GeusicKie Y. Ahn
    • H01L2100
    • H01L29/66825H01L21/28088H01L21/28273H01L29/42324H01L29/4966H01L31/113
    • A CMOS-compatible FET has a reduced electron affinity polycrystalline or microcrystalline silicon oxycarbide (SiOC) gate that is electrically isolated (floating) or interconnected. The SiOC material composition is selected to establish a desired barrier energy between the SiOC gate and a gate insulator. In a memory application, such as a flash EEPROM, the SiOC composition is selected to establish a lower barrier energy to reduce write and erase voltages and times or accommodate the particular data charge retention time needed for the particular application. In a light detector or imaging application, the SiOC composition is selected to provide sensitivity to the desired wavelength of light. Unlike conventional photodetectors, light is absorbed in the floating gate, thereby ejecting previously stored electrons therefrom. Also unlike conventional photodetectors, the light detector according to the present invention is actually more sensitive to lower energy photons as the semiconductor bandgap is increased.
    • CMOS兼容的FET具有电隔离(浮置)或互连的减少的电子亲和性多晶或微晶硅氧化碳(SiOC)栅极。 选择SiOC材料组成以在SiOC栅极和栅极绝缘体之间建立期望的势垒能。 在诸如闪存EEPROM的存储器应用中,选择SiOC组合以建立较低的势垒能量以减少写入和擦除电压和时间或适应特定应用所需的特定数据电荷保留时间。 在光检测器或成像应用中,选择SiOC组合以提供对期望波长的光的灵敏度。 与常规光电探测器不同,光在浮动栅极中被吸收,从而从其中喷射预先存储的电子。 与常规光电探测器不同,当半导体带隙增加时,根据本发明的光检测器实际上对较低能量的光子更敏感。