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    • 1. 发明授权
    • Light-emitting element
    • 发光元件
    • US08247823B2
    • 2012-08-21
    • US12923384
    • 2010-09-17
    • Kosuke YahataNaoki NakajoMasao Kamiya
    • Kosuke YahataNaoki NakajoMasao Kamiya
    • H01L27/15H01L27/148H01L21/00
    • H01L33/382H01L33/46H01L2924/0002H01L2924/00
    • A light-emitting element includes a semiconductor laminated structure including a first semiconductor layer, a light-emitting layer and a second semiconductor layer, an insulation layer provided on the semiconductor laminated structure, a first wiring including a first vertical conducting portion and a first planar conducting portion and being electrically connected to the first semiconductor layer, the first vertical conducting portion extending inside the insulation layer, the light-emitting layer and the second semiconductor layer in a vertical direction and the first planar conducting portion extending inside the insulation layer in a planar direction, and a second wiring including a second vertical conducting portion and a second planar conducting portion and being electrically connected to the second semiconductor layer, the second vertical conducting portion extending inside the insulation layer in a vertical direction and the second planar conducting portion extending inside the insulation layer in a planar direction.
    • 发光元件包括:半导体层叠结构,包括第一半导体层,发光层和第二半导体层,设置在半导体层叠结构上的绝缘层,第一布线,包括第一垂直导电部分和第一平面 导电部分并且电连接到第一半导体层,第一垂直导电部分在垂直方向上在绝缘层,发光层和第二半导体层的内部延伸,并且第一平面导电部分在绝缘层内部延伸 平面方向,第二布线包括第二垂直导电部分和第二平面导电部分,并且电连接到第二半导体层,第二垂直导电部分在垂直方向上延伸在绝缘层内部,第二平面导电部分延伸 里面 e绝缘层在平面方向上。
    • 2. 发明申请
    • Light-emitting element
    • 发光元件
    • US20110068359A1
    • 2011-03-24
    • US12923384
    • 2010-09-17
    • Kosuke YahataNaoki NakajoMasao Kamiya
    • Kosuke YahataNaoki NakajoMasao Kamiya
    • H01L33/60
    • H01L33/382H01L33/46H01L2924/0002H01L2924/00
    • A light-emitting element includes a semiconductor laminated structure including a first semiconductor layer, a light-emitting layer and a second semiconductor layer, an insulation layer provided on the semiconductor laminated structure, a first wiring including a first vertical conducting portion and a first planar conducting portion and being electrically connected to the first semiconductor layer, the first vertical conducting portion extending inside the insulation layer, the light-emitting layer and the second semiconductor layer in a vertical direction and the first planar conducting portion extending inside the insulation layer in a planar direction, and a second wiring including a second vertical conducting portion and a second planar conducting portion and being electrically connected to the second semiconductor layer, the second vertical conducting portion extending inside the insulation layer in a vertical direction and the second planar conducting portion extending inside the insulation layer in a planar direction.
    • 发光元件包括:半导体层叠结构,包括第一半导体层,发光层和第二半导体层,设置在半导体层叠结构上的绝缘层,第一布线,包括第一垂直导电部分和第一平面 导电部分并且电连接到第一半导体层,第一垂直导电部分在垂直方向上在绝缘层,发光层和第二半导体层的内部延伸,并且第一平面导电部分在绝缘层内部延伸 平面方向,第二布线包括第二垂直导电部分和第二平面导电部分,并且电连接到第二半导体层,第二垂直导电部分在垂直方向上延伸在绝缘层内部,第二平面导电部分延伸 里面 e绝缘层在平面方向上。
    • 5. 发明授权
    • Group III nitride semiconductor light-emitting device
    • III族氮化物半导体发光器件
    • US08653502B2
    • 2014-02-18
    • US13433195
    • 2012-03-28
    • Kosuke YahataNaoki NakajoKoichi GoshonooYuya Ishiguro
    • Kosuke YahataNaoki NakajoKoichi GoshonooYuya Ishiguro
    • H01L29/06H01L31/00
    • H01L33/20H01L33/42H01L33/46H01L2933/0083
    • The present invention provides a Group III nitride semiconductor light-emitting device exhibiting high-intensity light output in a specific direction and improved light extraction performance. The Group III nitride semiconductor light-emitting device comprises a sapphire substrate, and a layered structure having a light-emitting layer provided on the sapphire substrate and formed of a Group III nitride semiconductor. On the surface on the layered structure side of the sapphire substrate, a two-dimensional periodic structure of mesas is formed with a period which generates a light intensity interference pattern for the light emitted from the light-emitting layer. The light reflected by or transmitted through the two-dimensional periodic structure has an interference pattern. Therefore, the light focused on a region where the light intensity is high in the interference pattern can be effectively output to the outside, resulting in the improvement of light extraction performance as well as the achievement of desired directional characteristics.
    • 本发明提供了在特定方向上显示高强度光输出并且提高光提取性能的III族氮化物半导体发光器件。 III族氮化物半导体发光器件包括蓝宝石衬底和具有设置在蓝宝石衬底上并由III族氮化物半导体形成的发光层的层状结构。 在蓝宝石衬底的层状结构侧的表面上,以从发光层发出的光产生光强度干涉图案的周期形成台面的二维周期结构。 由二维周期结构反射或透射的光具有干涉图案。 因此,聚焦在干涉图案中的光强度高的区域的光可以有效地输出到外部,导致光提取性能的提高以及实现期望的方向特性。
    • 7. 发明申请
    • GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE
    • III类氮化物半导体发光器件
    • US20120248406A1
    • 2012-10-04
    • US13433195
    • 2012-03-28
    • Kosuke YahataNaoki NakajoKoichi GoshonooYuya Ishiguro
    • Kosuke YahataNaoki NakajoKoichi GoshonooYuya Ishiguro
    • H01L33/06
    • H01L33/20H01L33/42H01L33/46H01L2933/0083
    • The present invention provides a Group III nitride semiconductor light-emitting device exhibiting high-intensity light output in a specific direction and improved light extraction performance. The Group III nitride semiconductor light-emitting device comprises a sapphire substrate, and a layered structure having a light-emitting layer provided on the sapphire substrate and formed of a Group III nitride semiconductor. On the surface on the layered structure side of the sapphire substrate, a two-dimensional periodic structure of mesas is formed with a period which generates a light intensity interference pattern for the light emitted from the light-emitting layer. The light reflected by or transmitted through the two-dimensional periodic structure has an interference pattern. Therefore, the light focused on a region where the light intensity is high in the interference pattern can be effectively output to the outside, resulting in the improvement of light extraction performance as well as the achievement of desired directional characteristics.
    • 本发明提供了在特定方向上显示高强度光输出并且提高光提取性能的III族氮化物半导体发光器件。 III族氮化物半导体发光器件包括蓝宝石衬底和具有设置在蓝宝石衬底上并由III族氮化物半导体形成的发光层的层状结构。 在蓝宝石衬底的层状结构侧的表面上,以从发光层发出的光产生光强度干涉图案的周期形成台面的二维周期结构。 由二维周期结构反射或透射的光具有干涉图案。 因此,聚焦在干涉图案中的光强度高的区域的光可以有效地输出到外部,导致光提取性能的提高以及实现期望的方向特性。
    • 9. 发明授权
    • Method for manufacturing semiconductor light-emitting device
    • 半导体发光元件的制造方法
    • US08936950B2
    • 2015-01-20
    • US13636392
    • 2011-03-14
    • Naoki NakajoMasao KamiyaAkihiro Honma
    • Naoki NakajoMasao KamiyaAkihiro Honma
    • H01L21/00H01L33/42H01L33/44H01L33/46H01L33/00
    • H01L33/42H01L33/0095H01L33/44H01L33/46H01L2924/0002H01L2924/00
    • To improve light emission efficiency and reliability.A transparent conductive film 10 is formed on an entire top surface of a second semiconductor layer 108, and a photo-resist is applied thereon. When removing the photo-resist on the upper surface corresponding to an electrode forming part 16 of a first semiconductor layer 104, the photo-resist is removed to be gradually thinned at a boundary of a portion to be removed. The transparent conductive film is wet etched using the remaining photo-resist as a mask to expose a part of the second semiconductor layer. Dry etching is performed using the remaining photo-resist and the transparent conductive film as a mask to expose the electrode forming part of the first semiconductor layer. A portion of the transparent conductive film exposed in the dry etching using the remaining photo-resist as a mask is wet etched. The remaining photo-resist is eliminated.
    • 提高发光效率和可靠性。 在第二半导体层108的整个顶表面上形成透明导电膜10,并且在其上施加光刻胶。 当去除与第一半导体层104的电极形成部分16对应的上表面上的光致抗蚀剂时,除去光致抗蚀剂以在要去除的部分的边界处逐渐变薄。 使用剩余的光致抗蚀剂作为掩模对透明导电膜进行湿式蚀刻,以暴露第二半导体层的一部分。 使用剩余的光致抗蚀剂和透明导电膜作为掩模进行干法蚀刻,以暴露形成第一半导体层的一部分的电极。 在使用剩余光刻胶作为掩模的干蚀刻中曝光的透明导电膜的一部分被湿式蚀刻。 剩下的光刻胶被消除。
    • 10. 发明授权
    • Group III nitride compound semiconductor light-emitting device and method for producing the same
    • III族氮化物化合物半导体发光器件及其制造方法
    • US07244957B2
    • 2007-07-17
    • US11063747
    • 2005-02-24
    • Naoki NakajoMasao KamiyaTetsuya Taki
    • Naoki NakajoMasao KamiyaTetsuya Taki
    • H01L29/06H01L21/00
    • H01L33/42H01L33/20H01L33/32
    • In a Group III nitride compound semiconductor light-emitting device which outputs lights from a semiconductor plane, about 1.5 μm in height of a Group III nitride compound semiconductor projection part 150, which is made of Mg-doped p-type GaN having Mg doping concentration of 8×1019/cm3 and is formed through selective growth, is formed on a p-type contact layer (second p-layer) 108. And a light-transparency electrode 110 is formed thereon through metal deposition. The Group III nitride compound semiconductor projection part 150 makes a rugged surface for outputting lights and actual critical angle is widened, which enables to improve luminous outputting efficiency. And because etching is not employed to form the ruggedness, driving voltage does not increase.
    • 在从具有Mg掺杂的Mg掺杂的p型GaN制成的III族氮化物化合物半导体投影部150的半导体平面的高度为1.5μm的III族氮化物化合物半导体发光装置中, 8×10 9 / cm 3,并且通过选择性生长形成,形成在p型接触层(第二p层)108上。 并且通过金属沉积在其上形成透光性电极110。 III族氮化物化合物半导体投影部150形成用于输出光的坚固的表面,并且实际临界角被加宽,这能够提高发光效率。 并且由于不采用蚀刻来形成耐磨性,所以驱动电压不增加。