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    • 4. 发明授权
    • CPP type magneto-resistive effect device having a semiconductor oxide spacer layer and magnetic disk system
    • 具有半导体氧化物间隔层和磁盘系统的CPP型磁阻效应器件
    • US07672085B2
    • 2010-03-02
    • US11626562
    • 2007-01-24
    • Shinji HaraKei HirataKoji ShimazawaYoshihiro TsuchiyaTomohito Mizuno
    • Shinji HaraKei HirataKoji ShimazawaYoshihiro TsuchiyaTomohito Mizuno
    • G11B5/39
    • G11B5/4826B82Y10/00B82Y25/00G11B5/3906G11B2005/3996
    • The invention provides a giant magneto-resistive effect device (CPP-GMR device) having a CPP (current perpendicular to plane) structure comprising a spacer layer, and a fixed magnetized layer and a free layer stacked one upon another with said spacer layer interleaved between them, with a sense current applied in a stacking direction, wherein the spacer layer comprises a first and a second nonmagnetic metal layer, each formed of a nonmagnetic metal material, and a semiconductor oxide layer interleaved between the first and the second nonmagnetic metal layer, wherein the semiconductor oxide layer that forms a part of the spacer layer is made of indium oxide (In2O3), or the semiconductor oxide layer contains indium oxide (In2O3) as its main component, and an oxide containing a tetravalent cation of SnO2 is contained in the indium oxide that is the main component. The semiconductor oxide layer that forms a part of the spacer layer can thus be made thick while the device has a low area resistivity as desired, ensuring much more favorable advantages: ever higher MR performance, prevention of device area resistivity variations, and much improved reliability of film characteristics.
    • 本发明提供一种具有CPP(垂直于平面的电流)结构的巨磁阻效应器件(CPP-GMR器件),其包括间隔层,以及固定磁化层和自由层,所述固定磁化层和自由层彼此层叠, 它们具有沿层叠方向施加的感测电流,其中间隔层包括由非磁性金属材料形成的第一和第二非磁性金属层和交错在第一和第二非磁性金属层之间的半导体氧化物层, 其中形成间隔层的一部分的半导体氧化物层由氧化铟(In 2 O 3)制成,或者半导体氧化物层包含氧化铟(In 2 O 3)作为其主要成分,并且包含含有SnO 4的四价阳离子的氧化物 作为主要成分的氧化铟。 因此,形成间隔层的一部分的半导体氧化物层可以制成厚度,同时器件根据需要具有低的面积电阻率,确保更有利的优点:越来越高的MR性能,防止器件面积电阻率变化和大大提高的可靠性 的电影特色。
    • 6. 发明申请
    • MAGNETO-RESISTIVE EFFECT DEVICE, THIN-FILM MAGNETIC HEAD, HEAD GIMBAL ASSEMBLY, AND HARD DISK SYSTEM
    • 磁阻效应器件,薄膜磁头,头盖组件和硬盘系统
    • US20080100968A1
    • 2008-05-01
    • US11870097
    • 2007-10-10
    • Koji SHIMAZAWAYoshihiro TsuchiyaTomohito MizunoKei Hirata
    • Koji SHIMAZAWAYoshihiro TsuchiyaTomohito MizunoKei Hirata
    • G11B5/33
    • G11B5/3909B82Y10/00B82Y25/00B82Y40/00G01R33/093G11B5/3906G11B2005/3996H01F10/3272H01F41/305Y10T29/49044Y10T29/49048
    • The invention provides a giant magneto-resistive effect device (CPP-GMR device) having a CPP (current perpendicular to plane) structure comprising a spacer layer, and a fixed magnetization layer and a free layer stacked one upon another with the spacer layer interposed between them, with a sense current applied in a stacking direction. The free layer functions such that the direction of magnetization changes depending on an external magnetic field. The spacer layer comprises a first nonmagnetic metal layer and a second nonmagnetic metal layer, each made of a nonmagnetic metal material, and a semiconductor layer formed between the first and the second nonmagnetic metal layer. The semiconductor layer is an n-type oxide semiconductor. When the first and second nonmagnetic metal layers are formed in order, the first nonmagnetic metal layer is formed prior to the second nonmagnetic metal layer, and an anti-oxidizing layer is formed between the first and the semiconductor layer. The anti-oxidizing layer is formed of a material incapable of producing a Schottky barrier upon joining to the semiconductor layer. It is thus possible to achieve very favorable advantages of obtaining high MR performance without increasing the head noise, and holding back variations of device's area resistivity (AR), thereby making much more improvements in the reliability of film characteristics.
    • 本发明提供了一种具有CPP(垂直于平面的电流)结构的巨磁阻效应器件(CPP-GMR器件),该结构包括间隔层,以及固定磁化层和自由层,间隔层介于 它们具有沿堆叠方向施加的感测电流。 自由层起着使得磁化方向取决于外部磁场的作用。 间隔层包括由非磁性金属材料制成的第一非磁性金属层和第二非磁性金属层,以及形成在第一和第二非磁性金属层之间的半导体层。 半导体层是n型氧化物半导体。 当依次形成第一和第二非磁性金属层时,在第二非磁性金属层之前形成第一非磁性金属层,并且在第一和半导体层之间形成抗氧化层。 抗氧化层由与半导体层接合时不能产生肖特基势垒的材料形成。 因此,可以获得非常有利的优点,即不增加磁头噪声,并且抑制器件面积电阻率(AR)的变化,从而在膜特性的可靠性方面进一步提高,从而获得高MR性能。