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1. 发明申请

US20060177581A1 Nanostructured low-Cr Cu-Cr coatings for high temperature oxidation resistance 有权
公开(公告)号：US20060177581A1
公开(公告)日：2006-08-10
申请号：US11054665
申请日：2005-02-09
申请人： Kuang-Tsan Chiang , James Arps , Ronghua Wei
发明人： Kuang-Tsan Chiang , James Arps , Ronghua Wei
IPC分类号： C23C16/00 , C23C14/30 , B32B15/20
CPC分类号： C23C14/22 , C23C14/16 , Y02T50/67 , Y10T428/12903
摘要： This invention is directed to a method of preventing oxidation of copper alloys at high temperatures by deposition of a nano-structured, low-chromium copper-chromium protective coating to copper-alloy components. The coatings of the present invention are applied by an ion beam assisted, electron beam physical vapor deposition and consist of copper and chromium particles having a diameter of about 10 nm. This invention also encompasses the coated copper-alloy components produced by the disclosed deposition methods.

2. 发明申请

US20060251917A1 Method for magnetron sputter deposition 有权
标题翻译：磁控溅射沉积方法
公开(公告)号：US20060251917A1
公开(公告)日：2006-11-09
申请号：US11397878
申请日：2006-04-04
申请人： Kuang-Tsan Chiang , Ronghua Wei , Edward Langa
发明人： Kuang-Tsan Chiang , Ronghua Wei , Edward Langa
IPC分类号： C23C14/32 , B32B15/20
CPC分类号： C23C14/046 , C23C14/165 , C23C14/225 , C23C14/352 , C23C14/355 , H01J37/3405 , Y10T428/12903
摘要： A method for depositing a nanostructured coating comprising chromium or a copper-chromium mixture on a workpiece. The workpiece may comprise a hollowed structure such as a rocket or jet engine combustion chamber liner. The method comprises providing a magnetron and an external sputter target material comprising chromium or a copper-chromium composite and effecting a magnetron sputter deposition to deposit a substantially uniform nanostructured coating comprising said sputter target material on said workpiece. The method may include plasma enhancement wherein a filament is utilized to produce a plasma that effects an ion bombardment on the workpiece during the magnetron sputter deposition process. The invention also includes the nanostructured coatings deposited by these methods and workpieces coated thereby.
摘要翻译：一种在工件上沉积包含铬或铜 - 铬混合物的纳米结构涂层的方法。工件可以包括中空结构，例如火箭或喷气式发动机燃烧室衬套。该方法包括提供磁控管和包含铬或铜 - 铬复合材料的外部溅射靶材料，并进行磁控溅射沉积，以将包含所述溅射靶材料的基本均匀的纳米结构涂层沉积在所述工件上。该方法可以包括等离子体增强，其中使用丝来产生在磁控溅射沉积工艺期间对工件进行离子轰击的等离子体。本发明还包括通过这些方法沉积的纳米结构涂层和由此涂覆的工件。

3. 发明授权

US07052736B2 Method for depositing coatings on the interior surfaces of tubular structures 有权
标题翻译：在管状结构的内表面上沉积涂层的方法
公开(公告)号：US07052736B2
公开(公告)日：2006-05-30
申请号：US10807039
申请日：2004-03-23
申请人： Ronghua Wei , Christopher Rincon , James Arps
发明人： Ronghua Wei , Christopher Rincon , James Arps
IPC分类号： B05D7/22 , C23C14/22
CPC分类号： B05D7/22 , B05D1/62 , B05D7/52 , B05D2254/04 , F41A21/04 , Y10T428/13
摘要： A method is disclosed for substantially uniformly coating an interior surface of a ferromagnetic tubular structure such as a ferromagnetic tube having a high aspect ratio. The method entails inducing a magnetic field of a given magnitude within the tubular structure. Further, a bias is applied at a given voltage to the tubular structure. Then, the interior surface of the tubular structure is exposed to a gaseous precursor material under conditions effective to convert a quantity of the gaseous precursor material to ionize gaseous precursor material. The given magnitude and voltage is such that it is effective to deposit the ionized the gaseous precursor material onto the interior surface and converts the ionized gaseous precursor material to a substantially uniform protective coating in the interior surface.
摘要翻译：公开了一种基本上均匀地涂覆铁磁管状结构的内表面的方法，例如具有高纵横比的铁磁管。该方法需要在管状结构内引起给定量值的磁场。此外，在给定电压下施加偏压到管状结构。然后，管状结构的内表面在有效地将一定量的气态前体材料转化成电离气态前体材料的条件下暴露于气态前体材料。给定的量值和电压使得将离子化的气态前体材料沉积到内表面上并将离子化的气态前体材料转化成内表面中基本均匀的保护涂层是有效的。

4. 发明授权

US06764714B2 Method for depositing coatings on the interior surfaces of tubular walls 有权
标题翻译：在管壁内表面上沉积涂层的方法
公开(公告)号：US06764714B2
公开(公告)日：2004-07-20
申请号：US10167189
申请日：2002-06-11
申请人： Ronghua Wei , Christopher Rincon , James Arps
发明人： Ronghua Wei , Christopher Rincon , James Arps
IPC分类号： C23C1606
CPC分类号： F41A21/04 , B05D1/62 , B05D7/22 , B05D7/52 , B05D2254/04 , Y10T428/30
摘要： Methods for coating the interior surface of tubular structures having high aspect ratios and tubular structures produced by such methods. The interior surface of the tubular structure is coated by inducing a magnetic field having a given magnitude around a circumference along a length of the tubular structure, applying a bias at a given voltage to the tubular structure, and exposing the interior surface to a precursor material to deposit the precursor material onto the interior surface of the tubular structure.
摘要翻译：用于涂覆具有高纵横比的管状结构的内表面的方法和通过这些方法制造的管状结构。管状结构的内表面通过沿管状结构的长度诱导围绕圆周具有给定大小的磁场，将给定电压的偏压施加到管状结构，并将内表面暴露于前体材料以将前体材料沉积到管状结构的内表面上。

5. 发明授权

US07351480B2 Tubular structures with coated interior surfaces 有权
标题翻译：具有涂层内表面的管状结构
公开(公告)号：US07351480B2
公开(公告)日：2008-04-01
申请号：US10693076
申请日：2003-10-24
申请人： Ronghua Wei , Chistopher Rincon , James Arps
发明人： Ronghua Wei , Chistopher Rincon , James Arps
IPC分类号： B32B1/08 , B32B15/02 , B32B15/04 , B32B33/00
CPC分类号： F41A21/04 , B05D1/62 , B05D7/22 , B05D7/52 , B05D2254/04 , Y10T428/12625 , Y10T428/12674 , Y10T428/13 , Y10T428/24479 , Y10T428/24967 , Y10T428/26 , Y10T428/265 , Y10T428/30 , Y10T428/31
摘要： Tubular structures having aspect ratios of at least about 3 and comprising interior surfaces comprising substantially uniform coatings generated from a gaseous precursor material.
摘要翻译：具有至少约3的纵横比并且包括内表面的管状结构包括由气态前体材料产生的基本均匀的涂层。

6. 发明申请

US20050061251A1 Apparatus and method for metal plasma immersion ion implantation and metal plasma immersion ion deposition 审中-公开
标题翻译：金属等离子体浸没离子注入和金属等离子体浸没离子沉积的装置和方法
公开(公告)号：US20050061251A1
公开(公告)日：2005-03-24
申请号：US10932925
申请日：2004-09-02
申请人： Ronghua Wei , Thomas Booker , Christopher Rincon , James Arps
发明人： Ronghua Wei , Thomas Booker , Christopher Rincon , James Arps
IPC分类号： C23C14/00 , C23C14/26 , C23C14/30 , C23C14/32 , C23C14/48 , C23C16/00 , H01J37/32
CPC分类号： C23C14/48 , C23C14/26 , C23C14/30 , C23C14/32 , H01J37/32412
摘要： This invention is a method for metal plasma ion implantation and metal plasma ion deposition, comprising: providing a vacuum chamber with at least one workpiece having a surface positioned on a worktable within the vacuum chamber; reducing the pressure in the vacuum chamber; generating a plasma of metal ions within the vacuum chamber, applying a negative bias to the worktable to thereby accelerate metal ions from the plasma toward at least one workpiece to thereby either implant metal ions into or deposit metal ions onto the workpiece or both. This invention includes an apparatus for metal ion implantation and metal ion plasma deposition, comprising: a vacuum chamber, a metal plasma generator within the vacuum chamber, and at least one worktable within the vacuum chamber.
摘要翻译：本发明是一种用于金属等离子体离子注入和金属等离子体离子沉积的方法，包括：提供具有至少一个工件的真空室，所述工件具有位于所述真空室内的工作台上的表面; 降低真空室内的压力; 在真空室内产生金属离子等离子体，向工作台施加负偏压，从而将金属离子从等离子体加速至至少一个工件，从而将金属离子注入或将金属离子沉积到工件上或两者上。本发明包括一种用于金属离子注入和金属离子等离子体沉积的装置，包括：真空室，真空室内的金属等离子体发生器和真空室内的至少一个工作台。

7. 发明授权

US09175381B2 Processing tubular surfaces using double glow discharge 有权
标题翻译：使用双辉光放电加工管状表面
公开(公告)号：US09175381B2
公开(公告)日：2015-11-03
申请号：US12169837
申请日：2008-07-09
申请人： Ronghua Wei
发明人： Ronghua Wei
IPC分类号： C23C14/34 , C23C14/16 , C23C14/54 , C23C14/48 , C23C14/04
CPC分类号： C23C14/345 , C23C14/046 , C23C14/16 , C23C14/165 , C23C14/48 , C23C14/541
摘要： A method of sputtering a component includes positioning a conductive substrate into a vacuum chamber, wherein the conductive substrate is tubular and has a surface. A source electrode including a source material may be inserted into the conductive substrate. A first bias voltage ΔVac1 may be applied between the conductive substrate and the vacuum chamber and a second bias voltage ΔVas1 may be applied between the source electrode and the vacuum chamber, sputtering the source material onto the conductive substrate.
摘要翻译：溅射部件的方法包括将导电基板定位到真空室中，其中导电基板是管状的并具有表面。可以将包括源材料的源电极插入到导电基板中。可以在导电基板和真空室之间施加第一偏置电压＆amp; Vac1，并且可以在源电极和真空室之间施加第二偏压＆Dgr; Vas1，将源材料溅射到导电基板上。

8. 发明申请

US20080014466A1 Glass with scratch-resistant coating 审中-公开
标题翻译：玻璃具有耐刮擦涂层
公开(公告)号：US20080014466A1
公开(公告)日：2008-01-17
申请号：US11485639
申请日：2006-07-11
申请人： Ronghua Wei , Christopher Rincon , James H. Arps , David Kent Hartley , Lance A. Cotton , David E. Hubert , Paul Slovick
发明人： Ronghua Wei , Christopher Rincon , James H. Arps , David Kent Hartley , Lance A. Cotton , David E. Hubert , Paul Slovick
IPC分类号： B32B9/00
CPC分类号： C03C17/22 , C03C21/002 , C03C2217/282 , C03C2218/153 , C03C2218/31
摘要： Glass having a diamond-like carbon (DLC) coating on top of an intermediate bonding layer of tin oxide, and a method for producing same. A glow-discharge method is used to apply the DLC coating. The glass may be chemically strengthened prior to applying the DLC coating.
摘要翻译：在氧化锡的中间结合层的顶部具有类金刚石（DLC）涂层的玻璃及其制造方法。采用辉光放电法应用DLC涂层。玻璃可以在施加DLC涂层之前进行化学强化。

9. 发明申请

US20060159848A1 Method of making wear-resistant components 审中-公开
标题翻译：制造耐磨部件的方法
公开(公告)号：US20060159848A1
公开(公告)日：2006-07-20
申请号：US11039571
申请日：2005-01-20
申请人： Yucong Wang , Ronghua Wei
发明人： Yucong Wang , Ronghua Wei
IPC分类号： C23C16/00 , B05D3/00
CPC分类号： C23C16/26 , C23C16/0227 , C23C16/0272 , F16G5/16
摘要： A process for cleaning and coating CVT bands includes a precleaning step, an argon sputtering step, a bond layer deposition step, and a final layer deposition.
摘要翻译：用于清洁和涂覆CVT带的方法包括预清洗步骤，氩溅射步骤，接合层沉积步骤和最终层沉积。

10. 发明授权

US07073611B2 Ion-beam assisted deposition of inorganic coatings for elastomeric seal wear resistance improvement 失效
标题翻译：离子束辅助沉积无机涂层，用于弹性体密封耐磨性改进
公开(公告)号：US07073611B2
公开(公告)日：2006-07-11
申请号：US10975192
申请日：2004-10-28
申请人： Ping Sui , Ronghua Wei
发明人： Ping Sui , Ronghua Wei
IPC分类号： E21B10/24
CPC分类号： E21B10/25 , C23C14/022 , C23C14/20 , C23C14/221 , C23C14/30 , F16J15/102 , F16J15/108
摘要： Elastomeric seals for use in drill bits on which an inorganic surface modification material has been deposited onto the surface of the elastomeric seals. Wear resistance of the seal at the dynamic surface is improved by providing support for the soft seal surface, by means of the inorganic atoms, against a harder surface.
摘要翻译：用于钻头上的弹性密封件，其上无机表面改性材料已经沉积在弹性体密封件的表面上。通过为较软的表面提供对软密封表面的支撑，通过无机原子提供对动态表面的密封的耐磨性。

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