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1. 发明授权

US06330539B1 Dialog interface system 有权
标题翻译：对话框界面系统
公开(公告)号：US06330539B1
公开(公告)日：2001-12-11
申请号：US09234472
申请日：1999-01-21
申请人： Kuniharu Takayama , Masahiro Matsuoka , Takeshi Koshiba , Shinya Hosogi , Minoru Sekiguchi , Yoshiharu Maeda , Hirohisa Naito
发明人： Kuniharu Takayama , Masahiro Matsuoka , Takeshi Koshiba , Shinya Hosogi , Minoru Sekiguchi , Yoshiharu Maeda , Hirohisa Naito
IPC分类号： G10L1504
CPC分类号： G10L15/1822 , G10L2015/223
摘要： In the dialog interface apparatus of the present invention, input speech is converted to an input semantic representation by a speech recognition unit, and a dialog management unit outputs an output semantic representation that corresponds to the input semantic representation, based on the input semantic representation obtained by the speech recognition unit. Having received the output semantic representation from the dialog management unit, a speech synthesis unit converts the output semantic representation to output speech identifying a specific dialog target and outputs the output speech. Further, the dialog management unit outputs to an innate operation execution unit an innate operation command that corresponds to the input semantic representation. The innate operation execution unit receives the innate operation command from the dialog management unit and executes an operation corresponding to the innate operation command.
摘要翻译：在本发明的对话界面装置中，输入语音由语音识别单元转换为输入语义表示，对话管理单元根据所输入的语义表示输出与输入语义表示对应的输出语义表示由语音识别单元。在从对话管理单元接收到输出语义表示之后，语音合成单元将输出语义表示转换为识别特定对话目标的输出语音，并输出输出语音。此外，对话管理单元向先天操作执行单元输出与输入的语义表示相对应的固有操作命令。天生操作执行单元从对话管理单元接收固有操作命令，并执行与先天操作命令相对应的操作。

2. 发明授权

US6040840A Virtual clay system and its method of simulation 失效
标题翻译：虚拟粘土系统及其模拟方法
公开(公告)号：US6040840A
公开(公告)日：2000-03-21
申请号：US31916
申请日：1998-02-27
申请人： Takeshi Koshiba , Masahiro Matsuoka , Kuniharu Takayama
发明人： Takeshi Koshiba , Masahiro Matsuoka , Kuniharu Takayama
IPC分类号： G06F3/01 , G06F17/50 , G06T17/00 , G06F15/00
CPC分类号： G06T17/00
摘要： The system creates the aggregate of virtual particles in a cybernetic space on a computer and displays the shape of an object by means of a film covering its surface. When a user inputs a deforming designation, each particle moves and deforms the film. At this time the shape, sense of touch and counter force are output from the computer, and the user can deform the object with a feeling of working clay.
摘要翻译：系统在计算机上的控制论空间中创建虚拟粒子的聚合体，并通过覆盖其表面的薄膜来显示对象的形状。当用户输入变形名称时，每个粒子移动并使胶片变形。此时，计算机输出形状，触感和反力，用户可以用工作粘土的感觉使物体变形。

3. 发明授权

US07985958B2 Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program 有权
标题翻译：电子束描绘装置，偏转放大器，偏转控制装置，电子束描绘法，半导体装置的制造方法以及电子束绘制程序
公开(公告)号：US07985958B2
公开(公告)日：2011-07-26
申请号：US11268603
申请日：2005-11-08
申请人： Tetsuro Nakasugi , Kazuo Tawarayama , Hiroyuki Mizuno , Takumi Ota , Noriaki Sasaki , Tatsuhiko Higashiki , Takeshi Koshiba , Shunko Magoshi
发明人： Tetsuro Nakasugi , Kazuo Tawarayama , Hiroyuki Mizuno , Takumi Ota , Noriaki Sasaki , Tatsuhiko Higashiki , Takeshi Koshiba , Shunko Magoshi
IPC分类号： H01J37/153
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J2237/15 , H01J2237/30433
摘要： According to an aspect of the invention, there is provided an electron beam drawing apparatus comprising at least one stage of a deflection amplifier and a deflection unit, a first storage section which stores shot information at a drawing time, a second storage section which stores a correction table indicating a relation between the shot information and an output voltage of the deflection amplifier, and an adjusting section which adjusts an output of the deflection amplifier based on the correction table stored in the second storage section and the shot information stored in the first storage section.
摘要翻译：根据本发明的一个方面，提供了一种电子束描绘装置，其包括偏转放大器和偏转单元的至少一个级，在绘制时存储镜头信息的第一存储部分，指示拍摄信息和偏转放大器的输出电压之间的关系的校正表以及基于存储在第二存储部中的校正表来调整偏转放大器的输出的调节部和存储在第一存储部部分。

4. 发明申请

US20060151721A1 Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program 有权
标题翻译：电子束描绘装置，偏转放大器，偏转控制装置，电子束描绘法，半导体装置的制造方法以及电子束绘制程序
公开(公告)号：US20060151721A1
公开(公告)日：2006-07-13
申请号：US11268603
申请日：2005-11-08
申请人： Tetsuro Nakasugi , Kazuo Tawarayama , Hiroyuki Mizuno , Takumi Ota , Noriaki Sasaki , Tatsuhiko Higashiki , Takeshi Koshiba , Shunko Magoshi
发明人： Tetsuro Nakasugi , Kazuo Tawarayama , Hiroyuki Mizuno , Takumi Ota , Noriaki Sasaki , Tatsuhiko Higashiki , Takeshi Koshiba , Shunko Magoshi
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J2237/15 , H01J2237/30433
摘要： According to an aspect of the invention, there is provided an electron beam drawing apparatus comprising at least one stage of a deflection amplifier and a deflection unit, a first storage section which stores shot information at a drawing time, a second storage section which stores a correction table indicating a relation between the shot information and an output voltage of the deflection amplifier, and an adjusting section which adjusts an output of the deflection amplifier based on the correction table stored in the second storage section and the shot information stored in the first storage section.
摘要翻译：根据本发明的一个方面，提供了一种电子束描绘装置，其包括偏转放大器和偏转单元的至少一个级，在绘制时存储镜头信息的第一存储部分，指示拍摄信息和偏转放大器的输出电压之间的关系的校正表以及基于存储在第二存储部中的校正表来调整偏转放大器的输出的调节部和存储在第一存储部部分。

5. 发明申请

US20110012297A1 PATTERN TRANSFER METHOD 审中-公开
标题翻译：图案转移方法
公开(公告)号：US20110012297A1
公开(公告)日：2011-01-20
申请号：US12718778
申请日：2010-03-05
申请人： Ayumi KOBIKI , Takeshi Koshiba , Hidefumi Mukai , Seiro Miyoshi
发明人： Ayumi KOBIKI , Takeshi Koshiba , Hidefumi Mukai , Seiro Miyoshi
IPC分类号： B29C35/08 , B29C39/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A pattern transfer method for transferring an uneven pattern onto a resist material is disclosed. The uneven pattern is formed in a template having a through-groove in a predetermined region. The resist material is applied to a substrate. The template is made to come into contact with the resist material. The resist material is filled to concave portion in the uneven pattern. The residual resist material leaked from a gap between the substrate and the template to the outside is sucked through the through-groove in a state where the template is in contact with the resist material. The resist material is made to cure in a state where the template is in contact with the resist material after the suction of the residual resist material. The template is separated from the cured resist material.
摘要翻译：公开了一种用于将不均匀图案转印到抗蚀剂材料上的图案转印方法。不规则图案形成在具有预定区域中的通槽的模板中。将抗蚀剂材料施加到基底上。使模板与抗蚀剂材料接触。抗蚀剂材料以不均匀图案填充到凹部。在模板与抗蚀剂材料接触的状态下，从基板和模板之间的间隙向外部泄漏的残留抗蚀剂材料通过贯通槽进行吸引。抗蚀剂材料在残留抗蚀剂材料的吸附之后，在模板与抗蚀剂材料接触的状态下使其固化。将模板与固化的抗蚀剂材料分离。

6. 发明申请

US20100022036A1 METHOD FOR FORMING PATTERN, AND TEMPLATE 审中-公开
标题翻译：形成图案和模板的方法
公开(公告)号：US20100022036A1
公开(公告)日：2010-01-28
申请号：US12179804
申请日：2008-07-25
申请人： Ikuo YONEDA , Takumi Ota , Takeshi Koshiba
发明人： Ikuo YONEDA , Takumi Ota , Takeshi Koshiba
IPC分类号： H01L21/66
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： According to an aspect of the present invention, there is provided a template including: a template substrate; patterns for forming device patterns on a wafer substrate; and a charging monitoring pattern, a size of the charging monitoring pattern being equal to a largest pattern in the patterns for forming the device patterns.
摘要翻译：根据本发明的一个方面，提供了一种模板，包括：模板基板; 用于在晶片衬底上形成器件图案的图案; 以及充电监视模式，充电监视模式的大小等于用于形成设备模式的模式中的最大模式。

7. 发明申请

US20060289805A1 Electron beam lithography apparatus, lithography method, lithography program, and manufacturing method of a semiconductor device 失效
公开(公告)号：US20060289805A1
公开(公告)日：2006-12-28
申请号：US11430044
申请日：2006-05-09
申请人： Tetsuro Nakasugi , Noriaki Sasaki , Takeshi Koshiba , Takumi Ota
发明人： Tetsuro Nakasugi , Noriaki Sasaki , Takeshi Koshiba , Takumi Ota
IPC分类号： G21G5/00
CPC分类号： H01J37/3026 , H01J2237/31761
摘要： According to an aspect of the invention, there is provided an electron beam lithography apparatus including a first setting unit configured to set a drawing position on a semiconductor substrate based on layout information of the semiconductor substrate, a second setting unit configured to set a valid range on the semiconductor substrate based on shape information of the semiconductor substrate, a determination unit configured to determine whether or not the drawing position falls within the valid range, and an irradiation unit configured to irradiate the semiconductor substrate with an electron beam when the determination unit determines that the drawing position falls within the valid range.

8. 发明申请

US20120009791A1 PATTERN FORMATION METHOD 审中-公开
标题翻译：模式形成方法
公开(公告)号：US20120009791A1
公开(公告)日：2012-01-12
申请号：US13175349
申请日：2011-07-01
申请人： Yingkang ZHANG , Masafumi Asano , Takeshi Koshiba
发明人： Yingkang ZHANG , Masafumi Asano , Takeshi Koshiba
IPC分类号： H01L21/311 , B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： According to one embodiment, a pattern formation method is disclosed. The method can include filling an imprint material between a first protrusion-depression pattern of a first pattern transfer layer formed on a first replica substrate and a second pattern transfer layer being transparent to energy radiation and formed on a second replica substrate transparent to the energy radiation. The method can include curing the imprint material by irradiating the imprint material with the energy radiation from an opposite surface side of the second replica substrate. The method can include releasing the first protrusion-depression pattern from the imprint material. The method can include forming a second protrusion-depression pattern in the second pattern transfer layer by processing the second pattern transfer layer using the imprint material as a mask.
摘要翻译：根据一个实施例，公开了图案形成方法。该方法可以包括在形成在第一复制基板上的第一图案转移层的第一突起 - 凹陷图案和对能量辐射透明的第二图案转移层之间填充压印材料，并形成在对能量辐射透明的第二复制基板上。该方法可以包括通过用来自第二复制基板的相对表面侧的能量辐射照射压印材料来固化压印材料。该方法可以包括从压印材料释放第一突起 - 凹陷图案。该方法可以包括通过使用压印材料作为掩模处理第二图案转印层来在第二图案转印层中形成第二突起凹陷图案。

9. 发明授权

US07889910B2 Character pattern extracting method, charged particle beam drawing method, and character pattern extracting program 失效
标题翻译：字符图案提取方法，带电粒子束绘制方法和字符图案提取程序
公开(公告)号：US07889910B2
公开(公告)日：2011-02-15
申请号：US11797531
申请日：2007-05-04
申请人： Tetsuro Nakasugi , Takumi Ota , Takeshi Koshiba , Noriaki Sasaki
发明人： Tetsuro Nakasugi , Takumi Ota , Takeshi Koshiba , Noriaki Sasaki
IPC分类号： G06K9/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00
摘要： A character pattern extracting method includes ranking character patterns whose number is larger than a maximum number of character patterns in an aperture, depending on the number of reference times in design data of a semiconductor device, extracting first extraction patterns whose number is smaller than the maximum number from the large number of read character patterns in a descending order of the reference time number, defining character patterns except the first extraction patterns out of the larger number of character patterns as candidate patterns, selecting from the candidate patterns a plurality of candidate patterns whose number corresponds to a difference between the number of extracted patterns from the maximum number, and creating combinations of the selected candidate patterns, and extracting second extraction patterns included in a combination among the combinations of candidate patterns, in which a manufacturing time of the semiconductor device is most shortened.
摘要翻译：字符图案提取方法包括根据半导体器件的设计数据中的参考时间的数量来排列数量大于孔径中的最大字符图案数量的字符图案，提取数量小于最大值的第一提取图案以大量的读取字符图案的数量以参考时间数字的降序排列，将除了较大数量的字符图案之外的第一提取模式除外的字符图案作为候选图案，从候选图案中选择多个候选图案，数字对应于从最大数量提取的图案的数量之间的差异，以及创建所选择的候选图案的组合，以及提取包括在候选图案的组合中的组合中的第二提取图案，其中半导体器件的制造时间最缩短。

10. 发明申请

US20090095711A1 MICROFABRICATION APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：微生物装置和装置制造方法
公开(公告)号：US20090095711A1
公开(公告)日：2009-04-16
申请号：US12237806
申请日：2008-09-25
申请人： Takeshi Koshiba , Yumi Nakajima , Tetsuro Nakasugi , Kazuo Tawarayama , Ikuo Yoneda , Hiroyuki Mizuno
发明人： Takeshi Koshiba , Yumi Nakajima , Tetsuro Nakasugi , Kazuo Tawarayama , Ikuo Yoneda , Hiroyuki Mizuno
IPC分类号： B44C1/22 , B29C43/02
CPC分类号： B29C43/021 , B29C33/303 , B29C43/003 , B29C43/58 , B29C2043/025 , B29C2043/142 , B29C2043/525 , B29C2043/5833 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7003 , G03F9/7042 , G03F9/7088
摘要： A microfabrication apparatus for pressing an original plate including a pattern down on a substrate to transfer the pattern on the substrate includes a first measurement unit for measuring relative positional displacement between the substrate and the plate above the substrate, a position correction unit for correcting relative position between the substrate and the plate such that the pattern is to be transferred on a first predetermined position of the substrate based on the relative positional displacement measured by the first measurement unit, a pressing unit for pressing the plate above the substrate down on the substrate to transfer the pattern on the substrate in a state that the relative positional displacement between the substrate and the plate is corrected by the position correction unit, and a second measurement unit for measuring relative positional relationship between the pattern transferred on the substrate and a pattern previously formed on the substrate.
摘要翻译：一种用于将包括图案的原稿板压在基板上以将图案转印到基板上的微加工装置包括：第一测量单元，用于测量基板和基板上方的板之间的相对位置偏移;位置校正单元，用于校正相对位置在基板和板之间，基于由第一测量单元测量的相对位置位移，将图案转印到基板的第一预定位置上;按压单元，用于将基板上方的基板向下压在基板上，在通过位置校正单元校正基板和板之间的相对位置偏移的状态下，在基板上转印图案;以及第二测量单元，用于测量在基板上传送的图案与先前形成的图案之间的相对位置关系在基板上。

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