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    • 1. 发明授权
    • Semiconductor device with hole conduction via strained lattice
    • 半导体器件通过应变晶格具有空穴传导
    • US4665415A
    • 1987-05-12
    • US726543
    • 1985-04-24
    • Leo EsakiLeroy L. ChangWen-I Wang
    • Leo EsakiLeroy L. ChangWen-I Wang
    • H01L29/812H01L21/20H01L21/338H01L29/205H01L29/43H01L29/778H01L29/78H01L29/80
    • H01L29/7783H01L29/205H01L29/432
    • A field-effect transistor includes a conduction channel between a source terminal and a drain terminal, which channel employs holes as the charge carriers. The conduction channel is disposed within a layer of material comprising a group III-V compound of the periodic table and having a crystalline lattice structure which is stressed in two dimensions by means of epitaxial growth upon a thicker and rigid supporting layer comprising a different group III-V compound having a larger lattice spacing. The layer having the conduction channel is relatively thin being on the order of a few electron wavelength in thickness. The stretching of the layer having the conduction channel shift the energy levels of holes therein to remove the degenerate state thereof, thereby elevating light holes to an energy level characterized by increased mobility.
    • 场效应晶体管包括源极端子和漏极端子之间的导电沟道,该沟道使用空穴作为电荷载流子。 导电通道设置在包含元素周期表的III-V族化合物的材料层内,并且具有通过外延生长在二维上受应力的晶格结构,所述结晶晶格结构在包含不同III族的较厚且刚性的支撑层上 -V具有较大晶格间距的化合物。 具有导电通道的层相对较薄,厚度几个电子波长的数量级。 具有导电通道的层的拉伸使其中的孔的能量水平移位以去除其退化状态,从而将光孔提升到以增加的迁移率为特征的能级。
    • 7. 发明授权
    • Heterojunction tunneling base transistor
    • 异质结隧道基极晶体管
    • US4173763A
    • 1979-11-06
    • US805055
    • 1977-06-09
    • Leroy L. ChangLeo Esaki
    • Leroy L. ChangLeo Esaki
    • H01L29/73H01L21/331H01L29/76H01L29/88H01L29/267
    • H01L29/7606
    • Device having three semiconductor regions, which can be characterized as the emitter, base and collector regions. The emitter and collector regions have a first conductivity type, and the base region has the opposite conductivity type, where both the base-emitter and base-collector junctions are heterojunctions. The base region is sufficiently thin that charge carriers can tunnel therethrough. The base region has a small resistance due to its heavy doping (which is greater than the doping of both the emitter and the collector). Both the valence band and the conduction band in the emitter and collector regions are shifted in the same direction with respect to the valence band and conduction band of the base region (i.e., the energy gaps of the emitter and collector are shifted in the same direction with respect to the energy gap of the base region and overlap with the energy band of the base to produce band-edge discontinuities .DELTA.E.sub.c and .DELTA.E.sub.v). Any materials yielding the proper energy band diagram can be used; for example, Si-GaP and alloys of GaAsSb-InGaAs are particularly suitable.
    • 具有三个半导体区域的器件,其可以被表征为发射极,基极和集电极区域。 发射极和集电极区域具有第一导电类型,并且基极区域具有相反的导电类型,其中基极 - 发射极和基极 - 集电极结都是异质结。 基极区域足够薄,电荷载流子可以穿透其中。 由于其重掺杂(其大于发射极和集电极的掺杂),基极区域具有小的电阻。 发射极和集电极区域中的价带和导带都相对于基极区域的价带和导带在相同方向上偏移(即,发射极和集电极的能隙在相同方向上偏移 相对于基区的能隙并与基底的能带重叠以产生带边不连续性DELTA Ec和DELTA Ev)。 可以使用产生适当能带图的任何材料; 例如,Si-GaP和GaAsSb-InGaAs的合金是特别合适的。