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    • 2. 发明授权
    • Method for making molded glass articles having bulk homogeneity and
optical quality surface
    • 制造具有大容量均质和光学质量表面的模制玻璃制品的方法
    • US4046545A
    • 1977-09-06
    • US689791
    • 1976-05-25
    • Leon M. SanfordChe-Kuang Wu
    • Leon M. SanfordChe-Kuang Wu
    • C03C3/076C03C3/078C03C3/102C03C3/105C03C3/108C03C23/00C03B23/00C03C3/04
    • C03C3/105C03C23/00C03C3/078C03C3/102C03C3/108Y10S501/90
    • An optical glass article having a desired surface figure and demonstrating maximum theoretical light transmission can be prepared by forming a base anhydrous glass of defined compositional ranges, hydrating the glass, partially dehydrating the glass at a temperature above the softening point and, using an inert gas, at a pressure above the vapor pressure of water contained therein, and then molding a preformed blank of the glass against a die having a desired optical quality surface figure, the molding being under conditions sufficient to transfer the surface figure of the die to the glass. The base glass comprises, in mole percent, about 70 to 82% SiO.sub.2, 10 to 17% Na.sub.2 O and/or K.sub.2 O, and 5 to 15% of an oxide or oxides selected from ZnO and PbO. The water content of the partially dehydrated glass ranges from about 3 to 8 wt. percent and the molded glass has a substantially uniform refractive index throughout its bulk. Homogeneous distribution of the water throughout the glass bulk appears to be assured by limiting the total water content to a range at which the diffusion coefficient of the water species (H.sub.2 O, H.sup.+, and OH.sup.-) exhibits the greatest dependence on the total water concentration (i.e. the range at which the coefficient is a quasi-step function).
    • 具有期望的表面图形并且显示最大理论透光率的光学玻璃制品可以通过形成具有确定的组成范围的基础无水玻璃来制备,水合玻璃,在高于软化点的温度下部分地使玻璃脱水,并使用惰性气体 在高于其中所含的水蒸汽压力的压力下,然后将玻璃的预成型坯件模制成具有所需光学质量表面图形的模具,模制件处于足以将模具的表面图形转移到玻璃板的条件下 。 基础玻璃的摩尔百分比含有约70-82%的SiO 2,10-17%的Na 2 O和/或K 2 O,以及5-15%的选自ZnO和PbO的氧化物或氧化物。 部分脱水玻璃的含水量为约3-8wt。 并且模制玻璃在其整体上具有基本上均匀的折射率。 通过将水分含量限制在水分(H 2 O,H +和OH-)的扩散系数对总水分浓度的最大依赖性的范围内,整个玻璃体积中的水的均匀分布似乎是确定的( 即系数为准阶跃函数的范围)。
    • 3. 发明授权
    • Gray scale all-glass photomasks
    • 灰色全玻璃光掩模
    • US06524756B1
    • 2003-02-25
    • US10160573
    • 2002-05-30
    • Che-Kuang Wu
    • Che-Kuang Wu
    • G03F900
    • C03C3/11C03C3/093C03C15/00C03C23/004G03F1/50G03F1/54G03F1/60G03F9/00
    • A narrowly defined range of zinc silicate glass compositions is found to produce High Energy Beam Sensitive-glass (HEBS-glass) that possesses the essential properties of a true gray level mask which is necessary for the fabrication of general three dimensional microstructures with one optical exposure in a conventional photolithographic process. The essential properties are (1) A mask pattern or image is grainiless even when observed under optical microscope at 1000× or at higher magnifications. (2) The HEBS-glass is insensitive and/or inert to photons in the spectral ranges employed in photolithographic processes, and is also insensitive and/or inert to visible spectral range of light so that a HEBS-glass mask blank and a HEBS-glass mask are permanently stable under room lighting conditions. (3) The HEBS-glass is sufficiently sensitive to electron beam exposure, so that the cost of making a mask using an e-beam writer is affordable for at least certain applications. (4) The e-beam induced optical density is a unique function of, and is a very reproducible function of electron dosages for one or more combinations of the parameters of an e-beam writer. The parameters of e-beam writers include beam acceleration voltage, beam current, beam spot size, addressing grid size and number of retraces. A method of fabricating three-dimensional microstructures using HEBS-glass gray scale photomask for three dimensional profiling of photoresist and reproducing the photoresist replica in the substrate with the existing microfabrication methods normally used for the production of microelectronics is described.
    • 发现限定范围的硅酸锌玻璃组合物产生具有真正灰度级掩模的基本特性的高能束敏感玻璃(HEBS-glass),其是用一次光学曝光制造一般三维微结构所必需的 在常规的光刻工艺中。 基本特性是(1)即使在光学显微镜下以1000倍或更高的放大倍率观察,掩模图案或图像也是无颗粒的。 (2)HEBS玻璃对于光刻工艺中使用的光谱范围对光子不敏感和/或惰性,并且对光的可见光谱范围也不敏感和/或惰性,使得HEBS玻璃掩模空白和HEBS- 玻璃面罩在室内照明条件下永久稳定。 (3)HEBS玻璃对电子束曝光具有足够的敏感性,因此至少在某些应用中使用电子束写入器制作掩模的成本是可承受的。 (4)电子束诱导的光密度是电子束写入器的参数的一个或多个组合的电子剂量的独特功能,并且是电子剂量的非常可重现的功能。 电子束写入器的参数包括光束加速电压,光束电流,光斑尺寸,寻址格栅大小和回溯数。一种使用HEBS-玻璃灰度光掩模制造三维微结构的方法,用于光致抗蚀剂和再现的三维轮廓 描述了通常用于生产微电子的现有微加工方法的基板中的光致抗蚀剂复制品。
    • 5. 发明授权
    • Optical articles prepared from hydrated glasses
    • 由水合玻璃制成的光学制品
    • US4073654A
    • 1978-02-14
    • US640733
    • 1975-12-15
    • Che-Kuang Wu
    • Che-Kuang Wu
    • C03B11/08C03B19/06C03B19/12C03C3/078C03C3/102C03C23/00G02B1/00C03C3/10C03C3/04
    • C03B11/08C03B19/06C03B19/12C03C23/00C03C3/078C03C3/102G02B1/00Y10S501/903
    • A glass article having an optical quality surface smoothness can be formed by molding a "silanol" glass material against a die having a molding surface which is a mirror of that required for the glass article, thereby obviating glass grinding and polishing steps. The article is prepared by first forming an anhydrous base glass comprising, in mole percent on the oxide basis, about 72 to 82% SiO.sub.2, 10 to 17% Na.sub.2 O and/or K.sub.2 O, and 5 to 15% of an oxide or oxides selected from ZnO and PbO. The base glass may include up to 5% Al.sub.2 O.sub.3 and up to 3% of B.sub.2 O.sub.3, BaO and/or MgO. The anhydrous base glass is then hydrated to include a water content ranging from 0.5 to 10% by weight to form a "silanol" glass. That glass is then molded against the die surface at a temperature ranging from about 250.degree. C. to 500.degree. C. and a pressure ranging from about 4,000 to 20,000 psi for a period of time sufficient to replicate the surface smoothness of the die on the glass and, depending on the molding process, yield a glass article containing about 0.5 to 10% by weight of "tightly" bound total water.
    • 具有光学质量表面平滑度的玻璃制品可以通过将“硅烷醇”玻璃材料模制成具有作为玻璃制品所需镜面的成型表面的模具,从而避免玻璃研磨和抛光步骤而形成。 该制品通过首先形成无水基础玻璃来制备,其中以氧化物为基准的摩尔百分数为约72至82%的SiO 2,10至17%的Na 2 O和/或K 2 O,以及5至15%的选自以下的氧化物或氧化物 ZnO和PbO。 基底玻璃可以包括高达5%的Al 2 O 3和至多3%的B 2 O 3,BaO和/或MgO。 然后将无水基础玻璃水合以包含0.5至10重量%的水含量以形成“硅烷醇”玻璃。 然后将该玻璃在约250℃至500℃的温度和约4,000至20,000psi的压力下模制在模具表面上一段足以复制模具表面平滑度的时间 玻璃,并且根据成型方法,产生含有约0.5至10重量%的“紧密”结合的总水的玻璃制品。
    • 6. 发明授权
    • High energy beam sensitive glasses
    • 高能束敏感眼镜
    • US5285517A
    • 1994-02-08
    • US906277
    • 1992-06-26
    • Che-Kuang Wu
    • Che-Kuang Wu
    • C03C3/085C03C4/06C03C21/00C03C23/00G02F1/1335G11B7/243G02B6/00
    • C03C4/06C03C21/005C03C23/0005C03C23/007C03C3/085G11B7/243G02F1/133512G11B2007/24308G11B2007/24312G11B2007/2432Y10T428/315
    • The invention relates to a high energy beam-sensitive glass (HEBS glass) exhibiting insensitivity and/or inertness to actinic radiation. Silver ion exchange in acidic aqueous solution results in a slab waveguide having a constant refractive index in the thickness dimension. Low loss single mode as well as multimode waveguides were fabricated with a great precision in the designed thickness and step index .DELTA.n. Channel waveguides were patterned and fabricated in one process step within a HEBS glass via a lithographic printing method using a high energy beam. Alternatively, predesigned pattern of channel waveguides were fabricated instantaneously upon direct write with a laser beam pattern generator employing a focused laser beam, within a HEBS glass which has been flood exposed to a high energy beam. The product of the present invention is also suitable for use as a phototool in photolithographic processes, as a glass filter for spatial modulation of light intensity and/or color, as a laser beam direct write recording and archival storage medium, and as a carrier plate of color filters and black matrix of a flat panel display.
    • 本发明涉及对光化辐射具有不敏感性和/或惰性的高能束敏感玻璃(HEBS玻璃)。 在酸性水溶液中的银离子交换导致在厚度尺寸上具有恒定折射率的平板波导。 低损耗单模以及多模波导以设计的厚度和阶梯指数(Delta)n精确度制造。 通过使用高能量束的平版印刷方法,在HEBS玻璃内的一个工艺步骤中对通道波导进行构图和制造。 或者,通过使用聚焦激光束的激光束图案发生器在已经暴露于高能量束的HEBS玻璃内直接写入时,立即制造了通道波导的预先设计的图案。 本发明的产品也适合用作光刻工艺中的光学工具,作为用于光强度和/或颜色的空间调制的玻璃过滤器,作为激光束直接写入记录和归档存储介质,以及作为载体板 的滤色镜和黑色矩阵的平板显示器。
    • 7. 发明授权
    • High energy beam colored glasses exhibiting insensitivity to actinic
radiation
    • 高能束彩色玻璃对光化辐射表现出不敏感性
    • US4567104A
    • 1986-01-28
    • US507681
    • 1983-06-24
    • Che-Kuang Wu
    • Che-Kuang Wu
    • G03C1/72B32B17/06B41M5/26C03C3/083C03C3/085C03C3/11C03C3/112C03C4/00C03C4/04C03C4/06C03C21/00C03C23/00G02F1/1335G03C1/725G03F1/00G11B7/24H01L21/027H01L21/30C03C15/00
    • C03C23/0005C03C21/005C03C23/007C03C3/085C03C4/06G02F1/133512Y10S428/913Y10T428/315
    • The invention relates to high energy beam-sensitive glass articles exhibiting insensitivity and/or inertness to actinic radiation, i.e., glass articles which are darkened and/or colored within a thin surface layer of, e.g., about 0.1-3 .mu.m upon exposure to a high energy beam, electron beam, and ion beams in particular, without a subsequent development step, and which need no fixing to stabilize the colored image, since both the recorded image and the glass article are insensitive to radiation in the spectral range of uv and longer wavelengths. More particularly, the instant invention is concerned with Ag.sup.+ ion-exchanged glass articles having base glass within alkali metal silicate composition fields containing at least one of the oxides of transition metals which have one to four d-electrons in an atomic state. Whereas the base glass composition can be varied widely, spontaneous reduction as well as photo-reduction of Ag.sup.+ ions are inhibited and/or eliminated due to the presence of said transition metal oxides in the glass article. The product of the invention is suitable for use as recording and archival storage medium and as phototools. The recorded images and/or masking patterns are up-datable, can be any single color seen in the visible spectrum, and is erasable by heat at temperatures above about 200.degree. C.
    • 本发明涉及对光化辐射具有不敏感性和/或惰性的高能束敏感玻璃制品,即在薄表面层中变暗和/或着色的玻璃制品,例如暴露于 高能束,电子束和离子束,特别是没有随后的显影步骤,并且由于记录的图像和玻璃制品对紫外光谱范围的辐射不敏感,因此不需要固定来稳定着色图像 和更长的波长。 更具体地,本发明涉及在碱金属硅酸盐组合物领域内具有碱玻璃的Ag +离子交换的玻璃制品,其含有原子状态中具有一至四个d电子的过渡金属的氧化物中的至少一种。 尽管基础玻璃组合物可以广泛变化,但由于玻璃制品中存在所述过渡金属氧化物,Ag +离子的自发还原和光还原被抑制和/或消除。 本发明的产品适用于记录和存档存储介质以及照相工具。 所记录的图像和/或掩蔽图案是可以拍摄的,可以是在可见光谱中看到的任何单一颜色,并且可以通过在高于约200℃的温度下的热量而被擦除。
    • 8. 发明授权
    • Method for preparing optical articles from hydrated glasses
    • 从水合玻璃制备光学制品的方法
    • US4098596A
    • 1978-07-04
    • US805927
    • 1977-06-13
    • Che-Kuang Wu
    • Che-Kuang Wu
    • C03B11/08C03B19/06C03B19/12C03C3/078C03C3/102C03C23/00G02B1/00C03C17/00C03C3/10
    • C03B11/08C03B19/06C03B19/12C03C23/00C03C3/078C03C3/102G02B1/00Y10S501/903
    • A glass article having an optical quality surface smoothness can be formed by molding a "silanol" glass material against a die having a molding surface which is a mirror of that required for the glass article, thereby obviating glass grinding and polishing steps. The article is prepared by first forming an anhydrous base glass comprising, in mole percent on the oxide basis, about 72 to 82% SiO.sub.2, 10 to 17% Na.sub.2 O and/or K.sub.2 O, and 5 to 15% of an oxide or oxides selected from ZnO and PbO. The base glass may include up to 5% Al.sub.2 O.sub.3 and up to 3% of B.sub.2 O.sub.3, BaO and/or MgO. The anhydrous base glass is then hydrated to include a water content ranging from 0.5 to 10% by weight to form a "silanol" glass. That glass is then molded against the die surface at a temperature ranging from about 250.degree. C. to 500.degree. C. and a pressure ranging from about 4,000 to 20,000 psi for a period of time sufficient to replicate the surface smoothness of the die on the glass and, depending on the molding process, yield a glass article containing about 0.5 to 10% by weight of "tightly" bound total water.
    • 具有光学质量表面平滑度的玻璃制品可以通过将“硅烷醇”玻璃材料模制成具有作为玻璃制品所需镜面的成型表面的模具,从而避免玻璃研磨和抛光步骤而形成。 该制品通过首先形成无水基础玻璃来制备,其中以氧化物为基准的摩尔百分数为约72至82%的SiO 2,10至17%的Na 2 O和/或K 2 O,以及5至15%的选自以下的氧化物或氧化物: ZnO和PbO。 基底玻璃可以包括高达5%的Al 2 O 3和至多3%的B 2 O 3,BaO和/或MgO。 然后将无水基础玻璃水合以包含0.5至10重量%的水含量以形成“硅烷醇”玻璃。 然后将该玻璃在约250℃至500℃的温度和约4,000至20,000psi的压力下模制在模具表面上一段足以复制模具表面平滑度的时间 玻璃,并且根据成型方法,产生含有约0.5至10重量%的“紧密”结合的总水的玻璃制品。
    • 9. 发明申请
    • PDR and PBR glasses for holographic data storage and/or computer generated holograms
    • 用于全息数据存储和/或计算机产生的全息图的PDR和PBR眼镜
    • US20080254372A1
    • 2008-10-16
    • US11787031
    • 2007-04-13
    • Che-Kuang Wu
    • Che-Kuang Wu
    • G03C1/005
    • G03H1/02G03H1/0891G03H2001/0268G03H2250/12G03H2260/52G11C13/045
    • Silicate glasses for storing holographic data and for producing computer-generated holograms, including photo-darkenable-refractive (PDR) and photo-bleachable-refractive (PBR) glasses. In one embodiment, a PBR glass plate contains a photosensitive glass layer of a silver ion-exchanged holographic recording (SIHR) glass, with a base glass composition that has been ion-exchanged in an aqueous ion-exchange solution containing silver ions. The SIHR glass is uniformly darkened with darkening-light radiation, causing a refractive index change in the photosensitive glass layer upon exposure to bleaching-light radiation without any post-exposure steps. In another embodiment, an optical information recording medium includes a PDR glass plate containing SIHR glass optimized for multiplex recording and for reproducing information, which utilizes holography with darkening-light radiation as recording beams. In still another embodiment, an optical information recording medium includes a PBR glass plate containing SIHR glass optimized for multiplex recording and for reproducing information, which utilizes holography with bleaching-light radiation as recording beams.
    • 用于存储全息数据和用于制造计算机产生的全息图的硅酸盐玻璃,包括光可变光折射(PDR)和光可漂白折射(PBR)玻璃。 在一个实施方案中,PBR玻璃板包含银离子交换全息记录(SIHR)玻璃的感光性玻璃层,其具有在含有银离子的含水离子交换溶液中进行离子交换的基础玻璃组合物。 SIHR玻璃用变暗光辐射均匀地变暗,在暴露于漂白光辐射下,导致光敏玻璃层中的折射率变化,而没有任何后曝光步骤。 在另一个实施例中,光学信息记录介质包括一个PDR玻璃板,其中包含优化用于多重记录和再现信息的SIHR玻璃,其利用具有变暗光辐射的全息术作为记录光束。 在另一个实施例中,光学信息记录介质包括一个包含优化用于多重记录和用于再现信息的SIHR玻璃的PBR玻璃板,其利用具有漂白光辐射的全息术作为记录光束。
    • 10. 发明授权
    • Direct write all-glass photomask blanks
    • 直接写全玻璃光掩模毛坯
    • US06562523B1
    • 2003-05-13
    • US09507039
    • 2000-02-18
    • Che-Kuang WuLaurie Ann Wu
    • Che-Kuang WuLaurie Ann Wu
    • G03P108
    • C03C3/11C03C3/093C03C15/00C03C23/004G03F1/50G03F1/54G03F1/60
    • A narrowly defined range of zinc silicate glass compositions is found to produce High Energy Beam Sensitive-glass (HEBS-glass) that possesses the essential properties of a true gray level mask which is necessary for the fabrication of general three dimensional microstructures with one optical exposure in a conventional photolithographic process. The essential properties are (1) A mask pattern or image is grainiless even when observed under optical microscope at 1000× or at higher magnifications. (2) The HEBS-glass is insensitive and/or inert to photons in the spectral ranges employed in photolithographic processes, and is also insensitive and/or inert to visible spectral range of light so that a HEBS-glass mask blank and a HEBS-glass mask are permanently stable under room lighting conditions. (3) The HEBS-glass is sufficiently sensitive to electron beam exposure, so that the cost of making a mask using an e-beam writer is affordable for many applications. (4) the e-beam induced optical density is a unique function of, and is a very reproducible function of electron dosages for one or more combinations of the parameters of an e-beam writer. The parameters of e-beam writers include beam accelerations voltage, beam current, beam spot size and addressing grid size.
    • 发现限定范围的硅酸锌玻璃组合物产生具有真正灰度级掩模的基本特性的高能束敏感玻璃(HEBS-glass),其是用一次光学曝光制造一般三维微结构所必需的 在常规的光刻工艺中。 基本特性是(1)即使在光学显微镜下以1000倍或更高的放大倍率观察,掩模图案或图像也是无颗粒的。 (2)HEBS玻璃对于光刻工艺中使用的光谱范围对光子不敏感和/或惰性,并且对光的可见光谱范围也不敏感和/或惰性,使得HEBS玻璃掩模空白和HEBS- 玻璃面罩在室内照明条件下永久稳定。 (3)HEBS玻璃对电子束曝光具有足够的敏感性,因此使用电子束写入器制作掩模的成本在许多应用中是可以承受的。 (4)电子束感应光密度是电子束写入器的参数的一个或多个组合的独特功能,并且是电子剂量的非常可重现的功能。 电子束写入器的参数包括光束加速电压,光束电流,光斑尺寸和寻址格栅尺寸。