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    • 3. 发明申请
    • SEMICONDUCTOR DEVICE AND LTPS-TFT WITHIN AND METHOD OF MAKING THE SAME
    • 半导体器件和LTPS-TFT及其制造方法
    • US20090061570A1
    • 2009-03-05
    • US12261816
    • 2008-10-30
    • Kuang-Chao YehWen-Bin Hsu
    • Kuang-Chao YehWen-Bin Hsu
    • H01L21/336
    • H01L29/66757H01L29/4908
    • A thin film transistor (TFT) formed on a substrate includes a polycrystalline film, a gate insulator, a hydrogen-supplying film and a gate electrode. The polycrystalline film is formed on the substrate. Two sides of the polycrystalline film serve as the source and the drain of the semiconductor device, and the central region of the polycrystalline layer serves as the channel. The gate insulator is formed on the polycrystalline film, then the polycrystalline film is ions implanted, and the hydrogen-supplying film is formed on the gate insulator. The gate electrode is formed on the hydrogen-supplying film above the channel. The hydrogen-supplying film supplies hydrogen to the polycrystalline film, especially to the channel, so as to transform the unsaturated bonds into hydrogen bonds in the channel for avoiding the unsaturated bonds to degrade the charge carrier efficiency of the channel.
    • 形成在基板上的薄膜晶体管(TFT)包括多晶膜,栅极绝缘体,供氢膜和栅电极。 在基板上形成多晶膜。 多晶膜的两侧用作半导体器件的源极和漏极,并且多晶层的中心区域用作沟道。 栅极绝缘体形成在多晶膜上,然后多晶膜被注入离子,并且在栅极绝缘体上形成供氢膜。 栅电极形成在通道上方的供氢膜上。 氢供应膜向多晶膜,特别是通道提供氢,以将不饱和键转化为通道中的氢键,以避免不饱和键降低通道的载流子效率。
    • 4. 发明授权
    • Semiconductor device and LTPS-TFT within and method of making the same
    • 半导体器件和LTPS-TFT以及其制造方法
    • US08153495B2
    • 2012-04-10
    • US12261816
    • 2008-10-30
    • Kuang-Chao YehWen-Bin Hsu
    • Kuang-Chao YehWen-Bin Hsu
    • H01L21/331
    • H01L29/66757H01L29/4908
    • A thin film transistor (TFT) formed on a substrate includes a polycrystalline film, a gate insulator, a hydrogen-supplying film and a gate electrode. The polycrystalline film is formed on the substrate. Two sides of the polycrystalline film serve as the source and the drain of the semiconductor device, and the central region of the polycrystalline layer serves as the channel. The gate insulator is formed on the polycrystalline film, then the polycrystalline film is ions implanted, and the hydrogen-supplying film is formed on the gate insulator. The gate electrode is formed on the hydrogen-supplying film above the channel. The hydrogen-supplying film supplies hydrogen to the polycrystalline film, especially to the channel, so as to transform the unsaturated bonds into hydrogen bonds in the channel for avoiding the unsaturated bonds to degrade the charge carrier efficiency of the channel.
    • 形成在基板上的薄膜晶体管(TFT)包括多晶膜,栅极绝缘体,供氢膜和栅电极。 在基板上形成多晶膜。 多晶膜的两侧用作半导体器件的源极和漏极,并且多晶层的中心区域用作沟道。 栅极绝缘体形成在多晶膜上,然后多晶膜被注入离子,并且在栅极绝缘体上形成供氢膜。 栅电极形成在通道上方的供氢膜上。 氢供应膜向多晶膜,特别是通道提供氢,以将不饱和键转化为通道中的氢键,以避免不饱和键降低通道的载流子效率。
    • 6. 发明授权
    • Stacked capacitor having parallel interdigitized structure for use in thin film transistor liquid crystal display
    • 具有平行叉指结构的叠层电容器用于薄膜晶体管液晶显示器
    • US07112820B2
    • 2006-09-26
    • US10605015
    • 2003-09-01
    • Chih-Chin ChangKuang-Chao Yeh
    • Chih-Chin ChangKuang-Chao Yeh
    • G02F1/136
    • G02F1/136213H01L27/12
    • A capacitor structure includes a first conductive layer, a first insulating layer disposed on a substrate in sequence, a second conductive layer disposed on portions of the first insulating layer, a second insulating layer disposed on the second conductive layer and the first insulating layer, a third conductive layer disposed on portions of the second insulating layer, a third insulating layer disposed on the third conductive layer and the second insulating layer, and a fourth conductive layer disposed on the third insulating layer. The third conductive layer and the fourth conductive layer are electrically connected to the first conductive layer and the second conductive layer through at least one first contact hole adjacent to the second conductive layer and at least one second contact hole, respectively.
    • 电容器结构包括第一导电层,依次设置在基板上的第一绝缘层,设置在第一绝缘层的部分上的第二导电层,设置在第二导电层和第一绝缘层上的第二绝缘层, 设置在第二绝缘层的部分上的第三导电层,设置在第三导电层和第二绝缘层上的第三绝缘层,以及设置在第三绝缘层上的第四导电层。 第三导电层和第四导电层通过分别与第二导电层相邻的至少一个第一接触孔和至少一个第二接触孔电连接到第一导电层和第二导电层。
    • 7. 发明申请
    • Semiconductor device and LTPS-TFT within and method of making the same
    • 半导体器件和LTPS-TFT以及其制造方法
    • US20060006387A1
    • 2006-01-12
    • US11120966
    • 2005-05-04
    • Kuang-Chao YehWen-Bin Hsu
    • Kuang-Chao YehWen-Bin Hsu
    • H01L29/10
    • H01L29/66757H01L29/4908
    • A thin film transistor (TFT) formed on a substrate includes a polycrystalline film, a gate insulator, a hydrogen-supplying film and a gate electrode. The polycrystalline film is formed on the substrate. Two sides of the polycrystalline film serve as the source and the drain of the semiconductor device, and the central region of the polycrystalline layer serves as the channel. The gate insulator is formed on the polycrystalline film, and the hydrogen-supplying film is formed on the gate insulator. The gate electrode is formed on the hydrogen-supplying film above the channel. The hydrogen-supplying film supplies hydrogen to the polycrystalline film, especially to the channel, so as to transform the unsaturated bonds into hydrogen bonds in the channel for avoiding the unsaturated bonds to degrade the charge carrier efficiency of the channel.
    • 形成在基板上的薄膜晶体管(TFT)包括多晶膜,栅极绝缘体,供氢膜和栅电极。 在基板上形成多晶膜。 多晶膜的两侧用作半导体器件的源极和漏极,并且多晶层的中心区域用作沟道。 栅极绝缘体形成在多晶膜上,并且在栅极绝缘体上形成供氢膜。 栅电极形成在通道上方的供氢膜上。 氢供应膜向多晶膜,特别是通道提供氢,以将不饱和键转化为通道中的氢键,以避免不饱和键降低通道的载流子效率。