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    • 8. 发明申请
    • Cleaning Gas
    • 清洁气体
    • US20120234351A1
    • 2012-09-20
    • US13513042
    • 2010-11-19
    • Naoto TakadaIsamu Mori
    • Naoto TakadaIsamu Mori
    • C07C53/48B01J19/12B08B5/00C11D7/60
    • C23C16/4405C23C14/14C23C14/564C23C16/06
    • Disclosed is a cleaning gas for deposits, which contains CHF2COF. The cleaning gas may contain O2, O3, CO, CO2, F2, NF3, Cl2, Br2, I2, XFn (In this formula, X represents Cl, I or Br. n represents an integer satisfying 1≦n≦7.), CH4, CH3F, CH2F2, CHF3, N2, He, Ar, Ne, Kr and the like, and can be applied to deposits that include at least one selected from the group consisting of W, Ti, Mo, Re, Ge, P, Si, V, Nb, Ta, Se, Te, Os, Ir, Sb, Au, Ag, As, Cr, Hf, Zr, Ni, Co, their compounds, and the like. This cleaning gas is not only excellent in cleaning performances but also easily available and does not substantially by-produce CF4 that places a burden on the environment.
    • 公开了一种含有CHF2COF的沉积物清洗气体。 清洗气体可以含有O 2,O 3,CO,CO 2,F 2,NF 3,Cl 2,Br 2,I 2,X F n(在该式中,X表示Cl,I或Br,n表示满足1≦̸ n≦̸ 7) CH 4,CH 3 F,CH 2 F 2,CHF 3,N 2,He,Ar,Ne,Kr等,并且可以应用于包括选自W,Ti,Mo,Re,Ge,P, Si,V,Nb,Ta,Se,Te,Os,Ir,Sb,Au,Ag,As,Cr,Hf,Zr,Ni,Co,它们的化合物等。 这种清洁气体不仅具有优异的清洁性能,而且易于获得,并且基本上不产生对环境造成负担的CF4。