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1. 发明授权

US5585211A Fabrication and use of sub-micron dimensional standard 失效
标题翻译：制造和使用亚微米尺寸标准
公开(公告)号：US5585211A
公开(公告)日：1996-12-17
申请号：US383922
申请日：1995-02-06
申请人： Leon A. Firstein , John L. Rogers , Arthur Noz
发明人： Leon A. Firstein , John L. Rogers , Arthur Noz
IPC分类号： G01B15/00 , G01Q40/02 , G03F7/20 , G03F7/26 , H01J37/20 , G03C5/00
CPC分类号： G03F7/70558 , B82Y35/00 , H01J2237/30444 , H01J2237/3045 , Y10S430/143
摘要： A sub-micron dimensional standard is embodied in a grating of equal-sized lines and spaces formed in an electron-sensitive material by means of E-beam lithography. Several gratings are generated in the material at different respective doses of electrons. For each dose, a plurality of gratings are formed with different respective energy deposition contours over the interface of a line and a space. At one dose the energy deposition contour will be the same for all of the different energy deposition contour values. The grating formed with this dose is chosen as the one having a part which forms the standard. The width of a line, as well as the width of a space, in the selected grating is known in absolute terms to the same degree of accuracy as the grating's period. With such an artifact, the systematic error inherent to a measurement system can be determined. Once this error is known, it can be employed as a compensating factor to correct measurements made via the system.
摘要翻译：亚微米尺寸标准体现在通过电子束光刻法形成在电子敏感材料中的等大小线和间隔的光栅中。在不同相应剂量的电子的材料中产生几个光栅。对于每个剂量，在线和空间的界面上形成具有不同的相应能量沉积轮廓的多个光栅。在一个剂量下，对于所有不同的能量沉积轮廓值，能量沉积轮廓将是相同的。选择用该剂量形成的光栅作为具有形成标准的部分的光栅。所选光栅中的线的宽度以及空间的宽度绝对地与光栅周期的精度相同。通过这样的假象，可以确定测量系统固有的系统误差。一旦知道这个错误，就可以将其用作校正通过系统进行的测量的补偿因子。

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