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1. 发明申请

US20100213641A1 Method for Manufacturing a Material with a Multispectral Smoke Screening 审中-公开
标题翻译：用多光谱烟雾筛查制造材料的方法
公开(公告)号：US20100213641A1
公开(公告)日：2010-08-26
申请号：US12390543
申请日：2009-02-23
申请人： Kuo-Hui Wu , Pao-Hui Chen , Yann-Jang Gung , Wei-Che Hung
发明人： Kuo-Hui Wu , Pao-Hui Chen , Yann-Jang Gung , Wei-Che Hung
IPC分类号： C08J5/04 , B29C35/02
CPC分类号： C08J5/042 , C08K3/04 , C08K7/06 , C08L23/02 , C08L2205/16 , C08L2666/26 , C08L23/06
摘要： A method for manufacturing a material with a multispectral smoke screening, that is, to mix the composite materials of carbon fiber and graphite, carbon fiber and bamboo-charcoal, carbon fiber and carbon black respectively with epoxy resin to produce an absorbing film which dimensions are 15 cm×15 cm×0.2 cm and can absorbs millimeter-wave (8 mm) and infrared wave (3-5 and 8-12 μm). The film can be a smoke material of the M56 turbo smoke generator to resist the millimeter-wave and infrared wave.
摘要翻译：一种制造具有多光谱烟雾筛选的材料的方法，即将碳纤维和石墨，碳纤维和竹炭，碳纤维和炭黑的复合材料分别与环氧树脂混合以产生尺寸为 15厘米×15厘米×0.2厘米，可吸收毫米波（8毫米）和红外波（3-5和8-12微米）。该片可以是M56涡轮烟雾发生器的烟雾材料，以抵抗毫米波和红外波。

2. 发明申请

US20080239209A1 Polarizer-and-compensator assembly and method for makeing the same 失效
标题翻译：偏振器和补偿器组件及其制作方法
公开(公告)号：US20080239209A1
公开(公告)日：2008-10-02
申请号：US11898882
申请日：2007-09-17
申请人： Wei-Che Hung
发明人： Wei-Che Hung
IPC分类号： G02F1/1335 , H01L21/02
CPC分类号： G02B5/3083 , G02B5/3016
摘要： A method for making a polarizer-and-compensator assembly includes: (a) forming an alignment film on a releasable substrate; (b) forming a liquid crystal film on the alignment film so as to form a compensator layer on the releasable substrate; and (c) transferring the compensator layer from the releasable substrate to a polarizer plate by removing the releasable substrate from the compensator layer and attaching the alignment film to the polarizer plate.
摘要翻译：一种用于制造偏振器和补偿器组件的方法包括：（a）在可释放基底上形成取向膜; （b）在取向膜上形成液晶膜，以在可剥离基板上形成补偿层; 以及（c）通过从补偿层移除可释放基底并将取向膜附着到偏振片上，将补偿层从可释放基底转移到偏振板。

3. 发明申请

US20120080218A1 TRANSPARENT CONDUCTIVE FILM HAVING HIGH OPTICAL TRANSMITTANCE AND METHOD FOR MANUFACTURING THE SAME 失效
标题翻译：具有高光学透射率的透明导电薄膜及其制造方法
公开(公告)号：US20120080218A1
公开(公告)日：2012-04-05
申请号：US13243328
申请日：2011-09-23
申请人： Da-Ren Chiou , Wei-Che Hung , Shih-Yueh Lin , Chiu-Fang Chen , Tzu-Ying Chen
发明人： Da-Ren Chiou , Wei-Che Hung , Shih-Yueh Lin , Chiu-Fang Chen , Tzu-Ying Chen
IPC分类号： H05K1/09 , G03F7/20 , H05K1/00 , H05K1/02 , B82Y40/00
CPC分类号： B82Y30/00 , G03F7/0048 , G03F7/027 , G03F7/2014 , G03F7/26
摘要： The present invention pertains to a transparent conductive film including a conductive layer having different thicknesses so as to increase the optical transmittance while maintaining the conductivity of the transparent conductive film. The present invention also pertains to a process for the preparation of the above-mentioned transparent conductive film.
摘要翻译：本发明涉及包括具有不同厚度的导电层的透明导电膜，以便在保持透明导电膜的导电性的同时增加光透射率。本发明还涉及制备上述透明导电膜的方法。

4. 发明申请

US20120114903A1 METHOD FOR FORMING A MICROSTRUCTURE 失效
标题翻译：形成微结构的方法
公开(公告)号：US20120114903A1
公开(公告)日：2012-05-10
申请号：US13231863
申请日：2011-09-13
申请人： Da-Ren Chiou , Wei-Che Hung , Shoh-Yue Lin , Chiu-Fang Chen , Tzu-Ying Chen
发明人： Da-Ren Chiou , Wei-Che Hung , Shoh-Yue Lin , Chiu-Fang Chen , Tzu-Ying Chen
IPC分类号： B32B3/00 , G03F7/20
CPC分类号： G03F7/027 , G03F7/203 , G03F7/26
摘要： A method for forming a microstructure includes: (a) forming a photocurable layer on a substrate, the photocurable layer including at least one photocurable compound that has a photocurable functional group equivalent weight ranging from 70 to 700 g/mol; (b) covering partially the photocurable layer using a patterned mask; (c) exposing the photocurable layer through the patterned mask using a first light source so that the photocurable layer is cured at first regions which are exposed; (d) removing the patterned mask; and (e) illuminating the photocurable layer using a second light source to cure second regions of the photocurable layer which have not been cured. The first and second regions have different surface heights and provide a surface roughness for the microstructure.
摘要翻译：形成微结构的方法包括：（a）在基材上形成光固化层，所述光固化层包含至少一种光固化性的化合物，其光固化官能团当量为70-700g / mol; （b）使用图案化的掩模部分地覆盖光固化层; （c）使用第一光源使可光固化层通过图案化掩模曝光，使得可光固化层在暴露的第一区域固化; （d）去除图案化掩模; 和（e）使用第二光源照射光固化层以固化未固化的光固化层的第二区域。第一和第二区域具有不同的表面高度并为微观结构提供表面粗糙度。

5. 发明授权

US08784930B2 Transparent conductive film having high optical transmittance and method for manufacturing the same 失效
标题翻译：具有高透光率的透明导电膜及其制造方法
公开(公告)号：US08784930B2
公开(公告)日：2014-07-22
申请号：US13243328
申请日：2011-09-23
申请人： Da-Ren Chiou , Wei-Che Hung , Shih-Yueh Lin , Chiu-Fang Chen , Tzu-Ying Chen
发明人： Da-Ren Chiou , Wei-Che Hung , Shih-Yueh Lin , Chiu-Fang Chen , Tzu-Ying Chen
IPC分类号： B05D5/12 , B05D5/00
CPC分类号： B82Y30/00 , G03F7/0048 , G03F7/027 , G03F7/2014 , G03F7/26
摘要： The present invention pertains to a transparent conductive film including a conductive layer having different thicknesses so as to increase the optical transmittance while maintaining the conductivity of the transparent conductive film. The present invention also pertains to a process for the preparation of the above-mentioned transparent conductive film.
摘要翻译：本发明涉及包括具有不同厚度的导电层的透明导电膜，以便在保持透明导电膜的导电性的同时增加光透射率。本发明还涉及制备上述透明导电膜的方法。

6. 发明申请

US20130164661A1 METHOD FOR MAKING A RETARDATION FILM 审中-公开
标题翻译：制作延迟膜的方法
公开(公告)号：US20130164661A1
公开(公告)日：2013-06-27
申请号：US13617559
申请日：2012-09-14
申请人： Chien-Cheng Chang , Chiu-Fang Chen , Da-Ren Chiou , Wei-Che Hung
发明人： Chien-Cheng Chang , Chiu-Fang Chen , Da-Ren Chiou , Wei-Che Hung
IPC分类号： G03F7/20
CPC分类号： G02B5/3083 , G02B5/3016
摘要： A method for making a retardation film includes: (a) forming a photo-alignment layer on a substrate; (b) exposing the photo-alignment layer such that first and second regions of the alignment surface are oriented in a first alignment direction; (c) disposing a patterned mask over the photo-alignment layer such that the first regions of the alignment surface are shielded; (d) exposing the second regions such that the second regions are oriented in a second alignment direction, and the first regions remain oriented in the first alignment direction; (e) coating liquid crystal molecules over the alignment surface; and (f) curing the liquid crystal molecules.
摘要翻译：制造延迟膜的方法包括：（a）在基板上形成光取向层; （b）使所述光取向层曝光，使得所述对准表面的第一和第二区域沿第一对准方向取向; （c）在光取向层上设置图案化掩模，使得对准表面的第一区域被屏蔽; （d）使所述第二区域曝光，使得所述第二区域沿第二排列方向取向，并且所述第一区域保持朝向所述第一对准方向; （e）在对准表面上涂覆液晶分子; 和（f）固化液晶分子。

7. 发明授权

US07911563B2 Polarizer-and-compensator assembly and method for making the same 失效
标题翻译：偏振器和补偿器组件及其制作方法
公开(公告)号：US07911563B2
公开(公告)日：2011-03-22
申请号：US11898882
申请日：2007-09-17
申请人： Wei-Che Hung
发明人： Wei-Che Hung
IPC分类号： G02F1/1347 , G02F1/1335
CPC分类号： G02B5/3083 , G02B5/3016
摘要： A method for making a polarizer-and-compensator assembly includes: (a) forming an alignment film on a releasable substrate; (b) forming a liquid crystal film on the alignment film so as to form a compensator layer on the releasable substrate; and (c) transferring the compensator layer from the releasable substrate to a polarizer plate by removing the releasable substrate from the compensator layer and attaching the alignment film to the polarizer plate.
摘要翻译：一种用于制造偏振器和补偿器组件的方法包括：（a）在可释放基底上形成取向膜; （b）在取向膜上形成液晶膜，以便在可释放基板上形成补偿层; 以及（c）通过从补偿层移除可释放基底并将取向膜附着到偏振片上，将补偿层从可释放基底转移到偏振板。

8. 发明授权

US08828650B2 Method for making a retarder 有权
标题翻译：制造缓凝剂的方法
公开(公告)号：US08828650B2
公开(公告)日：2014-09-09
申请号：US13618008
申请日：2012-09-14
申请人： Da-Ren Chiou , Wei-Che Hung , Chiu-Fang Chen , Yu-June Wu
发明人： Da-Ren Chiou , Wei-Che Hung , Chiu-Fang Chen , Yu-June Wu
IPC分类号： G03F7/26 , C08F2/46
CPC分类号： C08F2/46 , G02B5/3083 , G02B27/26 , G02F2001/133633 , G03F7/027 , G03F7/038 , G03F7/2016 , G03F7/2022
摘要： A method for making a retarder includes: (a) forming a photocurable layer on a substrate, the photocurable layer including at least one photocurable prepolymer that has a plurality of reactive functional groups and a functional group equivalent weight ranging from 70 to 700 g/mol; (b) covering partially the photocurable layer using a patterned mask; (c) exposing the photocurable layer through the patterned mask; (d) removing the patterned mask; (e) exposing the photocurable layer to cure second regions of the photocurable layer so as to form a microstructure; (f) forming an alignment layer on the microstructure; (g) forming a liquid crystal layer on the alignment layer; and (h) curing the liquid crystal layer.
摘要翻译：一种制造缓凝剂的方法包括：（a）在基材上形成光固化层，所述光固化层包含至少一种具有多个反应性官能团和官能团当量为70〜700g / mol的光固化性预聚物 ; （b）使用图案化掩模部分地覆盖光固化层; （c）将光固化层曝光通过图案化掩模; （d）去除图案化掩模; （e）使光固化层曝光以固化光固化层的第二区域以形成微结构; （f）在所述微观结构上形成取向层; （g）在取向层上形成液晶层; 和（h）固化液晶层。

9. 发明授权

US08704984B2 Method of preparing composite optical retarder 失效
标题翻译：复合光阻器的制备方法
公开(公告)号：US08704984B2
公开(公告)日：2014-04-22
申请号：US13368559
申请日：2012-02-08
申请人： Da-Ren Chiou , Tzu-Ying Chen , Wei-Che Hung , De-Ling Hsu , Chiu-Fang Chen
发明人： Da-Ren Chiou , Tzu-Ying Chen , Wei-Che Hung , De-Ling Hsu , Chiu-Fang Chen
IPC分类号： G02F1/1337
CPC分类号： B29D11/0074 , B32B33/00 , B32B2307/40 , G02B5/3016 , G02F1/133788
摘要： A method of preparing a composite optical retarder is provided. A first and a second liquid crystal coating materials are respectively disposed on opposite surfaces of a photoalignment film to respectively form a first and a second optical retarders. The composite optical retarder having the photoalignment film sandwiched by the first and the second optical retarders is thus obtained.
摘要翻译：提供一种制备复合光学延迟器的方法。第一和第二液晶涂层材料分别设置在光取向膜的相对表面上，以分别形成第一和第二光学延迟器。由此获得具有被第一和第二光学延迟器夹持的光
取向膜的复合光学延迟器。

10. 发明授权

US08703409B2 Method for forming a microstructure 失效
标题翻译：微结构形成方法
公开(公告)号：US08703409B2
公开(公告)日：2014-04-22
申请号：US13231863
申请日：2011-09-13
申请人： Da-Ren Chiou , Wei-Che Hung , Shoh-Yue Lin , Chiu-Fang Chen , Tzu-Ying Chen
发明人： Da-Ren Chiou , Wei-Che Hung , Shoh-Yue Lin , Chiu-Fang Chen , Tzu-Ying Chen
IPC分类号： G03F7/26
CPC分类号： G03F7/027 , G03F7/203 , G03F7/26
摘要： A method for forming a microstructure includes: (a) forming a photocurable layer on a substrate, the photocurable layer including at least one photocurable compound that has a photocurable functional group equivalent weight ranging from 70 to 700 g/mol; (b) covering partially the photocurable layer using a patterned mask; (c) exposing the photocurable layer through the patterned mask using a first light source so that the photocurable layer is cured at first regions which are exposed; (d) removing the patterned mask; and (e) illuminating the photocurable layer using a second light source to cure second regions of the photocurable layer which have not been cured. The first and second regions have different surface heights and provide a surface roughness for the microstructure.
摘要翻译：形成微结构的方法包括：（a）在基材上形成光固化层，所述光固化层包含至少一种光固化性的化合物，其光固化官能团当量为70-700g / mol; （b）使用图案化掩模部分地覆盖光固化层; （c）使用第一光源使可光固化层通过图案化掩模曝光，使得可光固化层在暴露的第一区域固化; （d）去除图案化掩模; 和（e）使用第二光源照射光固化层以固化未固化的光固化层的第二区域。第一和第二区域具有不同的表面高度并为微观结构提供表面粗糙度。

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